Reflection liquid crystal display device and its manufacturing method

The present invention relates to a liquid crystal display device, and particularly includes a patterned spacer to improve the form of data wiring.<u style="single">Place</u>Regarding the manufacturing method.

Generally, a liquid crystal display device can be classified into a transmissive liquid crystal display device that uses a backlight and a reflective liquid crystal display device that uses an external light source, depending on how the light source is used. Since the transmissive liquid crystal display device uses a backlight as a light source, it consumes two-thirds or more of the total power, while the reflective liquid crystal display device does not require a backlight, so that power consumption and battery consumption can be reduced. However, the reflective liquid crystal display device has a problem that the brightness is not sufficient and the contrast ratio is small because there is no external light source.

In order to increase the light-dark ratio, a black matrix is generally used in a reflective liquid crystal display device, and the black matrix serves to reduce the area where light is reflected to reduce the brightness.

Hereinafter, the configuration of a general reflective liquid crystal display device will be schematically described with reference to FIG. As shown in FIG. 1, in the liquid crystal panel, the first substrate (upper substrate) 23 and the second substrate (lower substrate) 6 are joined together with a predetermined interval, and the first substrate 23 A data wiring 17 and a gate wiring 5 that define the pixel region P are configured on one surface of the second substrate 6 facing each other, and a thin film transistor T is configured at the intersection of the two wirings.

A reflective electrode (pixel electrode) 18 that comes into contact with the thin film transistor T is formed in the pixel region P. At this time, as the substance forming the reflective electrode 18, aluminum (Al) having excellent conductivity and reflectance and a conductive substance in the form of an alloy containing the aluminum (Al) are mainly used.

On the other hand, on one surface of the first substrate 23 facing the second substrate 6, a grid-like black matrix 21 and sub-color filters 22a, 22b, are formed in an open portion inside the grid, that is, a region corresponding to the pixel region P. A color filter layer 22 including 22c is formed, and a transparent common electrode 24 is formed on the entire surface of the first substrate 23 including the color filter layer 22 and the black matrix 21.

A liquid crystal layer 20 is formed in a space separated from the first substrate 23 and the second substrate 6. At this time, although not shown, a spacer is used as a means for maintaining the separated space between the first substrate and the second substrate. The spacer is generally configured to use a ball spacer having a round shape, and after the lower substrate is manufactured, the ball spacer is sprayed by a predetermined method.

FIG. 2 is a cross-sectional view showing a shape in which the ball spacer is formed between the first substrate and the second substrate. As shown in the figure, the spacer 40 is configured in the separated space between the first substrate 23 and the second substrate 6. The liquid crystal 20 is located around the spacer 40. However, the liquid crystal 20a located around the spacer 40 appears to have different orientation characteristics from the liquid crystal 20b far away from the spacer 40 due to the influence of the spacer 40.

As a result, in a dark state, light L passes around the spacer 40, resulting in poor light leakage.

The ball spacer 40 tends to be densely packed because it cannot be evenly distributed on the entire surface of the substrate, and there is a problem that the ball spacer 40 moves finely inside the substrate and damages the surface of the alignment film. Further, in a liquid crystal panel that requires a high-speed response, the cell gap between the first and second substrates must be very thin, but it is difficult to minimize the size of the spacer for maintaining such a gap. There is.

Therefore, in order to solve such a problem, a method of directly patterning the spacer on the upper substrate or the lower substrate has been conventionally proposed.

FIG. 3 is a partial cross-sectional view of a liquid crystal display device having a conventional patterned spacer. As shown in the figure, the first substrate 50 and the second substrate 60 are separated from each other, and the facing surfaces of the first substrate 50 include a gate electrode 52, an active layer 54, a source electrode 56, and a drain electrode 58. The thin film transistor T is configured, and the pixel electrode 59 in contact with the drain electrode 58 is configured.

A black matrix 62 is configured on one side of the second substrate 60 facing each other corresponding to the thin film transistor T, and a color filter 64 is configured corresponding to the pixel region P. A transparent common electrode 66 is formed on the entire surface of the color filter 64.

In the above-described configuration, a columnar patterned spacer 68 formed by patterning an organic film is configured between the first substrate 50 and the second substrate 60. The patterned spacer 68 can be formed on the first substrate 50 and the second substrate 60, but is generally formed on the color filter substrate which is the second substrate 60 which can secure many flat surfaces. is there.

The patterned spacer 68 has the advantage that it can be placed in the desired position and adheres to the substrate to maintain a firm and stable gap. Further, since it is not formed in the pixel portion, there is an advantage that the light leakage defect due to the spacer 68 can be prevented.

The patterned spacer is formed by using a photosensitive organic film exhibiting negative or positive characteristics. Hereinafter, a method for forming a patterned spacer will be described with reference to the drawings.

A method for forming a patterned spacer using a photosensitive organic film having positive characteristics will be described with reference to FIGS. 4A to 4B. As shown in FIG. 4A, a color filter layer 84 is formed on the substrate 80 and includes red, green, and blue subcolor filters 84a, 84b, 84c corresponding to the separated regions of the black matrix 82. To configure.

A transparent common electrode 86 is formed on the upper part of the color filter layer 84, and an organic substance (negative photoresist (PR)) having negative characteristics is applied to the entire surface of the substrate 80 on which the common electrode 86 is formed. The organic film 88 is formed.

At this time, the negative PR is composed of a solvent, a sensitizer, and a resin, and generally cross-links the resin by starting the photosensitizer in the absorption band for each wavelength by ultraviolet rays (UV). linking). The crosslinked product has a property that it cannot be dissolved by a developing solution.

Next, the mask M composed of the transmission portion C and the blocking portion D is arranged on the upper portion of the organic film 88. At this time, the transmission portion C is configured corresponding to the black matrix 82.

Subsequently, as shown in FIG. 4B, when the upper part of the mask M is irradiated with light to expose and develop the organic film 88 at the lower part, the portion where the light is blocked is formed by the characteristics described above. It can be removed to form a patterned spacer 90 of the desired shape.

Hereinafter, a method for forming a spacer using a photosensitive organic film having positive characteristics will be described with reference to FIGS. 5A to 5B. As shown in FIG. 5A, a color filter layer 84 is formed on the substrate 80 and includes red, green, and blue subcolor filters 84a, 84b, 84c corresponding to the separated regions of the black matrix 82. To configure.

A transparent common electrode 86 is formed on the upper part of the color filter layer 84, and an organic substance (positive photoresist (PR)) having a positive property is applied to the entire surface of the substrate 80 on which the common electrode 86 is formed. The organic film 88 is formed.

Next, the mask M composed of the transmission portion C and the blocking portion D is arranged on the upper portion of the organic film 88. At this time, the blocking portion D is configured corresponding to the black matrix 82.

Subsequently, as shown in FIG. 5B, when the upper part of the mask M is irradiated with light to expose and develop the organic film 88 at the lower part, a portion that does not receive the light remains due to the characteristics described above. Thus, a patterned spacer 90 of the desired shape can be formed. A patterned spacer can be formed by the process as described above.

However, when a spacer patterned with negative PR or positive PR is manufactured, there is a difference in its shape.

6A to 6B are cross-sectional views showing a process of forming a spacer patterned by positive PR. As shown in FIG. 6A, after the positive PR film 88 is formed on the substrate 80, the mask M composed of the transmission portion C and the blocking portion D is arranged on the upper part of the PR film 88. The blocking portion D is configured to be arranged so as to correspond to a region where a spacer pattern is formed. When the upper part of the mask M is irradiated with light, the light L that has passed through the transmitting portion C is diffracted inside the blocking portion D to expose a part of the positive PR film 88 corresponding to the blocking portion D. ..

Therefore, as shown in FIG. 6B, the exposed PR film 88 is patterned to form a round-shaped patterned spacer 90.

On the other hand, the negative PR film is shown in FIGS. 7A to 7B. 7A to 7B are cross-sectional views showing a process of forming a spacer patterned with a negative PR film. As shown in FIG. 7A, after the negative PR film 88 is formed on the substrate 80, the mask M composed of the transmission portion C and the blocking portion D is arranged on the upper part of the PR film 88. The transmission portion C is configured to be arranged so as to correspond to the region D in which the spacer pattern is formed. When the upper part of the mask M is irradiated with light, the light L that has passed through the transmitting portion C is diffracted inside the blocking portion D to expose a part of the positive PR film 88 corresponding to the blocking portion D.

Therefore, as shown in FIG. 7B, patterning the exposed PR film 88 forms a patterned spacer 90 having a width even larger than the original region.

Among the patterned spacers manufactured through the above steps, the patterned spacer using the negative PR film has a disadvantage that it is formed wider than the actually designed width, but maintains the cell gap of the liquid crystal panel. On the side surface, the more the upper flat surface is, the more advantageous it is, so judging from the final shape, there is a far more advantageous advantage. The contents of the spacer patterned as described above have been described.

In the configuration of the reflective liquid crystal display device having the patterned spacer as described above, as seen in FIG. 1, the black matrix 21 is configured in the region corresponding to the data wiring, the gate wiring, and the thin film transistor. At that time, the alignment margin is further provided in the design in consideration of the bonding error between the first substrate and the second substrate. As a result, the area occupied by the black matrix increases.

This will be described with reference to the cross-sectional views of FIGS. 8 and 9. FIG. 8 is a cross-sectional view of a conventional reflective liquid crystal display device cut along lines II-II of FIG. 1, and FIG. 9 is an enlarged cross-sectional view of the F region of FIG. As shown in the figure, the data wiring 17 is configured between the adjacent pixel regions P1 and P2 on the first substrate 23, and the pixel regions P1 and P2 on the second substrate 6 facing the first substrate 23. A color filter layer 22 including sub-color filters 22a, 22b, and 22c is configured corresponding to P2, and a black matrix 21 is configured corresponding to the data wiring 17.

A columnar patterned spacer 30 is formed between the first substrate 23 and the second substrate 6. At this time, if the distance between the adjacent reflection electrodes 18 from the upper part of the data wiring 17 is a and the area where both sides of the data wiring 17 and the adjacent reflection electrodes 18 overlap each other is b, the black matrix 21 The width shall be configured to the width of a + 2b.

Unlike the liquid crystal corresponding to the upper part of the reflective electrode, the liquid crystal (not shown) arranged corresponding to the width of a cannot sufficiently apply a uniform electric field, so that the voltage at which the pixel region shows a black state in the normally white mode. Even if the above is applied, this portion acts as a light leakage region. Therefore, this portion must be blocked by the black matrix 21, and 2b is an alignment margin value in consideration of the adhesion error between the first substrate 23 and the second substrate 6. .. Therefore, as mentioned above, the area occupied by the black matrix 21 is very large.

<p> Therefore, in the above-described configuration, the effective reflection area is significantly reduced, and there is a problem that the aperture ratio and the brightness are lowered.</p><p> The present invention has been proposed to solve the above-mentioned problems, and includes an array for a reflective liquid crystal display device capable of realizing high aperture ratio and high brightness, including a patterned spacer that maintains a gap in the liquid crystal panel. Basic<u style="single">Of the board</u>It provides a manufacturing method.</p>

<p><u style="single">Book</u>The method for manufacturing a reflective liquid crystal display device according to the invention includes a step of forming a gate wiring on an upper portion of a substrate having a first pixel region and a second pixel region, and a step of intersecting the gate wiring to form the first pixel region and the second pixel. A step of forming a data wiring defining a region, a step of forming a thin film transistor connected to the gate wiring and the data wiring and including a gate electrode, an active layer, a source electrode and a drain electrode, and the first step on the upper part of the thin film transistor. A step of forming a first reflective electrode and a second reflective electrode in each of the pixel region and the second pixel region, which are separated from each other by the first gap and completely cover the data lines of the first pixel region and the second pixel region. , The stage of forming a photosensitive organic film on the entire surface of the substrate including the first reflecting electrode and the second reflecting electrode, and<u style="single">Irradiate light from the bottom of the substrate</u>A spacer patterned by exposing the photosensitive organic film to light that has passed through the first gap and continuously developing the photosensitive organic film so as to fill the entire first gap between the first reflecting electrode and the second reflecting electrode. The data wiring was composed of a first line and a second line separated from each other by a second gap at the lower positions of the first reflecting electrode and the second reflecting electrode sandwiching the spacer, including the step of forming. It is characterized by that.</p><p><u style="single">Also</u>A method for manufacturing a reflective liquid crystal display device according to another invention includes a step of forming a gate wiring on an upper portion of a first substrate having a first pixel region and a second pixel region, and the first pixel intersecting the gate wiring. A step of forming a data wiring that defines a region and a second pixel region, a step of forming a thin film transistor that is connected to the gate wiring and the data wiring and includes a gate electrode, an active layer, a source electrode, and a drain electrode, and a step of forming the thin film transistor of the thin film transistor. The first and second reflective electrodes are separated from each other by the first gap and completely cover the data lines of the first pixel region and the second pixel region in the upper first pixel region and the second pixel region, respectively. And a step of forming a photosensitive organic film on the entire surface of the substrate including the first reflecting electrode and the second reflecting electrode.<u style="single">Irradiate light from the bottom of the substrate</u>The photosensitive organic film is exposed to light that has passed through the first gap and continuously developed to form a spacer patterned so as to fill all the first gaps between the first reflecting electrode and the second reflecting electrode. A step, a step of forming a color filter layer on the upper part of the second substrate, a step of forming a common electrode on the upper part of the color filter layer, and a step so that the first reflecting electrode and the second reflecting electrode face the common electrode. The data wiring includes a step of joining the first substrate and the second substrate and a step of forming a liquid crystal layer between the first reflective electrode and the second reflective electrode and the common electrode, and the data wiring is the spacer. It is characterized in that it is composed of a first line and a second line separated from each other by a second gap at the lower positions of the first reflecting electrode and the second reflecting electrode sandwiching the above.</p>

<p> In such a configuration, since the black matrix is not formed in the portion corresponding to the data wiring, the area of only the coalescence margin considered when designing the black matrix can be used as the opening, so that a high aperture ratio is obtained. Can be realized.</p><p> Further, since the patterned spacer uses the array wiring formed on the substrate and the reflecting electrode as a mask, an accurately patterned spacer can be formed between the separated regions of the reflecting electrode. It also has the advantage of reducing manufacturing costs because it does not require a separate mask.</p>

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. --Embodiment-- The feature of this embodiment is that the data wiring is configured under the reflective electrode, and a patterned spacer is configured in the separation region between the reflective electrodes.

FIG. 10 is a cross-sectional view showing a schematic configuration of a reflective liquid crystal display device according to the first embodiment of the present invention. As shown in the figure, the first substrate 100 and the second substrate 140 are separated from each other by a predetermined interval, and the gate electrode 102, the active layer 110, and the source electrode are formed on one surface of the first substrate 100 facing the second substrate 140. A thin film transistor T including 114 and a drain electrode 116, a data wiring 118 in contact with the source electrode 114, and a gate wiring (not shown) connected to the gate electrode 102 are configured. Both wirings define a plurality of pixel regions including a first pixel region P1 and a second pixel region P2 that intersect and are adjacent to each other.

A protective film 120 is formed on the entire surface of the substrate 100 on which the thin film transistor T and the data wiring 118 are formed, and the drain electrode 116 is formed on each of the first pixel region P1 and the second pixel region P2 above the protective film 120. The first reflecting electrode 124a and the second reflecting electrode 124b are configured so as to be in contact with each other and separated from each other by the first gap g1. At this time, the first reflecting electrode 124a and the second reflecting electrode 124b are formed in a concavo-convex shape in order to increase the brightness. Of course, it is common to form the surface of the protective film 120 in an uneven shape and indirectly express the uneven shape through the uneven shape.

In the above-described configuration, the data wiring 118 is composed of a first line 118a and a second line 118b that are divided on both sides and separated from each other by a second gap g2, and the separated first line 118a and second line 118b are separated. It is formed to extend below the first reflecting electrode 124a and the second reflecting electrode 124b, which are adjacent to each other in the horizontal direction. The width of the gap g1 has the same width or a smaller width than the width of the gap g2.

A color filter layer 134 including red, green, and blue sub-color filters 134a, 134b, and 134c corresponding to the pixel regions is configured on one surface of the second substrate 140 facing the first substrate 100. A transparent common electrode 132 is formed below the color filter layer 134.

In the configuration of the reflective liquid crystal display device described above, the first gap g1 of the first reflective electrode 124a and the second reflective electrode 124b configured in the first pixel region P1 and the second pixel region P2 adjacent to each other in the parallel direction, respectively. A columnar patterned spacer 150 is formed in the region.

The configuration as described above can realize a high aperture ratio because the effective area occupied by the black matrix can be reduced unlike the conventional one. Further, the patterned spacer 150 not only has a function of maintaining a cell gap, but also prevents light scattered by the unevenness of the reflective electrode 124 from being emitted between the separated regions of the reflective electrode 124. It plays a role in preventing a decrease in contrast.

Hereinafter, the planar configuration of the array substrate for a reflective liquid crystal display device according to the first embodiment of the present invention will be described in more detail with reference to FIG. As shown in the figure, a gate wiring 106 and a data wiring 118 that define a plurality of pixel regions including a first pixel region P1 and a second pixel region P2 that are vertically intersecting and adjacent to each other are configured. At the intersection of the two wirings 106 and 118, the gate electrode 102 connected to the gate wiring 106, the active layer 110, the source electrode 114 connected to the data wiring 118, and the drain electrode separated from each other by a predetermined distance. A thin film transistor T including 116 is configured, and each of the first pixel region P1 and the second pixel region P2 constitutes a first reflecting electrode 124a and a second reflecting electrode 124b that come into contact with the drain electrode 116.

At this time, the data wiring 118 is composed of a first line 118a and a second line 118b that are separated from the end, and each has a shape extending to the lower part of the adjacent first reflecting electrode 124a and second reflecting electrode 124b. Is. The sum of the widths of the first line 118a and the second line 118b must be the same as the width of the conventional data wiring in consideration of the line resistance.

A patterned spacer 150 is formed in the separation region F of the first reflection electrode 124a and the second reflection electrode 124b configured in the adjacent first pixel region P1 and the second pixel region P2, respectively. Since the patterned spacer 150 is configured by masking the first reflective electrode 124a and the second reflective electrode 124b and the gate wiring 106, it is not configured on the upper part of the gate wiring 106.

At this time, the first line 118a and the second line 118b are configured to be connected at least once at a portion passing through the gate wiring 106, and such a connecting portion is configured to overlap with the gate wiring 106.

Hereinafter, a method for manufacturing an array substrate for a reflective liquid crystal display device according to the present invention will be described with reference to FIGS. 12A to 12F. 12A to 12F are process cross-sectional views taken along the line XII-XII of FIG. 11 and shown according to the process sequence of the present invention. First, as shown in FIG. 12A, a gate wiring (106 in FIG. 11) including a gate electrode 102 is formed on the substrate 100. The mainstream of the gate material is aluminum (Al), which has a low resistance in order to reduce the RC delay because it is important for the operation of the liquid crystal display device, but pure aluminum is chemically corrosion resistant. In the case of aluminum wiring, a laminated structure (Al / Mo) including aluminum wiring may be applied because it is weak and causes a wiring defect problem due to hillock formation in the subsequent high temperature process.

Next, as shown in FIG. 12B, silicon nitride (SiN) is formed on the entire surface of the substrate 100 on which the gate electrode 102 and the like are formed._x) And silicon oxide (SiO)_x) Etc. are deposited to form the gate insulating film 108 by depositing one selected from the group of inorganic insulating substances.

Next, an active layer 110, which is amorphous silicon (a-Si: H) laminated in an island shape on the gate insulating film 108 above the gate electrode 102, and amorphous silicon containing impurities (). n + a-Si: H) Form an ohmic contact layer 112.

Next, as shown in FIG. 12C, it was selected from the conductive metal group containing chromium (Cr), molybdenum (Mo), antimony (Sb), and titanium (Ti) on the upper part of the ohmic contact layer 112. After vapor deposition of one, patterning is performed, and the source electrode 114 and the drain electrode 116 are connected to the source electrode 114, and the gate wiring (not shown) is vertically intersected and adjacent to the first pixel region P1 and A data wiring 118 that defines a plurality of pixel regions including the second pixel region P2 is formed.

At this time, the data wiring 118 is divided into a first line 118a and a second line 118b from one side end of the substrate 100, and is configured so as to be separated from each other by a second gap g2, and the first pixels adjacent to each other in the horizontal direction. It is configured to extend to the area P1 and the second pixel area P2, respectively. The first line 118a and the second line 118b are configured to be connected at least once from a portion intersecting the gate wiring (not shown), and such a connecting portion is configured to overlap the gate wiring.

Next, an organic insulating substance containing benzocyclobutene (BCB) and an acrylic resin (resin) is applied to protect the entire surface of the substrate 100 on which the source electrode 114, the drain electrode 116, and the data wiring 118 are formed. It forms a film 120.

Subsequently, the protective film 120 is etched to form a drain contact hole 122 in which the drain electrode 116 partially exposes. At this time, the surface of the protective film 120 corresponding to the pixel region P is formed by a predetermined method with irregularities composed of convex portions and concave portions.

Next, as shown in FIG. 12D, the exposed drain electrode 116 is in contact with the exposed drain electrode 116 and is arranged in the first pixel region P1 and the second pixel region P2, respectively, and separated from each other by the first gap g1. 1 The reflective electrode 124a and the second reflective electrode 124b are formed. The first reflective electrode 124a and the second reflective electrode 124b use a conductive material having low resistance and excellent reflectance, such as silver (Ag), aluminum (Al), or an aluminum alloy.

At this time, the first reflecting electrode 124a and the second reflecting electrode 124b are indirectly made uneven due to the unevenness of the protective film 120, and high reflectance can be realized.

Next, as shown in FIG. 12E, a negative photoresist is applied to the entire surface of the substrate 100 on which the first reflective electrode 124a and the second reflective electrode 124b are formed to form the photosensitive organic film 126. To do.

Next, the photosensitive organic film 126 is exposed by irradiating light L from the lower part of the substrate 100. At this time, the light L exposes only the organic film 126 exposed in the separated inter-region F of the first reflecting electrode 124a and the second reflecting electrode 124b.

Therefore, as shown in FIG. 12F, a patterned spacer 150 is formed in a portion corresponding to the separated region of the first reflecting electrode 124a and the second reflecting electrode 124b. Through the steps as described above, the array substrate for the reflective liquid crystal display device according to the present invention can be manufactured.

In the array substrate for a reflective liquid crystal display device according to the present invention as described above, since the data wiring is configured under the reflective electrode, the coalescence margin of the black matrix can be secured as an opening, and a high aperture ratio is realized. There is an effect that can be done. Further, by forming a patterned spacer between the separated regions of the reflecting electrode, not only the gap of the liquid crystal cell can be maintained in a stable state unlike the conventional case, but also the light diffusely reflected by the unevenness of the reflecting plate can be maintained. However, it is possible to prevent a light leakage defect emitted to the upper part corresponding to the separated region of the reflective electrode, so that there is an effect that high contrast can be realized.

<figref num="1">It is an enlarged plan view which showed a part of the array substrate for a general reflective liquid crystal display device.</figref><figref num="2">It is sectional drawing which showed the shape which the ball spacer was formed between the 1st substrate and 2nd substrate.</figref><figref num="3">It is a partial cross-sectional view of the liquid crystal display device which constructed the conventional patterned spacer.</figref><figref num="4A">It is sectional drawing which showed the conventional patterned spacer formation process using a positive type photosensitive organic film.</figref><figref num="4B">It is sectional drawing which showed the conventional patterned spacer formation process using a positive type photosensitive organic film.</figref><figref num="5A">It is sectional drawing which showed the conventional patterned spacer formation process using a negative type photosensitive organic film.</figref><figref num="5B">It is sectional drawing which showed the conventional patterned spacer formation process using a negative type photosensitive organic film.</figref><figref num="6A">It is sectional drawing for demonstrating the characteristic of a positive type photosensitive organic film.</figref><figref num="6B">It is sectional drawing for demonstrating the characteristic of a positive type photosensitive organic film.</figref><figref num="7A">It is sectional drawing for demonstrating the characteristic of a negative type photosensitive organic film.</figref><figref num="7B">It is sectional drawing for demonstrating the characteristic of a negative type photosensitive organic film.</figref><figref num="8">It is sectional drawing of the conventional reflective liquid crystal display device.</figref><figref num="9">It is an enlarged sectional view which enlarged F of FIG.</figref><figref num="10">It is sectional drawing of the reflection type liquid crystal display device by this invention.</figref><figref num="11">FIG. 5 is an enlarged plan view of a part of the array substrate for a reflective liquid crystal display device according to the present invention.</figref><figref num="12A">It is a process sectional view which showed the manufacturing process of the array substrate for the reflection type liquid crystal display device by this invention by the process sequence.</figref><figref num="12B">It is a process sectional view which showed the manufacturing process of the array substrate for the reflection type liquid crystal display device by this invention by the process sequence.</figref><figref num="12C">It is a process sectional view which showed the manufacturing process of the array substrate for the reflection type liquid crystal display device by this invention by the process sequence.</figref><figref num="12D">It is a process sectional view which showed the manufacturing process of the array substrate for the reflection type liquid crystal display device by this invention by the process sequence.</figref><figref num="12E">It is a process sectional view which showed the manufacturing process of the array substrate for the reflection type liquid crystal display device by this invention by the process sequence.</figref><figref num="12F">It is a process sectional view which showed the manufacturing process of the array substrate for the reflection type liquid crystal display device by this invention by the process sequence.</figref>

Code description

100: Substrate, 102: Gate electrode, 108: Gate insulating film, 110: Active layer, 112: Ohmic contact layer, 114: Source electrode, 116: Drain electrode, 118: Data wiring, 120: Protective film, 124a, 124b: Reflective electrode, 130: liquid crystal layer, 132: common electrode, 134a, 134b, 134c: color filter.