Light-emitting device
Abstract
Problem to be solved.To provide a light emitting device having excellent portability. Provide a light emitting device having excellent listability.
Solution.The light emitting device has a strip-shaped high-flexibility region and a strip-shaped low-flexibility region alternately in a first direction, and the highly flexible region emits light having flexibility. The region having a panel and having low flexibility is a light emitting device having a support panel having a lower flexibility than the light emitting panel and a light emitting panel in an overlapping manner. The light emitting panel includes an external connection electrode, and the length of the low flexibility region A overlapping the external connection electrode in the first direction is the first direction of the low flexibility region B closest to the region A. It is preferably longer than the length. [Selection diagram] Fig. 1

Term
12.3 yearsto projected expiry
Projected expiry 7 January 2039, counted from filing; an application has no term until it is granted.
- Priority
- Filed
- Published
- Today
- Projected expiry
3 claims: 2 independent, 1 dependent
- 1第1の支持パネル及び第2の支持パネルと、発光パネルと、を有し、 前記発光パネルは、前記第1の支持パネル及び前記第2の支持パネルよりも可撓性が高い第1の領域乃至第3の領域を有し、 前記第2の領域は、平面視において前記第1の領域と前記第3の領域との間に位置し、 前記第1の支持パネルは、第4の領域及び第5の領域を有し、 前記第2の支持パネルは、第6の領域及び第7の領域を有し、 前記第4の領域は、平面視において前記第1の領域を介して前記第5の領域と重なる領域を有し、 前記第6の領域は、平面視において前記第3の領域を介して前記第7の領域と重なる領域を有し、 前記発光パネルは、発光素子を含む発光領域と、駆動回路部を含む非発光領域と、を有し、 前記非発光領域は、平面視において前記発光領域を囲んでおり、 前記第2の領域は、平面視において前記非発光領域と重なる領域を有する発光装置であって、 前記発光装置は、前記第2の領域を内曲げまたは外曲げすることで折り畳み可能となる発光装置。
- 2第1の支持パネル及び第2の支持パネルと、発光パネルと、第1の保護層及び第2の保護層と、を有し、 前記発光パネルは、前記第1の支持パネル及び前記第2の支持パネルよりも可撓性が高い第1の領域乃至第3の領域を有し、 前記第1の保護層は、前記第1の支持パネル及び前記第2の支持パネルよりも可撓性が高く、 前記第2の保護層は、前記第1の支持パネル及び前記第2の支持パネルよりも可撓性が高く、 前記第2の領域は、平面視において前記第1の領域と前記第3の領域との間に位置し、 前記第1の支持パネルは、第4の領域及び第5の領域を有し、 前記第2の支持パネルは、第6の領域及び第7の領域を有し、 前記第4の領域は、平面視において前記第1の領域を介して前記第5の領域と重なる領域を有し、 前記第6の領域は、平面視において前記第3の領域を介して前記第7の領域と重なる領域を有し、 前記第1の保護層は、平面視において前記第1の領域と前記第4の領域との間の領域を有し、 前記第1の保護層は、平面視において前記第3の領域と前記第6の領域との間の領域を有し、 前記第2の保護層は、平面視において前記第1の領域と前記第5の領域との間の領域を有し、 前記第2の保護層は、平面視において前記第3の領域と前記第7の領域との間の領域を有し、 前記発光パネルは、発光素子を含む発光領域と、駆動回路部を含む非発光領域と、を有し、 前記非発光領域は、平面視において前記発光領域を囲んでおり、 前記第2の領域は、平面視において前記非発光領域と重なる領域を有する発光装置であって、 前記発光装置は、前記第2の領域を内曲げまたは外曲げすることで折り畳み可能となる発光装置。
- 3請求項1または請求項2において、 前記発光パネルは、外部接続電極を有し、 前記外部接続電極は、前記第1の領域と重なっている発光装置。
Independent claims3
194 paragraphs, as filed
The present invention relates to a light emitting device, a display device, an electronic device, a lighting device, or a method for manufacturing the same. In particular, the present invention relates to a light emitting device, a display device, an electronic device, a lighting device, or a method for manufacturing the same, using an electroluminescence (hereinafter, also referred to as EL) phenomenon.
In recent years, light emitting devices and display devices are expected to be applied to various applications, and diversification is required.
For example, light emitting devices and display devices for mobile device applications are required to be thin, lightweight, and hard to be damaged.
A light emitting element using the EL phenomenon (also referred to as an EL element) has features such as being easy to be thin and lightweight, being able to respond to an input signal at high speed, and being able to be driven by using a DC low voltage power supply. However, application to light emitting devices and display devices is being studied.
For example, Patent Document 1 discloses a flexible active matrix type light emitting device provided with a transistor as a switching element and an organic EL element on a film substrate.
<p><patcit num="1"><text>Japanese Unexamined Patent Publication No. 2003-174153</text></patcit></p>
<p>For example, if the display area is narrowed by downsizing the display device in order to improve portability, the amount of information that can be displayed at one time is reduced, and the listability is lowered.</p><p>One aspect of the present invention is to provide a light emitting device, a display device, an electronic device, or a lighting device having excellent portability. Alternatively, one aspect of the present invention is to provide a light emitting device, a display device, or an electronic device having excellent listability. One aspect of the present invention is to provide a light emitting device, a display device, or an electronic device having excellent portability and listability.</p><p>One aspect of the present invention is an object of providing a novel light emitting device, display device, electronic device, or lighting device. Alternatively, one aspect of the present invention is intended to provide a lightweight light emitting device, display device, electronic device, or lighting device. Alternatively, one aspect of the present invention is an object of providing a highly reliable light emitting device, display device, electronic device, or lighting device. Alternatively, one aspect of the present invention is to provide a light emitting device, a display device, an electronic device, or a lighting device that is not easily damaged. Alternatively, one aspect of the present invention is intended to provide a light emitting device, a display device, an electronic device, or a lighting device having a thin thickness. Alternatively, one aspect of the present invention is intended to provide a flexible light emitting device, display device, electronic device, or lighting device. Alternatively, one aspect of the present invention is to provide a light emitting device or a lighting device having a seamless wide light emitting area, or a display device or an electronic device having a seamless wide display area. Alternatively, one aspect of the present invention is to provide a light emitting device, a display device, an electronic device, or a lighting device having low power consumption.</p><p>It should be noted that one aspect of the present invention does not need to solve all of these problems.</p>
<p>The light emitting device of one aspect of the present invention alternately has strip-shaped high-flexibility regions and strip-shaped low-flexibility regions. The light emitting device can be folded by bending in a highly flexible region. The light emitting device of one aspect of the present invention is excellent in portability in the folded state, and is excellent in listability due to a wide seamless light emitting area in the unfolded state. By applying one aspect of the present invention, the portability of the device can be increased without reducing the size of the light emitting area or the display area.</p><p>Specifically, one aspect of the present invention includes a flexible light emitting panel and a plurality of support panels that support the light emitting panel and are separated from each other, and the support panel is attached to the light emitting panel. It is a light emitting device with lower flexibility than that.</p><p>Further, one aspect of the present invention is a light emitting device having alternating strip-shaped high-flexibility regions and strip-shaped low-flexibility regions in the first direction, and the highly flexible regions are acceptable. A light emitting device having a flexible light emitting panel and having a low flexibility region is a light emitting device having a support panel having a lower flexibility than the light emitting panel and a light emitting panel in an overlapping manner.</p><p>In the light emitting device having the above configuration, the protective layer has a higher flexibility than the support panel, and the highly flexible region and the less flexible region have the light emitting panel and the protective layer in an overlapping manner. Is preferable.</p><p>Further, one aspect of the present invention is a light emitting device having alternating strip-shaped high-flexibility regions and strip-shaped low-flexibility regions in the first direction, and the highly flexible regions are acceptable. A light emitting device having a flexible light emitting panel and having a low flexibility region is a light emitting device having a support panel having a lower flexibility than the light emitting panel and a light emitting panel between the support panels.</p><p>In the light emitting device having the above configuration, the light emitting device has a pair of protective layers, the protective layer is more flexible than the support panel, and in a region of low flexibility, the pair of protective layers are located between the support panels. , The light emitting panel is preferably located between the pair of protective layers.</p><p>Further, one aspect of the present invention is a light emitting device having alternating strip-shaped high-flexibility regions and strip-shaped low-flexibility regions in the first direction, and the highly flexible regions are acceptable. It has a flexible light emitting panel, the less flexible region has a pair of support panels and a light emitting panel between the pair of support panels, and the support panel is more flexible than the light emitting panel. Is a low light emitting device.</p><p>In the light emitting device having the above configuration, the light emitting device has a pair of protective layers, and the protective layer is more flexible than the support panel, and in a region of low flexibility, the pair of protective layers are placed between the pair of support panels. It is preferably located and the light emitting panel is preferably located between the pair of protective layers.</p><p>Further, in the light emitting device having each of the above configurations, when one of two continuous highly flexible regions is internally bent and the other is outwardly bent, the radius of curvature of the light emitting panel in one of the highly flexible regions is determined. It is preferable that the circle having a radius and the circle having a radius of curvature of the light emitting panel in the other highly flexible region overlap by moving in parallel with the plane supporting the light emitting device.</p><p>In the present specification, the case where the light emitting panel is bent so as to be inward is referred to as "inner bending", and the case where the light emitting panel is bent so as to be outward is referred to as "outer bending". Further, the light emitting surface in the light emitting panel or the light emitting device refers to a surface from which light from the light emitting element is taken out.</p><p>Further, in the light emitting device having the above configuration, when the inward bending and the outward bending are alternately repeated in a plurality of highly flexible regions, the surface of the light emitting panel closest to the plane supporting the light emitting device and the surface farthest from the plane are The shortest distance L between them is represented by L <2 (D + T) using the sum D of the radii of curvature of the light emitting panel in the plurality of highly flexible regions and the thickness T of the light emitting panel. Is preferable.</p><p>Further, in the light emitting device having each of the above configurations, the light emitting panel includes the external connection electrode, and the length of the low flexibility region A overlapping the external connection electrode in the first direction is the flexibility closest to the region A. It is preferably longer than the length of the low region B in the first direction.</p><p>Further, in each of the above light emitting devices, among the region A, the region B, and the region C having the lowest flexibility farthest from the region A, the region having the longest length in the first direction is the region A, which is the next longest. The region is preferably region C.</p><p>In each of the above light emitting devices, the region having the longest length in the first direction among the plurality of regions having low flexibility is preferably region A.</p><p>Further, an electronic device or a lighting device using the light emitting device having each of the above configurations is also an aspect of the present invention. In addition, the light emitting device itself having each of the above configurations may function as an electronic device or a lighting device.</p><p>The light emitting device in the present specification includes a display device using a light emitting element. In addition, a connector, for example, an anisotropic conductive film or a module in which a TCP (Tape Carrier Package) is attached to the light emitting element, a module in which a printed wiring board is provided at the end of TCP, or a COG (Chip On Glass) in the light emitting element. All modules in which ICs (integrated circuits) are directly mounted by the method shall be included in the light emitting device. Further, it shall include a light emitting device used for lighting equipment and the like.</p>
<p>In one aspect of the present invention, it is possible to provide a light emitting device, a display device, an electronic device, or a lighting device having excellent portability. In one aspect of the present invention, it is possible to provide a light emitting device, a display device, or an electronic device having excellent listability. In one aspect of the present invention, it is possible to provide a light emitting device, a display device, or an electronic device having excellent portability and listability.</p><p>In one aspect of the present invention, a novel light emitting device, display device, electronic device, or lighting device can be provided. Alternatively, in one aspect of the invention, a lightweight light emitting device, display device, electronic device, or lighting device can be provided. Alternatively, one aspect of the present invention can provide a highly reliable light emitting device, display device, electronic device, or lighting device. Alternatively, in one aspect of the present invention, one aspect of the present invention can provide a light emitting device, a display device, an electronic device, or a lighting device that is not easily damaged. Alternatively, in one aspect of the present invention, a light emitting device, a display device, an electronic device, or a lighting device having a thin thickness can be provided. Alternatively, in one aspect of the invention, a flexible light emitting device, display device, electronic device, or lighting device can be provided. Alternatively, in one aspect of the present invention, it is possible to provide a light emitting device or a lighting device having a wide seamless light emitting area, or a display device or an electronic device having a wide seamless display area. Alternatively, in one aspect of the present invention, it is possible to provide a light emitting device, a display device, an electronic device, or a lighting device having low power consumption.</p>
<figref num="1">The figure explaining the light emitting device.</figref><figref num="2">The figure explaining the light emitting device.</figref><figref num="3">The figure explaining the light emitting device.</figref><figref num="4">The figure explaining the light emitting device.</figref><figref num="5">The figure explaining the light emitting device.</figref><figref num="6">The figure explaining the light emitting device.</figref><figref num="7">The figure explaining the light emitting panel.</figref><figref num="8">The figure explaining the light emitting panel.</figref><figref num="9">The figure explaining the light emitting panel.</figref><figref num="10">The figure explaining the light emitting panel.</figref><figref num="11">The figure explaining the manufacturing method of a light emitting panel.</figref><figref num="12">The figure explaining the manufacturing method of a light emitting panel.</figref><figref num="13">The figure explaining the light emitting panel.</figref><figref num="14">The figure explaining the light emitting device.</figref><figref num="15">The figure explaining the light emitting device.</figref><figref num="16">The figure explaining the light emitting device.</figref><figref num="17">The figure explaining the light emitting device.</figref><figref num="18">The figure explaining the light emitting panel.</figref><figref num="19">The figure explaining the light emitting device.</figref><figref num="20">The figure explaining the light emitting device.</figref><figref num="21">The figure explaining the light emitting device.</figref><figref num="22">The figure explaining the light emitting device.</figref>
The embodiment will be described in detail with reference to the drawings. However, the present invention is not limited to the following description, and it is easily understood by those skilled in the art that the form and details of the present invention can be variously changed without departing from the spirit and scope of the present invention. Therefore, the present invention is not construed as being limited to the description of the embodiments shown below.
In the configuration of the invention described below, the same reference numerals are commonly used in different drawings for the same parts or parts having similar functions, and the repeated description thereof will be omitted. Further, when referring to the same function, the hatch pattern may be the same and no particular sign may be added.
Further, the position, size, range, etc. of each configuration shown in the drawings and the like may not represent the actual position, size, range, etc. for the sake of easy understanding. Therefore, the disclosed invention is not necessarily limited to the position, size, range, etc. disclosed in the drawings and the like.
(Embodiment 1) In the present embodiment, a light emitting device according to one aspect of the present invention will be described.
The light emitting device of one aspect of the present invention alternately has strip-shaped high-flexibility regions and strip-shaped low-flexibility regions. The light emitting device can be folded by bending in a highly flexible region. The light emitting device of one aspect of the present invention is excellent in portability in the folded state, and is excellent in listability due to a wide seamless light emitting area in the unfolded state.
In the light emitting device of one aspect of the present invention, the highly flexible region can be folded by either inward bending or outward bending.
When the light emitting device of one aspect of the present invention is not used, by bending the light emitting surface of the light emitting panel so as to be inward, it is possible to suppress scratches and stains on the light emitting surface.
When the light emitting device of one aspect of the present invention is used, it may be expanded to use the entire seamless light emitting region, or it may be bent so that the light emitting surface of the light emitting panel is on the outside to emit light. A part of the region may be used. By setting the light emitting region that is folded and invisible to the user as the non-light emitting region, the power consumption of the light emitting device can be suppressed.
In the following, a tri-foldable light emitting device having two strip-shaped high-flexibility regions and three strip-shaped low-flexibility regions will be described as an example.
Figure 1 (A) shows the light emitting device in the expanded state. FIG. 1 (B) shows a light emitting device in a state in which it is in the process of changing from one of the unfolded state or the folded state to the other. Figure 1 (C) shows the light emitting device in the folded state. FIG. 2 is a perspective view showing each configuration of the light emitting device. FIG. 3A is a plan view of the light emitting surface side of the light emitting device, and FIG. 3B is a plan view of the surface side of the light emitting device facing the light emitting surface. 3 (C), (D), and (F) are examples of side views of the light emitting device of FIG. 3 (A) viewed from the direction of the arrow. FIG. 3 (E) is a cross-sectional view between the alternate long and short dash lines AB in FIG. 3 (A). 4 (A), (C), and (D) are examples of side views of the light emitting device of FIG. 1 (C) as viewed from the direction of the arrow.
Further, FIGS. 14 (A) to 14 (C) show modified examples of FIGS. 1 (A) to 1 (C), respectively. FIG. 14 (A) shows the light emitting device in the expanded state. FIG. 14 (B) shows a light emitting device in a state in which it is in the process of changing from one of the unfolded state or the folded state to the other. FIG. 14 (C) shows a light emitting device in a folded state. FIG. 15 is a perspective view showing each configuration of the light emitting device. FIG. 16A is a plan view of the light emitting surface side of the light emitting device, and FIG. 16B is a plan view of the surface side of the light emitting device facing the light emitting surface. 16 (C) and 16 (D) are examples of side views of the light emitting device of FIG. 16 (A) as viewed from the direction of the arrow. FIG. 16 (E) is a cross-sectional view between the alternate long and short dash lines AB in FIG. 16 (A). FIG. 16 (F) is a modified example of the light emitting device shown in FIG. 16 (C) and the like.
The light emitting device shown in FIGS. 1 (A) to 1 (C) and 14 (A) to 14 (C) has a flexible light emitting panel 11. The light emitting device further has a plurality of support panels 15a and a plurality of support panels 15b. The support panels 15a and 15b are less flexible than the light emitting panel 11. The plurality of support panels 15a are separated from each other. The plurality of support panels 15b are separated from each other.
As shown in FIG. 3 (A), the light emitting device alternately has a highly flexible region E1 and a less flexible region E2. The highly flexible region and the less flexible region are formed in strips, respectively. In the present embodiment, a plurality of highly flexible regions and a plurality of inflexible regions are shown to be parallel to each other, but the regions may not be arranged in parallel.
The highly flexible region E1 in the light emitting device may have at least a flexible light emitting panel. In particular, a light emitting panel using an organic EL element is preferable because it can be made thin and lightweight in addition to high flexibility and impact resistance. A configuration example of the light emitting panel will be described in detail in the second and third embodiments.
The region E2 having low flexibility in the light emitting device may have at least a light emitting panel having flexibility and a support panel having lower flexibility than the light emitting panel in an overlapping manner.
As shown in FIG. 16 (A), the light emitting device alternately has high flexibility regions and low flexibility regions in one direction.
In FIG. 16 (A), the lengths in the direction in which the high-flexibility region and the low-flexibility region are lined up in the low-flexibility region are indicated by lengths W1 to W3.
Further, it is preferable that the region having low flexibility includes an external connection electrode included in the light emitting panel. Here, the external connection electrode corresponds to, for example, the conductive layer 157 and the like shown in FIG. 7 (B).
In FIG. 16 (A), the external connection electrode is included in the low flexibility region of length W1. In the light emitting device, the length W1 of the low flexibility region A overlapping the external connection electrode is longer than the length W3 of the low flexibility region B closest to the region A.
Here, when the light emitting device is folded, if the end portion of the light emitting panel 11 (which can be said to be a bent portion, an end portion in a folded state, etc.) is located outside the end portions of the support panels 15a and 15b, The light emitting panel 11 may be damaged, or the elements contained in the light emitting panel 11 may be destroyed.
On the other hand, in the light emitting device in the folded state shown in FIG. 1 (C), the end portions of the light emitting panel 11 and the end portions of the support panels 15a and 15b located above and below the light emitting panel 11 are aligned. As a result, it is possible to prevent the light emitting panel 11 from being damaged, the elements contained in the light emitting panel 11 from being destroyed, and the like.
Further, in the light emitting device in the folded state shown in FIG. 14C, the end portion of the light emitting panel 11 is located inside the end portions of the support panels 15a and 15b. As a result, it is possible to further prevent the light emitting panel 11 from being damaged, the elements contained in the light emitting panel 11 from being destroyed, and the like.
From the above, in the light emitting device, it is preferable that the length W1 of the low flexibility region A overlapping the external connection electrode is longer than the length W3 of the low flexibility region B closest to the region A. In particular, of the length W1 of the region A, the length W3 of the region B, and the length W2 of the low flexibility region C farthest from the region A, the length W1 is the longest, and then the length W2 is the longest. Is preferable.
The support panel may be provided on at least one of the light emitting surface side of the light emitting panel or the surface side facing the light emitting surface.
When the support panels are provided on both the light emitting surface side and the surface side facing the light emitting surface of the light emitting panel as in the support panels 15a and 15b shown in FIG. 3 (C) or FIG. 16 (C), a pair of support panels are used. Since the light emitting panel can be sandwiched, the mechanical strength of the low flexibility region is increased, and the light emitting device is less likely to be damaged, which is preferable.
Further, instead of the support panels 15a and 15b, the support panel 15 shown in FIG. 3D or FIG. 16D may be used, and the light emitting panel 11 may be arranged between the support panels 15.
Further, in FIGS. 1 (A), 2 and 3 (C) and the like, an example in which the protective layer and the side surface of the light emitting panel are exposed in the low flexibility region E2 is shown, but one aspect of the present invention is Not limited to this. As shown in FIG. 3 (F), even if the protective layer or the side surface of the light emitting panel is covered with the support panel 15 (or one or both of the pair of support panels 15a and 15b) in the low flexibility region E2. Good. FIG. 21 shows a specific configuration of a light emitting device in which the protective layer and the side surface of the light emitting panel are covered with the support panel 15b. FIG. 21 (A) shows the light emitting device in the deployed state. Further, FIG. 21B shows the light emitting device in a state in which it is in the process of changing from one of the unfolded state or the folded state to the other. Further, FIG. 21 (C) shows the light emitting device in a folded state. Further, FIG. 22 is a perspective view showing each configuration of the light emitting device.
It is preferable to have the support panel only on the light emitting surface side of the light emitting panel or the side facing the light emitting surface, because the light emitting device can be made thinner or lighter. For example, as shown in FIG. 16 (F), a light emitting device may have only a plurality of support panels 15b without using the plurality of support panels 15a.
The highly flexible region E1 and the less flexible region E2 preferably have a light emitting panel and a protective layer having a higher flexibility than the support panel in an overlapping manner. As a result, the highly flexible region E1 of the light emitting device becomes a region having flexibility and high mechanical strength, and the light emitting device can be made less likely to be damaged. Therefore, the light emitting device can be configured to be hard to break due to deformation due to an external force or the like not only in a region having low flexibility but also in a region having high flexibility.
For example, the thickness of each of the light emitting panel, the support panel, and the protective layer is preferably such that the support panel is the thickest and the light emitting panel is the thinnest. Alternatively, for example, the flexibility of the light emitting panel, the support panel, and the protective layer is preferably such that the flexibility of the support panel is the lowest and the flexibility of the light emitting panel is the highest. With such a configuration, the difference in flexibility between the highly flexible region and the less flexible region becomes large. By configuring the structure so that it can be reliably bent in a region having high flexibility, it is possible to suppress bending in a region having low flexibility, and it is possible to improve the reliability of the light emitting device. In addition, it is possible to prevent the light emitting device from bending in an unintended place.
If the light emitting panel has protective layers on both the light emitting surface side and the surface side facing the light emitting surface, the light emitting panel can be sandwiched between the pair of protective layers, so that the mechanical strength of the light emitting device is increased and the light emitting device is further damaged. It becomes difficult and preferable.
For example, as shown in FIG. 3 (C) or FIG. 16 (C), in the less flexible region E2, the pair of protective layers 13a, 13b are located between the pair of support panels 15a, 15b, and the light emitting panel. It is preferable that (not shown) is located between the pair of protective layers 13a and 13b.
Alternatively, as shown in FIG. 3 (D) or FIG. 16 (D), in the less flexible region E2, a pair of protective layers 13a, 13b are located between the support panels 15 and a light emitting panel (not shown). Is preferably located between the pair of protective layers 13a and 13b.
It is preferable that the protective layer is provided only on the light emitting surface side of the light emitting panel or the surface side facing the light emitting surface, because the light emitting device can be made thinner or lighter. For example, the light emitting device may have only the protective layer 13b without using the protective layer 13a.
Further, when the protective layer 13a on the light emitting surface side of the light emitting panel is a light shielding film, it is possible to suppress the irradiation of the non-light emitting region of the light emitting panel with external light. This is preferable because it can suppress photodegradation of transistors and the like included in the drive circuit included in the non-light emitting region.
As shown in FIGS. 2, 3 (E), 15 or 16 (E), the opening of the protective layer 13a provided on the light emitting surface side of the light emitting panel 11 overlaps with the light emitting region 11a of the light emitting panel. The non-light emitting region 11b that surrounds the light emitting region 11a in a frame shape and the protective layer 13a are provided so as to overlap each other. The protective layer 13b provided on the surface side of the light emitting panel 11 facing the light emitting surface overlaps the light emitting region 11a and the non-light emitting region 11b. By providing the protective layer 13b in a wider range on the surface side facing the light emitting surface, particularly preferably on the entire surface, the light emitting panel can be further protected and the reliability of the light emitting device can be enhanced.
In the light emitting device of one aspect of the present invention, when the inward bending and the outward bending are alternately repeated in a plurality of highly flexible regions, the surface of the light emitting panel closest to the plane supporting the light emitting device and the surface farthest from the plane are used. The shortest distance L between them is represented by L <2 (D + T) using the sum D of the radii of curvature of the light emitting panel in the plurality of highly flexible regions and the thickness T of the light emitting panel. Is preferable. As a result, the light emitting device can be made thinner.
The light emitting device shown in FIG. 4 (A) is in a state in which one highly flexible region is bent inward and one highly flexible region is bent outward. It is assumed that the light emitting panel is located at the boundary between the protective layer 13a and the protective layer 13b in FIG. 4 (A). A diagram illustrating the diameter D1 and the diameter D2 in FIG. 4 (A) in detail is shown in FIG. 4 (B). The diameter D1 indicates the diameter of a circle whose radius is the radius of curvature of the light emitting panel in the inwardly bent and highly flexible region. The diameter D2 indicates the diameter of a circle whose radius is the radius of curvature of the light emitting panel in the outwardly bent and highly flexible region. The thickness of the light emitting panel 11 is shown as a thickness T. L <2 (D + T) is L <D1 + D2 + because the sum of diameter D1 and diameter D2 corresponds to twice the sum D of the radii of curvature of the light emitting panel in multiple highly flexible regions. In other words, 2T. Here, the shortest distance L1 between the plane closest to the plane supporting the light emitting device of the light emitting panel in FIG. 4A and the surface farthest from the plane is D1 + D2 + 3T.
Reduce the thickness of the support panels 15a, 15b and the protective layers 13a, 13b, in the less flexible region between the more flexible region for inward bending and the more flexible region for outward bending. L2 <D1 + D2 + 3T, such as the shortest distance L2 between the surface closest to the plane supporting the light emitting device of the light emitting panel shown in FIG. 4C by narrowing the width and the like. , And even L2 <D1 + D2 + 2T, in other words, L2 <2 (D + T) can be satisfied.
Here, in the light emitting device, among the low flexibility regions overlapped by bending, the pair of regions located on the outside are preferably parallel to the plane supporting the light emitting device, and other regions located on the inside. Is preferably not parallel to the plane.
In the light emitting device of one aspect of the present invention, when one of two consecutive highly flexible regions is bent inward and the other is bent outward, the radius of curvature of the light emitting panel in one of the highly flexible regions is determined. It is preferable that the circle having a radius and the circle having a radius of curvature of the light emitting panel in the other highly flexible region overlap by moving in parallel with the plane supporting the light emitting device. As a result, the light emitting device can be made thinner.
As shown in FIG. 4 (D), the circle having a diameter D1 and the circle having a diameter D2 overlap by moving in parallel with the plane supporting the light emitting device (here, it corresponds to moving in the left-right direction of the paper surface). Since the radius of curvature of the light emitting panel in the inwardly bent highly flexible region and the radius of curvature of the light emitting panel in the outwardly bent highly flexible region correspond to the radii of the two circles, FIG. 4 (D) It can be said that the light emitting device shown in) has been made thinner.
Further, the shortest distance L3 between the plane closest to the plane supporting the light emitting device of the light emitting panel shown in FIG. 4 (D) and the surface farthest from the plane is L3 <D1 + D2 + 3T, and further L3 <D1 +. It can satisfy D2 + 2T, in other words L3 <2 (D + T). In FIG. 4D, the protective layer 13a and the protective layer 13b are collectively shown as the protective layer 13.
The protective layer and the support panel can be formed by using plastic, metal, alloy, rubber or the like. It is preferable to use plastic, rubber, or the like because it is lightweight and a protective layer and a support panel that are not easily damaged can be obtained. For example, silicone rubber may be used as the protective layer, and stainless steel or aluminum may be used as the support panel.
Further, it is preferable to use a material having high toughness for the protective layer and the support panel. As a result, it is possible to realize a light emitting device having excellent impact resistance and being hard to be damaged. For example, by using an organic resin or a thin metal material or alloy material, it is possible to realize a light emitting device that is lightweight and is not easily damaged. For the same reason, it is preferable to use a material having high toughness for the substrate constituting the light emitting panel.
The protective layer and the support panel located on the light emitting surface side may be translucent as long as they do not overlap with the light emitting region of the light emitting panel. When the protective layer or the support panel located on the light emitting surface side overlaps at least a part of the light emitting region, it is preferable to use a material that transmits light emitted from the light emitting panel. The translucency of the protective layer and the support panel located on the surface side facing the light emitting surface does not matter.
Various adhesives can be used to bond any two of the protective layer, support panel, and light emitting panel. For example, a resin that cures at room temperature, such as a two-component mixed resin, or a photocurable resin. , A resin such as a thermosetting resin can be used. Further, a sheet-shaped adhesive may be used. Further, each configuration of the light emitting device may be fixed by using a screw penetrating any two or more of the protective layer, the support panel, and the light emitting panel, a pin to be held, a clip, and the like.
In the light emitting device of one aspect of the present invention, one light emitting panel (one light emitting region) can be used by dividing it into two or more with a bent portion as a boundary. For example, a hidden area may be made non-emission by folding, and only an exposed area may emit light. As a result, it is possible to reduce the power consumed by the area not used by the user.
The light emitting device of one aspect of the present invention may have a sensor for determining whether or not each highly flexible region is bent. For example, it can be configured by using a switch, a MEMS pressure sensor, a pressure sensor, or the like.
In the above, the light emitting device having two highly flexible regions has been described as an example, but the present invention is not limited to this. For example, as shown in FIG. 5 (A), it is sufficient to have at least one highly flexible region E1 and the highly flexible region E1 shown in FIG. 5 (B) or FIG. 17 (A). A light emitting device capable of folding in four having three folds and a light emitting device capable of folding in five having four highly flexible regions E1 shown in FIG. 5 (C) or FIG. 17 (B) are also one of the present inventions. It is an aspect.
For example, in the light emitting device shown in FIG. 17A, the length W1 is the longest, the length W2 is the next longest, and the length W3 and the length W4 are the shortest among the lengths W1 to W4. The length W3 and the length W4 may have different values.
Further, in the light emitting device shown in FIG. 17 (B), of the lengths W1 to W5, the length W1 is the longest, the length W2 is the next longest, the length W3, the length W4, and the length W5. Is the shortest. The length W3, the length W4, and the length W5 may have different values.
Figures 6 (A) and 6 (B) show an example of the state in which the light emitting device shown in FIG. 5 (C) is folded in five.
In FIG. 6 (A), the shortest distance L4 between the surface of the light emitting panel closest to the plane supporting the light emitting device and the surface farthest from the plane is the radius of curvature of the light emitting panel within a plurality of highly flexible regions. It is represented by L4 = 2D + 5T using the sum D and the thickness T of the light emitting panel. In addition, 2D = D1 + D2 + D3 + D4.
Reduce the thickness of the support panels 15a, 15b and the protective layers 13a, 13b, in the less flexible region between the more flexible region for inward bending and the more flexible region for outward bending. By narrowing the width or the like, the shortest distance L5 between the surface closest to the plane supporting the light emitting device of the light emitting panel shown in FIG. 6 (B) and the surface farthest from the plane is within a plurality of highly flexible regions. Using the sum D of the radius of curvature of the light emitting panel and the thickness T of the light emitting panel, L5 <D1 + D2 + D3 + D4 + 5T, and further L5 <D1 + D2 + D3 + D4 + 2T, in other words L5 <2D + 2T can be satisfied.
Further, the circle having a diameter D1 and the circle having a diameter D2 shown in FIG. 6B overlap by moving in parallel with the plane supporting the light emitting device (here, corresponding to moving in the left-right direction of the paper surface). Further, the circle having a diameter D3 and the circle having a diameter D4 also overlap by moving in parallel with the plane supporting the light emitting device. The radius of the circle with diameter D1 and the radius of the circle with diameter D2 are in the highly flexible region that is inwardly bent when one of two consecutive highly flexible regions is inwardly bent and the other is outwardly bent. Since it can be said that the radius of curvature of the light emitting panel corresponds to the radius of curvature of the light emitting panel in the region of high flexibility that is bent outward, the light emitting device shown in FIG. 6 (B) is also thinned. It can be said that. The same can be said from the radius of the circle with the diameter D3 and the radius of the circle with the diameter D4.
Further, as shown in FIG. 6 (B), the width of the other low-flexibility regions is narrowed as compared with the pair of low-flexibility regions located on the outermost side of the light-emitting device. Can be made thinner.
Further, when the light emitting device is folded, the highly flexible region does not necessarily have to be bent inward and outward alternately. For example, as shown in FIG. 5 (D), each highly flexible region is formed. May be bent inward. In such a state, it is possible to prevent scratches and stains on the light emitting surface of the light emitting device when it is carried.
In the light emitting device of the present embodiment, one light emitting panel can be folded one or more times. At this time, the radius of curvature can be, for example, 1 mm or more and 150 mm or less.
This embodiment can be appropriately combined with other embodiments.
(Embodiment 2) In the present embodiment, the light emitting panel will be described with reference to FIGS. 7 to 12. When the light emitting panel illustrated in this embodiment is bent, the minimum value of the radius of curvature in the light emitting panel is 1 mm or more and 150 mm or less, 1 mm or more and 100 mm or less, 1 mm or more and 50 mm or less, 1 mm or more and 10 mm or less, or 2 mm or more and 5 mm or less. can do. The light emitting panel of the present embodiment is highly reliable because the element is not broken even if it is bent with a small radius of curvature (for example, 2 mm or more and 5 mm or less). By bending the light emitting panel with a small radius of curvature, the light emitting device according to one aspect of the present invention can be made thinner. The direction in which the light emitting panel of the present embodiment is bent does not matter. Further, the bending point may be one place or two or more places.
<Specific Example 1> FIG. 7 (A) shows a plan view of the light emitting panel 11 illustrated in the first embodiment, and FIG. 7 (B) shows an example of a cross-sectional view between the alternate long and short dash lines A1 to A2 in FIG. 7 (A). Shown in.
The light emitting panel shown in FIG. 7B has an element layer 101, an adhesive layer 105, and a substrate 103. The element layer 101 includes a substrate 201, an adhesive layer 203, an insulating layer 205, a plurality of transistors, a conductive layer 157, an insulating layer 207, an insulating layer 209, a plurality of light emitting elements, an insulating layer 211, a sealing layer 213, and an insulating layer 261. It has a colored layer 259, a light-shielding layer 257, and an insulating layer 255.
The conductive layer 157 is electrically connected to the FPC 108 via the connecting body 215.
The light emitting element 230 has a lower electrode 231 and an EL layer 233, and an upper electrode 235. The lower electrode 231 is electrically connected to the source electrode or drain electrode of the transistor 240. The end of the lower electrode 231 is covered with an insulating layer 211. The light emitting element 230 has a top emission structure. The upper electrode 235 is translucent and transmits the light emitted by the EL layer 233.
A coloring layer 259 is provided at a position where it overlaps with the light emitting element 230, and a light shielding layer 257 is provided at a position where it overlaps with the insulating layer 211. The colored layer 259 and the light-shielding layer 257 are covered with an insulating layer 261. The space between the light emitting element 230 and the insulating layer 261 is filled with the sealing layer 213.
The light emitting panel has a plurality of transistors such as transistors 240 in the light extraction unit 104 and the drive circuit unit 106. The transistor 240 is provided on the insulating layer 205. The insulating layer 205 and the substrate 201 are bonded by an adhesive layer 203. Further, the insulating layer 255 and the substrate 103 are bonded to each other by the adhesive layer 105. It is preferable to use a film having low water permeability for the insulating layer 205 and the insulating layer 255 because impurities such as water can be suppressed from entering the light emitting element 230 and the transistor 240, and the reliability of the light emitting panel is improved. As the adhesive layer 203, the same material as the adhesive layer 105 can be used.
In Specific Example 1, the insulating layer 205, the transistor 240, and the light emitting element 230 are manufactured on a highly heat-resistant manufacturing substrate, the manufacturing substrate is peeled off, and the insulating layer 205 and the transistor 240 are mounted on the substrate 201 using the adhesive layer 203. , The light emitting panel which can be manufactured by transposing the light emitting element 230 is shown. Further, in Specific Example 1, an insulating layer 255, a colored layer 259, and a light-shielding layer 257 are manufactured on a highly heat-resistant manufacturing substrate, the manufacturing substrate is peeled off, and the insulating layer 255 is placed on the substrate 103 using the adhesive layer 105. , A light emitting panel that can be produced by transposing the colored layer 259 and the light shielding layer 257 is shown.
When a material having low heat resistance (resin or the like) is used for the substrate, it is difficult to apply a high temperature to the substrate in the manufacturing process, so that the conditions for forming a transistor or an insulating film on the substrate are limited. When a material having high water permeability (resin or the like) is used for the substrate of the light emitting device, it is preferable to apply a high temperature between the substrate and the light emitting element to form a film having low water permeability. In the manufacturing method of this embodiment, a transistor or the like can be manufactured on a manufacturing substrate having high heat resistance, so that a highly reliable transistor or an insulating film having sufficiently low water permeability can be formed by applying a high temperature. .. Then, by transposing them onto a substrate having low heat resistance, a highly reliable light emitting panel can be produced. Thereby, in one aspect of the present invention, a light emitting device that is lightweight or thin and has high reliability can be realized. Details of the manufacturing method will be described later.
It is preferable to use a material having high toughness for the substrate 103 and the substrate 201, respectively. As a result, it is possible to realize a light emitting panel having excellent impact resistance and being hard to be damaged. For example, by using the substrate 103 as an organic resin substrate and the substrate 201 as a substrate using a thin metal material or alloy material, light emission is lighter and less likely to be damaged as compared with the case where a glass substrate is used as the substrate. A panel can be realized.
Since the metal material and the alloy material have high thermal conductivity and can easily conduct heat to the entire substrate, it is possible to suppress a local temperature rise of the light emitting panel, which is preferable. The thickness of the substrate using the metal material or alloy material is preferably 10 μm or more and 200 μm or less, and more preferably 20 μm or more and 50 μm or less.
Further, when a material having a high thermal emissivity is used for the substrate 201, it is possible to suppress an increase in the surface temperature of the light emitting panel, and it is possible to suppress destruction of the light emitting panel and deterioration of reliability. For example, the substrate 201 may have a laminated structure of a metal substrate and a layer having a high thermal emissivity (for example, a metal oxide or a ceramic material can be used).
<Specific Example 2> FIG. 8 (A) shows another example of the light extraction unit 104 in the light emitting panel. The light emitting panel shown in FIG. 8 (A) is a light emitting panel that can be touch-operated. In each of the following specific examples, the description of the same configuration as that of the specific example 1 will be omitted.
The light emitting panel shown in FIG. 8A has an element layer 101, an adhesive layer 105, and a substrate 103. The element layer 101 includes a substrate 201, an adhesive layer 203, an insulating layer 205, a plurality of transistors, an insulating layer 207, an insulating layer 209, a plurality of light emitting elements, an insulating layer 211, an insulating layer 217, a sealing layer 213, and an insulating layer 261. It has a colored layer 259, a light shielding layer 257, a plurality of light receiving elements, a conductive layer 281, a conductive layer 283, an insulating layer 291 and an insulating layer 293, an insulating layer 295, and an insulating layer 255.
In Specific Example 2, the insulating layer 217 is provided on the insulating layer 211. By providing the insulating layer 217, the distance between the substrate 103 and the substrate 201 can be adjusted.
FIG. 8A shows an example in which a light receiving element is provided between the insulating layer 255 and the sealing layer 213. Since the light receiving element can be arranged so as to overlap the non-light emitting area of the light emitting panel (for example, the area where the light emitting element is not provided such as the region where the transistor or the wiring is provided), the aperture ratio of the pixel (light emitting element) is lowered. A touch sensor can be provided on the light emitting panel without causing the light emitting panel to be provided.
For the light receiving element included in the light emitting panel, for example, a pn type or pin type photodiode can be used. In this embodiment, a pin-type photodiode having a p-type semiconductor layer 271, an i-type semiconductor layer 273, and an n-type semiconductor layer 275 is used as the light receiving element.
The i-type semiconductor layer 273 contains 1 × 10 impurities that impart p-type and impurities that impart n-type.<sup>20</sup>cm<sup>-3</sup>The concentration is as follows, and the light conductivity is 100 times or more the dark conductivity. The i-type semiconductor layer 273 also includes those having impurity elements of Group 13 or Group 15 of the periodic table. That is, since the i-type semiconductor exhibits weak n-type electrical conductivity when an impurity element for valence electron control is not intentionally added, the i-type semiconductor layer 273 is an impurity element that imparts p-type. Is included in the category of those added intentionally or unintentionally at the time of film formation or after film formation.
The light-shielding layer 257 is located closer to the substrate 201 than the light-receiving element and overlaps the light-receiving element. The light-shielding layer 257 located between the light-receiving element and the sealing layer 213 can prevent the light-emitting element 230 from being irradiated with the light emitted by the light-emitting element 230.
The conductive layer 281 and the conductive layer 283 are each electrically connected to the light receiving element. As the conductive layer 281, it is preferable to use a conductive layer that transmits light incident on the light receiving element. As the conductive layer 283, it is preferable to use a conductive layer that blocks light incident on the light receiving element.
It is preferable to have the optical touch sensor between the substrate 103 and the sealing layer 213 because it is not easily affected by the light emission of the light emitting element 230 and the S / N ratio can be improved.
<Specific Example 3> FIG. 8 (B) shows another example of the light extraction unit 104 in the light emitting panel. The light emitting panel shown in FIG. 8B is a light emitting panel that can be touch-operated.
The light emitting panel shown in FIG. 8B has an element layer 101, an adhesive layer 105, and a substrate 103. The element layer 101 includes a substrate 201, an adhesive layer 203, an insulating layer 205, a plurality of transistors, an insulating layer 207, an insulating layer 209a, an insulating layer 209b, a plurality of light emitting elements, an insulating layer 211, an insulating layer 217, and a sealing layer 213. It has a colored layer 259, a light shielding layer 257, a plurality of light receiving elements, a conductive layer 280, a conductive layer 281 and an insulating layer 255.
FIG. 8B shows an example in which a light receiving element is provided between the insulating layer 205 and the sealing layer 213. By providing the light receiving element between the insulating layer 205 and the sealing layer 213, the conductive layer and the light receiving light that are electrically connected to the light receiving element in the same material and the same process as the conductive layer and the semiconductor layer constituting the transistor 240. A photoelectric conversion layer constituting the device can be produced. Therefore, it is possible to manufacture a light emitting panel capable of touch operation without significantly increasing the manufacturing process.
<Specific example 4> Fig. 9 (A) shows another example of the light emitting panel. The light emitting panel of FIG. 9A is a light emitting panel that can be touch-operated.
The light emitting panel shown in FIG. 9A has an element layer 101, an adhesive layer 105, and a substrate 103. The element layer 101 includes a substrate 201, an adhesive layer 203, an insulating layer 205, a plurality of transistors, a conductive layer 156, a conductive layer 157, an insulating layer 207, an insulating layer 209, a plurality of light emitting elements, an insulating layer 211, an insulating layer 217, and a seal. It has a stop layer 213, a colored layer 259, a light-shielding layer 257, an insulating layer 255, a conductive layer 272, a conductive layer 274, an insulating layer 276, an insulating layer 278, a conductive layer 294, and a conductive layer 296.
FIG. 9A shows an example in which a capacitive touch sensor is provided between the insulating layer 255 and the sealing layer 213. The capacitive touch sensor has a conductive layer 272 and a conductive layer 274.
The conductive layer 156 and the conductive layer 157 are electrically connected to the FPC 108 via the connecting body 215. The conductive layer 294 and the conductive layer 296 are electrically connected to the conductive layer 274 via the conductive particles 292. Therefore, the capacitive touch sensor can be driven via the FPC 108.
<Specific example 5> Fig. 9 (B) shows another example of the light emitting panel. The light emitting panel shown in FIG. 9B is a light emitting panel that can be touch-operated.
The light emitting panel shown in FIG. 9B has an element layer 101, an adhesive layer 105, and a substrate 103. The element layer 101 includes a substrate 201, an adhesive layer 203, an insulating layer 205, a plurality of transistors, a conductive layer 156, a conductive layer 157, an insulating layer 207, an insulating layer 209, a plurality of light emitting elements, an insulating layer 211, an insulating layer 217, and a seal. It has a stop layer 213, a colored layer 259, a light-shielding layer 257, an insulating layer 255, a conductive layer 270, a conductive layer 272, a conductive layer 274, an insulating layer 276, and an insulating layer 278.
FIG. 9B shows an example in which a capacitive touch sensor is provided between the insulating layer 255 and the sealing layer 213. The capacitive touch sensor has a conductive layer 272 and a conductive layer 274.
The conductive layer 156 and the conductive layer 157 are electrically connected to the FPC 108a via the connecting body 215a. The conductive layer 270 is electrically connected to the FPC 108b via the connecting body 215b. Therefore, the light emitting element 230 and the transistor 240 can be driven via the FPC108a, and the capacitive touch sensor can be driven via the FPC108b.
<Specific Example 6> FIG. 10 (A) shows another example of the light extraction unit 104 in the light emitting panel.
The light emitting panel shown in FIG. 10A has an element layer 101, a substrate 103, and an adhesive layer 105. The element layer 101 includes a substrate 202, an insulating layer 205, a plurality of transistors, an insulating layer 207, a conductive layer 208, an insulating layer 209a, an insulating layer 209b, a plurality of light emitting elements, an insulating layer 211, a sealing layer 213, and a colored layer 259. Has.
The light emitting element 230 has a lower electrode 231 and an EL layer 233, and an upper electrode 235. The lower electrode 231 is electrically connected to the source electrode or drain electrode of the transistor 240 via the conductive layer 208. The end of the lower electrode 231 is covered with an insulating layer 211. The light emitting element 230 has a bottom emission structure. The lower electrode 231 is translucent and transmits the light emitted by the EL layer 233.
A colored layer 259 is provided at a position overlapping the light emitting element 230, and the light emitted by the light emitting element 230 is taken out to the substrate 103 side via the colored layer 259. The space between the light emitting element 230 and the substrate 202 is filled with a sealing layer 213. The substrate 202 can be manufactured by using the same material as the substrate 201 described above.
<Specific example 7> Fig. 10 (B) shows another example of the light emitting panel.
The light emitting panel shown in FIG. 10B has an element layer 101, an adhesive layer 105, and a substrate 103. The element layer 101 includes a substrate 202, an insulating layer 205, a conductive layer 310a, a conductive layer 310b, a plurality of light emitting elements, an insulating layer 211, a conductive layer 212, and a sealing layer 213.
The conductive layer 310a and the conductive layer 310b are external connection electrodes of the light emitting panel and can be electrically connected to the FPC or the like.
The light emitting element 230 has a lower electrode 231 and an EL layer 233, and an upper electrode 235. The end of the lower electrode 231 is covered with an insulating layer 211. The light emitting element 230 has a bottom emission structure. The lower electrode 231 is translucent and transmits the light emitted by the EL layer 233. The conductive layer 212 is electrically connected to the lower electrode 231.
The substrate 103 may have a hemispherical lens, a microlens array, a film having a concavo-convex structure, a light diffusing film, or the like as a light extraction structure. For example, a substrate 103 having a light extraction structure can be formed by adhering the lens or film on a resin substrate using the substrate or an adhesive having a refractive index similar to that of the lens or film. it can.
Although it is not always necessary to provide the conductive layer 212, it is preferable to provide the conductive layer 212 because the voltage drop due to the resistance of the lower electrode 231 can be suppressed. Further, for the same purpose, a conductive layer electrically connected to the upper electrode 235 may be provided on the insulating layer 211, the EL layer 233, the upper electrode 235, or the like.
The conductive layer 212 is a single layer or laminated using a material selected from copper, titanium, tantalum, tungsten, molybdenum, chromium, neodymium, scandium, nickel, aluminum, or an alloy material containing these as the main components. Can be formed. The film thickness of the conductive layer 212 can be, for example, 0.1 μm or more and 3 μm or less, preferably 0.1 μm or more and 0.5 μm or less.
When a paste (silver paste or the like) is used as the material of the conductive layer electrically connected to the upper electrode 235, the metals constituting the conductive layer become granular and aggregate. Therefore, the surface of the conductive layer is rough and has many gaps. For example, even if the conductive layer is formed on the insulating layer 211, it is difficult for the EL layer 233 to completely cover the conductive layer. It is preferable because it makes it easy to make an electrical connection with the conductive layer.
<Example of Material> Next, materials and the like that can be used for the light emitting panel will be described. The configuration described above in the present embodiment will not be described.
The element layer 101 has at least a light emitting element. As the light emitting element, an element capable of self-luminous light can be used, and an element whose brightness is controlled by a current or a voltage is included in the category. For example, a light emitting diode (LED), an organic EL element, an inorganic EL element, or the like can be used.
The element layer 101 may further include a transistor for driving a light emitting element, a touch sensor, and the like.
The structure of the transistor included in the light emitting panel is not particularly limited. For example, it may be a staggered transistor or an inverted staggered transistor. Further, either a top gate type or bottom gate type transistor structure may be used. The semiconductor material used for the transistor is not particularly limited, and examples thereof include silicon and germanium. Alternatively, an oxide semiconductor containing at least one of indium, gallium, and zinc, such as an In-Ga-Zn-based metal oxide, may be used.
The crystallinity of the semiconductor material used for the transistor is also not particularly limited, and is either an amorphous semiconductor or a semiconductor having crystallinity (microcrystalline semiconductor, polycrystalline semiconductor, single crystal semiconductor, or semiconductor having a partially crystalline region). May be used. It is preferable to use a semiconductor having crystallinity because deterioration of transistor characteristics can be suppressed.
The light emitting element included in the light emitting panel has a pair of electrodes (lower electrode 231 and upper electrode 235) and an EL layer 233 provided between the pair of electrodes. One of the pair of electrodes functions as an anode and the other functions as a cathode.
The light emitting element may have any of a top emission structure, a bottom emission structure, and a dual emission structure. A conductive film that transmits visible light is used for the electrode on the side that extracts light. Further, it is preferable to use a conductive film that reflects visible light for the electrode on the side that does not take out light.
The conductive film that transmits visible light can be formed by using, for example, indium oxide, indium tin oxide (ITO), indium zinc oxide, zinc oxide, zinc oxide added with gallium, or the like. Further, metal materials such as gold, silver, platinum, magnesium, nickel, tungsten, chromium, molybdenum, iron, cobalt, copper, palladium, or titanium, alloys containing these metal materials, or nitrides of these metal materials (for example, Titanium nitride) or the like can also be used by forming it thin enough to have translucency. Moreover, the laminated film of the said material can be used as a conductive film. For example, it is preferable to use a laminated film of an alloy of silver and magnesium and ITO because the conductivity can be enhanced. Moreover, graphene or the like may be used.
As the conductive film that reflects visible light, for example, a metal material such as aluminum, gold, platinum, silver, nickel, tungsten, chromium, molybdenum, iron, cobalt, copper, or palladium, or an alloy containing these metal materials should be used. Can be done. Further, lanthanum, neodymium, germanium or the like may be added to the above metal materials or alloys. Also, alloys containing aluminum (aluminum alloys) such as alloys of aluminum and titanium, alloys of aluminum and nickel, alloys of aluminum and neodymium, alloys of silver and copper, alloys of silver and palladium and copper, alloys of silver and magnesium. It can be formed by using an alloy containing silver such as. Alloys containing silver and copper are preferable because they have high heat resistance. Further, by laminating a metal film or a metal oxide film in contact with the aluminum alloy film, oxidation of the aluminum alloy film can be suppressed. Examples of the material of the metal film and the metal oxide film include titanium and titanium oxide. Further, the conductive film that transmits visible light and the film made of a metal material may be laminated. For example, a laminated film of silver and ITO, a laminated film of an alloy of silver and magnesium and ITO can be used.
The electrodes may be formed by a vapor deposition method or a sputtering method, respectively. In addition, it can be formed by using a ejection method such as an inkjet method, a printing method such as a screen printing method, or a plating method.
When a voltage higher than the threshold voltage of the light emitting element is applied between the lower electrode 231 and the upper electrode 235, holes are injected into the EL layer 233 from the anode side, and electrons are injected from the cathode side. The injected electrons and holes are recombined in the EL layer 233, and the luminescent substance contained in the EL layer 233 emits light.
The EL layer 233 has at least a light emitting layer. The EL layer 233 is a layer other than the light emitting layer, which is a substance having a high hole injecting property, a substance having a high hole transporting property, a hole blocking material, a substance having a high electron transporting property, a substance having a high electron injecting property, or a bipolar property. It may further have a layer containing the substance (substance having high electron transport property and hole transport property) and the like.
Either a low molecular weight compound or a high molecular weight compound can be used for the EL layer 233, and an inorganic compound may be contained. The layers constituting the EL layer 233 can be formed by a vapor deposition method (including a vacuum vapor deposition method), a transfer method, a printing method, an inkjet method, a coating method, or the like, respectively.
In the element layer 101, the light emitting element is preferably provided between a pair of insulating films having low water permeability. As a result, it is possible to prevent impurities such as water from entering the light emitting element, and it is possible to suppress a decrease in the reliability of the light emitting device.
Examples of the insulating film having low water permeability include a film containing nitrogen and silicon such as a silicon nitride film and a silicon nitride film, and a film containing nitrogen and aluminum such as an aluminum nitride film. Further, a silicon oxide film, a silicon nitride film, an aluminum oxide film or the like may be used.
For example, the amount of water vapor permeated by an insulating film with low water permeability is 1 x 10.<sup>-5</sup>[g / m<sup>2</sup>. Day] or less, preferably 1 × 10<sup>-6</sup>[g / m<sup>2</sup>. Day] or less, more preferably 1 × 10<sup>-7</sup>[g / m<sup>2</sup>. Day] or less, more preferably 1 × 10<sup>-8</sup>[g / m<sup>2</sup>. Day] The following.
The substrate 103 is translucent and transmits at least the light emitted by the light emitting element of the element layer 101. The substrate 103 may have flexibility. Further, the refractive index of the substrate 103 is higher than the refractive index of the atmosphere.
Since the weight of the organic resin is lighter than that of glass, it is preferable to use the organic resin as the substrate 103 because the weight of the light emitting device can be reduced as compared with the case of using glass.
Examples of the material having flexibility and transparency to visible light include glass having a thickness sufficient to have flexibility, polyester resin such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), and polyacrylonitrile resin. , Polymethyl methacrylate resin, polycarbonate (PC) resin, polyether sulfone (PES) resin, polyamide resin, cycloolefin resin, polystyrene resin, polyamideimide resin, polyvinyl chloride resin and the like. In particular, it is preferable to use a material having a low coefficient of thermal expansion, and for example, a polyamide-imide resin, a polyimide resin, PET and the like can be preferably used. It is also possible to use a substrate in which glass fibers are impregnated with an organic resin, or a substrate in which an inorganic filler is mixed with an organic resin to reduce the coefficient of thermal expansion.
As the substrate 103, the layer using the above material is a hard coat layer (for example, a silicon nitride layer) that protects the surface of the light emitting device from scratches or the like, or a layer of a material that can disperse the pressure (for example, an aramid resin layer). Etc.) and so on. Further, in order to suppress a decrease in the life of the light emitting element due to moisture or the like, the above-mentioned insulating film having low water permeability may be provided.
The adhesive layer 105 has translucency and transmits at least the light emitted by the light emitting element of the element layer 101. Further, the refractive index of the adhesive layer 105 is higher than the refractive index of the atmosphere.
For the adhesive layer 105, a resin such as a two-component mixed type resin that cures at room temperature, a photocurable resin, or a thermosetting resin can be used. For example, epoxy resin, acrylic resin, silicone resin, phenol resin and the like can be mentioned. In particular, a material having low moisture permeability such as epoxy resin is preferable.
Further, the resin may contain a desiccant. For example, a substance that adsorbs water by chemisorption, such as an oxide of an alkaline earth metal (calcium oxide, barium oxide, etc.), can be used. Alternatively, a substance that adsorbs water by physical adsorption, such as zeolite or silica gel, may be used. When a desiccant is contained, impurities such as moisture can be suppressed from entering the light emitting element, and the reliability of the light emitting device is improved, which is preferable.
Further, by mixing a filler having a high refractive index (titanium oxide or the like) with the resin, the efficiency of extracting light from the light emitting element can be improved, which is preferable.
Further, the adhesive layer 105 may have a scattering member that scatters light. For example, for the adhesive layer 105, a mixture of the above resin and the above resin and particles having different refractive indexes can also be used. The particles function as a light scattering member.
The difference in refractive index between the resin and the particles having a different refractive index from the resin is preferably 0.1 or more, and more preferably 0.3 or more. Specifically, as the resin, epoxy resin, acrylic resin, imide resin, silicone and the like can be used. Further, as the particles, titanium oxide, barium oxide, zeolite or the like can be used.
Titanium oxide and barium oxide particles are preferable because they have a strong property of scattering light. Further, when zeolite is used, water contained in a resin or the like can be adsorbed, and the reliability of the light emitting element can be improved.
Inorganic insulating materials can be used for the insulating layer 205 and the insulating layer 255. In particular, it is preferable to use the above-mentioned insulating film having low water permeability because a highly reliable light emitting panel can be realized.
The insulating layer 207 has an effect of suppressing the diffusion of impurities into the semiconductors constituting the transistor. As the insulating layer 207, an inorganic insulating film such as a silicon oxide film, a silicon nitride film, a silicon nitride film, a silicon nitride film, or an aluminum oxide film can be used.
As the insulating layer 209, the insulating layer 209a, and the insulating layer 209b, it is preferable to select an insulating film having a flattening function in order to reduce surface irregularities caused by transistors and the like. For example, an organic material such as polyimide, acrylic, or a benzocyclobutene resin can be used. In addition to the above organic materials, low dielectric constant materials (low-k materials) and the like can be used. A laminated structure using an insulating film or an inorganic insulating film formed of these materials may be used.
The insulating layer 211 is provided so as to cover the end portion of the lower electrode 231. In order to improve the coverage of the EL layer 233 and the upper electrode 235 formed on the upper layer of the insulating layer 211, it is preferable that the side wall of the insulating layer 211 is an inclined surface formed with a continuous curvature.
As the material of the insulating layer 211, a resin or an inorganic insulating material can be used. As the resin, for example, a polyimide resin, a polyamide resin, an acrylic resin, a siloxane resin, an epoxy resin, a phenol resin, or the like can be used. In particular, since the insulating layer 211 can be easily produced, it is preferable to use a negative type photosensitive resin or a positive type photosensitive resin.
The method for forming the insulating layer 211 is not particularly limited, but a photolithography method, a sputtering method, a vapor deposition method, a droplet ejection method (inkjet method or the like), a printing method (screen printing, offset printing or the like) or the like may be used.
The insulating layer 217 can be formed by using an inorganic insulating material, an organic insulating material, or the like. For example, as the organic insulating material, a negative type or positive type photosensitive resin, non-photosensitive resin and the like can be used. Further, a conductive layer may be formed instead of the insulating layer 217. For example, it can be formed using a metal material. As the metal material, titanium, aluminum and the like can be used. By using a conductive layer instead of the insulating layer 217 and electrically connecting the conductive layer and the upper electrode 235, the potential drop due to the resistance of the upper electrode 235 can be suppressed. Further, the insulating layer 217 may have a forward taper shape or a reverse taper shape.
The insulating layer 276, the insulating layer 278, the insulating layer 291 and the insulating layer 293 and the insulating layer 295 can be formed by using an inorganic insulating material or an organic insulating material, respectively. In particular, for the insulating layer 278 and the insulating layer 295, it is preferable to use an insulating layer having a flattening function in order to reduce surface irregularities caused by the sensor element.
For the sealing layer 213, a resin such as a two-component mixed type resin that cures at room temperature, a photocurable resin, or a thermosetting resin can be used. For example, PVC (polyvinyl chloride) resin, acrylic resin, polyimide resin, epoxy resin, silicone resin, PVB (polyvinyl butyral) resin, EVA (ethylene vinyl acetate) resin and the like can be used. The sealing layer 213 may contain a desiccant. Further, when the light of the light emitting element 230 is taken out of the light emitting panel through the sealing layer 213, it is preferable that the sealing layer 213 contains a filler having a high refractive index or a scattering member. Examples of the desiccant, the filler having a high refractive index, and the scattering member include the same materials as those that can be used for the adhesive layer 105.
The conductive layer 156, the conductive layer 157, the conductive layer 294, and the conductive layer 296 can be formed of the same material and the same process as the conductive layer constituting the transistor or the light emitting element, respectively. Further, the conductive layer 280 can be formed by the same material and the same process as the conductive layer constituting the transistor.
For example, the conductive layers are formed as a single layer or laminated using a metal material such as molybdenum, titanium, chromium, tantalum, tungsten, aluminum, copper, neodymium, or scandium, or an alloy material containing these elements, respectively. can do. Further, each of the conductive layers may be formed by using a conductive metal oxide. Indium oxide (In) is a conductive metal oxide.<sub>2</sub>O<sub>3</sub>Etc.), tin oxide (SnO)<sub>2</sub>Etc.), Zinc Oxide (ZnO), ITO, Indium Zinc Oxide (In<sub>2</sub>O<sub>3</sub>-ZnO, etc.) or those metal oxide materials containing silicon oxide can be used.
Further, the conductive layer 208, the conductive layer 212, the conductive layer 310a and the conductive layer 310b can also be formed by using the above-mentioned metal material, alloy material, conductive metal oxide or the like, respectively.
The conductive layer 272 and the conductive layer 274, and the conductive layer 281 and the conductive layer 283 are conductive layers having translucency. For example, indium oxide, ITO, indium zinc oxide, zinc oxide, zinc oxide added with gallium, or the like can be used. Further, the conductive layer 270 can be formed by the same material and the same process as the conductive layer 272.
As the conductive particles 292, those obtained by coating the surface of particles such as organic resin or silica with a metal material are used. It is preferable to use nickel or gold as the metal material because the contact resistance can be reduced. Further, it is preferable to use particles in which two or more kinds of metal materials are coated in layers, such as nickel is further coated with gold.
As the connecting body 215, a paste-like or sheet-like material in which metal particles are mixed with a thermosetting resin, which exhibits anisotropic conductivity by thermocompression bonding, can be used. As the metal particles, it is preferable to use particles in which two or more kinds of metals are layered, for example, nickel particles coated with gold.
The colored layer 259 is a colored layer that transmits light in a specific wavelength band. For example, a red (R) color filter that transmits light in the red wavelength band, a green (G) color filter that transmits light in the green wavelength band, and a blue (B) color filter that transmits light in the blue wavelength band. A color filter or the like can be used. Each colored layer is formed at a desired position by a printing method, an inkjet method, an etching method using a photolithography method, or the like using various materials.
Further, a light-shielding layer 257 is provided between the adjacent colored layers 259. The light-shielding layer 257 blocks light wrapping around from adjacent light emitting elements and suppresses color mixing between adjacent pixels. Here, by providing the end portion of the colored layer 259 so as to overlap the light-shielding layer 257, light leakage can be suppressed. The light-shielding layer 257 can be formed by using a material that blocks light emitted from the light-emitting element, and can be formed by using a metal material, a resin material containing a pigment or a dye, or the like. As shown in FIG. 7B, it is preferable to provide the light-shielding layer 257 in a region other than the light extraction unit 104 such as the drive circuit unit 106 because unintended light leakage due to waveguide light or the like can be suppressed.
Further, it is preferable to provide the insulating layer 261 that covers the colored layer 259 and the light-shielding layer 257 because impurities such as pigments contained in the colored layer 259 and the light-shielding layer 257 can be suppressed from diffusing into the light emitting element or the like. A translucent material is used for the insulating layer 261, and an inorganic insulating material or an organic insulating material can be used. The above-mentioned insulating film having low water permeability may be used for the insulating layer 261. The insulating layer 261 may not be provided if it is unnecessary.
<Example of manufacturing method> Next, a manufacturing method of the light emitting panel will be illustrated with reference to FIGS. 11 and 12. Here, a light emitting panel having the configuration of Specific Example 1 (FIG. 7 (B)) will be described as an example.
First, the release layer 303 is formed on the production substrate 301, and the insulating layer 205 is formed on the release layer 303. Next, a plurality of transistors, a conductive layer 157, an insulating layer 207, an insulating layer 209, a plurality of light emitting elements, and an insulating layer 211 are formed on the insulating layer 205. The insulating layer 211, the insulating layer 209, and the insulating layer 207 are opened so that the conductive layer 157 is exposed (FIG. 11 (A)).
Further, the release layer 307 is formed on the production substrate 305, and the insulating layer 255 is formed on the release layer 307. Next, a light-shielding layer 257, a colored layer 259, and an insulating layer 261 are formed on the insulating layer 255 (FIG. 11 (B)).
As the production substrate 301 and the production substrate 305, a glass substrate, a quartz substrate, a sapphire substrate, a ceramic substrate, a metal substrate, or the like can be used, respectively.
Further, as the glass substrate, for example, a glass material such as aluminosilicate glass, aluminoborosilicate glass, and bariumborosilicate glass can be used. If the temperature of the subsequent heat treatment is high, it is preferable to use one having a strain point of 730 ° C or higher. By adding a large amount of barium oxide (BaO), more practical heat-resistant glass can be obtained. In addition, crystallized glass or the like can be used.
When a glass substrate is used as the manufacturing substrate, if an insulating film such as a silicon oxide film, a silicon nitride film, a silicon nitride film, or a silicon nitride film is formed between the manufacturing substrate and the release layer, the glass substrate is contaminated. It can be prevented and is preferable.
The release layer 303 and the release layer 307 include elements selected from tungsten, molybdenum, titanium, tantalum, niobium, nickel, cobalt, zirconium, zinc, ruthenium, rhodium, palladium, osmium, iridium, and silicon, respectively. It is a single layer or a laminated layer composed of an alloy material containing the element or a compound material containing the element. The crystal structure of the layer containing silicon may be amorphous, microcrystal, or polycrystalline.
The release layer can be formed by a sputtering method, a plasma CVD method, a coating method, a printing method, or the like. The coating method includes a spin coating method, a droplet ejection method, and a dispensing method.
When the release layer has a single-layer structure, it is preferable to form a tungsten layer, a molybdenum layer, or a layer containing a mixture of tungsten and molybdenum. Further, a layer containing a tungsten oxide or an oxide nitride, a layer containing a molybdenum oxide or an oxide nitride, or a layer containing an oxide or an oxide nitride of a mixture of tungsten and molybdenum may be formed. The mixture of tungsten and molybdenum corresponds to, for example, an alloy of tungsten and molybdenum.
Further, when forming a laminated structure of a layer containing tungsten and a layer containing an oxide of tungsten as a release layer, a layer containing tungsten is formed, and an insulating film formed of an oxide is formed on the upper layer. , It may be utilized that a layer containing a tungsten oxide is formed at the interface between the tungsten layer and the insulating film. In addition, the surface of the layer containing tungsten is subjected to thermal oxidation treatment, oxygen plasma treatment, and nitrous oxide (N).<sub>2</sub>O) A layer containing a tungsten oxide may be formed by performing plasma treatment, treatment with a solution having a strong oxidizing power such as ozone water, or the like. Further, the plasma treatment and the heat treatment may be carried out by oxygen, nitrogen, nitrous oxide alone, or in a mixed gas atmosphere of the gas and another gas. By changing the surface state of the release layer by the above plasma treatment or heat treatment, it is possible to control the adhesion between the release layer and the insulating layer formed later.
Each insulating layer can be formed by a sputtering method, a plasma CVD method, a coating method, a printing method, or the like. For example, the insulating layer is formed at a film formation temperature of 250 ° C or more and 400 ° C or less by the plasma CVD method. As a result, a dense and extremely low water permeability film can be obtained.
After that, a material to be the sealing layer 213 is applied to the surface of the manufacturing substrate 305 provided with the colored layer 259 and the like or the surface of the manufacturing substrate 301 provided with the light emitting element 230 and the like, and the surface is passed through the sealing layer 213. The production substrate 301 and the production substrate 305 are bonded together so that they face each other (FIG. 11 (C)).
Then, the manufactured substrate 301 is peeled off, and the exposed insulating layer 205 and the substrate 201 are bonded together using the adhesive layer 203. Further, the manufactured substrate 305 is peeled off, and the exposed insulating layer 255 and the substrate 103 are bonded together using the adhesive layer 105. In FIG. 12A, the substrate 103 does not overlap with the conductive layer 157, but the conductive layer 157 and the substrate 103 may overlap.
In the peeling step, various methods can be appropriately used. For example, when a layer containing a metal oxide film is formed on the side in contact with the layer to be peeled as the peeling layer, the metal oxide film can be fragile by crystallization and the layer to be peeled can be peeled from the manufactured substrate. When an amorphous silicon film containing hydrogen is formed as a peeling layer between the highly heat-resistant fabrication substrate and the layer to be peeled off, the amorphous silicon film is removed by irradiation or etching with a laser beam. , The layer to be peeled off can be peeled off from the manufactured substrate. Further, as a peeling layer, a layer containing a metal oxide film is formed on the side in contact with the layer to be peeled, the metal oxide film is weakened by crystallization, and a part of the peeling layer is made into a solution or NF.<sub>3</sub>, BrF<sub>3</sub>, ClF<sub>3</sub>After removing by etching with a fluorinated gas such as, it can be peeled off in a fragile metal oxide film. Furthermore, a film containing nitrogen, oxygen, hydrogen, etc. (for example, an amorphous silicon film containing hydrogen, a hydrogen-containing alloy film, an oxygen-containing alloy film, etc.) is used as the release layer, and the release layer is irradiated with laser light. A method may be used in which nitrogen, oxygen or hydrogen contained in the peeling layer is released as a gas to promote the peeling between the peeled layer and the substrate. In addition, the fabrication substrate on which the layer to be peeled is formed is mechanically removed or a solution or NF is used.<sub>3</sub>, BrF<sub>3</sub>, ClF<sub>3</sub>A method of removing by etching with a fluorine gas or the like can be used. In this case, it is not necessary to provide the release layer.
Further, the peeling step can be performed more easily by combining a plurality of the peeling methods. That is, after irradiating the peeling layer with a laser beam, etching the peeling layer with a gas or solution, and mechanically removing the peeling layer with a sharp knife or a knife to make the peeling layer and the layer to be peeled easy to peel off, it is physically It can also be peeled off by force (by machine, etc.).
Further, the liquid to be peeled may be permeated into the interface between the peeled layer and the layer to be peeled to peel the layer to be peeled from the manufactured substrate. Further, when the peeling is performed, the peeling may be performed while sprinkling a liquid such as water.
As another peeling method, when the peeling layer is formed of tungsten, it is preferable to perform peeling while etching the peeling layer with a mixed solution of aqueous ammonia and hydrogen peroxide.
If peeling is possible at the interface between the manufactured substrate and the layer to be peeled, the peeling layer may not be provided. For example, glass is used as a manufacturing substrate, and an organic resin such as polyimide, polyester, polyolefin, polyamide, polycarbonate, or acrylic is formed in contact with the glass, and an insulating film, a transistor, or the like is formed on the organic resin. In this case, by heating the organic resin, it can be peeled off at the interface between the production substrate and the organic resin. Alternatively, a metal layer may be provided between the production substrate and the organic resin, the metal layer may be heated by passing an electric current through the metal layer, and peeling may be performed at the interface between the metal layer and the organic resin. The organic resin peeled off from the manufactured substrate can be used as the substrate of the light emitting panel. Further, the organic resin and another substrate may be bonded with an adhesive.
Finally, the conductive layer 157 is exposed by opening the insulating layer 255 and the sealing layer 213 (FIG. 12 (B)). When the substrate 103 overlaps with the conductive layer 157, the substrate 103 and the adhesive layer 105 are also opened in order to expose the conductive layer 157 (FIG. 12 (C)). The means for opening is not particularly limited, and for example, a laser ablation method, an etching method, an ion beam sputtering method, or the like may be used. Alternatively, the film on the conductive layer 157 may be cut with a sharp blade or the like, and a part of the film may be peeled off by a physical force.
From the above, the light emitting panel can be manufactured.
As shown above, the light emitting panel of the present embodiment is composed of two substrates, a substrate 103 and a substrate 201 or a substrate 202. Further, even if the configuration includes a touch sensor, it can be configured with two boards. By minimizing the number of substrates, it becomes easy to improve the efficiency of light extraction and the sharpness of the display.
This embodiment can be appropriately combined with other embodiments.
(Embodiment 3) In the present embodiment, the light emitting panel will be described with reference to FIG.
The light emitting panel shown in FIG. 13 includes a substrate 401, a transistor 240, a light emitting element 230, an insulating layer 207, an insulating layer 209, an insulating layer 211, an insulating layer 217, a space 405, an insulating layer 261, a light shielding layer 257, a colored layer 259, and a light receiving light. It has an element (having a p-type semiconductor layer 271, an i-type semiconductor layer 273, and an n-type semiconductor layer 275), a conductive layer 281, a conductive layer 283, an insulating layer 291, an insulating layer 293, an insulating layer 295, and a substrate 403.
The light emitting panel has an adhesive layer (not shown) arranged in a frame shape so as to surround the light emitting element 230 and the light receiving element between the substrates 401 and the substrate 403. The light emitting element 230 is sealed by the adhesive layer, the substrate 401, and the substrate 403.
In the light emitting panel of the present embodiment, the substrate 403 has translucency. The light emitted by the light emitting element 230 is taken out to the atmosphere through the colored layer 259, the substrate 403, and the like.
The light emitting panel of the present embodiment is a light emitting panel that can be touch-operated. Specifically, the light receiving element can be used to detect the proximity or contact of the object to be detected with the surface of the substrate 403.
The optical touch sensor is preferable because it has high durability because it does not affect the detection accuracy even if the surface to which the object to be detected comes into contact is scratched. In addition, the optical touch sensor has the advantages that it can be sensed by non-contact, the sharpness of the image does not deteriorate even if it is applied to a display device, and it can be applied to a large light emitting panel or a display device. is there.
It is preferable to have the optical touch sensor between the substrate 403 and the space 405 because it is not easily affected by the light emission of the light emitting element 230 and the S / N ratio can be improved.
The light-shielding layer 257 is located closer to the substrate 401 than the light-receiving element and overlaps the light-receiving element. The light-shielding layer 257 can suppress the light emitted by the light-emitting element 230 from being applied to the light-receiving element.
The materials used for the substrate 401 and the substrate 403 are not particularly limited. A material that transmits the light is used for the substrate on the side that extracts the light from the light emitting element. For example, materials such as glass, quartz, ceramics, sapphire, and organic resins can be used. Since the substrate on the side that does not emit light does not have to have translucency, a metal substrate using a metal material or an alloy material can be used in addition to the substrates listed above. Further, as the substrate 401 and the substrate 403, the material of the substrate exemplified in the above embodiment can also be used.
The sealing method of the light emitting panel is not limited, and may be solid sealing or hollow sealing, for example. For example, as the sealing material, a glass material such as glass frit, a resin that cures at room temperature such as a two-component mixed type resin, a photocurable resin, or a resin such as a thermosetting resin can be used. The space 405 may be filled with an inert gas such as nitrogen or argon, or may be filled with a resin or the like similar to the sealing layer 213. Further, the resin may contain the above-mentioned desiccant, a filler having a high refractive index, or a scattering member.
This embodiment can be appropriately combined with other embodiments.
<p>In this example, a light emitting device according to one aspect of the present invention was produced. It can be said that the light emitting device of this embodiment is a tri-fold folding screen type display that can be folded in three.</p><p>The light emitting panels included in the light emitting device manufactured in this example are shown in FIGS. 18 (A) and 18 (B). The light emitting device produced in this embodiment has different sizes of the substrate 103 and the substrate 201 and has an insulating layer 217 between pixels of different colors. (B)) is different. For others, the explanations such as Specific Example 1 can be referred to. For the insulating layer 217, the description of Specific Example 2 and the like can be referred to.</p><p>The light emitting panel was manufactured by using the manufacturing method shown in the second embodiment.</p><p>First, the release layer 303 was formed on the glass substrate which is the production substrate 301, and the release layer was formed on the release layer 303. Further, the release layer 307 was formed on the glass substrate which is the production substrate 305, and the peeled layer was formed on the release layer 307. Next, the production substrate 301 and the production substrate 305 were bonded so that the surfaces on which the layers to be peeled were formed faced each other. Then, the two manufactured substrates were peeled off from the layers to be peeled off, and the flexible substrates were attached to the respective layers to be peeled off. The material of each layer is shown below.</p><p>As the release layer 303 and the release layer 307, a laminated structure of a tungsten film and a tungsten oxide film on the tungsten film was formed.</p><p>The laminated structure constituting the release layer has low peelability immediately after film formation, but the state of the interface between the release layer and the inorganic insulating film changes due to the reaction with the inorganic insulating film due to the heat treatment, and exhibits brittleness. Then, by forming the starting point of the peeling, the peeling can be physically performed.</p><p>As the layer to be peeled off on the peeling layer 303, an insulating layer 205, a transistor, and an organic EL element which is a light emitting element 230 were formed. As the peeling layer on the peeling layer 307, an insulating layer 255, a color filter (corresponding to the colored layer 259), and the like were prepared.</p><p>As the insulating layer 205 and the insulating layer 255, a laminated structure including a silicon oxide film and a silicon nitride film was used, respectively.</p><p>A transistor using CAAC-OS (C Axis Aligned Crystalline Oxide Semiconductor) was applied to the transistor. Since CAAC-OS is not amorphous, it has few defect levels and can improve the reliability of the transistor. Further, since CAAC-OS does not have grain boundaries, cracks are unlikely to occur in the CAAC-OS film due to stress when the flexible device is bent.</p><p>CAAC-OS is an oxide semiconductor that is c-axis oriented approximately perpendicular to the film surface. It has been confirmed that there are various other crystal structures of oxide semiconductors, such as nano-crystal (nc), which is a nanoscale microcrystal aggregate, which is different from amorphous and single crystals. CAAC has lower crystallinity than single crystal, but higher crystallinity than amorphous and nc.</p><p>In this example, a channel-etched transistor using an In-Ga-Zn-based oxide was used. The transistor can be made on a glass substrate in a process of less than 500 ° C.</p><p>In the method of manufacturing an element such as a transistor directly on an organic resin such as a plastic substrate, the temperature of the device manufacturing process must be lower than the heat resistant temperature of the organic resin. In this embodiment, since the manufacturing substrate is a glass substrate and the heat resistance of the release layer which is an inorganic film is high, the transistor can be manufactured at the same temperature as when the transistor is manufactured on the glass substrate. Transistor performance and reliability can be easily ensured.</p><p>The light emitting element 230 is a tandem type organic EL element having a fluorescence light emitting unit having a light emitting layer exhibiting blue light, a phosphorescent light emitting unit having a light emitting layer exhibiting green light, and a phosphorescent light emitting unit having a light emitting layer exhibiting red light. Was used. The light emitting element 230 has a top emission structure. As the lower electrode 231 of the light emitting element 230, a titanium film was laminated on an aluminum film, and an ITO film functioning as an optical adjustment layer was laminated on the titanium film. The film thickness of the optical adjustment layer was changed according to the color of each pixel. By combining the color filter and the microcavity structure, light having high color purity can be extracted from the light emitting panel produced in this embodiment. For the substrate 103 and the substrate 201, a flexible organic resin film having a thickness of 20 μm was used.</p><p>The manufactured light emitting panel has a light emitting part (pixel part) with a diagonal size of 5.9 inches, a pixel count of 720 x 1280 x 3 (RGB), a pixel pitch of 0.102 mm x 0.102 mm, a resolution of 249 ppi, and an aperture ratio of 45.2%. And said. The scan driver is built-in, and the source driver is externally attached using COF (Chip On Film).</p><p>FIG. 19 shows a display photograph of the light emitting device produced in this embodiment. FIG. 19 (A) shows the unfolded state of the light emitting device, FIGS. 19 (B) and 19 (C) show the state in the process of changing the light emitting device from the unfolded state to the folded state, and FIG. 19 (D) shows the light emitting device folded. It is a display photograph of a light emitting device in the state. The radius of curvature of the bent part was 4 mm. Even if the light emitting device of this embodiment was folded while displaying an image, there was no problem in displaying or driving. The light emitting device of this embodiment has a function of detecting whether it is in an unfolded state or a folded state with a sensor and displaying different images for each. As a result, it also has a function of stopping the driving of the area of the light emitting panel that cannot be seen in the folded state to save power.</p><p>Here, if the light emitting panel is completely fixed by the pair of protective layers or the pair of support panels, the light emitting panel may be pulled when the light emitting device is bent, and the light emitting panel may be damaged. Further, when the light emitting device is deployed, a force is applied in the direction in which the light emitting panel contracts, and the light emitting panel may be damaged. In the light emitting device produced in this embodiment, the light emitting panel is not completely fixed by a pair of protective layers and a pair of support panels. Therefore, when the light emitting device is bent or unfolded, the light emitting panel slides to change the position of the light emitting panel with respect to the pair of protective layers and the pair of support panels. Therefore, it is possible to prevent the light emitting panel from being damaged due to the force applied to the light emitting panel.</p><p>20 (A) to 20 (C) show a light emitting device according to one aspect of the present invention. Here, the case where the light emitting panel 11 is not fixed by the pair of support panels 15a (1) and the support panel 15b (1) is shown. The light emitting panel 11 is fixed by a pair of support panels 15a (2) and a support panel 15b (2), or is fixed by a pair of support panels 15a (3) and a support panel 15b (3), or is fixed by both. Has been done. The light emitting device of one aspect of the present invention has a plurality of pairs of support panels, as long as at least a pair of support panels fix the light emitting panels.</p><p>In the unfolded light emitting device shown in FIG. 20 (A), the display of the light emitting panel 11 on the alternate long and short dash line M1-N1 is in the process of changing from the unfolded state shown in FIG. 20 (B) to the folded state. In the light emitting device, it moves on the alternate long and short dash line M2-N2. Further, in the folded light emitting device shown in FIG. 20 (C), the display moves on the alternate long and short dash line M3-N3. As described above, in the light emitting device of one aspect of the present invention, since the light emitting panel is not completely fixed by the pair of protective layers and the pair of support panels, the light emitting panel is used when the light emitting device is bent or unfolded. Slides. As a result, the position of the light emitting panel with respect to the pair of protective layers and the pair of support panels changes. Therefore, it is possible to prevent the light emitting panel from being damaged due to the force applied to the light emitting panel.</p>
11 Light emitting panel 11a Light emitting area 11b Non-light emitting area 13 Protective layer 13a Protective layer 13b Protective layer 15 Support panel 15a Support panel 15b Support panel 101 Element layer 103 Substrate 104 Light extraction part 105 Adhesive layer 106 Drive circuit part 108 FPC108a FPC108b FPC156 Conductive layer 157 Conductive layer 201 Substrate 202 Substrate 203 Adhesive layer 205 Insulation layer 207 Insulation layer 208 Conductive layer 209 Insulation layer 209a Insulation layer 209b Insulation layer 211 Insulation layer 212 Conductive layer 213 Encapsulation layer 215 Connection 215a Connection 215b Connection 217 Insulation layer 230 Light emitting element 231 Lower electrode 233 EL layer 235 Upper electrode 240 Transistor 255 Insulation layer 257 Light-shielding layer 259 Colored layer 261 Insulation layer 270 Conductive layer 271 p-type semiconductor layer 272 Conductive layer 273 i-type semiconductor layer 274 Conductive layer 275 n-type semiconductor layer 276 Insulation layer 278 Insulation layer 280 Conductive layer 281 Conductive layer 283 Conductive layer 291 Insulation layer 292 Conductive particles 293 Insulation layer 294 Conductive layer 295 Insulation layer 296 Conductive layer 301 Fabrication substrate 303 Peeling layer 305 Fabrication board 307 Peeling layer 310a Conductive layer 310b Conductive layer 401 Board 403 Board 405 Space
23 sheets
Sheet 1 Sheet 2 Sheet 3 Sheet 4 Sheet 5 Sheet 6 Sheet 7 Sheet 8 Sheet 9 Sheet 10 Sheet 11 Sheet 12 Sheet 13 Sheet 14 Sheet 15 Sheet 16 Sheet 17 Sheet 18 Sheet 19 Sheet 20 Sheet 21 Sheet 22 Sheet 23
Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| JP2005112251A | Cites | Japan | A | Search report | – |
| JP2005114759A | Cites | Japan | A | Search report | – |
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79 members in 7 offices
Priority claims7
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15 legal events, as the office reported them to INPADOC
Over the term
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| Receipt of annual feesJAPANESE INTERMEDIATE CODE: R250R250 | R250 | |
| Receipt of annual feesJAPANESE INTERMEDIATE CODE: R250R250 | R250 | |
| Receipt of annual feesJAPANESE INTERMEDIATE CODE: R250R250 | R250 | |
| First payment of annual fees (during grant procedure)JAPANESE INTERMEDIATE CODE: A61A61 | A61 | |
| Certificate of patent or registration of utility modelJAPANESE INTERMEDIATE CODE: R150R150 | R150 | |
| Written decision to grant a patent or to grant a registration (utility model)JAPANESE INTERMEDIATE CODE: A01A01 | A01 | |
| Decision of grant or rejection writtenTRDD | TRDD | |
| Request for written amendment filedJAPANESE INTERMEDIATE CODE: A523A521 | A521 | |
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| Request for written amendment filedJAPANESE INTERMEDIATE CODE: A523A521 | A521 | |
| Written request for extension of timeJAPANESE INTERMEDIATE CODE: A601A601 | A601 | |
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Numbers
- Publication
- 2019067775
- Application
- 465
Titles2
- Japanese
- 発光装置
- English
- Light emitting device
Classification
- CPC, 16
- F21V15/012
- H05B33/02
- F21Y2105/00
- F21Y2115/20
- H10K59/40
- H10K59/1213
- H10K59/1201
- H10K2102/311
- Y02E10/549
- H05B33/12
- H10K50/19
- H10K59/90
- H10K2102/3026
- F21Y2115/10
- H04W72/23
- H04W72/569
- IPC, 11
- H05B33 02
- H01L51 50
- G09F9 30
- G09F9 00
- F21V19 00
- F21S2 00
- F21Y115 10
- F21Y115 15
- F21Y115 20
- H10D30 01
- H10D30 67