Edge connect wafer level stacking
29 claims: 20 independent, 9 dependent
- 1第1のウエハの鋸レーンを第2のウエハの対応する鋸レーンに位置合わせすることによって、要素を形成するステップであって、 第1のウエハの 第1の 鋸 レーン を第2のウエハの 対応する第1の 鋸 レーン に、一方のウエハの前記 第1の 鋸 レーン が他方のウエハの前記 第1の 鋸 レーン の上方に位置するように、位置合わせする ことを含み、 前記第1および第2のウエハの各々は、 前記各ウエハの前記第1の 鋸 レーン において 隣接している 複数の超小型電子素子を備え、各超小型電子素子が、前記 第1の 鋸 レーン に向かって延在する複数のトレースを有している、ステップと、 前記第1のウエハの前記 第1の 鋸 レーン および前記第2のウエハの前記 第1の 鋸 レーン に位置合わせされた複数の開口を 前記第1および第2のウエハ に形成するステップであって、各開口は、 前記 超小型電子素子の いずれか1つ の単一トレース のみ を露出させ、 これによって、前記第1の鋸レーンに位置合わせされた前記複数の開口に複数のトレースを露出させる 、ステップと、 前記露出した複数のトレースの少なくともいくつかに、リードを電気的に接続させるステップと を含むことを特徴とする、積層パッケージを製造する方法。
- 2前記第1および第2の鋸レーンの各々は、第1の方向に延在する長さを有し、前記複数の開口の内の互いに隣接する開口は、前記第1の方向において離間され、互いに絶縁されることを特徴とする請求項1に記載の方法 。
- 3前記開口の少なくともいくつか の各々 は、前記第1のウエハの 前記いずれか1つの 超小型電子素子の単一トレース のみ および前記第2のウエハの 前記いずれか1つの 超小型電子素子の単一トレース のみ を露出させることを特徴とする請求項1に記載の方法。
- 4前記リードは、前記第1および第2のウエハの1つの面の上に位置する第1の端を備えていることを特徴とする請求項1に記載の方法。
- 5前記リードの前記第1の端は、導電バンプを備えていることを特徴とする請求項4に記載の方法。
- 6前記第1のウエハおよび前記第2のウエハを前記鋸レーンに沿って複数のアセンブリに分断するステップをさらに含み、各アセンブリは、複数の積層超小型電子素子および露出したリードを備えていることを特徴とする請求項1に記載の方法。
- 7前記リードを電気的に接続する前記ステップは、前記複数の開口内の前記露出したトレースと接触する導体を形成することを含み、各アセンブリの前記導体は、前記第1の鋸レーンに沿って、前記リードが前記導体の分断された部分を備えるように、分断されることを特徴とする請求項6に記載の方法。
- 8前記導体を形成することは、前記開口内に導体材料を堆積させることを含むことを特徴とする請求項7に記載の方法。
- 9前記導体を形成することは、前記開口を金属によって充填させることを含むことを特徴とする請求項7に記載の方法。
- 10前記鋸レーンにおいて互いに接続された複数の付加的な超小型電子素子を備える少なくとも1つの付加的なウエハの前記鋸レーンを前記第1および第2のウエハの前記鋸レーンに位置合わせするステップであって、前記複数の超小型電子素子は、前記鋸レーンに向かって延在する付加的なトレースを有している、位置合わせするステップをさらに含み、前記開口を形成するステップ中に、前記付加的な超小型電子素子の少なくとも1つの前記付加的なトレースの内の単一トレースが露出することを特徴とする請求項1に記載の方法。
- 11第1の積層サブアセンブリおよび前記第1の積層サブアセンブリの一部の上に位置する第2の積層サブアセンブリであって、各積層サブアセンブリは、面を有する少なくとも第1の超小型電子素子および前記第1の超小型電子素子の面の上に平行に延在する面を有する第2の超小型電子素子を備え、前記第1および第2の超小型電子素子の各々は、前記各面から離れる方に延在するエッジを有すると共に、前記各面において、少なくとも1つの前記エッジの近くに延在する複数のトレースを有し、前記第1および第2の積層サブアセンブリの各々は、前記複数のトレースの少なくともいくつかに接続された接点を備えている、第1の積層サブアセンブリおよび第2の積層サブアセンブリと、 前記第1の積層サブアセンブリの前記接点を前記第2の積層サブアセンブリの前記接点に導電接続するボンドワイヤと を備えていることを特徴とする積層超小型電子アセンブリ。
- 12前記第1および第2のサブアセンブリの各々は、面を有し、前記複数の接点の少なくともいくつかは、前記第1および第2のサブアセンブリの前記面の少なくとも1つに露出していることを特徴とする請求項 11 に記載の積層超小型電子アセンブリ。
- 13前記第1および第2の積層サブアセンブリの各々は、面および前記面から離れる方に延在するエッジを有し、前記第1の積層サブアセンブリの前記面は、前記第1の積層サブアセンブリの前記面の前記接点が前記第2の積層サブアセンブリの前記面を超えて延在するように、前記第2の積層サブアセンブリの前記面を超えて延在していることを特徴とする請求項 11 に記載の積層超小型電子アセンブリ。
- 14第1のサブアセンブリおよび前記第1のサブアセンブリの下に位置する第2のサブアセンブリを含む複数のサブアセンブリを備えている積層超小型電子パッケージであって、 各サブアセンブリは、前面および前記前面から離れた後面を有し、前記第2のサブアセンブリの前記前面は、前記第1のサブアセンブリの後面と向き合い、前記第1および第2のサブアセンブリの各々は、前記前面に露出している複数の前接点、 前記前面および前記後面との間に延在する 少なくとも1つのエッジ 面 、および前記少なくとも1つのエッジ 面 の近くに延在する複数の前トレースを備え、前記第2のサブアセンブリは、前記後面に露出している複数の後接点、および前記少なくとも1つのエッジ 面 の近くの前記後接点から前記第1または第2のサブアセンブリの少なくとも1つの前記複数の前接点の少なくともいくつかに延在する複数の後トレースを有し 、前記第1のサブアセンブリのエッジ面および前記第2のサブアセンブリのエッジ面は、前記積層超小型パッケージの側壁を画定する共平面であ ることを特徴とする積層超小型電子パッケージ。
- 15前記複数のサブアセンブリの各々は、少なくとも1つの超小型電子チップを備えていることを特徴とする請求項 14 に記載の積層超小型電子パッケージ。
- 16請求項 15 に記載の積層超小型電子パッケージを備えるアセンブリであって、少なくともいくつかのパッケージ接点に導電接続される端子を有する回路パネルをさらに備え、前記パッケージ接点は、前記第2のサブアセンブリの前記後接点および前記複数のサブアセンブリの1つの前記前接点からなる群から選択されることを特徴とするアセンブリ。
- 17付加的な超小型電子チップをさらに備え、前記付加的な超小型電子チップは、前記付加的な超小型電子チップの面が前記第1および第2のサブアセンブリの1つの面と向き合って、前記積層超小型パッケージに接合されていることを特徴とする請求項 16 に記載のアセンブリ。
- 18前記付加的な超小型電子チップの接点は、前記1つのサブアセンブリの前記前接点にワイヤボンドによって接合されていることを特徴とする請求項 17 に記載のアセンブリ。
- 19前記付加的な超小型電子チップの前記接点を前記1つのサブアセンブリの前記前接点に接合する導電塊をさらに備えていることを特徴とする請求項 17 に記載のアセンブリ。
- 20前記付加的な超小型電子チップは、マイクロコントローラを含んでいることを特徴とする請求項 17 に記載のアセンブリ。
- 21前記複数のサブアセンブリ内の前記超小型電子チップの少なくとも1つは、前記少なくとも1つの超小型電子チップを前記1つのサブアセンブリの前記前接点の1つから遮断し、前記付加的な超小型電子チップを前記前接点の一つに接続することによって、前記付加的な超小型電子チップと置き換え可能であることを特徴とする請求項 17 に記載のアセンブリ。
- 22ボンドワイヤをさらに備え、前記ボンドワイヤは、前記1つのサブアセンブリの前記前接点を前記回路パネルの前記端子に導電接続するようになっていることを特徴とする請求項 17 に記載のアセンブリ。
- 23前記付加的な超小型電子チップの前記接点を前記1つのサブアセンブリの前記前接点に接合する導体塊をさらに備えていることを特徴とする請求項 22 に記載のアセンブリ。
- 24ボンドワイヤをさらに備え、前記ボンドワイヤは、前記付加的な超小型電子チップの接点を前記回路パネルの前記端子に導電接続するようになっていることを特徴とする請求項 17 に記載のアセンブリ。
- 25前記回路パネルの前記端子を前記1つのサブアセンブリの前記露出している前接点に接合する導体塊をさらに備えていることを特徴とする請求項 16 に記載のアセンブリ。
- 26前記第2のサブアセンブリの前記後面に接合された付加的な超小型電子チップをさらに備え、前記付加的な超小型電子チップは、前記回路パネルの端子に導電接続される接点を有していることを特徴とする請求項 25 に記載のアセンブリ。
- 27ボンドワイヤをさらに備え、前記ボンドワイヤは、付加的な超小型電子チップの前記接点を前記回路パネルの前記端子に接合するようになっていることを特徴とする請求項 26 に記載のアセンブリ。
- 28前記回路パネルの前記端子を第2のサブアセンブリの後接点に接合する導体塊をさらに備えていることを特徴とする請求項 16 に記載のアセンブリ。
- 29前記1つのサブアセンブリの前記前接点と導通する接点を有する付加的な超小型電子チップをさらに備えていることを特徴とする請求項 28 に記載のアセンブリ。
Independent claims29
103 paragraphs, as filed
[Cross-reference of related applications] This international application is filed on April 13, 2007, US Patent Application No. 11 / 787,209, February 9, 2007, US Patent Application No. 11 / 704,713, and October 10, 2006. It claims the priority of US Provisional Patent Application No. 60 / 850,850 filed in. The U.S. Patent Application No. 11 / 787,209 filed on April 13, 2007 is a partial continuation of U.S. Patent Application No. 11 / 704,713 filed on February 9, 2007. Application No. 11 / 704,713 claims a gain on the filing date of US Provisional Patent Application No. 60 / 850,850 filed on October 10, 2006. By quoting the disclosure content of the application, it shall form part of this specification.
[Field of invention] The present invention generally relates to laminated microelectronic packages, such as laminated microelectronic packages manufactured at the wafer level, and methods of manufacturing such packages.
A semiconductor chip is a flat body in which contacts connected to an electric circuit inside the chip are arranged on the front surface. Semiconductor chips are typically packaged with a substrate, thereby forming an ultra-compact electronic package with terminals electrically connected to the contacts of the chip. The package may then be connected to test equipment to determine if the packaged device meets the desired performance standard. At the time of testing, this package can be connected to larger circuits, such as circuits of electronic products such as computers or mobile phones.
The substrate materials used to package the semiconductor chips have been selected to maintain compatibility with the processes used to form the packaging. For example, high heat may be applied to the substrate during the joining operation by solder or other means. From this point, a metal lead frame has been used as a substrate. Laminated substrates have also been used to package ultra-small electronic components. Such a substrate may include two to four layers of alternating glass fiber and epoxy layers. In this case, it is preferable that the series of glass fiber layers are arranged in a direction intersecting each other, for example, in a direction orthogonal to each other. Optionally, a heat resistant compound such as bismaleimide triazine (BT) may be added to such a laminated substrate.
Tapes have been used as substrates to provide thinner ultra-compact electronic packages. Such tapes are typically supplied in the form of sheets or roll-wound sheets. For example, copper-on-polyimide single-sided or double-sided sheets are commonly used. The polyimide-based film provides good thermal / chemical stability and low permittivity, and copper has high tensile strength, high flexibility, and high bendability, so this tape is suitable for flexible circuit applications and chip scale packages. It is used advantageously for all purposes. However, such tapes are relatively expensive, especially compared to lead frames and laminated substrates.
Wafer level packages are also examples of ultra-small electronic packages. Wafer level packaging packages semiconductor components that are manufactured while the die is in wafer form. To form the package structure, the wafer is subjected to many additional process steps, which in turn result in the wafer being diced and fragmented into individual dies. Wafer level processing offers the benefit of cost savings. In addition, the footprint of the package can be made the same as the die size, so that the area of the printed circuit board (PCB) on which the die is finally mounted can be utilized very efficiently. As a result of these features, dies packaged in this way are commonly referred to as wafer level chip scale packages (WLCSP).
To save space, some traditional designs include a large number of stacked microelectronic chips in the package. This allows the package to occupy a surface area of the substrate that is less than the total surface area of the chips in the laminate. However, traditional laminated packages have drawbacks related to complexity, cost, thickness, and testability.
<p> Despite the above developments, there is a need for improved wafer scale packages, especially laminated wafer scale packages that are more reliable, thinner, more testable and can be economically manufactured.</p>
<p> According to the embodiments of the present invention described herein, forming a laminated microelectronic package suitable for wafer level processing for producing low cost, compact, lightweight, and high electrical performance integrated circuits. Many methods are provided for manufacturing laminated circuit elements, including.</p><p> According to one aspect of the present invention, there is provided a method of manufacturing an integrated circuit element. In such a method, a first subassembly with a plurality of microelectronic components is laminated on a second subassembly with a plurality of microelectronic elements, and the microelectronic components extend to their edges. To have a trace (wiring), then to form a partial notch in the microelectronic assembly to expose the trace, and then to bring electrical contacts to the flat surface of the assembly. By forming leads on the side walls, ultra-small electronic assemblies are formed. According to a preferred embodiment of the invention, the assembly will subsequently be diced to form individual electronic components. The notch-forming step is only partially cut into at least one subassembly, which allows wafer-level processing of the device to continue.</p><p> According to a particular aspect of the invention, the laminated assembly includes a substrate to provide additional mechanical integrity to the assembly both during and after processing. The substrate may have relief cavities that reduce stress concentration during the notch forming process. It has been found that in the absence of such cavities, the substrate tends to crack during the notch forming process.</p><p> According to a particular aspect of the invention, an adhesive is used to laminate the various layers of the microelectronic subassembly. Due to the laminating method used, the traces of each subassembly are supported and held by the adhesive in the layer immediately below, which will prevent damage.</p><p> In one embodiment of the invention, each layer is formed with an initial notch to expose the trace, and then during the laminating process, the initial notch is filled with an adhesive and this notch forming and filling pattern is It is repeated for each subassembly layer. Thus, after the initial notch formation that personalizes the microelectronic components, the notch formation that completely penetrates the adhesive layer and the trace that was mechanically supported and insulated by the adhesive during the initial notch formation process. Will be done.</p><p> The initial notch forming process may be performed by non-mechanical means such as etching in order to maintain its mechanical integrity without compromising the trace.</p><p> According to a particular aspect of the invention, a laminated micropackage with four subassembly layers and a substrate layer can have a total package thickness of 155 μm or less, which thickness reduces the thickness of the substrate. Therefore, the laminated thickness can be reduced to 125 μm or less.</p><p> The laminated electronic packages may have traces formed on both the top and bottom surfaces so that the laminated packages can be further laminated. This is because, in this case, the contacts of the upper layer and the lower layer of the package can be arranged in a straight line.</p><p> The method for manufacturing a laminated ultra-small electronic package is as follows: (a) A first subassembly including a plurality of ultra-small electronic components is laminated on a substrate, and a second sub-assembly including a plurality of ultra-small electronic components is first. At least some of the plurality of microelectronic components of the first and second subassemblies are each of the microelectronic components, which is a step of forming a microelectronic assembly by stacking on the subassemblies of. A step that has traces that extend to the edges, and (b) a step that forms a notch in the microelectronic assembly to expose at least some traces of multiple microelectronic components, and (c). ) A step of forming a lead on the side wall of a notch, wherein the lead may include a step that is electrically conductive with at least some of the traces. In yet another aspect of this embodiment, the notch forming step forms an initial notch to expose the trace to at least the first subassembly and glues the initial notch to cover the trace. Fill with adhesive and fill at least the second subassembly with an initial notch to expose the trace and to cover the trace with adhesive and at least some of the microelectronic elements It optionally involves forming a notch in the adhesive to expose the traces of the.</p><p> The method of manufacturing an ultra-small electronic subassembly according to an embodiment of the present invention is (a) a first subassembly including a plurality of ultra-small electronic components, and traces extending to each edge of the ultra-small electronic components. In the first subassembly, which has, the step of forming the initial notch to expose the trace, and (b) the step of filling the initial notch with adhesive to cover the trace, and (c). ) It may include the step of forming a notch in the adhesive to expose at least some traces of multiple microelectronic components.</p><p> According to a particular aspect of the invention, a laminated microelectronic package comprises four stacked subassemblies and substrates, each subassembly comprising at least one microelectronic chip, the package comprising. It can be configured to have a laminated thickness of 155 μm or less. Such a substrate-free package can have a stacking thickness of 125 μ or less.</p><p> According to a particular aspect of the invention, it is a method of manufacturing a laminated microelectronic package by (a) laminating a first subassembly comprising a plurality of microelectronic elements on an adhesive layer of a substrate. At least some of the plurality of microelectronic components in the first subassembly have traces that extend to each edge of the microelectronic components, which is the step of forming the microelectronic components. Steps and (b) An initial notch is formed in the first subassembly to expose the trace, and an adhesive layer is placed on the first subassembly to fill the initial notch with adhesive and cover the trace. A coating step and (c) a step of stacking a second subassembly with a plurality of microelectronic components on an adhesive layer of the first subassembly, wherein the plurality of microelectronics of the first subassembly are laminated. At least some of the components have traces that extend to each edge of the microelectronic component, with steps and (d) forming an initial notch in the second subassembly to expose the traces. To fill the initial notch with adhesive to cover the traces, to form an adhesive layer on the second subassembly, and (e) to expose at least some traces of multiple microelectronic components. A method that may include a step of forming a notch in the adhesive layer and (f) a step of forming a lead on the side wall of the notch, wherein the lead is electrically conductive to at least some of the traces. Is provided.</p><p> In one embodiment of the invention, a method of manufacturing a laminated package is provided. In such a method, the saw lanes of the first wafer may be aligned with the saw lanes of the second wafer so that the saw lanes of one wafer are above the saw lanes of the other wafer. .. Each of the first and second wafers may include a plurality of microelectronic elements connected to each other in a saw lane. Each microelectronic element may also have a plurality of traces extending towards the saw lane. A plurality of openings aligned with the saw lanes of the first and second wafers may be formed. Each aperture exposes a single trace of at least one microelectronic device. The leads will then be electrically connected to at least some of the exposed traces.</p><p> Each aperture may expose a single trace of the microelectronic element on the first wafer. The same aperture may also expose a single trace of the microelectronics on the second wafer. Each aperture may expose a single trace of one or more microelectronic components on the first wafer. The same aperture may also expose a single trace of one or more microelectronic components on the second wafer.</p><p> In one embodiment, the first wafer may be attached to the second wafer after the saw lanes of the two wafers have been aligned.</p><p> In one embodiment, the leads may include a first end located on one surface of the first and second wafers. This first end of the reed may be provided with a conductor bump.</p><p> In one embodiment, the first and second wafers may be split into multiple assemblies along the saw lane. In this case, each assembly will include a plurality of laminated microelectronic components and exposed reeds.</p><p> The saw lanes of at least one additional wafer with a plurality of additional microelectronic components may be connected together in the saw lanes of the first and second wafers.</p><p> These plurality of microelectronic elements may have additional traces extending towards the saw lane. A single trace of at least one additional trace of the additional microelectronic component may be exposed during the step of forming the aperture.</p><p> According to one aspect of the invention, there is provided a laminated microelectronic assembly with a first laminated subassembly and a second laminated subassembly located above a portion of the first laminated subassembly. Each laminated subassembly may include a first microelectronic element with a face. It is preferable that the second ultra-small electronic element having a surface is located parallel to the surface of the first ultra-small electronic element. Each of the first and second microelectronic elements may have an edge extending away from each surface. Multiple traces on each face should extend near at least one edge. Each of the first and second laminated subassemblies may have contacts connected to at least some of the multiple traces. The bond wire may be such that the contacts of the first laminated subassembly are conductively connected to the contacts of the second laminated subassembly.</p><p> In one embodiment, each of the first and second subassemblies may have faces. At least some of the contacts should be exposed on at least one of these faces of the first and second subassemblies.</p><p> Each of the first and second laminated subassemblies may have a face and an edge extending away from the face. The surface of the first laminated subassembly extends beyond the surface of the second laminated subassembly so that the contacts of the surface of the first laminated subassembly are exposed beyond the surface of the second laminated subassembly. It is good to do it.</p><p> According to one aspect of the invention, there is provided a laminated microelectronic package that may include a plurality of subassemblies, eg, a first subassembly and a second subassembly located beneath the first subassembly. .. Each subassembly may have a front surface and a rear surface away from the front surface. The front of the second subassembly should face the back of the first subassembly. Each of the first and second subassemblies may have a plurality of front contacts exposed in the anterior surface, at least one edge, and a plurality of pretraces extending near at least one edge. The second subassembly may have a plurality of rear contacts exposed on the rear surface. The second subassembly may also have multiple posterior traces extending from the posterior contacts near at least one edge. The post-trace may extend to at least some of the front contacts of at least one of the first or second subassemblies.</p><p> In one embodiment, each of the plurality of subassemblies comprises at least one microelectronic chip. An assembly with an ultra-small electronic package may further include a circuit panel with terminals conductively connected to at least some of the package contacts, the package contacts being, for example, a rear contact and a plurality of second subassemblies. It may be selected from the group consisting of one front contact of the subassembly.</p><p> Additional microelectronic chips may be attached to the laminated microelectronic package or assembly. In one embodiment, the face of the additional microelectronic chip faces one face of the first and second subassemblies. The assembly may further include bond wires that conductively connect the contacts of the additional microelectronic chips to the terminals of the circuit panel.</p><p> The contacts of the additional microelectronic chips may be joined by wire bond to the front contacts of one subassembly. The conductive mass may join the contacts of the additional microelectronic chip to the front contacts of one subassembly. In one embodiment, the additional microelectronic chip may include a microcontroller.</p><p> In one embodiment, it is preferred that one or more microelectronic chips in the plurality of subassemblies can be replaced with additional microelectronic chips. For example, an assembly microelectronic chip blocks the microelectronic chip from one of the front contacts of a subassembly, and then connects an additional microelectronic chip to one of the front contacts. , Can be replaced.</p><p> The assembly may further include a bond wire that conductively connects the front contacts of one subassembly to the terminals of the circuit panel.</p><p> In one embodiment, the conductive mass may join the contacts of the additional microelectronic chip to the front contacts of one subassembly.</p><p> In one embodiment, the conductive mass may join the terminals of the circuit panel to the exposed front contacts of one subassembly.</p><p> The additional microelectronic chip may be joined to the rear surface of the second subassembly. In such an assembly, the additional microelectronic chip may have contacts that are conductively connected to the terminals of the circuit panel.</p><p> The bond wire may join the contacts of the additional microelectronic chips to the circuit panel.</p><p> In one embodiment, the conductive mass may join the terminals of the circuit panel to the rear contacts of the second subassembly.</p><p> In one embodiment, the additional microelectronic chip may have contacts that conduct with the front contacts of one subassembly.</p>
<figref num="1A">It is a top view of the subassembly according to one embodiment of the present invention.</figref><figref num="1B">It is sectional drawing of the subassembly of FIG. 1A.</figref><figref num="2">FIG. 5 is a cross-sectional view of a plurality of subassemblies attached to each other to form a laminated assembly.</figref><figref num="3">It is sectional drawing of the laminated assembly of FIG. 2 in the latter stage of the manufacturing method by one Embodiment of this invention.</figref><figref num="4A">It is sectional drawing of the laminated assembly of FIG. 3 in the post-stage of manufacturing by one Embodiment of this invention.</figref><figref num="4B">FIG. 4A is an enlarged cross-sectional view of a part of the laminated assembly of FIG. 4A.</figref><figref num="5">FIG. 4A is a cross-sectional view of the laminated assembly of FIG. 4A after the laminated assembly has been diced into individual units.</figref><figref num="6">FIG. 5 is a cross-sectional view of an alternative embodiment of a laminated assembly according to an embodiment of the present invention.</figref><figref num="7A">It is a top view of the subassembly according to one embodiment of the present invention.</figref><figref num="7B">FIG. 7A is a cross-sectional view of the subassembly of FIG. 7A.</figref><figref num="7C">It is a bottom view of the subassembly of FIG. 1A.</figref><figref num="8">FIG. 5 is a cross-sectional view of a substrate used in an additional embodiment of the present invention in which a laminated assembly is formed using a substrate.</figref><figref num="9">It is sectional drawing of the substrate of FIG. 8 in the latter stage of the manufacturing method by one Embodiment of this invention.</figref><figref num="10">It is sectional drawing of the substrate of FIG. 9 in the latter stage of the manufacturing method by one Embodiment of this invention.</figref><figref num="11">FIG. 5 is a cross-sectional view of a laminated assembly in which the subassemblies of FIGS. 7A-7C are laminated on the substrate of FIG. 10 during the post-production stage according to one embodiment of the present invention.</figref><figref num="12">It is sectional drawing of the laminated assembly of FIG. 11 in the latter stage of the manufacturing method by one Embodiment of this invention.</figref><figref num="13">It is sectional drawing of the laminated assembly of FIG. 12 in the latter stage of the manufacturing method by one Embodiment of this invention.</figref><figref num="14">It is sectional drawing of the laminated assembly of FIG. 13 in the latter stage of the manufacturing method by one Embodiment of this invention.</figref><figref num="15">FIG. 6 is a cross-sectional view of the laminated assembly of FIG. 14 at a later stage of the manufacturing method according to one embodiment of the present invention.</figref><figref num="16">FIG. 5 is a cross-sectional view of the laminated assembly of FIG. 15 at a later stage of the manufacturing method according to one embodiment of the present invention.</figref><figref num="17">It is sectional drawing of the laminated assembly of FIG. 16 in the latter stage of the manufacturing method by one Embodiment of this invention.</figref><figref num="18">It is sectional drawing of the laminated assembly of FIG. 17 in the latter stage of the manufacturing method by one Embodiment of this invention.</figref><figref num="19">It is sectional drawing of the laminated assembly of FIG. 18 in the latter stage of the manufacturing method by one Embodiment of this invention.</figref><figref num="20">FIG. 19 is a cross-sectional view of an alternative embodiment of a laminated assembly based on the assembly shown in FIG.</figref><figref num="20A">FIG. 5 is a cross-sectional view showing a laminated microelectronic assembly in which individual laminated assemblies are further stacked one above the other and electrically connected to each other.</figref><figref num="21">FIG. 19 is a cross-sectional view of the laminated assembly of FIG. 19 after the laminated assembly has been diced into individual units.</figref><figref num="22">FIG. 2 is a cross-sectional view of the individual elements produced by the dicing process of FIG. 21 configured to be suitable for wire bonding.</figref><figref num="23">FIG. 21 is a cross-sectional view of the individual elements according to FIG. 21 configured to be suitable for solder-ball joining.</figref><figref num="24">It is a bottom view of the modified form of the laminated assembly shown in FIG.</figref><figref num="25A">It is a figure which shows the apparatus typically used in the manufacture of the laminated assembly described herein.</figref><figref num="25B">It is a figure which shows the apparatus typically used in the manufacture of the laminated assembly described herein.</figref><figref num="26">It is sectional drawing of the laminated assembly attached to the circuit panel by embodiment of this invention.</figref><figref num="27">FIG. 26 is a cross-sectional view of a laminated assembly attached to a circuit panel according to a modification of the embodiment shown in FIG.</figref><figref num="28">FIG. 26 is a cross-sectional view of a laminated assembly mounted on a circuit panel according to another modification of the embodiment shown in FIG.</figref><figref num="29">FIG. 5 is a cross-sectional view of a laminated assembly attached to a circuit panel according to another embodiment of the present invention.</figref><figref num="30">FIG. 29 is a cross-sectional view of a laminated assembly mounted on a circuit panel according to a modification of the embodiment shown in FIG.</figref><figref num="31">FIG. 9 is a cross-sectional view of a laminated assembly mounted on a circuit panel according to another modification of the embodiment shown in FIG.</figref><figref num="32">FIG. 5 is a cross-sectional view of a laminated assembly attached to a circuit panel according to another embodiment of the present invention.</figref>
Hereinafter, FIGS. 1 to 4B showing a method and an apparatus for laminating ultra-small electronic components will be described. As shown in FIGS. 1A and 1B, a portion of the first wafer or first subassembly 10 comprises a plurality of microelectronic elements 12 juxtaposed adjacent to each other. The first wafer or first subassembly 10 preferably comprises a large number of rows of microelectronic elements aligned along the X and Y axes. The ultra-small electronic elements are integrally formed with each other by using conventional semiconductor process technology. It will be clear that the subassembly 10 may be part of the wafer. Also, the dashed line in FIG. 1A indicates that the subassembly may have additional elements attached to the subassembly, and that the subassembly may be in the shape of a circular wafer.
Each microelectronic element 12 has a front surface 14 and an opposite rear surface 16. The microelectronic device 12 also includes a first edge 18, a second edge 20, a third edge 19, and a fourth edge 21, all of which are from the front surface 14 of the microelectronic device 12. It extends to the rear surface 16. As shown in FIGS. 1A and 1B, the first edge 18 of one microelectronic element 12 is connected to the second edge 20 of the second adjacent microelectronic element 12. Similarly, the third edge 19 of one microelectronic element 12 is connected to the fourth edge 21 of an adjacent microelectronic element. Therefore, as shown in FIG. 1A, the microelectronic element 12 located in the center of the first subassembly 10 has all four edges in contact with the adjacent microelectronic element 12. There is. Microelectronic devices 12 located at the first edge 11, the second edge 13, the third edge 15, or the fourth edge 17 of the wafer are not limited by yet other microelectronic devices. It has at least one edge. These edges are drawn in the drawing for clarity, but in reality these edges are not visible to the naked eye. Rather, at this stage, the edges or bands in contact with the adjacent microelectronic components 12 are the saw lanes or strips used to cut the wafer without damaging the individual microelectronics. For example, as shown in FIG. 1B, the second edge 20'of the microelectronic element 12' contactes the first edge 18" of the microelectronic element 12 "to form a saw lane 23. ing. Similarly, throughout the wafer 10, the saw lanes 23 are located at positions where the microelectronic elements 12 are in contact with each other. The first wafer / subassembly 10 may include any number of microelectronic components 12, eg, only two microelectronic elements 12, or any number of ultra-small electronic components desired. A small electronic element 12 may be provided.
Each of the microelectronic elements 12 also includes a plurality of contacts 22 exposed on the front surface 14 of the microelectronic element 12. Further, the trace 24 extends outward from each of the contacts 22 of the individual microelectronic elements 12 toward the first edge 18, the second edge 20, the third edge 19, or the fourth edge 21. Exists. For example, referring to FIG. 1B, the trace 24'extends outward from the contact 22'of the microelectronic element 12' toward the second edge 20'. The trace 24'extends from the contact 22' to the outwardly extending trace 24' and is in contact with this trace 24'. Therefore, the trace 24', 24'is the microelectronic element 12'. They meet at the', 12' junction and effectively form a single trace that extends between the', 22' contacts. However, it is not always necessary for the traces to come into substantial contact with each other. It is preferable that a similar structure is included in all the ultra-small electronic devices 12 adjacent to each other. Again, the contacts 22 located at each end of the first subassembly 10 do not have traces 24 extending to adjacent contacts of different microelectronic devices, and these traces 24 are the first. It simply extends to each end of assembly 10.
As shown in FIG. 2, the first subassembly 10 is placed on top of the second wafer / subassembly 10A and the third wafer / subassembly 10B to make the laminated assembly 30. It will be. The second subassembly 10A and the third subassembly 10B are configured in the same manner as the first subassembly 10, so unless otherwise specified, similar elements are numbered similarly. ing. The laminated assembly 30 of FIG. 2 comprises three individual wafers / subassemblies stacked one above the other, whereas in an alternative embodiment, the laminated assembly 30 is two or less laminated one above the other or It may have 4 or more wafers / subassemblies.
As shown in FIG. 2, the microelectronic element 12 of the first subassembly 10 is attached to the microelectronic element 12A of the second subassembly 10A and the microelectronic element 12B of the third subassembly 10B. It is aligned. Therefore, the first edge, the second edge, the third edge, and the fourth edge of each of the microelectronic devices 12, 12A, 12B of the subassemblies 10, 10A, 10B are also on the vertical axis, respectively. Aligned with each other along. As a result, the saw lanes 23, 23A, 23B of each of these subassemblies are also aligned with each other. In this way, the laminated assembly 30 will consist of a plurality of microelectronic devices 12, 12A, 12B oriented and aligned in various columns and rows.
An adhesive layer 32 is located between the front surface 14 of the first subassembly 10 and the rear surface 16A of the second subassembly 10A to attach the individual subassemblies 10, 10A, 10B to each other. Similarly, the adhesive layer 33 is located between the front surface 14A of the second subassembly 10A and the rear surface 16B of the third subassembly 10B. In order to protect the contact 22B and the trace 24B of the third subassembly 10B, an additional adhesive layer 35 may be placed on the front surface 14B of the third subassembly 10B. The adhesive layers 32, 33, 35 are preferably formed of epoxy or the like.
At the time of assembly, the subassemblies 10,10A, 10B are adhered to each other by curing the adhesive layers 32,33,35, whereby a plurality of microelectronic elements 12 laminated one above the other adjacent to each other. , 12A, 12B can be formed into a laminated assembly.
Next, referring to FIG. 3, a plurality of notches 46 will be cut into the laminated assembly 30. The notch 46 is preferably formed using a mechanical cutting tool (not shown). Examples of such mechanical cutting tools are found in US Pat. Nos. 6,646,289 and 6,972,480. By quoting these disclosures, they form part of this specification. The notch 46 is a microelectronic element 12, each of the various subassemblies 10, 10A, 10B, Most of the first edge 18,18A, 18B of 12A, 12B, the second edge 20,20A, 20B, the third edge 19,19A, 19B, and the fourth edge 21,21A, 21B, respectively. It is cut into the laminated assembly 30 at a close position. More specifically, the notch 46 is formed by cutting the gap 47 in the saw lanes 23, 23A, 23B. The saw lanes 23, 23A, 23B of the subassemblies 10, 10A, 10B, respectively, are aligned throughout the laminated assembly 30, so that a single excision can form a gap 47 between the many subassemblies. Can be done. Preferably, the notch 46 is designed so that it does not completely penetrate the laminated assembly 30. For example, as shown in FIG. 3, the microelectronic elements 12 of the first subassembly 10 are attached to each other because the various notches 46 do not completely penetrate the first subassembly 10. It is kept in a state. However, the notch 46 extends deep enough to traverse the trace 24 of the first subassembly 10 extending between the contacts 22 exposed to the microelectronic elements 12 adjacent to each other. Similarly, the notch 46 is not only the various adhesive layers 32,33,35 interconnecting the subassemblies 10,10A,10B, but also the microelectronic elements 12A, 12B and their respective adjacent to each other in each subassembly. The traces 24, 24A and 24B are torn apart. Notches 46 with sloping side walls 48,50 are shown, but these side walls may be vertical.
For example, the notch 46A in FIG. 3 traverses the microelectronic devices 52,54 of the second subassembly 10A. Specifically, the notch 46A provides two microelectronic elements 52, so that the various edges of each of the microelectronic elements that were connected to each other and formed the saw lane 23 are separated by a gap 47. It crosses 54. The gap 47 created by the notch 46A exposes the traces 56,58 adjacent to the notch 46A. Preferably, a similar structure is included at all edges of the various microelectronic devices throughout the laminated assembly 30. The exposed traces 24, 24A, 24B form contact surfaces for each of the microelectronic elements 12, 12A, 12B. Of course, the first edge 60 and the second edge 62 of the laminated assembly 30 do not need to be mechanically cut because the traces extending towards these edges are already exposed. Although not shown in FIG. 3, the first edge 60 and the second edge 62 may be mechanically trimmed to obtain a more symmetrical configuration. Similarly, the edges of the laminated assembly 30 (not shown) are preferably mechanically cut, but may not be mechanically cut.
Leads 66 may be formed on the sloping side walls 48, 50 of the notches 46 when the various notches 46 are formed in the laminated assembly 30. As shown in FIGS. 4A,4B, these sloping side walls 48,50 caused by the notch 46 are at least the first subassembly 10, the second subassembly 10A, and the third subassembly 10B. It extends within a part. Lead 66 may be formed by any suitable metal deposition technique, such as a process including sputtering, 3D lithography, and electroplating. Yet other processes may be used. One such process is disclosed in US Pat. No. 5,716,759. By quoting this disclosure, it shall form part of this specification. The lead 66 extends within the various notches 46 and results in electrical contact with the traces 24, 24A, 24B. Preferably, the lead 66 extends beyond the sloping side walls 48,50 of the notch 46 and is exposed to the first surface 70 of the adhesive layer 35 located below the third subassembly 10B. As a result, the lead 66 includes an exposed end 75 on the surface of the adhesive layer 35 away from the notch 46. Pads or solder bumps 74 may be formed at the ends 75 of the leads 66. Lead 66 is in contact with the three traces 24, 24A, 24B as a result of the traces 24, 24A, 24B being aligned and exposed on each of the sloping sidewalls 48, 50. However, the lead 66 may be electrically connected to only one or two of the traces 24, 24A, 24B at each of the sloping sidewalls 48, 50. This situation, from the reader's point of view, traces 24,24A, on different front and back sides of the page. May occur as a result of the 24B being placed. For example, the trace 24 shown in FIG. 4B may be closer to the reader and deviate from the trace 24A when viewed three-dimensionally. Therefore, the reed 66 aligned with the trace 24 deviates from the trace 24A and does not come into contact with the trace 24A. Thus, when viewed two-dimensionally, in Figure 4B, traces 24 and 24A appear to be connected to the reed 66, but in reality only one of these is connected to the reed. There is.
As shown in FIG. 5, after the notch 46 and various conductive elements, such as the leads 66, are formed in the laminated assembly 30, the wafer 10, i.e., the microelectronic element 12 of the first subassembly 10. Individual packages 80 can be formed by mechanically cutting the wafer. The microelectronic element 12 of the first subassembly 10 will be cut at the position closest to the notch 46 so that the notch 46 can fully penetrate the laminated assembly 30. By this cutting, a plurality of laminated units 80 are formed, and each of these laminated units 80 contains a plurality of ultra-small electronic elements laminated one above the other. As shown in FIG. 5, individual stacking units 80 may be electrically connected via solder bumps 74 to microelectronic elements such as substrates 83, circuit boards, or circuit panels.
The individual stacking units 80 are particularly well suited for flash memory and DRAM units, although they may be incorporated within microprocessors and RF units.
In an alternative embodiment, as shown in FIG. 6, the laminated assembly 130 may include an additional substrate such as packaging layer 180. The laminated assembly 130 is assembled in the same manner as the laminated assembly 30 described above with respect to FIGS. 1 to 5, and has most, if not all, of the features described above with respect to the laminated assembly 30. In addition, the laminated assembly 130 may be assembled according to the steps described above for the laminated assembly 30. The only additional point of the laminated assembly 130 compared to the laminated assembly 30 is that during the manufacture of the laminated assembly 130, preferably before forming a notch in the laminated assembly 130, the packaging layer 180 of the compliant layer 135. It is to be placed below. The packaging layer 180 is preferably made of glass, silicon, or a similar material. When the packaging layer 180 is placed adjacent to the adhesive layer 135, a plurality of notches 146 will be formed using the cutting tool, as described for the laminated assembly 30. This exposes the traces 124,124A,124B to the sloping side walls 148,150 of the notch 146. Further, as described for the laminated assembly 30, a plurality of leads 166 are formed on the sloping side walls 148,150 and are in electrical contact with various traces 124,124A, 124B exposed on the sloping side walls 148,150 of the notch 146. Become. The various reeds 166 preferably extend beyond the notch 146 to the front surface 182 of the packaging layer 180. The exposed end 175 of the lead 166 may include a pad or solder bump 174. Although not shown in FIG. 6, when the various notches and conductive elements are formed, the notches are penetrated through a row of microelectronic elements 112 in the first assembly 110 to form individual laminated units 180. Good.
In an alternative embodiment, the laminated assembly 230 may include an additional substrate, such as packaging layer 201, as shown in FIGS. 7-22. The laminated assembly 230 is assembled in the same manner as the laminated assemblies 30, 130 described above with respect to FIGS. 1 to 7, except that the assembly starts from the substrate layer 201, and has many of the same features as described with respect to the laminated assemblies 30, 130. .. In addition, the laminated assembly 230 may be assembled according to the steps described above for the laminated assemblies 30,230.
As shown in FIGS. 7A-7C, a portion of the first wafer or first subassembly 210 comprises a plurality of microelectronic elements 212 juxtaposed adjacent to each other. The first wafer or first subassembly 210 preferably comprises a large number of rows of microelectronic elements 212 aligned along the X and Y axes. The ultra-small electronic elements are integrally formed with each other by using conventional semiconductor process technology. It will be clear that the subassembly 210 may be part of the wafer and that the various elements may be iteratively repeated over the entire range of the wafer. 7A-7C show that the subassembly may have additional elements attached to the subassembly and the subassembly may be in the shape of a circular wafer.
Each microelectronic element 212 has a front surface 214 and an opposing rear surface 216. The microelectronic device 212 also includes a first edge 218, a second edge 220, a third edge 219, and a fourth edge 221 all of which are from the front surface 214 of the microelectronic device 212. It extends to the rear surface 216. As shown in FIGS. 7A-7C, the first edge 218 of one microelectronic component 212 is connected to the second edge 220 of the second adjacent microelectronic element 212. Similarly, the third edge 219 of one microelectronic element 212 is connected to the fourth edge 221 of an adjacent microelectronic element. Therefore, the microelectronic element located in the center of the first subassembly 210 has all four edges in contact with the adjacent microelectronic element 212, as shown in FIG. 7A. .. The microelectronics 212 located at the first end 211, the second end 213, the third end 215, or the fourth end 217 of the wafer are not further restricted by other microelectronics. It has at least one edge. These edges are drawn in the drawing for clarity, but in reality these edges are not visible to the naked eye. Rather, at this stage, the edges or bands in which adjacent microelectronic components 212 are in contact with each other are saw lanes or bands for cutting the wafer without damaging the individual microelectronic components. For example, as shown in FIG. 7B, the second edge 220'of the microelectronic element 212' contactes the first edge 218" of the microelectronic element 212 "to form a saw lane 223. ing. Similarly, across the entire wafer 210, the saw lane 223 is located at a position where the microelectronic elements 212 are in contact with each other. The first wafer / subassembly 210 may include any number of microelectronic components 212, eg, only two microelectronic elements 212, or any number desired. The ultra-small electronic element 212 may be provided.
Each of the microelectronic devices 212 also includes a plurality of contacts 222 exposed on each front surface 14 of the microelectronic device 212, as best shown in FIG. 7C. Further, the trace 224 extends outward from each of the contacts 222 of the individual microelectronic elements 212 toward the edges 218,220,219,221. The traces 224 meet at the junction of the microelectronic devices 212', 212 "and effectively form a single trace extending between the contacts 222', 222". However, it is not always necessary for the traces to come into substantial contact with each other. A similar structure may be included in all microelectronic devices 212 adjacent to each other. Again, the contacts 222 located at each end of the first subassembly 210 do not have traces 224 extending to adjacent contacts of different microelectronic devices, and these traces 224 are the first. It merely extends to each end of assembly 210.
In contrast to the embodiments described in relation to FIGS. 1 to 6, the embodiments of FIGS. 7 to 22 are assembled by a method of stacking upwards from the substrate. As a result, many of the various parts and processes are drawn in reverse to the previous figure.
A packaging support wafer or support layer 201 having a substrate 202 for the laminated assembly of this embodiment is shown in FIG. The substrate 202 is preferably made of glass, silicon, or a similar material that provides sufficient mechanical strength to support and reinforce subsequent layers of the laminated assembly. For this reason, the substrate 202 may be thicker than the subsequent layers. The material of substrate layer 202 may be thinned or removed by etching or mechanical polishing during subsequent process steps if support is no longer needed. The substrate has a lower surface 205 and an upper surface 206, extending to the left side surface 203 and the right side surface 204. FIG. 9 shows a plurality of escape cavities 208,208'formed on the upper surface 206. These cavities 208 are aligned with the expected position of the saw lane for cutting the laminated package. Cavities 208,208'are formed by the aforementioned mechanical cutting tools used in laminated assemblies 30,130. The relief cavities 208,208'will serve as stress relievers to prevent breakage of the laminated assembly by forming notches in the substrate 202 during subsequent work. Therefore, in order to alleviate the stress concentration, it is preferable that the cavity 208 with rounded corners is formed. After the cavities 208,208'are formed, the adhesive layer 209 will be applied to the top surface 206 and the cavities 208,208', as shown in FIG. Preferably, the adhesive layer has a thickness of 2.5 to 4.0 mm from the top surface 206.
As shown in FIG. 11, a first assembly 212 will be placed over the substrate layer 201 to form a laminated assembly. As shown, contacts 222,222'and traces 224,224'are aligned with cavities 208,208' and thus saw lanes 218,222, respectively. The active bottom surface 214 and the traces 224,224'are attached to the adhesive layer 209 of the substrate layer 201, after which the adhesive is cured. The subassembly 210 containing the traces 224,224'is joined to and supported by the substrate layer 201.
If desired, the top surface 216 of the subassembly 210 may be thinned, as shown in FIG. 12, to form a new surface 216'and reduce the height of the subassembly. If a small laminated package is desired, the reduced height of the subassembly is preferably 22.4 to 25.4 μm.
Next, referring to FIG. 13, a plurality of initial notches 240,240'may be formed within the subassembly 210 to expose the traces 224,224'. The notches 240,240'are preferably formed using non-mechanical techniques such as selective chemical etching to keep the delicate traces 240,240' intact. Traces 240,240'are adhered to and supported by the adhesive layer 209 of substrate 201 during this step. The initial notches 240,240'are aligned with contacts 222,222', traces 224,224', cavities 208,208', and saw lanes 218,222. The contours of the initial notches 40 and 41 are sized in anticipation of clearance for the rear notch, which will be described later.
After the initial notches 240,240'are formed, the adhesive layer 243 will be provided on the top surface 216 or 216'and the initial notches 40,40', as shown in FIG. Preferably, the adhesive layer has a thickness of approximately 2.5-4.0 μm from the top surface 216 or 216'.
As shown in FIGS. 15 and 16, the second, third, and fourth subassemblies shown by 210A, 210B, 210C, respectively, are aligned and subassembled in subassembly 210. The assembly 210 and the substrate layer 201 will be sequentially laminated upward. Specifically, each of the subassemblies 210A, 210B, 210C will be laminated using the same procedure as the previous series of steps for laminating the subassembly 210 on the substrate 201. That is, steps including alignment, laminating, curing, thinning, initial notch formation, and adhesive application are performed step by step to form the laminated assembly 230. As a result, the microelectronic element 212 of the first subassembly 210 has the microelectronic element 212A of the second subassembly 210A, the microelectronic element 212B of the third subassembly 210B, and the third subassembly. It is aligned with the 210C ultra-compact electronic element 212C. Therefore, the initial notches 240,240', 240A, 240A', 240B, 240B', 240C, 240C' are contacts 222,222', 222A, 222A', 222B, 222B', 222C, 222C', traces 224,224', 224A, respectively. Aligned with 224A', 224B, 224B', 224C, 224C', cavities 208,208', and saw lanes 218,222. In summary, the laminated assembly 230 will consist of a plurality of laminated and bonded microelectronic devices 12, 12A, 12B, 12C oriented and aligned in various columns and rows.
First edge 218,218A, 218B, 218C, second edge 220,220A, 220B, 220C, respectively, of each microelectronic element 12,12A, 12B, 12C of various subassemblies 10,10A, 10B, 10C At the position closest to the third edge 219,219A, 219B, 219C, and the fourth edge 221,221A, 221B, 221C, the notch 246 is cut into the laminated assembly 230. Notches 246,247 may be formed in saw lanes 220,218 by the method described in the previous embodiment. As shown in FIG. 17, one major difference from the previous embodiment is that the plurality of notches 246 cut through the adhesive layers 243,243A, 243B, 243C. Preferably, the notch 246 extends only partially within the relief cavity 208,208'without completely penetrating the laminated assembly 230. Therefore, since the adhesive 209 is removed rather than the substrate 202, the substrate 202 is maintained without loss of function and is connected to the laminated microelectronic elements to protect these elements from cracking. Can be done. Notches 246 with sloping side walls 248,250 are shown, but these side walls may be vertical walls.
The laminated assembly 230 of FIG. 17 comprises four individual wafers / subassemblies stacked one above the other, whereas in an alternative embodiment, the laminated assembly 230 has three or less or five laminated one on top of each other. It may have one or more wafers / subassemblies. FIG. 17 also shows the optimum thinning of the substrate 202. This thinning may be done by mechanical polishing or etching. This step may be performed between the various steps of the process, preferably after the formation of the notch 246.
When the individual notches 246 are formed in the laminated assembly 230, the reeds 266 may be formed on the sloping side walls 248,250 of the notches 246. The sloping side walls 248,250 that accompany the formation of the notch 246 of the first, second, third, and fourth subassemblies 210,210A, 210B, 210C, as shown in FIGS. 17 and 18. It extends at least in part. The lead 266 may be formed by any suitable metal deposition technique described in the previous embodiment. The lead 266 extends within the individual notches 246 and results in electrical contact with the traces 224,224A, 224B, 224C.
Preferably, the lead 266 extends beyond the sloping side walls 248,250 of the notch 246 and is attached to the adhesive layer 243C of the top surface 216C'of the third subassembly 210C. Thus, the lead 266 has an end 275 exposed on the surface of the adhesive layer 243C away from the notch 246.
Each lead 266 is in contact with these traces 224,224A, 224B, 224C as a result of the four traces 224,224A, 224B, 224C being aligned and exposed on the sloping side wall 248 or 250. However, the lead 266 may be electrically connected to less than four of the sloping side wall 48 or 50 traces 224,224A, 224B, 224C. Such a situation arises as a result of the traces 224,224A, 224B, 224C being placed on different front and back sides of the paper, as described in the previous embodiment. Become.
Pads or solder bumps may be formed at the end 275 of the reed 266. To this end, as shown in FIG. 19, the solder mask 277 is patterned over the surface of the adhesive layer 216C and across the leads 266 to suit the attachment of wires or solder bumps. Good.
In another optimal embodiment shown in FIG. 20, the lead 266 may also extend to the underside of the substrate 202. The lead 266 extends beyond the sloping side walls 248,250 of the notch 246 and enters the adhesive layer 209 in the relief cavity 208 located below the first subassembly 210. If the substrate 202 is made thinner, the bottom of the lead 266 will be exposed. The bottom lead 286 can be formed by extending this lead by the method described above. Also, the solder mask 227 may be patterned over the entire bottom surface of the substrate 202 to suit the attachment of wires or solder bumps, which allows pads or bumps to be formed at the ends 288.
This configuration is particularly advantageous for laminating assemblies 230 or individual packages, aligning one of their top 275 and the other bottom 288, and connecting these top 275 and bottom 288 to each other, for example using solder bumps. By doing so, they can be stacked one above the other and electrically interconnected. In the illustrated example, the top 275 and bottom 288 connected are aligned in a suitable pattern within the xy plane to allow interconnection.
Leads 266 allow the test probe to access each device so that defective subassembly layers can be inspected and isolated, thereby distinguishing and reworking the devices. The ability to stack multiple assemblies 230 facilitates high levels of integration and wafer level rework. Specifically, leads located on the lower surface of the unit shown in FIG. 20 are provided on the upper surface of the adjacent unit via a conductive mass, for example, a ball or bump of a conductive material such as a solder. Can be connected to a lead. Although the overall thickness is increased, each element of the laminated assembly laminated with each other is functionally repaired to be equal to the defect-free laminated assembly 230, and the wafer level rework makes the value of the functional layer 210 economical. Will be recovered.
As shown in FIG. 21, after the notch 246 and various conductive elements, such as the leads 266, are formed in the laminated assembly 230, the leads 266, the adhesive layer 209, and the substrate 202 are mechanically cut. Individual packages 280 may be formed by detaching the packages 280. The cut is aligned with the dicing lanes 218,220 at the point closest to the notch 246, which allows the notch 246 to penetrate the entire laminated assembly 230. At the time of cutting, a plurality of laminated elements 280 are individually formed. Each of these lamination units 280 contains a plurality of ultra-small electronic elements laminated one above the other. Individual laminated units 280, as shown in FIG. 22, are like boards, circuit boards, or circuit panels via wire bonding, pads 275, or solder bumps 274, as shown in FIG. It is preferable to be electrically connected to a small electronic element.
In a particular example (FIG. 20A), three laminated assemblies 230 of the form shown in FIG. 20 or 21 can be laminated and interconnected. Bond wires 2202,2202', 2202 "connecting to lands 2204,2204', 2204" of these laminated assemblies will provide interconnection of circuit panel 2210 to terminal 2206. Bond wires may be arranged to connect the lands of assembly at adjacent levels to each other, as shown in Figure 20A, or to connect each laminated assembly directly to the circuit panel. You may. Alternatively, some of the bond wires connected to a particular laminate assembly may be connected to other laminate assemblies that are not adjacent to this particular laminate assembly.
As is clear from FIG. 20A, the surface 2220 "of the laminated assembly 230" and the land 2204 "on the surface exceed the surface 2220', the edge 2222' and the land 2204'on the surface 2220'of the laminated assembly 230'. It extends and allows the lands 2204', 2204' to be interconnected using the bond wire 2202'. Similarly, the surface 2220'of the laminated assembly 230'and the land 2204'on it extend beyond the surface 2220, the edge 2222, and the land 2204 on the surface 2220 of the laminated assembly 230, thereby the bond wire 2202. Can be used to interconnect rands 2204', 2204.
In the embodiments described above (FIGS. 7-23), wafer level packaging results in a thin element 280. Since individual layers having a thickness of approximately 25 μm can be produced, a die package having a thickness of 155 μm or less can be obtained using a substrate of 30 μm. As described above, the package thickness can be reduced to 125 μm or less by further thinning the substrate.
In the method of manufacturing the laminated package as described above (FIGS. 7-23), the notch 246 is formed in the laminated assembly 230 (FIG. 17). These notches typically extend along the edges aligned with the saw lanes 218,220 of each microelectronic element 212,212', so that a series of traces 224 of each microelectronic element (Figure). 7C) will be exposed in the notches at these edges. These notches may extend over the entire length of each saw lane of the laminated assembly 230, or may be a series of openings, each opening being a respective saw aligned with that opening. It should extend over a portion of the length of the lane. As shown in FIG. 7C, all of the traces 224 extending from the contact 222 "of the microelectronic element 212" and all of the traces 224 extending from the contact 222'of the microelectronic element 212'are one. It may be exposed in the notch 246 (FIG. 17), then by depositing a main metal layer along the edges of the subassembly exposed in the notch, for example by sputtering, electroless plating, etc. Leads 266 (FIG. 18) are then formed by patterning the main metal layer into individual leads by photolithography and, if necessary, electroplating to increase the thickness of the leads. , Leads with many different metal layers can be formed.
Referring to FIG. 24, in the modification of the aforementioned embodiment, after the laminated assembly 230 has been formed (FIGS. 16 and 17), it is aligned with saw lanes 218,220 (FIG. 7C) such as each microelectronic element 212,212'. Instead of forming a notch that exposes all of the traces, openings 228,228', 228'are formed aligned with saw lanes 218,220, etc. However, the notch 246 in the aforementioned embodiment ( Unlike FIG. 17), each of the openings 228,228', 228'etc. exposes only a single trace of each microelectronic element 224,224',224'. Typically, microelectrons adjacent to each other. The trace 224 connected to the contacts of the elements 212,212'is exposed in the opening 228. Similarly, the trace 224' connected to the contacts of the microelectronic elements adjacent to each other is inside the other opening 228'. Trace 224, which is exposed and connected to the contacts of microelectronic elements adjacent to each other, is exposed in the other opening 228 . Each trace 224 connected to the microelectronics of the stacked subassembly may be exposed in a single aperture, but in the laminated assembly 230, only one trace of each microelectronic element is in each aperture. It is designed not to be exposed to.
In order to form leads 266 (Fig. 18) connected to individual traces 224,224', 224 "etc., all openings 228,228', 228" etc. of the laminated assembly are simultaneously filled with conductors of each microelectronic element. Conductive vias connected to a single trace can be formed. For example, the main metal can be deposited by sputtering or electroless deposition, and then the obtained structure can be electroplated to fill the openings with the metal to form conductor vias. In the electroplating process, any metal remaining on the surface of the exposed adhesive or dielectric layer 243C (FIG. 18) should be removed, leaving the surface of the individual conductor vias exposed in each opening 228. Can be done. Alternatively, the metal layer covering the top adhesive layer 243C may be patterned by photolithography into individual reeds 266 (FIG. 18) extending above the layer 243C from the vias. Conductive bumps may then be formed at the ends of the leads, as described above with reference to FIG.
Hereinafter, FIGS. 25A and 25B showing the devices used for manufacturing the assembly of the type described here will be described. As shown in FIGS. 25A and 25B, the conventional wafer manufacturing facility 680'prepares a finishing wafer 681 of the type partially shown in FIGS. 1A and 1B. The active surfaces of the individual wafers 682 will be joined to the protective layer 683 by the joining device 685. Preferably, in order to obtain a uniform distribution of epoxies, the bonding device 685 has equipment to rotate wafers 682, layers 683, and epoxies.
The inactive surface of the bonded wafer 686 is thinned, for example, by a polishing apparatus 684 using an abrasive 687. This inactive surface of the wafer is then exposed, preferably through a mask 691 by a mask exposure machine 692, to the photosensitive photoresist 690 coated by conventional spin coating, and then in a bath 693 containing solution 699, silicon. It is preferable that the etching process is performed by a photolithography method for etching the wafer. The inactive surface of the etched wafer is bonded to the protective layer 686 by a bonding device 694, which should be essentially identical to device 685, resulting in a wafer sandwich with both sides bonded to the protective layer. become. The wafer may then be bonded to a second wafer or an additional wafer.
The notch forming apparatus 695 partially cuts the bonded wafer in the method of forming the laminated package as described above with reference to FIGS. 1 to 6. The notched wafer is then subjected to a corrosion resistant treatment in a bath 696 containing the chromate solution 698. Alternatively, a chemical etching apparatus (not shown) is used to make a notch or single trace that exposes one or more traces of each microelectronic element according to the manufacturing method described above with respect to FIGS. 7-24. An opening may be formed to be exposed.
A conductive layer depositor 700 operated by vacuum deposition technology will be used to generate conductive layers on one or more surfaces of each die of the wafer. The conductive layer depositor 700 may be used before the two wafers are assembled together. The formation of the contact strips or lead bridges is preferably carried out using a conventional electrolytic photoresist 701. The photoresist 701 will be applied to the laminated wafer 707 in the photoresist bath set 702. The photoresist 701 is preferably exposed by a UV exposure system 704, which may be identical to the system 692, using a mask 705 to define a suitable etching pattern. The photoresist is developed in the developing bath 706, and then the wafer is etched by the metal solution 708 in the etching bath 710, which results in the formation of conductors.
The exposed strips are then preferably plated by the electroless plating apparatus 712. The laminated wafers will then be diced into individual packaged integration devices. Preferably, the dicing blade 714 can be a diamond resinoid blade with a thickness of 4-12 mils corresponding to the thickness of the saw lane.
Referring to FIG. 26, for example, a laminated assembly 280 (FIG. 22) having a rear surface 2602 attached to an interconnect element 2610 or a circuit panel by an adhesive (not shown) is shown. Bond wire 2604 electrically connects the end 2668 of the reed 2666 to the contact 2606 on the inner surface 2601 of the interconnect element 2610. On the other hand, the contact 2606 is connected to a conductive bump or ball 2612 exposed on the outer surface 2611 of the interconnect element, for example a solder ball, via a via 2608. As further shown in FIG. 26, a microelectronic component, eg, a semiconductor chip, extends over a front surface 2622 of the microelectronic element 210 of the laminated assembly 280 via a conductive mass 2624, eg, a solder ball. It may be connected to an existing lead 2666. In certain embodiments, examples of the microelectronic elements 210 included in the stacked assembly are memory elements such as, but not limited to, dynamic random access memory (DRAM), static access memory (SRAM), erasable. Pluggable read-only memory (EPROM), such as memory that can be erased by exposure to radiant energy or memory that can be erased and reprogrammable via electrical means, or data without reprogramming the chip. Flash memory in the form of non-volatile random access memory that can be stored, modified, and overwritten.
In one particular example, examples of chip 2620 include processors, such as microprocessors or microcontroller elements. This processor is capable of accessing and executing the program in connection with the use of the memory resources contained within the stacked assembly 280. In another example, the chip 2620 may include circuits that match the circuits of one or more microelectronic elements 210 in terms of function or circuit mechanism. In such a case, the chip 2620 can function as a replacement unit connected to another microelectronic element 210 via the lead 2666. The chip 2620 is connected to the interconnect element by a bond wire 2604. To make the chip 2620 function as a repair-replacement unit for an assembly with a defective microelectronic component, the lead extending from the defective microelectronic component is, for example, a mechanical technique or a laser. The technology should be electrically disconnected from the contacts on the front 2622. Alternatively, an electrically fusible element (eg, an electric fuse or an anti-fuse) of the chip 2620 or the defective element 210 may be activated. In this way, the repair chip 2620 can be electrically connected in place of the defective chip in the laminated assembly.
FIG. 27 shows a modified embodiment of the embodiment shown in FIG. Here, the chip 2720 is mounted with its front surface 2722 facing away from the front surface 2622 of the adjacent microelectronic element 210. Bond wire 2704 connects the chip pad 2716 to the interconnect element contact 2706. In yet another modification shown in FIG. 28, the bond wire 2804 connected to the pad 2704 of the chip 2720 is connected to the exposed contact 2806 of the laminated assembly. This exposed contact 2806 may be connected by a lead 2666 to one or more microelectronic elements in a laminated assembly. Alternatively or additionally, the exposed contact 2806 may be connected to the interconnect element by another bond wire 2814.
In another modification shown in FIG. 29, the end 2968 of the lead 2966 exposed on the rear surface 2902 of the laminated assembly 230 (as described above with reference to FIG. 20) is a conductor block, eg, a solder ball. It is connected to the contact 2906 of the interconnect element 2910 via. FIG. 30 shows a modified embodiment of the embodiment shown in FIG. 29. Here, the chip 2720 mounted on the front surface 3001 of the laminated assembly is electrically directly connected to the interconnect element 3010 by a bond wire 3004 extending from the pad of the chip 2720 to the contact 3006 of the interconnect element 3010. .. In another modification shown in FIG. 31, the tip 2620 is a flip chip attached to the end or other contact of the lead 2666 exposed on the front 3001 of the laminated assembly. In yet another modification shown in FIG. 32, the laminate assembly 280 is a flip chip attached to the interconnect element 2610 with the front surface 3201 of the laminate assembly facing the anterior surface 2601 of the interconnect element 2610.
The following numbered paragraphs describe the features of a particular embodiment of the invention.
(1) A step of forming an ultra-small electronic assembly by laminating a first subassembly having a plurality of ultra-small electronic elements on a second sub-assembly including a plurality of ultra-small electronic elements. At least some of the plurality of microelectronics in the first and second subassemblies have traces extending to their respective edges of the microelectronics, a step and a plurality of microelectronics. A step of forming a notch in a microelectronic assembly and a step of forming a lead on the side wall of the notch to expose at least some traces, the lead being electrically conductive to at least some of the traces. A method of manufacturing a laminated microelectronic package, which comprises steps, and.
(2) The first and second subassemblies are equipped with saw lanes, and during the step of forming the microelectronic assembly, the saw lanes of the first assembly are located in the saw lanes of the second subassembly. The method described in paragraph (1), characterized in that the notches are fitted and formed in the saw lanes of each assembly.
(3) The method according to paragraph (1), wherein the notch extends only partially within the first subassembly.
(4) The method according to paragraph (1), characterized in that the saw lanes of the first assembly are completely diced to further include the steps of forming individual laminated packages.
(5) At least some of the plurality of microelectronic elements in the first and second subassemblies have contacts exposed in front of each, and at least some of the traces are electrically connected to at least some of the contacts. The method described in paragraph (1), which is characterized by being connected in a symmetric manner.
(6) A paragraph characterized in that during the step of forming the microelectronic assembly, the first surface of the first subassembly is adhered to the second surface of the second subassembly by an adhesive. The method described in (1).
(7) Some of the traces of the first subassembly are misaligned with some of the traces of the second assembly, and the leads formed on the side wall of the notch contact one trace of the subassembly and the other. The method described in paragraph (1), characterized in that it does not touch the traces of its subassemblies.
(8) A step of aligning the saw lane of the first wafer with the saw lane of the second wafer so that the saw lane of one wafer is located above the saw lane of the other wafer. Each of the first and second wafers has multiple traces extending towards the saw lane, with the alignment step and at least partial cutting of the saw lanes of the first and second wafers. A method of manufacturing a laminated package, characterized in that the steps include exposing a plurality of traces and electrically connecting the leads to at least some of the exposed traces.
(9) The method according to paragraph (8), wherein the first and second wafers include a plurality of microelectronic elements that are in electrical contact with the plurality of traces.
(10) The method according to paragraph (9), further comprising the step of attaching the first wafer to the second wafer after the saw lanes of the two wafers have been aligned.
(11) The method of paragraph (9), wherein the lead comprises a first end extending to one front surface of the wafer.
(12) The method according to paragraph (11), wherein the first end of the lead is provided with a solder-bump for attachment to an additional microelectronic component.
(13) During the step of exposing multiple traces of the first and second wafers, further comprising aligning the saw lanes of at least one additional wafer with the saw lanes of the first and second wafers. , The method according to paragraph (8), characterized in that multiple traces of at least one additional wafer are also exposed.
(14) A first subassembly and a second subassembly connected to each other, each comprising a plurality of traces exposed on at least one edge and at least one edge. Multiple leads attached to at least some of the subassemblies and the second subassembly and the multiple traces of the first and second subassemblies, both the first and second subassemblies. A laminated ultra-compact electronic package characterized by having multiple leads that extend near at least one edge of the.
(15) The laminated microelectronic package according to paragraph (14), wherein the first subassembly and the second subassembly each contain at least one microelectronic chip.
(16) Each of the microelectronic chips in the first and second subassemblies has a front surface, an opposing rear surface, and a plurality of contacts exposed on each of the front surfaces of the microelectronic chip. The stacking described in paragraph (15), wherein the multiple traces of the first and second subassemblies extend outward from the plurality of contacts exposed on the front surface of the microelectronic chip. Ultra-small electronic package.
(17) The first and second subassemblies each have at least one additional edge, and at least some of the multiple traces of each of the first and second subassemblies are the first and second. The laminated microelectronic package according to paragraph (16), characterized in that it extends to at least one additional edge of the assembly.
(18) The laminated microelectronic package according to paragraph (17), wherein at least some of the multiple reeds extend near at least one additional edge of the first and second subassemblies.
(19) In paragraph (18), the second subassembly features a front surface, with the plurality of leads having a first end exposed to the front surface of the second subassembly. Described laminated ultra-compact electronic package.
(20) Further comprising at least one additional subassembly attached to the first and second subassemblies, the at least one additional subassembly being electrically conductive with at least some of the plurality of leads. The laminated ultra-compact electronic package described in paragraph (19), characterized in that it does.
(21) By laminating a first subassembly having a plurality of ultra-small electronic elements on a substrate and stacking a second subassembly having a plurality of ultra-small electronic elements on the first subassembly. In the step of forming the microelectronic assembly, at least some of the plurality of microelectronic components of the first and second subassemblies have traces extending to their respective edges of the microelectronic components. Leads, a step of forming a notch in a microelectronic assembly to expose at least some traces of a plurality of microelectronic components, and a step of forming a lead on the side wall of the notch. Is a method of manufacturing a laminated microelectronic package, which comprises a step that is electrically conductive with at least some of the traces.
(22) The first and second subassemblies are equipped with saw lanes, and during the step of forming the microelectronic assembly, the saw lanes of the first subassembly are aligned with the saw lanes of the substrate and the second The method according to paragraph (21), wherein the saw lanes of the subassemblies are aligned with the saw lanes of the first subassembly and notches are formed in the saw lanes of the respective subassemblies.
(23) The method according to paragraph (22), wherein the escape passages aligned with the saw lanes of the substrate are formed by partially entering the substrate.
(24) The method of paragraph (21), wherein the lead comprises a first end extending over the top surface of the second subassembly.
(25) The method of paragraph (24), wherein the lead comprises a second end extending over the top surface of the substrate.
(26) The method according to paragraph (23), wherein the step of forming a notch does not include forming a notch in the substrate.
(27) The method according to paragraph (22), further comprising the step of dicing the saw lanes of the substrate to form individual laminated packages.
(28) Described in paragraph (21), wherein the first surface of the first subassembly is adhered to the second surface of the substrate by an adhesive during the step of forming the microelectronic assembly. the method of.
(29) At least some of the plurality of microelectronic elements in the first and second subassemblies have traces extending across the saw lanes in the first and second subassemblies. The method described in paragraph (21), characterized in that it is present.
(30) The step of forming the notch is to form an initial notch in at least the first assembly to expose the trace, fill the initial notch with an adhesive to cover the trace, and at least An initial notch is formed in the second subassembly to expose the trace, and the initial notch is filled with an adhesive to cover the trace, at least some of the plurality of microelectronic elements. 21. The method of paragraph (21), comprising forming the notch in the adhesive to expose the trace.
(31) Exposing the trace to a first subassembly comprising a plurality of microelectronic components, the first subassembly having a trace extending to each edge of the microelectronic component. A step of forming an initial notch to allow the initial notch, a step of filling the initial notch with an adhesive to cover the trace, and a notch to expose at least some traces of a plurality of microelectronic components. A method of manufacturing an ultra-small electronic subassembly, which comprises a step of forming the adhesive into the adhesive.
(32) The method according to paragraph (31), wherein the initial notch is formed by etching.
(33) The method of paragraph (31), wherein after etching the notch, the trace is maintained without substantially impairing its function.
(34) Laminated microelectronic package with four subassemblies and substrates stacked on top of each other, each subassembly with at least one microelectronic chip, the package having a stacking thickness of 155 μm or less. A laminated ultra-compact electronic package characterized by being
(35) Laminated microelectronic packages with four subassemblies stacked on top of each other, each subassembly with at least one microelectronic chip, the package having a stacking thickness of 125 μm or less An ultra-compact electronic package characterized by being
(36) A step of forming an ultra-small electronic assembly by laminating a first subassembly including a plurality of ultra-small electronic elements on an adhesive layer of a substrate, which is a step of forming a plurality of ultra-small electronic components. At least some of the small electronic components have traces that extend to their respective edges of the micro electronic components, with steps and initial notches formed in the first subassembly to expose the traces. Then, in order to fill the initial notch with an adhesive and cover the trace, a step of coating an adhesive layer on the first subassembly and a second subassembly including a plurality of micro electronic components are provided. A step of stacking on the adhesive layer of the first subassembly, at least some of the plurality of microelectronic components of the first subassembly are traces extending to the respective edges of the microelectronic components. The second subassembly has an initial notch formed in the second subassembly to expose the step and the trace and fills the initial notch with an adhesive to cover the trace. A step of forming an adhesive layer on the subassembly of the adhesive layer, a step of forming a notch in the adhesive layer in order to expose at least some of the traces of a plurality of microelectronic components, and a lead being formed in the side wall of the notch. A method of manufacturing a laminated microelectronic package, characterized in that the leads include steps, which are electrically conductive to at least some of the traces.
(37) The board, the first subassembly, and the second subassembly are provided with saw lanes, and after the microelectronic assemblies are laminated, the board saw lane, the first subassembly saw lane, and the first. Paragraph (36), characterized in that the saw lanes of the two subassemblies are aligned and a notch is formed in the saw lanes of each subassembly after the second subassembly is coated with an adhesive layer (36). The method described in.
(38) The escape cavity aligned with the saw lane of the substrate is formed by partially entering the substrate before the first subassembly is laminated on the adhesive layer of the substrate. The method described in paragraph (37).
(39) The method according to paragraph (37), further comprising the step of dicing the saw lanes of the substrate to form individual laminated packages.
(40) The method according to paragraph (36), wherein the step of forming a notch does not include forming a notch in the substrate.
(41) The method according to paragraph (38), wherein the step of forming a notch does not include forming a notch in the substrate.
(42) At least some of the plurality of microelectronic elements in the first and second subassemblies have traces extending across the saw lanes in the first and second subassemblies. The method described in paragraph (36), characterized in that.
Although the present invention has been described herein with reference to specific embodiments, it should be understood that these embodiments are merely exemplary of the principles and uses of the invention. Accordingly, numerous modifications may be made to the exemplary embodiments, or other configurations may be devised without departing from the spirit and scope of the invention as set forth in the appended claims. Please understand that it is good.
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Priority claims7
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Numbers
- Publication
- 5114490
- Application
- 2009532373
Titles2
- Japanese
- エッジ接続ウエハレベル積層体
- English
- Edge connection wafer level laminate
Classification
- CPC, 14
- H10P54/00
- H10W90/00
- H10W70/60
- H10W70/641
- H10W70/611
- H10W90/22
- H10W90/752
- H10W90/754
- H10W90/724
- H10W90/20
- H10W72/834
- H10W90/28
- H10W90/291
- H10W90/297
- IPC, 4
- H01L25 065
- H01L25 07
- H01L25 18
- H10W70 60
