Clean transfer method, clean box, and clean transfer device

Description: TECHNICAL FIELD [Detailed description of the invention]

【0001】

[Technical field to which the invention belongs]

INDUSTRIAL APPLICABILITY According to the present invention, it is possible to transfer an object to be transported, which is necessary for processing and assembling semiconductors, electronic component-related products, optical disks, etc., in a clean state without contaminants, especially in a state of being sealed with a clean gas such as nitrogen. The present invention relates to a clean transfer method, a clean box, and a clean transfer device that can be transferred.

【0002】

[Conventional technology]

The applicant has proposed a clean transfer method in Japanese Patent Application Laid-Open No. 7-235580 for transporting an object to be transported by vacuum-sealing it in a vacuum clean box. Figure 6 shows an example of a vacuum clean box used in this case.

【0003】

The vacuum clean box 1 shown in FIG. 6 consists of a box body 2 and a lid 3 that also serves as a shutter for airtight sealing, and is a lid due to a pressure difference between the inside and outside of the box (vacuum inside the box and atmospheric pressure outside). The closed state is maintained by pressing 3. Therefore, when a clean gas such as nitrogen is to be transferred in a state of being sealed in the vacuum clean box, the closed state of the lid 3 cannot be maintained as it is because there is no pressure difference between the inside and outside of the box.

【0004】

In addition, at present, mechanical seal type transport boxes with nitrogen purge specifications for local cleanliness (for example, what is called a smiff box (trade name)) are used at semiconductor manufacturing sites (1) fine particles such as dust. It is used for the purpose of preventing (particles) from adhering to the transported object, (2) preventing oxidation of the transported object, and (3) preventing organic contamination.

【0005】

[Problems to be Solved by the Invention]

By the way, these transport boxes are practically sufficient for using (1) a complicated mechanism and sufficient reliability cannot be guaranteed for mechanical sealing, and (2) mechanical holding force such as a spring. There remains the problem of not being able to obtain a sufficient holding power.

【0006】

In view of the above points, the first object of the present invention is to add a lid chuck capable of holding the lid in an airtight seal state by using the force of vacuum suction (atmospheric pressure) to the clean box. It is an object of the present invention to provide a clean transfer method and apparatus capable of transferring an object to be transported not only in a vacuum-sealed state but also in a state where the object to be transported is sealed with a clean gas such as nitrogen without the need for mechanical sealing using a spring or the like.

【0007】

A second object of the present invention is that the transferable object can be transferred not only in a vacuum-sealed state but also in a state where the object to be transported is sealed with a clean gas such as nitrogen, and a conventional mechanical seal using a spring or the like is not required. The purpose is to provide a clean box with a simple structure.

【0008】

Other objects and novel features of the present invention will be clarified in embodiments described below.

【0009】

[Means for solving problems]

In order to achieve the above object, the clean transport method of the present invention includes a box main body having an opening / closing port and a flange portion of an opening edge, and a lid that also serves as a shutter that is in contact with the end surface of the flange portion and airtightly closes the opening / closing port. It has a body and a lid chuck that holds the lid in a closed state by vacuum suctioning on both the opposite surface of the surface of the shutter-combined lid that comes into contact with the end face of the flange and the end face of the flange, and exhausts the lid. A clean box having no means and transfer means and a clean device having an opening / closing port that can be opened / closed by a shutter are airtightly coupled to each other in a closed state of the lid and the shutter so that the lid and the shutter are surfaced. Moreover, a closed space including the lid chuck is formed inside, the closed space is vacuum exhausted to remove the lid chuck, the lid is opened, and then the lid is surrounded by the clean box and the shutter. It is characterized in that the inside of the closed space is made to have the same clean atmosphere as the inside of the clean device, and then the shutter is opened to pull the shutter and the lid into the inside of the clean device.

【0010】

【0011】

The clean box of the present invention comprises a box body having an opening / closing opening and a flange portion of an opening edge, a shutter / opening / closing lid that is in contact with the end surface of the flange portion and airtightly closing the opening / closing, and a shutter / closing lid. It is provided with a lid chuck that vacuum-sucks to both the opposite surface of the surface in contact with the end face of the flange portion and the end face of the flange portion to hold the lid in a closed state, and does not have an exhaust means and a transfer means. ..

【0012】

The clean transport device of the present invention comprises a box body having an opening / closing port and a flange portion at an opening edge, a shutter / opening / closing lid that is in contact with the end surface of the flange portion, and a shutter / closing lid that airtightly closes the opening / closing. A clean box having a lid chuck that vacuum-sucks to both the opposite surface of the surface in contact with the end face of the flange portion and the end face of the flange portion to hold the lid in a closed state, and does not have an exhaust means and a transfer means. A clean device including a lid receiving / lifting table for receiving the lid, a chuck receiving / lifting table for receiving the lid chuck, an elevating shutter, and an opening / closing port that can be opened / closed by the shutter. Is a closed space in which the lid and the shutter face each other and the lid chuck is included inside in the combined state of the clean box, and a vacuum exhaust means for vacuum exhausting the closed space is provided. It is characterized by.

【0013】

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, embodiments of a clean transport method, a clean box, and a clean transport device according to the present invention will be described with reference to the drawings.

【0014】

1 to 5 show the configuration of a clean box and a clean device according to the embodiment of the present invention, and FIGS. 1 to 5 explain an operation of sequentially transferring an object to be transported (semiconductor wafer, etc.).

【0015】

In these figures, the clean box 11 has a box body 12 having an opening / closing port, a lid body 13 that also serves as a shutter for airtightly closing the opening / closing port, and a lid body 13 that is vacuum-sucked to the box body 12 and the lid body 13. It has an annular lid chuck 14 that is held in the closed state and has an L-shaped cross section, and has airtightness that can maintain a vacuum state or a clean state when the lid 13 is closed. It is a structure that does not have. In order to ensure airtightness, an annular groove 13a is formed on the upper surface of the lid 13 that abuts on the flange portion 12a of the box body 12, and an O-ring 13b for an airtight seal (airtight seal) is formed in the annular groove 13a. Are arranged. An annular groove 14a is also formed on the annular upper end surface of the lid chuck 14 that abuts on the flange portion 12a to ensure airtightness, and an O-ring 14b for airtight sealing (airtight sealing) is formed in the annular groove 14a. Are arranged. Similarly, an annular groove 14c is formed on the annular inner bottom surface of the lid chuck 14 that abuts on the lower surface of the lid 13, and an O-ring 14d for airtight sealing (airtight sealing) is arranged in the annular groove 14c. There is.

【0016】

A holder 15 that supports an object to be transported 20 such as a semiconductor wafer is attached to the upper surface of the lid 13. The holder 15 has a structure capable of storing, for example, a large number of objects 20 to be transported in a horizontal state at equal intervals. Further, the positioning pin 16 is integrally fixed to the lower surface of the lid 13.

【0017】

The vacuum changer portion 40 of the clean device 30 for delivering the transported object in various processing devices or various processes to which the clean box 11 can be combined (however, the clean device 30 may not have a mechanism other than the vacuum changer section 40). There is an airtight container 43 in which a connecting block 42 having an opening / closing port 41 is integrated at the upper part, an elevating shutter 45 that abuts on the lower surface of the connecting block 42 to close the opening / closing port 41, and a clean box 11 side. It has a lid receiving and elevating table 46 for receiving and supporting the shutter combined lid 13 from below, and a chuck receiving and elevating table 47 for receiving and supporting the lid chuck 14 from below. The shutter 45 is driven up and down by the central elevating shaft 48, the lid receiving elevating table 46 is elevating and driving relative to the shutter 45 by the elevating part 49, and similarly, the chuck receiving and elevating table 47 is also a cylinder around the elevating part 49. The shape elevating part 50 is driven up and down relative to the shutter 45. An annular groove 45a is formed on the surface of the shutter 45 facing the connecting block 42, and an O-ring 45b for an airtight seal is arranged therein. Further, on the upper surface of the lid receiving lift 46, a positioning recess 51 that fits with the positioning pin 16 on the lower surface of the lid body 13 that also serves as a shutter is formed.

【0018】

The wall thickness of the connecting block 42 is set sufficiently larger than the sum of the thicknesses of the shutter combined lid 13 and the lid receiving lift 46.

【0019】

The joint portion between the clean box 11 and the clean device 30 has a double airtight seal structure (airtight seal structure), and the joint surface facing the clean box 11 of the vacuum changer portion 40, that is, the upper part of the airtight container 43. Airtight seals P1 and P2 are arranged on the upper surface of the connecting block 42 forming the above. Specifically, double annular grooves 61, 62 are formed on the upper surface of the connecting block 42 so as to surround the opening / closing port 41, and O-rings 63, 64 for airtight sealing are fitted therein, and the outer ring is formed. The groove 61 and the O-ring 63 form an airtight seal P1, and the inner annular groove 62 and the O-ring 64 form an airtight seal P2. Further, an annular groove 65 for vacuum exhausting between the airtight seals P1 and P2 is formed on the upper surface of the connecting block 42 between the annular grooves 61 and 62, and the annular groove 65 is formed in the connecting block 42. It communicates with the vacuum exhaust path 66. In this vacuum exhaust path 66, the clean device 30 is connected to a vacuum exhaust means such as a vacuum pump provided outside the airtight container 43 via a vacuum exhaust opening / closing valve 71. However, when necessary, open the leak opening / closing valve 72 connected to the vacuum exhaust path 66 to release the vacuum state, introduce the internal clean gas (nitrogen, etc.) from the clean device 30, and between the airtight seals P1 and P2. Can be returned to atmospheric pressure.

【0020】

Further, when the clean box 11 is connected to and combined with the vacuum changer portion 40 of the clean device 30, the inner surface of the connecting block 42 (inner surface of the opening / closing port 41) and the lower surface of the shutter combined lid 13 and the flange portion 12a The intermediate area S surrounded by the upper surface of the shutter 45 becomes an airtight sealed space, and the vacuum exhaust path 80 penetrating laterally through the connecting block 42 so that the intermediate area S can be evacuated. Is formed. In this vacuum exhaust path 80, the clean device 30 is connected to a vacuum exhaust means such as a vacuum pump provided outside the airtight container 43 via a vacuum exhaust opening / closing valve 81. However, if necessary, the leak opening / closing valve 82 connected to the vacuum exhaust path 80 can be opened to release the vacuum state, and the internal clean gas (nitrogen, etc.) can be introduced from the clean device 30 to return to atmospheric pressure. You can do it.

【0021】

The clean device 30 is provided with a transfer means for transferring the object to be transported 20 drawn into the airtight container 43 to various processing portions.

【0022】

In this embodiment, as shown in FIG. 1, in the state before the clean box 11 is combined, the inside of the clean box 11 is in a vacuum state (for example, dust is significantly reduced) by the vacuum changer portion 40 of another clean device 30 in advance. Therefore, the degree of vacuum is preferably 0.1 Torr or less), a desired clean gas such as nitrogen is sealed, the inside is sealed by the lid 13 that also serves as a shutter, and the lid 13 is further sealed by the vacuum adsorption force of the lid chuck 14. Is kept in a sealed state. That is, in the vacuum changer portion 40, the inner space T of the lid chuck 14 (the space surrounded by the inner surface of the lid chuck 14 and the flange portion 12a and the outer surface of the lid 13) is made into a vacuum state, and the lid chuck 14 is in a vacuum state. Is in close contact with the box body 12 and the lid 13, and after the clean box 11 is taken out into the atmosphere, the pressure difference between the inside and outside of the lid chuck 14 (the pressure difference between the high vacuum in the inner space T and the external atmospheric pressure). ) Allows the lid chuck 14 to securely hold the lid 13 in the closed state, and therefore does not require a mechanical seal using a spring or the like.

【0023】

By adding the lid chuck 14 to the clean box 11 in this way, the lid 13 can be pressed against the flange portion 12a on the opening / closing side of the box body 12 by the lid chuck 14 to securely seal the opening / closing port, which also serves as a shutter. The clean box 11 can be transported in a state in which the clean gas is sealed inside and the object to be transported 20 such as a semiconductor wafer is housed without the lid 13 moving.

【0024】

As shown in FIG. 1, when the clean box 11 is not mounted, the opening / closing port 41 of the vacuum changer portion 40 of the clean device 30 is closed by the shutter 45, and the outer surface of the shutter has a normal factory atmosphere. Is exposed to.

【0025】

The connection between the clean box 11 and the clean device 30 is a connection block that constitutes the opening edge of the opening / closing port 41 of the vacuum changer portion 40 as shown in FIG. 2 with the shutter / lid 13 of the clean box 11 facing downward. This is done by placing the flange portion 12a of the box body 12 in contact with the 42. At this time, the positioning pin 16 on the side of the lid that also serves as a shutter is fitted into the positioning recess 51 on the side of the lid receiving lift 46 to perform mutual alignment. Further, since the elevating shaft 48 of the shutter 45 on the vacuum changer portion 40 side is in the raised state, the shutter 45 abuts on the inner surface (lower surface) of the connecting block 42 constituting the opening edge portion of the opening / closing port 41 to make the opening / closing port 41 airtight. It is sealed.

【0026】

As described above, as a result of connecting the clean box 11 to the vacuum changer portion 40 of the clean device 30, the inner surface of the connecting block 42 (inner surface of the opening / closing port 41), the lower surface of the shutter combined lid 13 and the flange portion 12a, and the shutter. The intermediate area S surrounded by the upper surface of 45 is an airtight sealed space. That is, the shutter combined lid 13 and the shutter 45 face the intermediate area S which is a closed space, and the lid chuck 14 is included inside the intermediate area S. Since this intermediate area S is initially at atmospheric pressure, it is evacuated by the vacuum exhaust means on the cleaning device 30 side through the vacuum exhaust path 80 and the vacuum exhaust opening / closing valve 81 (for example, the degree of vacuum is 0.1 Torr or less). At this time, dust on the lid receiving lift 46, the chuck receiving lift 47, the upper surface of the shutter 45, etc., which were exposed to the normal factory atmosphere in FIG. 1, will be discharged at the same time.

【0027】

After the intermediate area S is evacuated (actually, since the lid chuck 14 is evacuated to the flange portion 12a and the lid 13 that also serves as a shutter, the lid chuck in the intermediate area S is evacuated. Since the pressure difference between the inside and outside of the lid chuck 14 disappears (which is the outer space of 14), the holding of the lid chuck 14 is released, and the lid chuck 14 is released as the chuck receiving platform 47 is lowered as shown in FIG. Descends under its own weight. In the state of FIG. 3, the shutter-combined lid 13 is still supported by the lid receiving lift 46 in the raised position and does not lower.

【0028】

In the next step, the clean gas (nitrogen, etc.) inside is introduced from the clean device 30 into the intermediate area S and the clean box 11, but at a timing before that (immediately after connecting the clean box 11 or the vacuum in the intermediate area S). (It does not matter at the same time as the exhaust), vacuum exhaust is performed between the airtight seals P1 and P2 through the annular groove 65, the vacuum exhaust path 66, and the vacuum exhaust opening / closing valve 71.

【0029】

Clean gas (nitrogen, etc.) inside from the clean device 30 in a state where the airtight seals P1 and P2 are evacuated and the flange portion 12a of the box body 12 is evacuated to the upper surface of the connecting block 42 on the clean device 30 side. The leak opening / closing valve 82 is opened and put into the intermediate area S through the vacuum exhaust path 80 (leakage), and the lid receiving lift 46 is raised and lowered with the pressure difference between the inside and outside of the shutter combined lid 13 substantially eliminated. As shown in FIG. 4, lower the lid 13 by 49 to open the lid 13. However, the shutter 45 is still in the closed state. When the lid 13 is opened, the intermediate area S and the internal space of the clean box 11 communicate with each other, and the internal space of the clean box 11 is also replaced with the clean gas from the clean device 30.

【0030】

As described above, after the intermediate area S and the inside of the clean box 11 are replaced by the clean gas (nitrogen or the like) from the clean device 30, the gases on the upper and lower surfaces of the shutter 45 are the same and the pressure difference is eliminated. ), The elevating shaft 48 is pulled in (lowered) greatly, and the shutter 45 linked with the elevating shaft 48 is opened wide as shown in FIG. To communicate (continuously). At this time, since the lid receiving and lowering table 46 and the chuck receiving and lowering table 47 are also attached so as to move up and down relative to the shutter 45 by the raising and lowering portions 49 and 50, respectively, they are lowered as the shutter 45 is lowered. Because of the weight of the shutter combined lid 13 and the weight of the holder 15 and the object to be transported 20 held by the holder 15, the shutter combined lid 13 is cleaned together with the lid receiving platform 46. It is pulled into the device 30. Similarly, the lid chuck 14 is also pulled into the clean device 30 in a state of being mounted on the chuck receiving platform 47. In this state, the object to be transported 20 held by the holder 15 is subjected to necessary treatment (for example, treatment in clean gas at atmospheric pressure, inspection, etc.).

【0031】

The vacuum exhaust between the airtight seals P1 and P2 needs to be continued at least until the inside becomes stable after the clean gas is introduced into the intermediate area S and the clean box 11. By executing the vacuum exhaust between the airtight seals P1 and P2, the flange portion 12a of the clean box 11 is pressed against the upper surface of the connecting block 42 even if the inside of the clean box 11 becomes atmospheric pressure. As a result, unclean air does not leak from the outside to the inside of the clean box 11, and the situation where fine particles of dust invade and float in the clean box that occurred when only a single airtight seal was used. It can be avoided.

【0032】

On the contrary, when the processed object 20 is returned to the holder 15, vacuum exhaust is performed in advance between the airtight seals P1 and P2 in the state of FIG. 5, and the clean box side flange portion 12a is evacuated to the upper surface of the connecting block 42. After sucking, the elevating shaft 48 is raised from the state shown in FIG. 5, and the opening / closing port 41 on the device side is closed by the shutter 45 (however, the shutter combined lid 13 is opened in the state shown in FIG. 4). In the state shown in FIG. 4, the inside of the intermediate area S and the clean box 11 is evacuated through the vacuum exhaust path 80 and the vacuum exhaust opening / closing valve 81 (for example, the degree of vacuum is 0.1 Torr or less so that the amount of suspended dust is sufficiently reduced).

【0033】

After that, clean gas (nitrogen, etc.) to be sealed in the clean box 11 is put into the intermediate area S and the clean box 11 through the leak opening / closing valve 82 and the vacuum exhaust path 80 (leakage), and further, the shutter 45 as shown in FIG. On the other hand, the lid receiving elevating table 46 is raised by the elevating part 49, and the lid body 13 also used as a shutter is pressed against the flange portion 12a on the box body 12 side.

【0034】

When the shutter / lid 13 is closed as shown in FIG. 3, the intermediate area S including the lid chuck 14 isolated from the clean box 11 is evacuated through the vacuum exhaust path 80 and the vacuum exhaust open / close valve 81. After evacuating, as shown in FIG. 2, the chuck receiving and elevating table 47 is raised with respect to the shutter 45 by the elevating part 50, and the lid chuck 14 is pressed against the flange portion 12a on the box body 12 side and the lower surface outer edge of the lid 13. Let me.

【0035】

As shown in FIG. 2, while maintaining the pressure contact state of the lid chuck 14 with the clean box 11, the leak opening / closing valve 82 passes through the intermediate area S to leak to atmospheric pressure, and the vacuum exhaust between the airtight seals P1 and P2 is performed. It stops and leaks to atmospheric pressure through the leak opening / closing valve 72. After that, the box body 12 and the shutter combined lid 13 are airtightly integrated with the transported object 20 housed inside, and the lid chuck 14 holds the closed state of the lid 13 in the clean box 11. As shown in FIG. 1, it can be removed from the cleaning device 30 and transported to an arbitrary position. At this time, since clean gas (normally the same pressure as atmospheric pressure) is sealed inside the clean box 11, there is no difference in pressure between the inside and outside of the lid 13 that also serves as a shutter, but the lid 13 has an annular shape and an L-shaped cross section. Since an internal / external pressure difference (inner space T is vacuum and outer atmospheric pressure) is applied to the lid chuck 14 that surrounds and holds the outer edge of the lid chuck 14, the lid chuck 14 is placed on the box body side flange portion 12a and the lower surface of the lid 13. Since vacuum suction is performed, the lid 13 is securely sealed in a closed state.

【0036】

According to this embodiment, the following effects can be obtained.

【0037】

(1) The clean box 11 includes a box body 12 that does not have an exhaust means and a transfer means and has an opening / closing port, a lid body 13 that also serves as a shutter that airtightly closes the opening / closing port, and the box body 12 and the lid body 13. It may be a simple mechanism having a lid chuck 14 that holds the lid 13 in a closed state by vacuum suction. Further, since the mechanical seal by a spring or the like is not used, the defects associated with the use of the mechanical seal can be eliminated, and the problems of the prior art can be completely solved.

【0038】

(2) Since the inside of the clean box 11 is filled with clean gas such as nitrogen after vacuum exhaust, nitrogen for purging and the like can be suppressed to the minimum necessary. In the conventional technique, the replacement is performed in the atmosphere, and the nitrogen for purging is wasted.

【0039】

(3) The clean box 11 can be used safely even when purging nitrogen. That is, unnecessary nitrogen is not diffused to the outside, and problems such as oxygen deficiency do not occur.

【0040】

(4) The joint surface of the vacuum changer portion 40 of the clean device 30 on which the clean box 11 is arranged has a double airtight seal structure, and vacuum exhaust is performed between the airtight seals P1 and P2 through the annular groove 65 and the vacuum exhaust path 66. Then, the flange portion 12a of the clean box 11 can be pressed (vacuum suction) on the upper surface of the connecting block 42, and when opening and closing the shutter combined lid 13 of the clean box 11 and the shutter 45 on the device side, etc. It is possible to prevent the invasion of the outside air and surely prevent the floating of dust particles due to the invasion of the outside air. Further, since it is not necessary to mechanically lock the flange portion 12a on the clean box side to the connecting block 42 on the device side, it is easy to automate the transfer of the clean box 11.

【0041】

In the above embodiment, the case where the inside of the clean box 11 is sealed with a clean gas such as nitrogen (normally the same pressure as atmospheric pressure) has been described, but the clean box 11 is also used when the inside is vacuum-sealed. At this time, it is possible to omit the step of filling the clean box 11 with a clean gas such as nitrogen after evacuating the inside of the clean box 11 and close the shutter / lid 13 while the inside of the clean box 11 remains in a vacuum state.

【0042】

Further, in the above embodiment, the joint portion between the clean box 11 and the clean device 30 side is a double airtight seal P1 and P2, but a double or more airtight seal is provided so that vacuum exhaust is performed between the seals. It may be.

【0043】

As the clean gas sealed in the clean box 11, in addition to nitrogen, clean air from which suspended matter particles have been sufficiently removed, other inert gas, and the like can be used depending on the application.

【0044】

The positioning pin 16 was provided on the lid 13 to align the lid 13 and the lid receiving lift 46, but other positioning means was used to align the lid 13 with the lid receiving lift 46. Alignment may be performed.

【0045】

Although the embodiments of the present invention have been described above, it will be obvious to those skilled in the art that the present invention is not limited to this and various modifications and changes can be made within the scope of the claims.

【0046】

[Effect of the invention]

As described above, according to the present invention, by adding a lid chuck capable of holding the lid of the clean box in an airtight seal state by utilizing the force of vacuum suction (atmospheric pressure), the clean box is provided. It is possible to transfer using a clean box not only in a vacuum-sealed state but also in a state where the object to be transported is sealed with a clean gas such as nitrogen without the need for a mechanical seal using a conventional spring or the like. As a result, the mechanism of the clean box can be simplified, and the mechanical chuck release operation is not required for opening and closing the clean box, and it is easy to automate the attachment / detachment operation to the clean device. In addition, the clean box can be safely filled with a clean gas such as nitrogen by a clean device.

[Simple explanation of drawings]

[Figure 1]

FIG. 5 is a front sectional view showing a state in which the clean box is separated from the clean device according to the embodiment of the present invention.

[Figure 2]

Similarly, it is a front sectional view showing a state in which a clean box is connected to a clean device.

[Fig. 3]

Similarly, it is a front sectional view showing a state in which the lid chuck on the clean box side is removed after the clean box is connected to the clean device.

[Fig. 4]

Similarly, it is a front sectional view showing a state in which the shutter combined lid body on the clean box side is opened.

[Fig. 5]

Similarly, it is a normal cross-sectional view which shows the state which opened the shutter on the side of a clean device, and pulled the lid which also serves as a shutter and the object to be conveyed placed on the lid into the inside of a clean device.

[Fig. 6]

It is a front sectional view which shows the conventional clean box.

[Explanation of symbols]

11 Clean box 12 Box body 12a Flange 13 Shutter combined lid 13b, 14b, 14d, 45b, 63, 64 O-ring 14 Lid chuck 15 holder 16 Positioning pin 20 Items to be transported 30 Clean device 40 Vacuum changer section 41 Opening and closing 42 Connecting block 43 Airtight container 45 Lifting shutter 46 Lid support lift 47 Chuck receiving platform 65 annular groove 66,80 Vacuum exhaust path 71,81 Open / close valve for vacuum exhaust 72,82 Leak open / close valve P1, P2 Airtight seal S middle area