Multilayered optical structures

【0001】<u style="single">Technical field</u>The present invention relates to a multilayer optical structure including a layer of an optical material such as glass or crystalline material. In particular, the present invention relates to a plurality of optical layer structures having various optical characteristics used in, for example, planar optical instruments, optical fibers, optical fiber preforms, optical memories, and the like. [0002]<u style="single">Background technology</u>Congruences or agglomerates of mechanical, electrical and / or optical components within an aggregator create great demand for material manufacturing. Further, it is desired to install a larger number of integrated devices in the same volume. In order to form their integrated structure, there is great interest in providing selected properties for the unique components on the substrate. In order to form an optical device with high quality optical material, the coatings and layers of the material are very uniform. [0003] The wavelength of optical communication currently used is 1.3 to 1.6 microns. The optical waveguide has a size several tens of times the wavelength. Thus, optical structures are typically a few microns to about 100 microns in size, depending on the desired light mode conditions and other factors. [0004] The increase in communication and information technologies, including systems based on the Internet, has stimulated global activities to realize optical communication networks that utilize the large bandwidth available on optical communication networks. The capacity of fiber optic technology is the Dense Wavelength Division. It can be further expanded by the realization of Multiplexing) technology. As demand increased, more channels were needed to enhance system functionality. In order to manufacture more complex optics, it is required to deposit high quality optics on more complex structures and / or assemblies. In addition, the optical material must be made into a unique device. [0005] The basic characteristics of optical materials include surface texture, uniformity, and optical quality. Optical quality is referred to as sufficiently small absorption and scattering loss to achieve the desired transmission level. Optical quality also includes uniformity of optical properties such as refractive index and birefringence properties. In addition, the optical properties are influenced by the properties of the interface, such as the interface between the core layer and the clad layer. For some materials, silica (SiO), despite the single crystal shape having the highest quality light transmission.₂) And many other materials, the preferred form for light transmission is glass. [0006] Many techniques have been used and proposed for the precipitation of optical materials. These techniques include, for example, flame hydrolysis deposition, chemical vapor deposition, physical vapor deposition, sol-gel chemical deposition, and ion implantation. The forms of flame hydrolysis and chemical vapor deposition have been successful in the production of glass fibers used as fibrous optics. In the flame polymerase precipitation method, hydrogen-oxygen flame is used to react a gas precursor to form particles of an optical material as a film on a substrate surface. The coating can then be heat treated to form a uniform optical material, usually a glass material. [0007] It will be difficult to introduce different elements into the desired composition, whether dopants or stoichiometric components. In particular, it is difficult to mix elements to form a complex composition of optical materials. A further challenge will be the ability to place a particular complex composition at a particular location within the structure. [0008] Methods for producing highly homogeneous submicron and nanoscale particles by laser pyrolysis have been developed. Higher uniformity particles are required to form various devices including, for example, batteries, abrasives, catalysts, and phosphors for light display. Laser pyrolysis requires a strong beam of light to drive the chemical reaction of the reactant flow, forming highly homogeneous particles after rapid cooling of the flow before leaving the laser beam. The laser pyrolysis method has the advantage that a variety of different elements can be incorporated into the composition of the particles. [0009]<u style="single">Disclosure of invention</u>In a first aspect, the present invention relates to a monolithic optical structure comprising a plurality of layers. Each layer has an independent optical path confined within the layer portion. A monolithic optical structure can include one or more integrated optical circuits. In some embodiments, the monolithic optical structure can include at least a plurality of independent optical paths with optical cores penetrating in the linear direction of the structure, especially for use as a preform. [0010] In another aspect, the invention relates to a method of making a monolithic optical structure, which method involves passing the structure through a stream of particles multiple times. The composition of the particles varies between passages and the next passage. The particles form a number of layers, each layer having an optical material after each layer is in close contact with a plurality of layers having independent optical paths confined within the layer portion. .. The particle layer may or may not have uniform optical properties throughout the layer. [0011] In another aspect, the invention relates to a flexible optical fiber having a plurality of independent optical channels. The optical channel includes an optical core material that penetrates along the linear direction of the optical fiber. [0012] Furthermore, the present invention relates to a method for producing an optical fiber, which comprises stretching a patterned / layered preform while heating it to a softening temperature to produce an optical fiber. This optical fiber has a plurality of independent optical channels including an optical core material. [0013] The present invention then relates to a computer including a non-volatile optical memory that stores a plurality of selectively accessible programs. [0014] Further, the present invention relates to a method of producing a structure having at least a three-particle coating, each of which covers at least a portion of the substrate surface, the method of precipitating at least a portion of the flow of particles on the substrate. including. The precipitation of the particles involves moving the substrate through the particle stream of the particles three times within about one minute at the longest. [0015] In the next embodiment, the present invention relates to the preform of an optical fiber containing a plurality of layers, each layer consisting of an optical material forming a plurality of independent optical paths penetrating along the linear direction of the structure. [0016] The present invention also relates to a method of operating a computer, including selecting and executing a program from a non-volatile optical memory. The non-volatile optical memory includes a plurality of programs. [0017] One of ordinary skill in the art will be able to clarify or clarify other systems, methods, shapes, and advantages of the present invention by examining the figures and detailed description below. All such additional systems, methods, shapes, and advantages are meant to be included in the invention, within the scope of the invention, and protected by the appended claims. .. [0018]<u style="single">Detailed description of the invention</u>The composite optical structure is formed with a plurality of optical paths in a multilayer optical material having selected optical properties in the layer and / or in a part of the layer. These composite structures can be effectively utilized to achieve improved light transmission and workability. Focused radiation (eg, light) reactive precipitation methods include, for example, various refractive indexes and / or compositions in order to incorporate appropriate optical properties into a particular layer or a particular part of a layer within a multilayer structure. It is a widely used method for forming layered materials. In a particularly interesting embodiment, an optically independent layer, and in some embodiments, an optically independent channel within one layer, forms a multilayer structure incorporating the desired optical channel / optical path. Will be done. Multilayer structures are applied to form multidimensional optical structures with individual layers that optically function as optical circuits in integrated optics, or from multilayer preforms to form products such as multichannel optical fibers. Adapted to The multidimensional optical structure can be used to form a multidimensional optical storage device. [0019] Particularly interesting multilayer optical structures are those having regions or parts of layers within layer morphologies with different optical properties. These changing optical properties are utilized in independent optical channel structures within a multilayer optical structure. Interesting optical properties of various optical materials include, for example, refractive index, scattering, birefringence, photoactivity, absorption / transmission, and the like. The optical properties of the material can be altered, for example, by changing the density, structure, uniformity, and chemical composition. In particular, the chemical composition provides many parameters for adjusting the optical properties over a wide range. Within a multi-layer structure, the optical properties of the individual layers or some of the layers are generally selected based on the intended use of the structure. [0020] In order to form a highly uniform coating and device, a new method called focused radiation (eg, photo) reactive precipitation has been advanced. Focused radiation (eg, light) reactive precipitation methods include a focused radiation (eg, light) driven flow reactor formed to generate particles in the flow and subsequently deposit the produced particles on the surface. To form submicron powders, focused radiation (eg, light) reactive precipitation methods incorporate the characteristics of radiation-based processes to drive the reaction of flow reactions, but this precipitation method is a high source of radiation. When a bright light beam is incorporated, the process of the radiation system is known as the laser thermal decomposition method in the direct coating process. In particular, a wide range of reaction precursors can be used to generate a reaction flow with composition in the form of gases, vapors, and / or aerosols, and the efficient formation of a wide range of highly homogeneous produced particles. Can be done. Reactant transport methods developed for laser pyrolysis can be applied to focused radiation (eg, light) reactive precipitation methods. For convenience, this application refers interchangeably to the thermal decomposition of the radiation system and the laser thermal decomposition method, and interchangeably refers to the focused radiative precipitation method and the photoreactive precipitation method. [0021] [0021] In the laser pyrolysis method, the reaction flow reacts with a high-intensity light beam, for example, a laser beam. Laser beams are a convenient source of energy, but other high-intensity light sources can also be used in laser pyrolysis methods. Laser pyrolysis provides phase formation of materials that are thermodynamically difficult to form in equilibrium. As the reactant flow departs from the light beam, the resulting particles cool rapidly. For the production of doped material or other composite optical material, the method out to prepare the composition of the material in the desired range it is advantageous as possible. [0022] A basic feature of a device that succeeds in laser pyrolysis / photochemical precipitation for particle formation with the desired composition and the equivalent coating is to generate a reaction stream containing the appropriate precursor composition. It is in. In particular, the formation of the dope material by the photoreactive precipitation method includes the host glass or crystal precursor in the reactant flow and optionally the precursor of the dopant. In particular, the composition of the produced optical material is adjusted to the desired stoichiometric and dopant composition by varying the composition of the reactant flow. Similarly, if the precursor is not a suitable radiation absorber, an additional radiation absorber is added to the reactant stream to absorb the energy of light and convert it to other compounds in the reactant stream. Other additional reactants can be used to adjust the reaction flow to an oxidation / reduction atmosphere. [0023] Submicron inorganic particles with various stoichiometry and crystal structures including amorphous structures have been formed by laser pyrolysis alone or by laser pyrolysis with additional steps. In particular, amorphous and crystalline submicron and nanoscale particles can be produced using laser pyrolysis with selected dopants. Similarly, the use of light driven reaction methods can produce a variety of new materials. The photoreactive precipitation method can be used to form a highly homogeneous coating of glass, i.e., from an amorphous or crystalline material, selectively containing, for example, a dopant containing a composite mixture of dopant compositions. [0024] In order to form a uniform glass layer, the layer of amorphous particles precipitated by the photoreactive precipitation method can be solidified / densified. To solidify the glass, the powder is heated above the flow temperature of the powder. At those temperatures, the powder densifies to form a uniform layer of glass material. In fact, uniform optical materials have optical qualities that allow light to pass through. Dopant contamination in the particles is distributed through the high density glass obtained as a result of powder precipitation. Similarly, in crystalline optical materials such as sapphire, the formation of sapphire can be formed within the layer by solidifying a crystalline powder such as aluminum oxide. Dopants can be introduced into the crystalline material. Similarly, a suitable heating and cooling rate is usually used to solidify the amorphous material (generally a slow cooling rate) in the crystal layer and the crystalline powder (generally a fast cooling rate) in the glass layer. [0025] Common commercial methods for introducing dopants, especially rare earth dopants, into glass materials include the initial glass formation followed by the introduction of the dopant from the gaseous or liquid state into the glass. The glass can be formed with pores that facilitate the introduction of dopants within it. These methods usually require a plurality of steps to form pores in the glass. Furthermore, it is difficult to obtain the desired dopant concentration and uniform distribution of dopants. In contrast, the flow reaction methods described herein incorporate the dopant directly into the glass material. Therefore, it is not necessary to form the pores of the glass, and many steps can be reduced, usually without the extra steps required to change the composition. [0026] By applying the characteristics of the laser pyrolysis method, the photoreactive precipitation method can precipitate very few particles with high uniformity. Due to the uniform and small size of the powder, the photoreactive precipitation method can be used to form a uniform and smooth coated surface. By using the photoreactive precipitation method and subsequently heating, a silicon oxide glass film having a surface roughness of about 0.25 to about 0.5 nm of the root mean square measured by an atomic force microscope was formed. Therefore, its surface is smoother than that believed to be obtained by the flame hydrolysis precipitation method and is comparable to the smoothness obtained by the chemical vapor deposition method. These smooth glass coatings using the Photoreactive Precipitation Method (LRD) precipitate at a relatively high precipitation rate by moving the substrate through the formation stream. Thus, it has already become clear that LRD can be an efficient and effective method for forming very high quality glass coatings. [0027] Further, by using the photoreactive precipitation method, it is possible to selectively change the composition to form a complicated structure having a complicated material change. In addition, by applying laser pyrolysis techniques for the production of commercial production of powders, the photoreactive precipitation method can form high quality coatings at a very high rate. Additionally, the substrate can be swept through the generated particle stream to form multiple layers. [0028] Each coating layer has a high degree of uniformity and smoothness, so that multiple layers can be laminated and the optics can be applied to the entire layer structure without any structural deformation that adversely affects the ability to form the optics. Appropriate control over the layered structure can be maintained so that it can be formed. In order to form the desired optical structure, the composition can be changed within the structure, between layers, i.e., in the direction perpendicular to the structural plane, or at a portion of the layer. In this way, a multilayer structure of laminated integrated optical devices can be formed. [0029] In order to form an optical laminate, the coating substrate must generally be heated to produce a uniform optical material with acceptable optical properties. Solidification of the layer into a dense optical material can be achieved at various stages during layer formation. For example, this heating step may be performed after precipitation of each layer, after precipitation of several layers, or after precipitation of all layers. One or more layers may be patterned for solidification and certain optical materials may be placed on a portion of one layer. If the substrate is selectively heated over only a part of the substrate, only a part of the layer can be solidified in a specific heating process. In general, increasing the number of heating processes improves the quality of the glass layer, but further processing efforts are required. The photoreactive precipitation method can produce high quality layers by heat treatment after precipitation of a large number of layers without excessively reducing the quality of the composite structure. [0030] In order to form a patterned structure in one layer, a desired pattern in one or more layers is used by using a patterning method such as a lithograph method or a photographic method together with an etching method such as chemical etching or radiation system etching. Can be formed. This patterning is generally done on an intermediate precipitate before precipitating additional material. [0031] The method for forming the structure of the optical material of the multi-layered multi-optical path described here is generally based on the precipitation of a plurality of layers, and each layer of the plurality of layers is used to form a special structure within a specific layer. It may or may not be controlled. The ability to form multi-layer optical structures opens up the possibility of forming optical materials with high transfer performance in very small volumes. For example, multiple optical channels along different layers, or optical paths, can be formed within a single structure, for example, in the z-plane, that is, in the plane perpendicular to the coating substrate, by changing the precipitation material. Can be integrated into. Alternatively, or in addition to this, by selectively precipitating a selective optical material covering a portion of one layer to form adjacent optical channels along one layer, or With proper etching or another method, multiple structures can be formed on one layer by contouring the material to form independent regions within the layer, i.e. within the xy plane of the substrate. it can. A single monolithic structure with multiple optical channels simultaneously transmits a plurality of corresponding uncorrelated optical signals, each optical signal having a material-dependent maximum bandwidth within a particular optical channel. The optical independence of the optical channels within the monolithic structure keeps the signal uncorrelated, even if the spatial separation distance is small. [0032] Multilayer optics are used to form planar optics that include optical circuits with optical waveguides in individual layers and, in general, multiple additional integrated optics such as couplers and amplifiers. be able to. Therefore, a laminated structure including a plurality of integrated optical circuits can be formed in a monolithic structure. According to this method, a large number of optical devices can be placed in a small volume. In some embodiments, layer-based stacking of integrated optics dramatically increases mounting capacitance by applying a large number of integrated optics, usually along a flat surface on a flat substrate. The thinness of the layers allows additional layers with optical circuits and / or other optics to be added to each layer without significantly changing the space occupied by the monolithic shape. Therefore, it is easy to add the same footprint as in conventional equipment due to the large scale or significant increase in optical processing power. [0033] Similarly, the multilayer optical structure can be used for fibrous preforms. Optical fibers are generally formed by stretching from a large mass of material. In other embodiments, the mass of material is in the preform, even though the composition of the interior of the fiber and parts thereof can also be modified by the dopant or additional dopant in the fiber following the forming of the fiber. A raw material for an optical material having a composition selected for the fiber in an appropriate position is provided. In general, the composition of the fiber needs to be changed after fiber molding, as the photoreactive precipitation method can introduce the desired composition within the selected layer of the preform in place within the layer for a very wide range of applications. There is no. This wide range of applications is particularly valuable in the molding of multi-layered preforms, as the composition can be placed in desired positions within the preform. [0034] The optical fiber includes a core covered with a clad material, and the core and clad have different refractive indexes so that light of an appropriate frequency is confined in the core region. In particular, by using the photoreactive precipitation method, the fiber preform changes within one layer and between layers so that multiple independent optical channels arranged in two dimensions can be formed inside the monolithic shape. Can be produced with the selected chemical composition. A monolithic shape with a two-dimensionally varying composition stretches a fiber with a number of corresponding independent optical channels arranged within a single fiber to provide for increased transmission capacity. Can be used as a preform to form. The varying compositional composition within the preform is preserved within the corresponding fiber, even though the dimensions of the structure are apparently changed by stretching into the fiber. Further, the multilayer monolithic structure can be used as a coupler of a monolithic optical structure including a multi-channel optical fiber and / or a laminate of optical integrated circuits. [0035] The ability to form complexes of 3D optics includes robust 3D optical memory devices, optical waveguides / conduits / fibers (eg Bragg gratings), optical attenuaters, optical demultiplexers. / Combiner, Optical Filter, Optical Switch, Laser, Modulator, Interconnector, Optical Isolator, Optical Addrop Multiplier (OADM), Optical Amplifier, Polarizer, Optical Mirror / Reflector, Optical Phase Delayer , And has the advantage of being applicable to the formation of optical detectors. In some embodiments, the three-dimensional optical structure can be formed as a preform of an optical fiber. In the selected embodiment, the optical memory unit can be formed as a large capacity non-volatile memory system. The unit inside the monolithic structure forms an independent data element that can be called by address as a data storage area. The non-volatile memory can be advantageously used for storing computer programs. [0036]<u style="single">Photoreactive precipitation method for film formation</u>In a particularly interesting embodiment, the optical layer can be formed by a photoreactive precipitation method. A highly uniform flow of produced particles is formed and directed towards the substrate to be coated. The resulting particle coating is formed on an optical material such as glass or crystals. [0037] The photoreactive precipitation method is a coating method that drives the synthesis of a desired composition from a reaction stream that flows using a high-intensity light source. In the photoreactive precipitation method, the thermal particles precipitated on the surface are partially melted in the precipitation process at that temperature, but in general, powder is precipitated. The photoreactive precipitation method is similar to the laser pyrolysis method in that in powder synthesis, a strong focused radiation (eg, light) source drives the reaction. Laser pyrolysis involves a strong radiation (eg, light) beam in the reaction region where the reaction product forms particles, i.e., a flowing reaction stream that intersects the focused transmitted light. The particles produced by the laser pyrolysis method are recovered for next use, but in the laser reactive precipitation method, the obtained composition is directed to the surface of the substrate on which the film is formed. The characteristic of the laser pyrolysis method that a very uniform particulate product is obtained is similarly introduced in the production of a coating with high uniformity. [0038] In the photoreactive precipitation method, the coating of the substrate can be performed in a coating chamber separated from the reaction chamber, and the coating can be performed in the reaction chamber. In either configuration, the reactant transport mechanism can be configured similar to the reactant transport mechanism for laser reactors that produce particles of various compositions. A wide range of coatings are then formed for the next treatment of the optical material. [0039] If the coating is formed in a coating chamber separate from the reaction chamber, the processing volume of the reactants and the dimensions of the reaction distribution will be set to suit the coating process, but the reaction chamber is a laser pyrolysis method. It is essentially the same as the reaction chamber of. In these embodiments, the coating chamber and the conduit connecting the coating chamber to the reaction chamber are replaced with a recovery mechanism of a laser pyrolysis mechanism. If the coating is done in the reaction chamber, the substrate intersects the flow from the reaction region and deposits the particles directly onto the substrate. [0040] The design of laser pyrolyzers incorporating elongated reactant inlets has evolved to facilitate commercial particle volume production. This design is based on Bi et al.'S USP5958348, "Efficient Production of" Particle by Chemical Reaction ", which is incorporated herein by reference. Further embodiments and other suitable shapes of commercial capacity laser pyrolyzers have been transferred to Mosso et al. And pending. USP application 09/362631, "Particle Production MFP", incorporated herein by reference. These designs for commercial particle production by laser pyrolysis are by photoreactive precipitation. It can be adapted to the rapid coating of high quality optical materials. [0041] In some embodiments of the mass laser pyrolysis apparatus, the reaction chamber and reactant inlet are significantly elongated along the light beam to provide increased throughput of reactants and products. By directing the light beam to the elongated reaction stream, product particles are generated in sheet form. As described below, the transport of gaseous / vapor reactants and / or aerosol-like reactants is suitable for elongated reaction chamber designs. The elongated reactant inlet is selected based on the dimensions of the substrate to be coated. [0042] Generally, a particle generator equipped with an elongated reaction chamber and a reaction inlet is designed to reduce the dirt on the wall surface of the chamber, increase the production capacity, and make effective use of resources. The result of the chamber design allows the elongated reaction chamber to increase the amount of reactants and products processed without increasing the associated dead volume. The dead volume of the chamber can be contaminated with unreacted compounds and / or reaction products. In addition, a suitable shielding gas stream can confine the reactants and products in a stream that passes through the reaction chamber. The high throughput of the reactants makes effective use of the energy of the focused radiation (eg, light). [0043] In the photoreactive precipitation method, the particle formation rate can be varied from a reaction product of about 5 grams / hour to a desired reaction product of about 10 kilograms / hour. In particular, when using the apparatus described herein, coating can be achieved at a particle formation rate of at least about 10 kilograms / hour (kg / hr), and in some embodiments at least 1 kg / hr. Yes, in other embodiments it is as low as about 25 grams / hour (g / hr), and in yet another embodiment it is about 5 g / hr. Those skilled in the art will appreciate that production rates in between these explicit production rates are predictable and within this disclosure. Typical particle generation rates are about 5 or more, 10 or more, 50 or more, 100 or more, 250 or more, 500 or more, 1000 or more, 2500 or more, 5000 or more, or 10000 or more (in grams generated per hour). including. [0044] Not all the generated particles are deposited on the substrate. In general, in an embodiment based on a moving substrate that passes through a sheet-like product stream, the precipitation efficiency depends on the relative velocity of the product stream that contains particles that pass through the substrate. With slow relative velocity substrate movement, a coating efficiency of about 15 to about 20 percent is achieved, i.e., about 15 to about 20 percent of the produced particles are deposited on the substrate surface. This precipitation efficiency can be further increased by normal optimization. A deposition efficiency of at least about 40% is achieved when the substrate passing through the generated particle stream is in slow relative motion. In some embodiments, the particle formation rate is such that the reaction product precipitates on the substrate at at least about 5 grams / hour, or instead, or in addition, at at least about 25 grams / hour. In general, depending on the achievable particle formation rate and precipitation efficiency, the precipitation rate is at least 5 g / hr, about 25 g / hr can be obtained in other embodiments, and at least about 100 g / hr in yet another embodiment. At 5 kg / hr, in yet another embodiment, about 250 g / hr to 2.5 kg / hr can be obtained. Those skilled in the art will appreciate that precipitation rates between these stated rates are predictable and within the scope of this disclosure. Typical particle deposition rates are about 5 or more, 10 or more, 25 or more, 50 or more, 100 or more, 250 or more, 500 or more, 1000 or more, 2500 or more, or 5000 or more (in grams generated per hour). including. [0045] Alternatively or additionally, the present invention provides that the relative velocity of each other's motion between the substrate and the particle flow can be substantially modified by the desired specifications of the coated substrate. Thus, in certain embodiments, the relative velocity can be measured in absolute velocity and can be varied in the range of about 0.001 inch / sec to about 12 inch / sec or more. Moreover, in another embodiment, the relative velocity can be measured on the coated substrate scale and can vary from about 1 substrate / minute to about 1 substrate / second. [0046] For suitable embodiments using sheet-like generated particles, the operating rate of the substrate is generally limited by the precipitation rate of choice and the ability to move the substrate at the desired rate while obtaining the desired film uniformity. It is a function of thickness. Since a high precipitation rate can be achieved by the photoreactive precipitation method, a very fast coating rate can be easily achieved. These coating rates with LRD are dramatically faster than the rates achievable by competing methods. Especially when the particle formation rate is about 10 kg / hr, an 8-inch wafer takes about 1 second, even though the precipitation efficiency is only about 2.5 percent assuming the powder density is about 10 percent of the bulk density. , Can be coated with a powder with a thickness of about 10 microns. One of ordinary skill in the art can calculate the coating rate, the desired thickness, and the density of the powder on the substrate, especially based on the precipitation rate, by simple geometric rules. [0047] In addition, the rapid formation rate is convenient to utilize for forming multiple particle coatings, with or without solidification during coating. Each coating can cover the entire layer or a portion of the layer. The composition can be varied within or between layers. If the composition is changed between layers, it is preferable to wait a few seconds for the product flow to stabilize. In general, a substrate of reasonable size described herein can be coated with a three-particle layer in less than one minute, in less than 15 seconds in other embodiments, and in the range of about 9 seconds to about 3 seconds in other embodiments. Can be covered. Similarly, a substrate of reasonable size described herein can be coated with a 5 particle layer in less than 1 minute, in less than 25 seconds in other embodiments, and in the range of about 15 seconds to about 5 seconds in other embodiments. Can be covered with. One of ordinary skill in the art will appreciate that the scope and partial scope within these explicit scopes are predictable and within this disclosure. [0048] The design of the improved reaction chamber 100 is outlined in Figure 1. The reactant inlet 102 leads to the main chamber 104. In general, the reactant inlet 102 conforms to the shape of the main chamber 104. The main chamber 104 includes an outlet 106 along the reactant / product flow for removing particle products, unreacted gases, and inert gases. The shielding gas inlet 108 is arranged on both sides of the reactant inlet 102. The shielding gas inlet is used to form an inert gas cover on either side of the reactant flow to prevent contact between the chamber wall and the reactants or products. The dimensions of the elongated reaction chamber 104 and the reactant inlet 102 can be designed to produce particles with high efficiency. Reasonable dimensions of the reactant inlet 102 for producing nanoparticles are CO with an output in the range of a few kilowatts.₂When using a laser, it is about 5 mm to about 1 meter. [0049] Tubular portions 11 and 12 extend from the main chamber 104. The tubular portions 110 and 112 are fixed to the window portions 114 and 116, respectively, and position the light beam path 118 passing through the reaction chamber 100. The tubular portions 110, 112 can include the inert gas inlets 120, 122 for introducing the inert gas into the tubular portions 110, 112. [0050] The outlet 106 can lead to a conduit that is directly connected to the covering chamber. No dimensional changes are required to clearly separate the transition from the reaction chamber to the conduit to the coating chamber. The reaction region is located inside the reaction chamber, and the conduit can include, although not required, a change in flow direction. Alternatively, in the reaction chamber, the substrate can block the product flow and coat the substrate. [0051] The reactant inlet is generally connected to the reactant transport mechanism. Referring to FIG. 2, embodiment 130 of the reactant transport device comprises a raw material 132 for a compound precursor. For liquid or solid reactants, selective carrier gas from one or more carrier gas sources 134 is introduced into the precursor source 132 to facilitate transport of the reactants. The precursor source 132 can be a liquid holding container, a solid precursor transport device, or other suitable container. The carrier gas from the carrier gas source 134 may be, for example, an infrared absorber, an inert gas, or a mixture thereof. [0052] The gases / vapors from the precursor source 132 are the gas from the infrared absorber source 136, the gas from the inert gas source 138, and / or the gas from the gaseous reactant source 140, and one location in the tube 142. It can be mixed by combining in. The gas / vapor is combined at a sufficient distance from the reaction chamber so that the gas / vapor mixes well before entering the reaction chamber. The gas bound in the tube 142 passes through the duct 144 into the channel 146, which is in the fluid and is connected to the reactant inlet as shown in 102 in FIG. [0053] The second reactant precursor is supplied as vapor / gas from a second reactant source 148, which is a liquid reactant transporter, solid reactant reactant, gas cylinder, or other suitable container. As shown in FIG. 2, the second reactant source 148 transports the second reactant to the duct 144 via the tube 142. Instead, the second reactant source can transport the second reactant to the second duct so that the two reactants are separated and transported into the reaction chamber. Combine in or near the reaction area of the reaction chamber. Therefore, due to the composition of composites and / or dopants, multiple reactant sources and selectively separated reaction ducts can be used for transport of reactants / precursors. For example, about 25 reaction sources and ducts are being studied, but in principle a larger number may be used. Inside the reactant transport mechanism of FIG. 2, a mass flow regulator 150 is used to regulate the gas / vapor flow. Additional reactants / precursors can be provided as well for the synthesis of composites. [0054] As mentioned above, the reactant flow can include one or more aerosols. Aerosols are produced in the reaction chamber or outside the reaction chamber before being ejected into the reaction chamber. If the aerosol is produced before it is injected into the reaction chamber, the aerosol is via a reactant inlet, equivalent to that used for gaseous reactants such as reactant inlet 102 in FIG. be introduced. For the formation of the composite, additional aerosol generators and / or vapor / gas feedstocks are combined to provide the desired composition in the reactant flow. [0055] Reactant transport nozzles formed for the transport of aerosol reactants are shown in FIGS. 3 and 4. The inlet nozzle 160 is connected to the reaction chamber at its lower surface 162. The inlet nozzle 160 includes a plate 164 bolted through a lower surface 162 to securely secure the inlet nozzle 160 to the reaction chamber. The inlet nozzle 160 includes an internal nozzle 166 and an external nozzle 168. The internal nozzle 166 may include, for example, an internal mixing atomizer 170 with two orifices at the top of the nozzle. A preferred gas atomizer is Wheaton Available from IL's spray system. The internal mixing atomizer 170 of the two orifices is fan-shaped to produce a thin sheet of mixture of aerosol and gas. The liquid is sent to the atomizer via the tube 172 and the gas introduced into the reaction chamber is sent to the atomizer via the tube 174. The interaction of gas and liquid assists in the formation of droplets. [0056] The external nozzle 168 includes a chamber area 176, a funnel area 178, and a transport area 180. The chamber area 176 holds the atomizer of the internal nozzle 166. The funnel region 178 directs the mixture of aerosol and gas to the transport region 180. The transport region 180 leads to a rectangular reactant opening 182, as shown in the inset of FIG. The reactant opening 182 forms the reactant inlet in the reaction chamber of the laser pyrolysis method or the photoreactive precipitation method. The external nozzle 168 includes a drain pipe 184 for draining the liquid accumulated in the external nozzle. The outer nozzle is covered with an outer wall 186 that forms a shielding gas opening 188 that surrounds the reactant opening 182. The Inactive Shielding Gas is introduced via the tube 190. Further embodiments of the introduction of aerosols with one or more aerosol generators in an elongated reaction chamber are described in USP 6193939, "Reactant Delivery MFP", assigned to and pending by Gardner et al., See. And incorporated herein by reference. [0057] A suitable second reactant to form the oxide is, for example, O₂, CO, N₂O, H₂O, CO₂, O₃And provided as an oxygen source containing mixtures thereof. Oxygen molecules can be supplied from air. Alternatively, oxygen can be provided in the metal / metalloid precursor mixture, such as carbonyl. Carbon sources for carbides, nitrogen sources for nitrides, and sulfur sources for sulfides are described below. The second reactant mixture, if present, should not react significantly with the metal precursor before entering the reaction region, as it generally forms large particles. [0058] [0058] Laser pyrolysis / photoreactive precipitation can be achieved at various light frequencies using a laser or other strongly focused source. Some desirable light sources operate in the infrared region of the electromagnetic spectrum. CO₂Lasers are a particularly convenient light source. Infrared absorbers as inclusions in the reaction flow include, for example, C.₂H₄, Isopropyl alcohol, NH₃,SCIENCE FICTION₆, SiH₄, And O₃including. O₃Functions as both an infrared absorber and an oxygen source. Radiant absorbers, like infrared absorbers, absorb energy from the radiated beam and distribute the energy to other reactants to drive the reaction. [0059] In general, the energy absorbed from the light beam rises in temperature at a very high rate, and often heating is generally generated by an exothermic reaction under controlled conditions. This process usually involves non-equilibrium, but temperature can be described approximately based on the energy within the absorption region. In the photoreactive precipitation method, the reaction process is qualitatively different from the process in the combustion reactor where the energy source causes the reaction, but the reaction is driven by the energy radiated by the exothermic reaction. Within a combustion reactor, there is generally no clear reaction area with boundaries. The reaction region is large and the residence time of the reaction product is long. Low thermal gradients generally occur within the combustion reactor. In contrast, the reaction state can be adjusted as well, so that the laser / light intensity can be adjusted. In the photoreactive precipitation method, the reaction region is initially the overlap between the light beam and the reactant flow, but the reaction region extends beyond the range of the light beam by a few millimeters depending on the net reaction characteristics. There will be. In photoreactive precipitation reactors, the particles will still be somewhat fluid / soft depending on their temperature, even if the reaction is complete after leaving the reaction region. [0060] The internal shielding gas can be used to reduce the amount of reactants and product molecules that come into contact with the components of the reaction chamber. The inert gas can also be introduced into the reactant stream as a carrier gas and / or as a reaction easing agent. Suitable inert shielding gases are, for example, Ar, He, and N.₂including. [0061] The laser pyrolysis apparatus can be adapted to the photoreactive precipitation method. The essence of adaptation depends on whether the coating takes place in the reaction chamber or in a separate coating chamber. In some embodiments, the reactant transport inlet into the reaction chamber is generally formed in dimensions that provide a flow of product for the precipitation process of the desired dimensions to transport the reactant flow. .. For example, in some embodiments, the reactant inlet allows the substrate to pass through the product stream once and cover the substrate along its full dimensions without consuming excess product. Has a length approximately equal to or somewhat larger than the dimensions of. [0062] The outlet of the laser pyrolyzer can be applied for coating the substrate in a separate coating chamber. A coating device with a separate reaction chamber is outlined in FIG. The coating device 200 includes a reaction chamber 202, a coating chamber 204, a conduit 206 connecting the reaction chamber 202 to the coating chamber 204, an exhaust conduit 208 leading to the coating chamber 204, and a pump 210 connected to the exhaust conduit 208. And, including. The valve 212 can be used to regulate the flow rate of the pump 210. As the valve 212, for example, a manual needle valve or an automatic throttle valve can be used. The valve 212 can be used to regulate the suction rate and the corresponding chamber pressure. The collection mechanism, filter, dust collector, etc. 214 can be arranged between the coating chamber 204 and the pump 210 to remove particles that could not coat the substrate surface. [0063] Referring to FIG. 6, the conduit 206 from the particle generator 202 leads to the coating chamber 204. The conduit 206 terminates at an opening 216 in the covering chamber 204. In some embodiments, the conduit opening 216 is located near the surface of the substrate 218 so that the momentum of the particle flow allocates the particles on the surface of the substrate 218. The substrate 218 can be placed on a stage or other platform to position the substrate 218 with respect to the opening 216. [0064] An embodiment using a stage for positioning the substrate with respect to the conduit from the particle generator is shown in FIG. The particle nozzle 230 allocates particles towards the rotary stage 232. According to FIG. 7, four substrates 234 are mounted on the stage 232. More or fewer substrates can be placed on the movable stage as the stage and chamber dimensions change. A motor is used for the rotary stage 232. [0065] The movement of stage 232 sweeps through the particle flow from one end to the other of the surface of one particular substrate 234 in the passage of nozzle 230. Stage 232 can be used for a series of substrates to pass through the product stream in order to attach one or more layers of coating to each substrate. The stage 232 can include a temperature control function to provide temperature control of the substrate on the stage 232. Alternative designs include stages of linear movement and other movements. In other embodiments, the particle flow is not focused so that the entire substrate or the desired portion of the substrate can be simultaneously covered without moving the substrate with respect to the product flow. [0066] If the coating is made in the reaction chamber, the substrate is placed and receives the resulting composition from the reaction zone. Quenching is fast enough to form solid particles, but the composition does not have to be completely solidified within the solid particles. The particles are highly homogeneous whether the composition is solidified into solid particles or not. The distance from the reaction region to the substrate can be selected to obtain the desired coating. [0067] The apparatus 250 for forming the substrate coating in the reaction chamber is outlined in FIG. The reaction / coating chamber 252 is connected to the reactant supply mechanism 254, the radiation source 256, and the exhaust section 258. The exhaust unit 258 can be connected to the pump 260, even though the pressure from the reactant flow itself can maintain the flow through the mechanism. Valve 262 can be used to regulate the flow to pump 260. Valve 262 can be used to regulate the suction rate and the corresponding chamber pressure. The Resolution and Collection Corporation, filters, dust collectors, etc. 264 can be placed between the chamber 252 and the pump 260 to remove particles that could not cover the substrate surface. [0068] Substrate 266 contacts the flow from reaction region 268 and coats the substrate with produced particles / powder. The substrate 266 can be placed on a stage, a conveyor, or the like 270 in order for the substrate 266 to sweep through the flow. The stage 270 is connected to a motion arm 272 or other automation device to move the stage 270 so that the substrate sweeps through the product stream. Various configurations can be used to pass through the coating from one end to the other end of the substrate surface as the product leaves the reaction region. As shown in FIG. 8, the operating arm 272 moves the stage 270 so that the substrate 266 is swept in the material flow. [0069] A similar embodiment is shown by the enlarged views of FIGS. 9 and 10. The substrate 280 moves with respect to the reactant nozzle 282, as indicated by the arrow pointing to the right. The reactant nozzle 282 is arranged directly above the substrate. The optical passage 284 is defined by a suitable optical element that directs the light beam along the optical passage 284. The optical passage 284 is located between the nozzle 282 and the substrate 280 to define the reaction region just above the surface of the substrate 280. Hot particles tend to be attracted to the cold substrate surface. [0070] With reference to FIGS. 9 and 10, the particle coating 286 is formed such that it is scanned by the reaction region through which the substrate has passed. Generally, the substrate 280 is carried on a conveyor / stage 288. The conveyor / stage 288 can be connected to the operating arm as shown in FIG. In alternative embodiments, various designs are used to carry the substrate, including rollers and motors, continuous belt conveyors, or known designs for moving the substrate. [0071] In some embodiments, the position of conveyor 288 can be adjusted to vary the distance from substrate 286 to the reaction region. Changing the distance from the substrate to the reaction region will change the temperature of the particles colliding with the substrate accordingly. The temperature of the particles colliding with the substrate generally varies between the properties of the resulting coating and the required subsequent processes, such as the heating process after solidifying the coating. The distance between the substrate and the reaction region is empirically adjusted to produce the desired coating properties. In addition, the stage / conveyor supporting the substrate can include a temperature control function so that the temperature of the board can be adjusted to a higher or lower temperature as desired. [0072] Characteristic embodiments of the photochemical precipitation apparatus are shown in FIGS. 11 to 13. With reference to FIG. 11, the processing chamber 300 is CO₂Includes an optical tube 302 to which a laser and a beam dump (not shown) are connected. The inlet tube 306 is connected to a precursor transport mechanism that transports the reactant vapor and the carrier gas. The particle transport tube 310 is connected to the processing chamber 300 along the direction of flow from the processing nozzle 308. The particle transport tube 310 leads to the particle filtration chamber 312. The particle filtration chamber 312 is connected to the pump by a pump connector 314. [0073] An enlarged view of the processing chamber 300 is shown in FIG. The wafer transport unit 316 supports the wafer on the processing nozzle. The wafer transport unit 316 connects the particle flow emitted from the reaction region where the laser beam crosses the precursor flow from the processing nozzle 308 to the arm unit 318 that transports the wafer transport unit so that the wafer passes and moves. ing. The arm portion 318 includes a linear transport aircraft shielded by a tube. The laser outlet 320 is used to direct the laser beam between the processing nozzle 308 and the wafer. The unobstructed flow from the processing nozzle will travel directly to the exhaust nozzle 322 leading to the particle transport tube 310. [0074] An enlarged view of the wafer carrier 316 and the processing nozzle 308 is shown in FIG. The processing nozzle 308 includes an opening in the precursor transport section 324 and a shielding gas opening 326 surrounding the vapor precursor opening to limit the diffusion of the precursor and the produced particles. The circular wafer 332 is held on the pedestal 334 so that the wafer 332 slides along the track portion 336 inside the pedestal 334 in order to move the wafer 332 in the flow from the reaction region. The back shield 338 prevents uncontrolled particle deposition on the back of the wafer 332. The track portion 336 is connected to the arm portion 318. [0075] The substrate temperature during the precipitation process can be adjusted to achieve a particular purpose. A relatively cold substrate attracts particles to its surface, so that, for example, the substrate can be cooled during the precipitation process. However, in some embodiments, the substrate is heated to, for example, about 500 ° C. during the precipitation process. The particles adhere well to the heated substrate. In addition, the particles tend to be dense and melt on the heated substrate, so if the coating is first formed on the heated substrate, then the coating in molten glass or other material. Solidification is promoted. [0076] For the products of individual devices and structures on the surface of the substrate formed by the coating formed during the coating process, the precipitation process means simply covering a portion of the substrate. For example, masking is used during the coating process to simply cover selected parts of the substrate, or mass flow regulators that supply the reactants are used while the substrate is moving through the product stream. Adjusted to change the coating composition at the selected position along. For example, striped precipitation of material is used in corresponding devices that take advantage of changes in composition. Therefore, the precipitation process itself is manipulated to produce a particular structure. Instead, various patterning methods are used. In order to pattern the coating after precipitation, a common method from the manufacture of integrated circuits such as photolithography and dry etching can be used. Suitable patterning and optics are described below. [0077] Film formation and optics by photoreactive precipitation and silicon glass precipitation were pending and assigned to Bi et al. USP application 09/715935, "COATING FORMATION BY REACTIVE" US Serial Number PCT / US01 /, which is described in "DEPOSITION", incorporated herein by reference, and assigned to Bi et al.<u style="single"></u>A PCT application referred to as "Coating Formation By Reactive Deposition", which is incorporated herein by reference. [0078]<u style="single">Precipitated particle coating</u>The basic steps of particle coating precipitation are described in detail above. Various particles can be produced by the laser pyrolysis method / photoreactive precipitation method. The adaptation of the laser pyrolysis method to the photoreactive precipitation method can be used to form a film having a composition similar to that of particles having a selective composition produced by the laser pyrolysis method. Particularly interesting powders are metals / semis such as silicon particles, metal particles, and metal / semimetal oxides, metal / semimetal carbides, metal / semimetal nitrides, metal / semimetal sulfides. Includes metal mixture. In optical materials, some particularly interesting materials include, for example, silicon oxide (silica), aluminum oxide, titanium oxide. Generally, the powder contains fine particles or ultrafine particles having a particle size in the range of submicrons to nanometers. The particles may or may not be partially fused or fired during precipitation. [0079] The photoreactive precipitation method is particularly suitable for the formation of highly homogeneous particles, especially nanoscale particles. In particular, the photoreactive precipitation method uses primary particles with a predetermined average particle size of about 500 nm or less, instead in the range of 3 nm to 100 nm, also in the range of 3 nm to 75 nm, and further in the range of 3 nm to about 50 nm. Recovered particles can be produced. One of ordinary skill in the art will appreciate that these explicit and other scopes and partial scopes are predictable and within the scope of this disclosure. [0080] [0080] The photoreactive precipitation method described above generally yields primary particles with a very narrow particle distribution. In the aerosol transport of the reactants in the photoreactive precipitation method, the particle size distribution is particularly sensitive to the reaction conditions. Nevertheless, if the reaction conditions are precisely adjusted, the aerosol transport mechanism can provide a very narrow particle size distribution. However, if desired, a broader particle size distribution of primary particles can be obtained by adjusting the flow rate, the density of the reactants, and the residence time of the photoreactive precipitation method, or by using a different flow reaction mechanism. You can also do it. [0081] Furthermore, in embodiments of highly homogeneous particles, it is substantially greater than about 4 times the average particle size, in other embodiments it is greater than about 3 times the average particle size, and in yet another embodiment about the average particle size. No primary particle is larger than twice. That is, the particle size distribution has virtually no tail, which means that there are some particles of fairly large size. Effective removal of the tail of the particle size distribution means that particles having a diameter equal to or larger than the specified removal value on the average particle size are 10⁶Indicates less than about 1 of the grains. Particles with a narrow particle size distribution, no tail of distribution, and a generally spherical form are advantageous for obtaining a highly uniform coating or for a highly uniform sintered body. [0082] The small particle size and particle uniformity give all of the resulting coating uniformity. In particular, the absence of particles that are significantly larger than average, i.e. the absence of tails of particle size distribution, results in a more uniform coating. In addition, the particles can have very high purity levels. [0083] The photoreactive precipitation method consists of a gas / vapor phase reactant. Many metal / metalloid precursor compounds can be transported as a gas into the reaction chamber. Metalloids are elements that exhibit chemical properties between metals and non-metals, or including metals and non-metals. Metalloid elements include, for example, silicon, boron, arsenic, antimony, and tellurium. A suitable metal / semi-metal precursor mixture for gas transport is generally a metal with a reasonable vapor pressure, i.e., a vapor pressure sufficient to obtain the desired amount of precursor gas / vapor in the reactant stream. It is a compound. The container holding the liquid or gaseous precursor mixture can be heated to increase the vapor pressure of the metal precursor, if desired. The solid precursor is usually heated to produce sufficient vapor pressure. [0084] The carrier gas can be whipped through the liquid precursor so that the desired amount of precursor vapor can be easily transported. Similarly, the carrier gas can pass over the solid precursor so that the vapor of the precursor can be easily transported. In other embodiments, the carrier gas is mixed with the vapor of the precursor before being transported into the reaction region. Suitable precursors of silicon for vapor transport are, for example, silicon tetrachloride (SiCl).₄), Trichlorosilane (Cl₃SiH), trichloromethylsilane CH₃SiCl₃, And tetraethoxylan (Si (OC)₂H₅)₄, Also known as ethylsilane and tetraethylsilane). In these representative precursor compounds, chlorine can be exchanged for other halogens such as Br, I, and F. [0085] Preferred dopants for silicon oxide materials include, for example, boron, germanium, phosphorus, titanium, zinc, and aluminum. Suitable boron precursors include, for example, boron trichloride (BCl).₃), Diborane (B₂H₆), And BH₃including. Suitable phosphorus precursors include, for example, phosphine (PH).₃), Phosphorus trichloride (PCl₃), Phosphoryl oxychloride (POCl)₃) And P (OCH₃)including. Suitable germanium precursors include, for example, GeCl.₄including. Suitable titanium precursors include, for example, titanium tetrachloride (TiCl).₄) And Titanium Isopropoxide (Ti [OCH (CH)₃)₂]₄)including. Suitable liquid zinc precursor compounds include, for example, diethylzinc (Zn (C)₂H₅)₂) And dimethylzinc (Zn (CH)₃)₂)including. Suitable solid zinc precursors with sufficient vapor pressure include, for example, zinc chloride (ZnCl).₂)including. Suitable liquid aluminum precursors include, for example, aluminum s-butoxide (Al (OC).₄H₉)₃)including. Some suitable solid aluminum precursor compounds are available, for example aluminum chloride (AlCl).₃), Aluminum ethoxydo (Al (OC)₂H₅)₃), And aluminum isopropoxide (Al [OCH (CH)₃)₂]₃)including. Other dopants and base metal precursors are similarly selected based on the similarities of this type of precursor. [0086] The use of gas-only reactants imposes some restrictions on the types of precursor compounds that can be conveniently used. Therefore, a technique for introducing an aerosol containing a reactant precursor to the reaction region is utilized. An improved aerosol transport device for the laser pyrolysis reaction system has been assigned to Gardner et al. And is described in the pending USP 6193936, "Reactant Delivery MFPes", which is incorporated herein by reference. These aerosol transport devices are suitable for making photoreactive precipitation methods. [0087] When using an aerosol transport device, the solid precursor compound can be transported by dissolving the compound in a solvent. Alternatively, the powdered precursor compound can be dispersed in a liquid / dispersant for aerosol transport. Liquid precursor compounds can be transported as aerosols from raw liquids, multiple liquid dispersions, or solutions. The solvent / dispersant can be selected to achieve the desired properties of the resulting solvent / dispersant. Suitable solvents / dispersants include water, methanol, ethanol, isopropyl alcohol, other organic solvents, and mixtures thereof. The solvent must have the desired level of purity so that the resulting particles have the desired level of purity. Some solvents, such as isopropyl alcohol, are CO₂CO as a light source, as it is a sufficient absorber of infrared light from the laser₂If a laser is used, the addition of a laser absorbing compound into the reaction stream is not necessary. [0088] If an aerosol precursor is used, the liquid solvent / dispersant is quickly evaporated by the light beam in the reaction chamber, causing a vapor phase reaction. Therefore, the basic properties of the laser pyrolysis reaction have not changed due to the presence of aerosols. Nevertheless, the reaction conditions are affected by the presence of aerosols. [0089] Some of the suitable solid metal precursor compounds can be transported as solution aerosols. Silicon precursors suitable for aerosol formation include, for example, silicon tetrachloride Si (Cl) that dissolves in ether.₄) And trichlorosilane (Cl) dissolved in carbon tetrachloride₃HSi) and, including. Suitable dopants can be transported in aerosols. For example, zinc chloride (ZnCl)₂) And zinc nitrate (Zn (NO)₃)₂) Dissolves in water or some organic solvent such as isopropyl alcohol. Similarly, boron dopants are ammonium borate ((NH), which is soluble in water and various organic solvents.₄)₂B₄O₇) Can be transported as an aerosol. Other dopants and base metal precursors are similarly selected based on the similarities of this type of precursor. [0090] Precursor compounds for aerosol transport are generally dissolved in solvents at concentrations greater than 0.1 molar. In general, the higher the concentration of precursor in solution, the greater the amount of reactants processed through the reaction chamber. However, at higher concentrations, the solution becomes more viscous and the aerosol will have droplets of larger dimensions than desired. Therefore, the selection of solution concentration can include the harmonization of elements in the selection of the desired solution concentration. [0091] Several different types of nanoscale particles can be produced by laser pyrolysis. Similar particles can be produced by the photoreactive precipitation method based on the above. In particular, many materials suitable for producing optical materials can be produced by the photoreactive precipitation method. [0092] A typical such nanoscale particle is generally considered to contain several different elements and a composition of various composition ratios, the number and composition ratio of the elements depending on the application to the nanoscale particles. Will change. Typical numbers of different elements are expected to be 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, and 15, for example, about 2. Includes numbers in the range of elements to about 15 elements. Typical composition ratio numbers include values in the range of about 1 to about 1000000, in anticipation of 1, 10, 100, 1000, 10000, 100000, 1000000, and suitable sums thereof. [0093] Alternatively or in addition to the above, such nanoscale particles have the following chemical formula: AaBbCcDdEeFfGgHhIiJjKkLlMmNnOo Can be considered to have. Here, A, B, C, D, E, F, G, H, I, J, K, L, M, N, and O each exist or do not exist independently, and A, B , C, D, E, F, G, H, I, J, K, L, M, N, and O are present, and Group 1A, Group 2A, Group 3B elements ( (Including lanthanoid elements and actinoid elements), 4B group elements, 5B group elements, 6B group elements, 7B group elements, 8B group elements, 1B group elements, 2B group elements, 3A group elements, 4A group elements, 5A group It is independently selected from the group consisting of elements in the periodic table consisting of elements, group 6A elements, and group 7A elements. a, b, c, d, e, f, g, h, i, j, k, l, m, n, and o are 1, 10, 100, 1000, 10000, 100000, 1000000, and their suitability. It is selected independently from the values in the range of about 1 to about 1000000 in anticipation of the sum. [0094] For example, the production of silicon oxide nanoparticles is described in USP application 09/085514, "Silicon Oxide Particles", which was assigned to Kumar et al. In a pending manner and is incorporated herein by reference. This patent application is amorphous SiO₂Manufacture is described. The production of titanium oxide nanoparticles and crystalline silicon oxide nanoparticles is described in USP application 09/123255, "Metal (Silicon) Oxide / Carbon Composition", which was pending and transferred to Bi et al. Incorporated herein by reference. In particular, this application applies to anatase and rutile TiO₂Manufacture is described. [0095] Glass layers containing amorphous nanoscale powders and dopants such as rare earth dopants and / or other metal dopants are pending and transferred to Horne et al., US Provisional Patent Application 60/313588, "Doped Glass Material". It has been described and is incorporated herein by reference. Suitable dopants include rare earths that can give the desired modification to properties such as refractive index. The powder and glass layers are formed with a complex composition containing a plurality of selected dopants in an amorphous material. The powder can be used for forming an optical material or the like. The glass layer can be formed by directly precipitating a uniform particle coating by a photoreactive precipitation method and then solidifying the powder into a uniform glass layer. [0096] Amorphous submicron particles and nanoscale particles can be produced using laser pyrolysis methods or other flow reaction mechanisms, including selected dopants, including rare earth materials. Various new materials can be produced using these methods. Dopants can be introduced into the desired stoichiometry by varying the composition of the reactant flow. The dopant is introduced into a suitable host glass forming material. Appropriate selection of the composition in the reaction flow and the treatment conditions can result in the formation of submicron particles incorporating one or more metal or metalloid elements as the glass-forming base material containing the selected dopant. Since the amorphous material of the base material is generally an oxide, an oxygen source must also be present in the reaction flow. The environment inside the reactor must be sufficiently oxidized to produce the oxide material. Similarly, the photoreactive precipitation method is used, for example, to form a highly homogeneous glass coating to which a dopant containing a composite mixture of rare earth dopants and / or dopant compositions has been added. [0097] Some metal / semimetal oxides are particularly desirable in optical applications and / or in the ability of the material to solidify within a uniform glass layer. Oxides for glass forming substrates suitable for doping include, for example, TiO₂, SiO₂, GeO₂, Al₂O₃, P₂O₅, B₂O₃, And combinations or mixtures thereof. Phosphorus is located near the metallic element in the periodic table, but is not generally considered a metalloid element. However, P₂O₅Phosphorus in the form of is a good glass formation as well as metalloid oxides, and P in the doped form.₂O₅Can have desirable optical properties. For convenience, phosphorus is also considered to be a metalloid element, as used herein, including the claims. [0098] Dopants are introduced to change the properties of the amorphous particles and / or the resulting glass layer. For example, dopants are introduced to change the index of refraction of glass. In optical applications, the index of refraction can be modified to form a particular optical device that works with light in a selected frequency domain. Dopants can be introduced to change the processing properties of the material. In particular, some dopants change the flow temperature of the glass, i.e. the glass transition temperature, so that the glass can be processed at lower temperatures. Dopants also affect the interior of the material. For example, some dopants are introduced to increase the solubility of other dopants. Rare earth dopants are desirable for modifying the optical properties of the resulting doped material. Rare earth-doped glasses are useful in the manufacture of optical amplifiers. [0099] Of particular interest are the amorphous compositions that form the optical glass with the addition of multiple dopants. In some embodiments, the one or more dopants are rare earth metals. Rare earth metals are particularly desirable due to the modification of the optical properties of the material. If the particles are solidified in the glass layer, the resulting material will have a refractive index affected by the rare earth metal dopants as well as other dopants. In addition, rare earth dopants affect the light absorption properties that can change the application of materials for the manufacture of optical amplifiers. Rare earth metals are transition metals of Group IIIb in the periodic table. Includes. In particular, rare earth metals include Sc, Y and lanthanoid elements. Other suitable dopants include actinide-based elements. Rare earth metals, which are particularly interesting dopants for optical glass, include, for example, Er, Yb, Nd, La, Y, Pr, and Tm. Suitable non-rare earth metal dopants include, for example, Bi, Sb, Zr, Pb, Li, Na, K, Ba, W, and Ca. [0100] The layer of amorphous particles is solidified to form a uniform glass layer. To solidify the glass, the powder is heated above its flow temperature. At that temperature, the powder densifies to form a uniform layer of glass material. Due to the inclusion of the dopant in the particles, the result of powder precipitation is that the dopant diffuses directly throughout the densified material. [0101] Material handling remains a significant consideration in the design of the desired optics. For example, properties such as material composition and density are adjusted to obtain the desired material with the desired index of refraction. Similarly, the thermal expansion and flow temperature of the material must be consistent with reasonable treatment methods in order to form the material inside the monolithic integrated structure. The solidified optical material can have good optical properties so that the light transmission of the material does not cause an undesired amount of loss. In addition, the material must be able to be processed under reasonable conditions in order to form an integrated optical circuit or electro-optical circuit integrated device. Similar material constraints are problematic in the formation of state-of-the-art integrated electronics. [0102] Dope glass is useful for making optical devices. By using the techniques described herein, the dope glass can be formed into flat optics. Dopants can change the optical properties of a material to be particularly suitable for a particular optical adaptation. The doped composition, especially the doped silicon oxide, can be produced by introducing a suitable precursor. For example, a convenient method for producing high refractive index optical layers is to use doped silicon oxide. Suitable dopants include, for example, titanium oxide, tantalum oxide, tin oxide, niobium oxide, zinc oxide, aluminum oxide, lanthanum oxide, germanium oxide, boron oxide, or a combination thereof. [0103] Some silicon oxide dopants also significantly reduce the flow temperature of the material. In particular, boron and phosphorus dopants help reduce the viscosity of silicon oxide and thus help reduce the flow temperature. Phosphorus dopants increase the index of refraction, while boron dopants also decrease the index of refraction. [0104] Rare earth-doped glass is particularly suitable for use in the manufacture of optical amplifiers. The amplification material is excited by a pumping optical signal that is laterally coupled to the optical material. Pumping light excites rare earth metal-doped materials. The input of light at a frequency lower than the pumping signal that has passed through the optical material is amplified by stimulated emission. In this way, the energy from the pumping light is used to amplify the input light signal. [0105] In particular, nanoscale manganese oxide particles have been formed. The production of these particles is described in USP application 09/188770, "Metal Oxide Particles", assigned to pending Kumar et al., Which is incorporated herein by reference. This application is MnO, Mn₂O₃, Mn₃O₄, And Mn₅O₈Manufacture is described. [0106] Vanadium oxide nanoparticles are described in USP6106798, "Vanadium Oxide Nanoparticles" by Bi et al., Which are incorporated herein by reference. Similarly, nanoparticles of silver vanadium oxide have been produced, both with USP application 09/246076, now USP6225007, and Reitz et al.'S USP application 09/311506, which were transferred to pending Home et al. The title is described in "Metal Vanadium Oxide Particles", both of which are incorporated herein by reference. [0107] In addition, lithium manganese oxide nanoparticles are produced by laser pyrolysis with or without subsequent heat treatment, which was transferred to pending Kumar et al., USP application 09/188768, " Composite Metal Oxide Particles ", and Kumar et al. USP Application 09/334203," Reaction Method for Producing Ternary "Particles", and USP 6136287 by Horne et al., "Lithium Manganese Oxides and Batteries", all of which are incorporated herein by reference. [0108] Aluminum oxide nanoparticles are described in USP application 09/136483, "Aluminum Oxide Particles", assigned to pending Kumar et al., And are incorporated herein by reference. In particular, this application is γ-Al₂O₃Manufacture is described. Delta-Al by laser pyrolysis / photoreactive precipitation with doped crystals and amorphous alumina₂O₃And Tetra-Al₂O₃The formation of is described in USP application 09/969025, "Aluminum Oxide Powders", assigned to pending Chiruvolu et al., Which is incorporated herein by reference. Amorphous aluminum oxide materials include, for example, SiO₂And / or P₂O₃Like, it can be combined with other glass formations. For example, cesium oxide (Ce) is a suitable metal oxide dopant for aluminum oxide that forms optical glass.₂O), rubidium oxide (Rb)₂O), Titanium oxide (Ti)₂O), lithium oxide (Li₂O), sodium oxide (Na₂O), potassium oxide (K)₂Includes O), beryllium oxide (BeO), magnesium oxide (MgO), calcium oxide (CaO), strontium oxide (SrO), and barium oxide (BaO). The glass dopant affects, for example, the index of refraction, the sintering temperature, and / or the porosity of the glass. Metal oxide dopants suitable for infrared emitters include, for example, cobalt oxide (Co).₃O₄)including. [0109] In addition, tin oxide nanoparticles are manufactured by laser pyrolysis, which is described in USP application 09/042227, now USP6200674, "Tin Oxide Particles", which was assigned to pending Kumar et al. , Incorporated herein by reference. The production of zinc oxide nanoparticles is described in USP application 09/266202, "Zinc Oxide Particles", assigned to pending Reitz et al., Which is incorporated herein by reference. In particular, the production of ZnO nanoparticles is described. [0110] Rare earth dopants can be introduced into metal compositions using photoreactive precipitation and laser pyrolysis. In particular, with rare earth metal oxide particles, rare earth-doped metal / semi-metal oxides, rare earth metal / semi-metal sulfides, and rare earth-doped metal / semi-metal oxide submicron and nanoscale particles and their corresponding coatings. In particular, crystalline powders and coatings were transferred to pending Kumar et al. USP application 09/843195, "High Luminescence Phosphor" Described in "Particles" and incorporated herein by reference. Suitable base materials for the composition of the phosphor include, for example, ZnO, ZnS, Zn.₂SiO₄, SrS, YBO₃, Y₂O₃, Al₂O₃, Y₃Al₅O₁₂, And BaMgAl₁₄O₂₃including. In particular, non-rare earth metals for active phosphor particles as dopants include, for example, manganese, silver, and lead. In particular, rare earth metals for the production of phosphors of metal oxides include, for example, europium, cerium, terbium, and erbium. Generally, heavy metal ions or rare earth ions are used as activators in phosphors. In adaptation to phosphors, the particles are generally crystalline. Incorporation of rare earth metals and other dopants into amorphous particles and coatings is described in US Provisional Patent Application 60/313588, "Doped Glass Materials", assigned to pending Horne et al. Incorporate into. With complex compositions, dope or undoped optics were assigned to Bi et al. In a pending manner and filed on October 16, 2001 with US serial number PCT / US01 /.<u style="single"></u>A PCT application referred to as "Coating Formation By Reactive Deposition", which is incorporated herein by reference. [0111] The production of iron, iron oxide, and carbonized iron is described in the publication of Bi et al., "Nanocrystalline α-Fe, Fe.₃C, and Fe7C3 produced by CO₂ laser pyrolysis "J. Mater. Res. Vol. 8, No. 7 1666-1674 (July 1993), which is incorporated herein by reference. The production of silver metal nanoparticles is pending. USP application 09/311506 transferred to Reitz et al., "Metal Vanadium Oxide Particles", which is incorporated herein by reference. Nanoscale carbon particles produced by laser pyrolysis are Bi et al. References, "Nanoscale carbon blacks produced by CO₂ laser pyrolysis "J. Mater. Res. Vol. 10, No. 11 2875-2884 (Nov. 1995), which is incorporated herein by reference. [0112] Iron sulfide (Fe) by laser pyrolysis method_1-xS) Particle production is described in Bi et al., Material Research Society Symposium Proceedings, vol. 286.p. 161-166 (1993) and is incorporated herein by reference. The precursor for the production of iron sulfide by the laser pyrolysis method is pentacarbonyl iron (Fe (CO).₅)) And hydrogen sulfide (H)₂It was S). [0113] As described above, cerium oxide can be produced using a laser pyrolysis apparatus. Precursors suitable for aerosol transport include, for example, cerium nitrate (Ce (NO).₃)₃), Cerium chloride (CeCl)₃), And cerium oxalate (Ce)₂(C₂O₄)₃)including. Similarly, zirconium oxide can be produced using a laser pyrolysis apparatus as described above. Zirconium chloride (ZrCl) is a suitable precursor for zirconium for aerosol transport.₂) And zirconium nitrate (ZrO (NO)₃)₂)including. [0114] The precipitation of dielectric material coatings for chipco capacitors is described in US Provisional Patent Application 60/312234, "Reactive Deposition For The Formation Of Chip Capacitors", assigned to pending Bryan et al., See. Incorporated herein. Particularly suitable dielectric materials include those whose main component is barium titanate, which is selectively mixed with other metal oxides. Other insulating oxides that contain suitable dopants and are suitable for incorporation into suitable ceramic chip capacitors include, for example, SrTiO.₃, CaTiO₃, SrZrO₃, CaZrO₃, NdO₃-2TiO₃, And La₂O₃-2TiO₂including. [0115] The production of three-element nanoparticles of aluminum silicate and aluminum titanate is described in USP application 09/311506, "Metal Vanadium Oxide Particles", transferred to pending Reitz et al., Incorporated herein by reference. It is carried out by the laser pyrolysis method in the following procedure similar to the production of nanoparticles of silver vanadium oxide. Suitable precursors for the production of aluminum silicate include aluminum chloride (AlCl) in steam transport.₃) And silicon tetrachloride (SiCl)₄), In aerosol transport, tetra (N-butoxy) silane and aluminum isopropoxide (Al (OCH (CH))₃)₂)₃) Is included. Similarly, a suitable precursor for the production of aluminum titanate in aerosol transport is aluminum nitrate dissolved in sulfuric acid (Al (NO).₃)₃) And titanium dioxide (TiO₂) Mixture with powder, or aluminum isopropoxide and titanium isopropoxide (Ti (OCH (CH))₃)₂)₄) Includes a mixture with. [0116] The formation of submicron and nanoscale particles with a coating of metallic / semi-metallic compounds containing anions of the complex was transferred to pending Chaloner-Gill et al. USP application 09/845985, "Phosphate powder Compositions And Methods For Forming". Particles With Complex Anions ", which are incorporated herein by reference. Suitable complex anions include, for example, phosphates, silicates, sulfates. The composition can include multiple metal / metalloid elements. [0117] The laser pyrolysis synthesis of silicon carbide and silicon nitride is described in USP application 09/433202, "Particle Dispersions", assigned to pending Reitz et al., Which is incorporated herein by reference. In the production of silicon nitride, ammonia (NH3) was the nitrogen source. In the production of silicon carbide particles, diethoxysilane was decomposed to form particles. [0118] In order to obtain a particular object, the properties of the coating can be varied by the composition of the powder layer, as well as the location of the material on the substrate. In addition, layers of multiple particles can be precipitated in a controlled manner to form layers with different compositions and / or optical properties. Generally, uniform optical materials are localized to specific locations on the substrate to form optics. Localization of uniform materials involves selective precipitation of the material at a particular location, or post-precipitation etching. The above procedure is adapted to adhere a coating to a desired region, for example by sweeping the substrate against a particle nozzle, with passing nozzles sweeping only the desired portion of the substrate. Etching is described below. [0119] Similarly, the coating can be of uniform thickness, or different parts of the substrate can be coated with particles of different thickness. Different coating thicknesses can be applied by varying the sweep rate of the substrate relative to the particle nozzles, or by sweeping a portion of the substrate that receives the thick particle coating multiple times. This can be achieved, for example, by altering the reactant flow during the coating process, or by performing multiple partial coating sweeps across different parts of the substrate. [0120] In this way, layers of material can include specific layers that do not have the same surface spread as other layers, as described herein. Thus, while other layers cover a small portion of the substrate surface, some layers can cover all or most of the substrate surface. In this way, the layers can form one or more localization devices. At any particular point along the planar substrate, a cross section through the structure exposes a different number of potentially identical layers than a cross section at any other point along the surface. [0121]<u style="single">Solidification / densification process</u>The heat treatment melts or fuses the particles, resulting in compaction, i.e., densification of the powder, forming the desired material, especially the optical material. This fusion is commonly referred to as solidification. To solidify the optical material, the material is heated to a temperature above the melting point of the material, or a flow temperature, i.e., a temperature above the glass transition point, to solidify the coating into a smooth and uniform material. [0122] Generally, heating is performed under conditions where the particles melt into a viscous liquid. Due to the high viscosity, the material does not flow significantly on the substrate surface. Steps at higher temperatures to reduce the viscosity of the melt result in undesired melting of the substrate, transfer of composition between layers, or influx of composition from selected regions of the substrate. Heating and cooling times can be adjusted to alter the properties of the solidified coating, such as density. In addition, heat treatment can remove unwanted impurities and / or alter the stoichiometry and crystal structure of the material. [0123] Suitable treatment temperatures and treatment times generally depend on the composition of the particles. Because nanoparticles have a lower melting point than massive materials, nanometer-scale small particles generally travel at lower temperatures and / or shorter times than powders of larger particles. However, it is desirable to use a commensurate melting point in order to obtain greater surface smoothness from the improved melting of nanoparticles. [0124] In the treatment of silicon oxide nanoparticles, the particle coating is heated to a temperature on the order of 1200 ° C. Dopants in silicon oxide particles can lower the temperature of suitable solidification. Some dopants affect the flow temperature as well as the optical properties. Therefore, the dopant can be selected to flow into a uniform optical material at low temperatures. Silicon oxide (SiO)₂Dopants suitable for lowering the flow temperature when placed in) include, for example, boron, phosphorus, germanium, and combinations thereof. The amount and composition of one or more dopants can be selected to provide the desired flow temperature and index of refraction. [0125] The heat treatment can be carried out in a suitable furnace. It is desirable to control the atmosphere in the furnace with respect to gas pressure and / or gas composition. Suitable furnaces include, for example, induction heating furnaces or furnaces that allow gas to flow through tubes. The heat treatment is performed following removal of the coated substrate from the coated chamber. In an alternative embodiment, the heat treatment can be incorporated into the coating process such that the treatment process is carried out by a series of suitable automated methods. [0126] For many applications, it is desirable to adhere multiple particle coatings of different compositions. Generally, these multiple particle coatings are placed adjacent to each other on the xy plane of the coated substrate (ie, perpendicular to the direction of movement of the substrate with respect to product flow), or of the coated substrate. They are laminated one after another in the z-plane direction, or consist of an appropriate combination of adjacent and laminated layers. Each coating is attached to the desired thickness. For example, in some embodiments, silicon oxide and doped silicon oxide can precipitate in alternating layers. Similarly, separate layers of silicon oxide with different dopants added can precipitate in alternating layers. In particular, two layers of different composition can precipitate one on top of the other, such as layers A and B formed with AB, and / or additionally or instead, deposit one next to the other. To do. In other embodiments, three consecutive layers (ie, one layer is stacked on top of the other, or placed near the other layer, or placed near the other layer). More than two layers having different compositions are precipitated, such as A layer, B layer, and C layer precipitated as layer ABC. Similarly, layers of different compositions can be formed in alternating order, such as ABABAB ... Or ABCABCABC .... [0127] In many applications, the attractiveness of the application of multiple particle coatings of different compositions (ie, placed adjacent to each other or one stacked on top of the other) can be suggested by the functional requirements for the coated substrate. Thus, for example, in optical applications, the following functions, three-dimensional optical memory devices, optical waveguides / conduits / fibers (eg Bragg diffraction grids), optical attenuators, optical Demultiplexer / duplexer, optical filter, optical switch, laser, modulator, interconnect, optical isolator, optical add-drop multiplexing (OADM), optical amplifier, polarizer, optical mirror / reflector, optics Applications of multilayer coatings of different compositions are valuable to achieve one, or a suitable combination of two or more or more phase delayers, and optical detectors. [0128] The individual uniform layers after solidification generally have an average thickness of 100 microns or less, from about 1 micron to about 50 microns in many embodiments, and from about 3 microns to about 20 in other embodiments. It is micron. Those skilled in the art will appreciate that the scope and partial scope of these manifestations are predictable and within the scope of this disclosure. Thickness is measured perpendicular to the projection plane where the structure has the largest surface area. [0129] A material having a large number of particle coatings is heat-treated after the precipitation of each layer or following the precipitation of a plurality of layers, or a combination of the two methods. The optimum processing sequence generally depends on the melting point of the material. However, in general, it is desirable to heat-treat a plurality of layers at the same time to solidify them. If the heating temperature is selected to a reasonable value, the molten material remains sufficiently viscous so that the layer does not dissolve an undesired amount at its interface. Some penetration generally does not affect unacceptable amounts of performance. [0130]<u style="single">Etching and device formation</u>In the manufacture of individual devices or individual structures within a layer of coatings formed in the coating process, the precipitation process simply means coating a portion of the layer of a particular composition. Instead, various patterning methods can be used. For example, conventional methods from the manufacture of integrated circuits such as photolithography and etching can be used for patterning the coating after precipitation. [0131] Before or after patterning, the coating is heat treated to transform the coating from a layer of individual particles into a continuous layer. In some embodiments, the particles in the coating are heated in order to solidify the particles into glass or a uniform crystal layer. Silica glass is used for optical applications. Crystalline aluminum oxide such as sapphire and crystalline SiO₂Quartz, for example, is suitable for optical applications at fixed wavelengths of light. In addition, crystalline silicon can be used to form silicon-on-insulator electronic components. The solidification process is described in detail above. [0132] Selective precipitation of powder material and / or selective removal of material can be utilized to form the desired structure within the layer of optical material. Based on the above, suitable selective precipitation includes, for example, selective precipitation with a mask, substrate operation through a flow of generated particles to cover only part of the substrate to form a coating, single. Includes changing the composition during the formation of the coating layer, and combinations thereof. These methods allow selective placement of a particular composition in selected portions within the layer, and allow other compositions to be placed in other positions. In addition, the optical layer can be etched to form a pattern of optical material. In particular, patterning methods such as photolithography are used, as well as etchings such as chemical etching or radiation-based etching, to form a pattern structure in one or more layers by selective removal of material. .. In this way, the composition and optical properties can be varied within and between layers. [0133] For example, after precipitation of two or more layers, a controlled precipitation or etching process is performed to form the structure outlined in FIG. The layer can be precipitated using a photoreactive precipitation method. The shaped optical structure 340 includes one or more support layers 342 and one or more shaped optical structures 344 on the support layer 342. The channel 344 is formed by patterning the layer above the support layer 342 in order to remove the material between the channels 344. As shown in FIG. 15, additional optical material 346 is generally placed over the channel. The heat treatment is performed at appropriate times, including before and / or after patterning and etching. Additional flattening, such as chemical-mechanical polishing, is also possible. [0134] Although the multilayer optical coatings described herein have variations of application, the optics formed on the substrate are of particular interest. Controlling the transmission of light along the optics requires a change in the index of refraction of the adjacent material. The device can be characterized by the boundaries of the material with the index of refraction, or by a structure different from the adjacent material. A basic feature of optics is that they are made from crystalline or amorphous materials that are transparent to electromagnetic radiation within a particular wavelength region propagating through the device. [0135] Optical devices of interest include, for example, optical waveguide devices such as optical couplers, optical distributors, array optical waveguide diffraction gratings (AWG), and the like. The optical waveguide manufactured on the surface of the substrate is called a planar optical waveguide. Planar optical waveguides are useful in the manufacture of integrated optical circuits for optical communications and other optoelectronic applications. Other interesting optics include, for example, three-dimensional optical memory devices, fiber optics, Bragg gratings, optical attenuaters, optical filters, optical switches, lasers, modulators, interconnects, optical isolators, optical add-drop multiplexing devices. Includes (OADM), optical amplifier, polarizing device, optical mirror / reflector, optical phase delayer, and optical detector. [0136] Light is transmitted through a material that has a higher refractive index than its surroundings. In some preferred embodiments, the planar waveguide has a thickness approximately comparable to the wavelength of light, i.e., electromagnetic radiation, for transmission along the optical waveguide. For example, for 1.5 micron light, an optical layer thickness of about 6 microns is generally appropriate for optical waveguides. In some embodiments, the optical waveguide did not significantly attenuate light propagating through the material beyond medium range. [0137] In order to produce a planar optical waveguide by particle coating technology, three layers are generally precipitated. The core layer forms an optical channel surrounded by a lower clad layer and an upper clad layer. The lower clad layer generally adheres between the substrate or the underlying optical material and the core layer. In other words, the core layer is generally formed between two other optical materials to provide proper light transfer through the core material. [0138] The optical circuit on the substrate is outlined in FIG. 16 or 17. As shown in FIG. 16, the optical circuit 350 includes optical devices 352, 354, 356 on a substrate 358. A cross-sectional view including the optical device 352 is shown in FIG. The optical device 352 includes an optical material 362 for the lower clad, an optical material 364 for the core, and an optical material 366 for the upper clad. In general, the core optical material 364 has some optical properties such as refractive index for the lower clad optical material 362 and the upper clad due to, for example, different compositions, different densities, or different crystal structures. Different from optical material 366. The lower clad optical material 362 may or may not differ from the upper clad optical material 366 in composition and / or optical properties. The top clad optical material 366 is located between two layers, a layer that serves as the core optical material and a layer that lies on top. [0139] The substrate 358 is made of silicon. A quadrangular or other shaped substrate can be used, but the usual substrate is a circular wafer. The preform configuration forms a very long substrate in one direction. The aspect ratio can range from about 1: 5 to about 1:50 and, in other embodiments, from about 1:10 to about 1:25. One of ordinary skill in the art will appreciate that the scope and partial scope within these explicit scopes are predictable and within this disclosure. Similarly, in preformation, in order to have a dimensional coating, further coating changes are made so that the final structure is not rectangular in order to easily extend the fiber from the preform. Is desirable. Substrateless planar structures were also considered, as described below. In these embodiments, the protrusion of the planar device to obtain the maximum area provides surface spread of the device. The protruding surface spread establishes a plane similar to the substrate surface in order to be oriented along a flat surface. [0140] In some embodiments, the optical material is formed from silica-based glass. In some embodiments, a dope bottom clad layer of silicon dioxide is deposited over the substrate. Next, a core layer of different doped silicon dioxide powders is deposited over the clad layer. If the heat treatment is performed under appropriate conditions, both the lower clad layer and the additional layer can be solidified at the same time, but in general the lower clad layer solidifies before adding the additional layer. A convenient technique for producing a core layer with a high index of refraction is to use doped silicon oxide. Suitable dopants include, for example, titanium oxide, tantalum oxide, tin oxide, lead oxide, lithium oxide, sodium oxide, bismuth oxide, potassium oxide, antimony oxide, calcium oxide, barium oxide, tungsten oxide, niobium oxide, zirconium oxide, etc. Includes aluminum oxide, lanthanum oxide, Er, Yb, Nd, Y, Pr, and other rare earth dopants such as Tm, germanium oxide, boron oxide, or a combination thereof. The lower clad layer and the upper clad layer can be produced from doped silicon dioxide having a lower refractive index than the doped core layer. [0141] As the index of refraction of the core material increases, the required layer thickness decreases due to the change in wavelength due to the index of refraction. Therefore, the interrelationships between these variables must be controlled accordingly. The use of excess amounts of certain dopants should be avoided, as excess amounts of certain dopants can result in impaired transmission of the material to light. In many materials, the dopants are generally less than 40% by weight, but the upper limit of those dopants depends on the individual dopants. [0142] To form the separated optics, a core layer with the same or different optical properties and composition is deposited in the same or different layers over a selected portion of the substrate. Alternatively, after solidification of the material for the core layer, the material can be formed within a particular layer to produce one or more desired devices. After forming the desired structure from the core material, the upper clad layer is usually attached. The formation of planar optical waveguides by the flame hydrolysis precipitation method was further described by Keck et al., USP3934061, "Method of Forming Planer Optical." It is described in Waveguides and incorporated herein by reference. The formation of coupling elements by etching is further described in Kawachi et al., USP4735667, "Method For Fabricating Hybrid Optical Integrated Circuit" and is referenced. Incorporated herein. [0143]<u style="single">Multilayer optical structure</u>Using the techniques described herein, a plurality of optical materials can be deposited in a stacked structure. The multilayer structure includes a plurality of layers having different optical properties between materials of different layers. In some embodiments, the optical properties of the material also vary within the layers so that the particular optics are localized within a spatial extent that covers a small portion of the surface area of the individual layers. Therefore, the multilayer optical structure can be used as a multilayer laminate of a planar optical device, a fiber preform, or the like. [0144] With reference to FIG. 18, a schematic perspective view of a multilayer optical structure of alternating layers of material A and material B is shown. In particular, structure 380 includes layer 384 of material B and layer 382 of material A alternating to form the ABABAB structure. In one embodiment, material A is SiO₂Glass, SiO B doped with material B₂It is glass. An embodiment of an alternative multilayer optical structure is shown in FIG. 19 as a schematic side view. In the child embodiment, the structure 390 has alternating layers of material A392, material B394, and material C396. In one embodiment, material A is SiO₂SiO glass doped with material B₂SiO in one form of glass, and another doped form of material C₂It is glass. [0145] 18 and 19 show a specific number of layers, but the number of layers can be changed as needed. In some embodiments, the layer preform has three or more layers, in another embodiment five or more layers, and in further embodiments at least ten layers. In yet another embodiment, it has at least 20 layers, in further embodiments it has at least 30 layers, and is generally less than about 1000 layers. Those skilled in the art will appreciate that the number of layers within these explicit ranges and the number of layers in partial ranges are predictable and are included within this disclosure. In addition, more than three materials can be used in the layered structure. Layers can be arranged in complex patterns and / or non-repetitive structures. [0146] In general, one or more layers of optical material within an optical structure will have uniform yes optical properties from one end to the other of the layers. In general, the optical properties will change with changes in composition across the layer, even though the optical properties are changed by changes in other properties of the material. For example, the index of refraction of some materials will depend on the light shining on the material, for example ultraviolet light. Changes in optical properties are used to form a channel / optical path of light through the layer so that the light is localized within the optical channel. As described below, the optical channels match the optical path of the planar optics or of the fiber preform. [0147] The overall average thickness of the individual optical layers is generally less than 1 millimeter, in some embodiments about 250 microns or less, and in other embodiments in the range of about 500 nanometers to 150 microns. Yes, in yet another embodiment it is in the range of about 3 microns to about 100 microns, and in yet another embodiment it is in the range of about 4 microns to 20 microns. Those skilled in the art will appreciate that the scope and partial scope within these explicit scopes are predictable and are included within this disclosure. Layers are identified by one or more boundaries, especially along planar interfaces. The layer thickness is specified by the flat surface of the substrate, or the plane defined by the extent of the structure without the substrate described above, and the vertical thickness. [0148] The multi-layer structure can be made without a substrate. The substrate can be specified as a material that is optically independent of the material that transmits light, that is, as a non-optical material. Therefore, the clad layer is not part of the substrate because the optical properties of the clad layer help confine light within the core layer and are not optically independent. However, the multilayer structure includes a plurality of substrates in which additional non-optical layers provide a buffer layer between the optical layers in the substrate. [0149] In general, the photoreactive precipitation method involves precipitation of a material on a substrate. However, it has been discovered that a release layer is formed so that the optical structure is separated from the substrate by detachment from the release layer formed on the substrate. The release layer generally contains a powder with a flow temperature sufficiently higher than the material deposited on it. The composition of the powder can be gradually or abruptly changed from one composition to another by adjusting the composition of the precursor in the precipitation apparatus. The conditions and composition are selected so that the release layer is formed on heat treatment to obtain the desired separation. Instead, the release layer can be formed by exposing it to heat from the top surface in order to solidify only part of the thickness of the material while leaving the release layer intact. The formation of release layers and the use of release layers to form substrateless optics is described in USP application 09/931977, "Layer Materials On Substrate", assigned to pending Bryan et al., See. And incorporated herein by reference. [0150]<u style="single">Stacked planar optical circuits</u>The multilayer optical structure is suitable for the structure of stacked planar optical circuits. Selected layers of the multilayer optical structure are formed to provide optical channels / optical paths through the layers. In some embodiments, the optical channels through the layers include planar optics for optical processing / manipulation. In an alternative or additional embodiment, one or more integrated optics are placed on a single layer with one or more optical channels. [0151] FIG. 20 shows a typical cross-sectional view through a layer equipped with planar optics. Layer 400 includes integrated optical circuits 402, 404, 406. Optical circuit 402 includes optical devices 410, 412, 414, and optical circuit 404 includes optical devices 416, 418, 420, 424. Optical circuit 406 includes an optical device 424 such as a planar optical waveguide and an electro-optical device 426 such as a photodetector, eg, a photodiode, together with an electrical connection 428. The electrical connection can be formed by a photoreactive deposition method using silver particles or by a semiconductor processing method such as a chemical vapor deposition method. Although layer 400 is shown with three optical circuits, the layer can generally include one or two optical circuits, or three or more optical circuits. Similarly, the number of optics in the optical circuit can be varied as needed within the spatial limitations of the layers. In general, one or more edges of a layer, such as edges 430, 432 in FIG. 20, are optical, such as connections to fiber optics and other optics and / or electrical-optical devices. Suitable for connection with various interconnectors. [0152] Regardless of the presence or absence of the substrate, the planar optical structure has a flat plate-like appearance that is clearly different from that of an elongated optical fiber or the like. The flat appearance of a planar optical structure can be evaluated based on the planar protrusions of the structure having a large projection surface. This planar protrusion can be evaluated without being complicated by surface features and the like. Generally, planar structures are at least about 1 cm²Surface area of, in another embodiment about 10 cm², At least 25 cm in further embodiments²Of, in additional embodiments at least 50 cm²And in some embodiments about 1 cm²~ About 1m²It has a plane protrusion of the largest area with a surface area in the range of. One of ordinary skill in the art will appreciate that the scope and partial scope within these explicit scopes are predictable and within this disclosure. A wafer substrate with a diameter of 5 inches results in a structure with a maximum overhang of 6.25 π square inches. [0153] Further, the planar optical structure generally has a layer having an aspect ratio of about 20 or less, another embodiment having an aspect ratio of about 10 or less, and another embodiment having an aspect ratio of about 5 or less. Those skilled in the art will appreciate that other and partial scopes within these explicit scopes are predictable and are included within this disclosure. This aspect ratio is the ratio of length to width, where length is the distance along the maximum length in the plane protrusion connecting the points of the two edges, and width is the two edges. It is the distance along the maximum length perpendicular to the line segment connecting the points of the part. The minimum aspect ratio is about 1. The two-dimensional nature of the layer can also be explained by the term of minimum end-to-end distance within the maximum region protrusion of the line segment passing through the center of the protruding region. Generally, the minimum end-to-end distance is at least about 1 cm, in the range of at least about 2 cm in many embodiments, about 5 cm in other embodiments, and about 1 cm to 1 meter in some embodiments. is there. Those skilled in the art will appreciate that the scope and partial scope within these explicit scopes are predictable and are included within this disclosure. The rectangular structure is convenient for the placement of the optical structure along the flat surface. The circular structure is convenient because a circular substrate is available. [0154]<u style="single">Multi-core preform-optical fiber</u>The multi-layer structure can be used to form a multi-core preform and a multi-core optical fiber. These embodiments generally have an optical channel / optical path extending through a one-dimensional material. Multi-core optical fibers can be formed from multi-core preforms. [0155] In particular, the optical fiber is formed with a plurality of regions, each region having a confined channel or core for separate transmission. The optical fiber is formed from the preform with a structure that matches the inside of the preform. The preform is essentially a multilayer monolithic structure having a one-dimensional structure along the direction in which the fiber is stretched so that the composition of the fiber is approximately uniform along the longitudinal direction. By constructing a preform having a structure corresponding to multiple cores, the optical fiber is formed by imitating the structure of the device and interacts with the optical device having a plurality of channels to and the optical fiber. Simplify the connection with the composite optics so that they have multiplex precipitation of optical channels. Fibers are provided for more complex connections of complex optics to provide better use of composite structures. [0156] As shown in FIGS. 21 and 22, in order to form a multi-core preform, the precipitation step and the patterning step are repeated to form a patterned preform. The pattern preform 440 includes a plurality of optical channels 442 embedded in the background clad material 444. The individual optical channels 442 can be formed from the same or different materials as the other optical channels 442. Similarly, the clad material 444 can be formed from one or more materials. However, the clad material is formed from at least a different material than the adjacent optical channel material. In some embodiments, all materials are SiO containing the appropriate dopant.₂Formed from glass, it forms a confined optical channel and a clad material. The number and arrangement of optical channels can be varied to form the desired structure. In general, a multi-core fiber has at least 3 optical channels / cores, with at least 5 optical cores in additional embodiments and about 10-1000 optical cores in other embodiments. In the form, it has an optical core in the range of 20 to 100. Those skilled in the art will appreciate that the scope and partial scope within these explicit scopes are predictable and are included within this disclosure. [0157] Preferred manufacturing methods for optical fibers with multiple transmission channels include the formation of pattern preforms such as preform 440 in FIGS. 21 and 22. In contrast to the laminated planar equipment described above, the preform is designed based on the desired structure of the resulting fiber. The patterned / precipitated preform is stretched, for example, using a conventional fiber stretching process. The preform is heated to soften the material stretched from the preform to form a fiber shape. The dimensions of the preform structure are selected to produce a patterned optical fiber with independent optical channels at the desired dimensions, based on the known dimensions of the optical fiber obtained by stretching the preform. To. Suitable speeds are generally in the range of about 1 m / min to about 100 m / min. Suitable tensions are in the range of about 10 grams to about 40 grams. One of ordinary skill in the art will appreciate that the scope and partial scope within these explicit scopes are predictable and within this disclosure. Stretching results in reduced structural dimensions. Temperature, tension and stretching speed contribute to the dimensions of the resulting fiber. With reasonable stretching conditions, the basic structural relationships of the multi-core structure were maintained within the reduced dimensions. Stretching of fiber optic cables from preforms is described in Ashkin et al., USP 4630890, "Exposed Core Optical Fibers, and Method of Masking Same," which is incorporated herein by reference. The fiber can be stretched to the standard dimensions of an optical fiber, or to other convenient dimensions based on a multi-core structure. [0158] After stretching, the resulting fiber maintains the preform structure. In particular, fibers have separated optical channels through independent cores that are individually used to transmit light without interfering with adjacent cores. Even after stretching, the fiber has an overall structure reminiscent of a standard optical fiber, in particular the patterned optical fiber is generally flexible. [0159] The pattern fiber is conveniently attached to the optical device instead of attaching a plurality of optical fibers. The structure within the optical fiber extended from the patterned preform is so small that the patterned optical fiber can be attached to a structure to which similar optical fibers cannot be conveniently attached. Therefore, smaller optical devices can be formed and patterned optical fibers can be connected to individual devices. In certain embodiments, the patterned optical fiber can be connected to a multilayer structure with stacked planar optical circuits and can be connected to individual optical channels / paths through the core of the fiber. A single patterned optical fiber can be replaced with multiple optical fibers, as shown in Figure 3b of Chen et al. USP6045888, "Optical Volume Memory", which is incorporated herein by reference. Alternatively, patterned fiber optics can be used in place of or in addition to optical couplers such as the optical couplers described in Keck et al. USP4948217, "Optic Coupler", see this patent. Incorporate into the specification. [0160] The high storage capacity, non-volatile optical memory device makes it possible to fundamentally change the configuration of a computer, especially a personal computer. In particular, optical memory devices include a plurality of executable programs. Preferred optical memory devices are fixed to semiconductor devices integrated within a network of optoelectronics inside a computer. Selective access to the program provides the execution of the desired routine and the selected operating system. The multidimensional optical memory device can be configured with the multilayer optical structure described herein. [0161] Suitable three-dimensional optical data storage structures are described, for example, in USP6045888, "Optical Volume Memory" by Chen et al., Which are incorporated herein by reference ('888 patent). The non-volatile optical memory described in the '888 patent has a large number of individually addressable cells, i.e., data elements. These data elements are used to store a predetermined program. Since the individual data elements are accessed via optical instructions to read the data elements, the non-volatile optical memory can be accessed without any moving parts. Data elements are addressed using overlapping light beams or using a spatial light modulator in which each data element is associated with a controlled modulation pixel. In an alternative embodiment, a storage medium such as a disk, or condensing element, moves towards focused radiation on a single optical data element. [0162] In a preferred embodiment, a non-volatile optical memory is used to store a plurality of computer programs. Suitable programs include, for example, operating systems, word processors, spreadsheet software, drawing programs, communication programs, games and the like. These programs can be selectively connected. [0163] In a particularly preferred embodiment, the non-volatile optical memory is attached to the motherboard by a connection. The non-volatile memory is made removable from the connection to provide replacement with a different memory device. For example, a global upgrade of a program stored in an optical memory device can be performed. Replacing the optical memory device also includes removing and adding program selections. [0164] The program stored in the optical memory is fixed by the activity number. Connections are restricted based on the presence of appropriate licenses and / or activation numbers. Similar restrictions on connections are currently being built within various software programs. For example, some software currently available on the Internet can be downloaded but cannot be run without an access code. [0165] The use of access codes provides a large amount of software storage along with connection restrictions for software allocations on a single optical memory device. In a particularly preferred embodiment, the optical memory device includes all or specific parts of software available for hardware. Then, the user accesses the software licensed to the user of the software by entering an appropriate access code. Additional software can be connected later with the appropriate access code. The upgrade will be done worldwide by replacing the non-volatile optical memory. Additional software can be connected by using conventional volatile memory or other non-volatile memory in addition to non-volatile optical memory. In a preferred embodiment, the individual personal computer has no hard disk drive or other volatile storage other than for RAM memory. In particular, all executable code can be found in the optical memory device. Work results can be stored on other volatile or non-volatile memory connected to a computer such as a small disk drive or semiconductor memory, but work results can be stored on a central server or on other networks such as an internet server. Can be stored in the server. [0166] The use of non-volatile optical memory for program storage is the basis of the rules for non-volatile memory, from relatively less important rules for volatile memory, such as hard disk drive, to central rules for volatile memory, where smaller rules are used. It will be a turning point. The use of more non-volatile semiconductor memory provides almost instantaneous booting of the computer by quick connection to non-volatile optical memory. Substitution of the majority of memory capacities, high-speed non-volatile memory, provides faster connectivity to large amounts of information. [0167] As used herein, the terms "within" or "between" are listed after the term "within" or "between", as are some and all subranges contained within that range. Consists of a range defined by the given numbers, each of such subranges as the first endpoint of any number within that range, and from the value of the first endpoint within that range. Any number within that range is defined as having as a second end point. [0168] The above embodiment is an example and means that the present embodiment is not limited thereto. Additional embodiments are within the scope of the following claims. Although the present invention has been described with reference to certain embodiments, one of ordinary skill in the art will appreciate that the shape and details can be modified without departing from the spirit and purpose of the invention. [Simple explanation of drawings] FIG. 1 is a side perspective view of a reaction chamber for performing laser pyrolysis synthesis of powder at a high production rate. FIG. 2 is a schematic diagram of a reactant transport system for transporting a vapor / gas reactant such as the laser pyrolysis reaction of FIG. 1 to a flow reaction system. FIG. 3 is a cross-sectional view of a reactant injection nozzle with an aerosol generator for transporting a mixture of aerosol and vapor / gas into the reaction chamber, which cross section is along line 3-3 of the inset. It is a thing. The insertion view is a top view of a horizontally long reaction injection port. FIG. 4 is a side sectional view of the reactant injection nozzle of FIG. 3 along line 4-4 of the insertion diagram of FIG. FIG. 5 is a schematic view of a photochemical precipitation apparatus comprising a separate coating chamber and a particle production apparatus connected via a conduit. FIG. 6 is a perspective view of a coated chamber, in which the walls of the chamber are made transparent so that the internal configuration can be seen. FIG. 7 is a perspective view of a particle nozzle placed on a turntable toward a substrate. FIG. 8 is a schematic view of a photochemical precipitation device that coats a substrate on a substrate in a particle manufacturing chamber. FIG. 9 is a perspective view of a reactant nozzle that introduces a reactant into a reaction region located adjacent to a substrate. 10 is a cross-sectional view of the device taken along line 10-10 of FIG. FIG. 11 is a perspective view of a photochemical precipitation chamber according to an embodiment. 12 is an enlarged view of the reaction chamber of the photochemical precipitation chamber of FIG. 11. FIG. 13 is an enlarged view of a substrate support of the reaction chamber of FIG. FIG. 14 is a perspective view of a patterned layer of an optical material. FIG. 15 is a side view of the material of FIG. 14 after precipitation of the overclad layer. FIG. 16 is a perspective view of an optical circuit. FIG. 17 is a cross-sectional view taken along the line 17-17 of the optical circuit of FIG. FIG. 18 is a perspective view of a multilayer optical structure. FIG. 19 is a side view of a characteristic embodiment of a multilayer optical structure. FIG. 20 is a cross-sectional view of a multilayer optical structure that is taken through layers having a plurality of optical paths. FIG. 21 is a side view of a multi-core / patterned preform. 22 is a cross-sectional view of the multi-core / patterned preform of FIG. 21 along line 22-22 of FIG.