Use of full width array imaging sensor to measure real time film thicknesses on film manufacturing equipment
Abstract
Problem to be solved.To provide a compact and low-cost spectrophotometer for in-line color output and / or thickness measurement. A detection system 300 comprises a lighting device 301 that emits a light beam onto a film 302A deposited on a substrate surface, and a substrate surface via a reflectance distribution type lens 304 and a linear variable filter 306. By configuring the linear sensor 308 to receive the reflected light from the film 302A deposited on it, it becomes a spectrophotometer, and the thickness of the film is determined based on the spectral reflectance of the film received from the linear sensor. Including configuring the processor of. [Selection diagram] Fig. 3B

Term
Projected expiry 31 May 2036.
- Priority and filed
- Published
- Today
- Projected expiry
10 claims: 2 independent, 8 dependent
- 1分光光度計によってフィルムの厚さの分析を提供するための方法において、 基材表面上に蒸着したフィルムに光ビームを放射する照明装置を構成することであって、前記照明装置が前記基材表面に隣接して配置されている、構成することと、 屈折率分布型レンズ及び線形可変フィルタを介して前記基材表面上に前記蒸着したフィルムからの反射光を受光するようにリニアセンサを構成することであって、前記リニアセンサが基材に隣接して配置されており、前記屈折率分布型レンズが、前記基材表面から反射する光ビームの光路に配置され、前記基材表面と線形可変フィルタとの間に配置されており、前記線形可変フィルタが、前記基材表面から反射する光の光路に配置され、前記リニアセンサと前記屈折率分布型レンズとの間に配置されている、構成することと、 前記リニアセンサから受信した前記フィルムの分光反射率に基づいて前記フィルムの厚さを判定するためのプロセッサを構成することとを備え、 前記線形可変フィルタが、バンドパスコーティングを有する光学フィルタであり、前記バンドパスコーティングの特性が、前記線形可変フィルタの長さにわたって線形的に前記線形可変フィルタの中心波長をシフトするように前記線形可変フィルタの長さにわたって変化する、方法。
- 2前記線形可変フィルタと前記リニアセンサとの間に間隙を設けることをさらに備える、請求項1に記載の方法。
- 3前記リニアセンサが全幅アレイイメージセンサである、請求項1に記載の方法。
- 4前記リニアセンサがイメージセンサチップである、請求項1に記載の方法。
- 5命令を実行するように前記プロセッサを構成することをさらに備え、前記命令が、 前記分光反射率に基づいて所定の厚さ値と前記フィルムの厚さを比較することと、 前記フィルムの厚さと前記所定の厚さとの差異が所定の許容値よりも大きい場合に、調整後の蒸着パラメータを定義するために少なくとも1つの蒸着パラメータを調整することとを備える、請求項1に記載の方法。
- 6前記フィルムが第1のフィルムを備え、前記方法が、 前記第1のフィルム上に配置された第2のフィルムにおいて光ビームを放射するように第2の照明装置を構成することと、 第2の屈折率分布型レンズ及び第2の線形可変フィルタを介して前記第1のフィルム上に配置された前記第2のフィルムからの反射光を受光するように第1のリニアセンサとは異なる位置に第2のリニアセンサを構成することであって、前記第2のリニアセンサが前記基材に隣接して配置されており、前記第2の屈折率分布型レンズが、前記第1のフィルムの表面からの反射光の光路に配置され、前記第1のフィルムの表面と第2の線形可変フィルタとの間に配置され、前記第2の線形可変フィルタが、前記第1のフィルムの表面から反射した光ビームの光路に配置され、前記第2のリニアセンサと前記第2の屈折率分布型レンズとの間に配置されている、構成することと、 前記第2のリニアセンサから受信した前記第2のフィルムの分光反射率に基づいて前記第2のフィルムの厚さを判定するように前記プロセッサを構成することとをさらに備え、 前記第2の線形可変フィルタが、バンドパスコーティングを有する光学フィルタであり、前記バンドパスコーティングの特性が、前記第2の線形可変フィルタの長さにわたって線形的に前記第2の線形可変フィルタの中心波長をシフトするように前記第2の線形可変フィルタの長さにわたって変化する、請求項1に記載の方法。
- 7命令を実行するように前記プロセッサを構成することをさらに備え、前記命令が、 前記分光反射率に基づいて所定の厚さ値と前記第2のフィルムの厚さを比較することと、 前記第2のフィルムの厚さと前記所定の厚さの値との差異が所定の許容値よりも大きい場合、少なくとも1つの蒸着パラメータを調整することとを備える、請求項6に記載の方法。
- 8感光体を製造する方法において、 少なくとも1つのフィルム蒸着ステーションを備えるフィルム蒸着システムを介して基材搬送速度で基材を移動させることと、 液体量が蒸着速度及び蒸着量によって画定される前記液体を前記基材上に蒸着するために前記少なくとも1つのフィルム蒸着ステーションを起動することと、 前記液体から前記基材上に第1の層を形成することと、 インライン分光光度計に光を提供し、前記基材及び前記第1の層のうちの少なくとも一方を表す分光応答データを取得することであって、前記光が、前記第1の層の表面及び前記基材の表面のうちの少なくとも一方から反射されるか又は前記第1の層及び前記基材のうちの少なくとも一方を通って透過される、提供し取得することと、 少なくとも1つの電子プロセッサを使用し且つ分光光度計データに基づいて前記基材及び前記第1の層のうちの少なくとも一方の厚さを判定することと、 少なくとも1つの電子プロセッサを使用して所定の厚さ値と前記測定された厚さ値を比較することと、 前記基材搬送速度、前記蒸着速度及び前記蒸着量のうちの少なくとも1つを調整することとを備える、請求項1に記載の方法。
- 9感光体の組み立て中に分光光度計を使用して蒸着したフィルムの厚さデータを取得するためのシステムにおいて、 表面から反射した又は基材及び前記基材上に蒸着した層のうちの少なくとも一方の表面を通って透過した光の分光応答測定値を取得するように構成された分光光度計と、 前記分光光度計に通信可能に接続され、且つ、 少なくとも1つの電子プロセッサを使用し且つ分光光度計データに基づいて前記基材及び前記層のうちの少なくとも一方の厚さを判定し、 少なくとも1つの電子プロセッサを使用して所定の厚さ値と前記測定された厚さ値を比較するように構成された少なくとも1つの電子プロセッサと、 所定の基材搬送速度で前記基材を提供するための基材搬送装置と、 前記少なくとも1つの電子プロセッサに通信可能に接続され、且つ、蒸着速度及び蒸着量のうちの少なくとも一方によって前記基材上に前記層を蒸着するように構成された層蒸着ステーションとを備える、システム。
- 10前記少なくとも1つの電子プロセッサが、前記蒸着速度及び前記蒸着量のうちの少なくとも一方を調整するために前記層蒸着ステーションを制御するようにさらに構成されている、請求項9に記載のシステム。
Independent claims10
44 paragraphs, as filed
0001The present disclosure relates to a system for providing analysis of a deposited material, such as monitoring the thickness of a film deposited on a substrate surface with a spectrophotometer.
0002In high-end printing or publishing systems, spectrophotometers are used to characterize the quality of the color output of the system and provide a mechanism for adjusting the color output characteristics of the system. In many such systems, the spectrophotometer is an offline device in which printing from the system is performed on the spectrophotometer for measurement. For ease of use and integration, it is often desirable to have a spectrophotometer in-line to the print path so that the sheet or medium is automatically scanned with little or no user interaction. Currently, prior art in-line spectrophotometers (ILS) are relatively expensive and require excessive calibration techniques.
<p num="0003"> It is desirable to provide a compact, low cost spectrophotometer for in-line color output and / or thickness measurement.</p>
<p num="0004"> In embodiments, there are methods for providing an analysis of film thickness by a spectrophotometer. In this method, a lighting device that radiates a light beam onto a film deposited on the surface of the base material is configured, and the reflected light from the film deposited on the surface of the base material via a refractive index distribution type lens and a linear variable filter. It includes configuring a linear sensor to receive light and configuring a processor to determine the thickness of the film based on the spectral reflectance of the film received from the linear sensor. The lighting device and the linear sensor are arranged adjacent to the surface of the base material. The refractive index distribution type lens is arranged in the optical path of light reflected from the surface of the base material, and is placed between the surface of the base material and the linear variable filter. The linear variable filter is arranged in the optical path of the light reflected from the surface of the base material, and is arranged between the linear sensor and the refractive index distribution type lens. A linear variable filter is an optical filter with a bandpass coating. The properties of the bandpass coating vary over the length of the linear variable filter so as to linearly shift the center wavelength of the linear variable filter over the length of the linear variable filter.</p><p num="0005"> In another embodiment, there is a method of producing a photoconductor. The method moves the substrate at a substrate transfer rate via a film deposition apparatus having at least one film deposition station and activates at least one film deposition station to deposit a liquid on the substrate. Including that. The amount of liquid is defined by the deposition rate and the deposition amount. The method also provides light to an in-line spectrophotometer to form a first layer on a substrate from a liquid and obtain spectroscopic response data representing at least one of the substrate and the first layer. Including to do. Light is reflected from at least one of the surface of the first layer and the surface of the substrate, or transmitted through at least one of the first layer and the substrate. The method also uses at least one electronic processor and determines the thickness of at least one of the substrate and the first layer based on spectrophotometer data and uses at least one electronic processor. It includes comparing the predetermined thickness value with the measured thickness value and adjusting at least one of the substrate transport rate, the vapor deposition rate and the vapor deposition amount.</p><p num="0006"> In yet another embodiment, there is a system for acquiring thickness data of a film deposited using a spectrophotometer during assembly of the photoconductor. The system is spectrophotometrically configured to obtain spectrophotometric measurements of light reflected from the surface or transmitted through the substrate and at least one of the layers deposited on the substrate. Communicatably connected to the photometric meter and using at least one electronic processor to determine the thickness of at least one of the substrate and layer based on spectrophotometric data and using at least one electronic processor At least one electronic processor configured to compare a predetermined thickness value with a measured thickness value, a substrate transfer device for providing the substrate at a predetermined substrate transfer rate, and at least. Includes a layer deposition station communicatively connected to one electronic process and configured to deposit layers on a substrate by at least one of the deposition rate and the deposition amount.</p><p num="0007"> Other objectives, features and advantages of one or more embodiments will become apparent from the detailed description below, the accompanying drawings and the appended claims. It should be understood that the general description described above and the detailed description below are both exemplary and descriptive and do not limit the teaching as claimed.</p><p num="0008"> The accompanying drawings incorporated and constructed as part of the specification of the present application, together with detailed description, exemplify embodiments of the present teaching and serve to explain the principles of the present teaching.</p><p num="0009"> Various embodiments are disclosed by way of example only, with reference to the attached schematics showing the corresponding parts of the corresponding reference numerals.</p>
0010<figref num="1">FIG. 1 shows a conventional system for determining the spectral transmittance of a sample by a spectrophotometer.</figref><figref num="2">FIG. 2 shows a graph showing a linear variable filter and a spectrum measured using the linear variable filter.</figref><figref num="3A">FIG. 3A shows a different view of a system for providing color analysis of a toner image on an image-bearing surface by a spectrophotometer according to an embodiment of the present disclosure.</figref><figref num="3B">FIG. 3B shows a different view of a system for providing color analysis of a toner image on an image-bearing surface by a spectrophotometer according to an embodiment of the present disclosure.</figref><figref num="3C">FIG. 3C is a diagram of an alternative system for providing spectral analysis of a material on a substrate surface by a spectrophotometer according to an embodiment of the present disclosure.</figref><figref num="4">FIG. 4 is a simplified elevation view of the basic elements of an electrophotographic color printer showing the context of various embodiments. It should be noted that some details of the figure have been simplified to facilitate understanding of the embodiments rather than maintaining strict structural accuracy, detail and scale. ..</figref><figref num="5">FIG. 5 is a simplified elevation view of the basic elements of a system for manufacturing belt photoconductors that show the context of various embodiments.</figref>
0011Details of embodiments of this teaching are referenced herein, examples of which are illustrated in the accompanying drawings. In drawings, similar reference numerals are used throughout to specify the same element. In the following detailed description, reference is made to the accompanying drawings in which specific exemplary embodiments are illustrated, which form a portion thereof and in which this teaching can be practiced. Therefore, the following detailed description is merely an example.
0012FIG. 1 shows a prior art system 100 used to determine the spectral transmittance of a sample by a spectrophotometer. System 100 includes a test sample 102, a lighting device (not shown), a self-focusing lens array (eg, Selfoc® lens array) 104, a collimating lens 106, a linear variable filter 108, and a linear sensor 110. including. The illuminator emits a light beam in the test sample 102, and the light beam reflected from or transmitted through the test sample 102 is received and analyzed by the linear sensor 110. The light beam reflected or transmitted from the test sample 102 is received by the linear sensor 110 via the Selfock® lens array 104, the collimating lens 106 and the linear variable filter 108. The effect of effectively widening the nominal passband characteristics of the linear variable filter is eliminated by collimating (ie, reflecting from test sample 102) the light beam entering the linear variable filter 108 and the linear sensor 110. The light beam (ie, reflected or transmitted from test sample 102) is collimated by using a collimating lens 106 placed between the Selfock® lens array 104 and the linear variable filter 108. ..
0013In contrast, the present disclosure proposes a system for providing an analysis of the thickness of a film deposited on a substrate surface by a spectrophotometer. The system of the present disclosure lacks a collimating lens located between a refractive index distributed lens (eg, a Selfock® lens) and a linear variable filter. The present disclosure proposes to maintain a gap between the linear variable filter and the linear sensor, and the size of the gap allows the effect of effectively widening the nominal passband characteristics of the linear variable filter. Small enough to ensure. In one embodiment, the gap maintained between the linear variable filter and the linear sensor is small, for example, on the order of about 1 millimeter. In addition, the angular spread of the light imaged by a refractive index distributed lens (eg, a Selfock® lens) is also kept small, thus effectively widening the nominal passband characteristics of the linear variable filter. The effect is acceptable.
0014In one embodiment, as shown in FIGS. 3A-3C, the detection systems 300 and 310 of the present disclosure include a luminaire 301, respectively. In FIG. 3B, the illuminator 301 is arranged adjacent to the substrate surface 302 so that the illuminator radiates light with a material arranged as a layer containing the thin film 302A arranged on the surface. It is configured. In FIG. 3C, the illuminator is located adjacent to the substrate and is configured to radiate light through the material of film 302A. The detection systems 300 and 310 also include a linear sensor 308 placed adjacent to the substrate surface 302, respectively. The linear sensor 308 may include light reflected (as in FIG. 3B) or transmitted (as in FIG. 3C) by one or more of the substrate, the surface of the substrate and the material formed as film 302A. It can be configured to receive light from the lighting device of. The detection system also has a refractive index distributed lens 304 located in the optical path of the light beam reflected from the substrate surface 302 and a linearly variable lens located in the optical path of the light beam reflected or transmitted through the substrate surface 302. Includes filter 306. The refractive index distribution type lens is optional. The detection system may lack a collimating lens located between the index of refraction distribution lens 304 and the linear variable filter 306, the linear variable filter 306 and the linear sensor 308 being separated by a gap G. The illuminating device 301 is configured to radiate a light beam on the film 302A deposited on the substrate surface 302. The linear sensor 308 is configured to receive a light beam reflected or transmitted through the deposited film 302A on the substrate surface 302. The light beam reflected from the deposited film 302A on the substrate surface 302 is guided to the linear sensor 308 by the refractive index distribution type lens 304. The refractive index distribution type lens 304 is arranged between the substrate surface 302 and the linear variable filter 306. The linear variable filter 306 is a linear sensor 308 and a refractive index distribution type lens.
0015In one embodiment, the substrate surface 302 of the film production system is selected from web substrates such as webs on which various layers of photoconductor belts are deposited during production. For example, the substrate surface 302 of the film manufacturing system can be a substrate supplied in a continuous supply configuration or a roll-to-roll configuration. The substrate may also include any substrate having a surface that receives the toner image, such as a printing system, such as a drum or drum formed before the toner image is transferred to the printed document. It may be a belt). For example, a "tandem" electrophotographic color printing system (eg, US Pat. Nos. 5,278,589; 5,365,074; 6,904,255 and 7,177,585) is usually an intermediate image transfer surface (eg, for example). , Belt or drum) and then multiple printing engines that sequentially transfer each color to the final substrate.
0016Image printing systems generally have two important dimensions: a process (or slow scan) direction and a cross process (or high speed scan) direction. The direction in which the substrate surface (that is, the image-bearing surface) moves is referred to as the process (or low-speed scanning) direction, and the direction in which the plurality of sensors are oriented is referred to as the cross-process (or high-speed scanning) direction. The cross-process (or fast scan) direction is generally perpendicular to the process (or slow scan) direction.
0017In one embodiment, the object deposited on the substrate is a material that can be dried after being deposited as a liquid in the form of a layer containing the thin film 302A. The film 302A can be placed on a web substrate, in which case the web is illuminated by the illuminator 301. In another embodiment, the object deposited on the substrate is, for example, a toner image printed on a document of interest, in which case the document to be scanned is illuminated by the illuminator 301. The surface of the substrate, a belt photoreceptor manufacturing can be a web surface, such as a web to be granulated, each layer of the belt photoreceptor, while moving the web is deposited onto the web. Therefore, the film 302A can be one or more of the layers that make up the photoconductor during production and are deposited on the substrate. Therefore, the substrate can be a web that can contain polymeric materials. Thus, in one embodiment, the film 302A imaged is, for example, a layer of photoconductor drum on the web, in which case the scanned web with the film deposited on it is the illuminator 301. Illuminated by. The substrate can partially or completely transmit a portion of the light emitted by the illuminator, or can partially or completely reflect the light radiated by the illuminator. .. The substrate can be moved in the process direction by a supply device (not shown) of a system that deposits material onto the substrate, such as a printing system. Therefore, the linear sensor 308 can be configured to capture spectral responses in both process, cross-process or process and cross-process directions.
0018The illuminator 301 can be an array of light emitting diodes (LEDs) or any other suitable illuminator (eg, a fluorescent light source). For example, as shown in the illustrated embodiment of FIG. 3B, the illuminator 301 includes two linear LED arrays 301A, 301B, one on each side of the refractive index distributed lens 304 and the linear sensor 308. Can be done. In other embodiments, the illuminator 301 can include a single linear LED array. In yet another embodiment, the LED array on one side and the reflective mirror on the other side may be used in place of the two linear LED arrays. The LED arrays can all be one color, eg white or multiple colors, as described in US Pat. No. 6,975,949. The illuminator arrays 301A and 301B can include a plurality of discrete illuminating elements that are spaced apart in a linear arrangement. Preferably, the illuminating element is an LED that is evenly distributed at regular intervals. In one embodiment, a light guide or lens configuration can be used to transfer light from the LED to the film 302A.
0019The refractive index distribution type lens 304 is arranged between the substrate surface 302 and the linear variable filter 306. In one embodiment, the refractive index distribution lens 304 can be used to vertically image the film 302A deposited on the substrate surface 302 on the linear sensor 308. In one embodiment, the refractive index distributed lens 304 is a Selfoc® lens or other microlens configuration with a predetermined light receiving angle α. The SELFOC® lens is a refractive index distribution type lens composed of a fiber rod having a parabolic refractive index distribution. In one embodiment, the Selfock® lens has a light receiving angle α of about +/- 9 degrees.
0020In one embodiment, the linear variable filter 306 is an optically narrow band coated glass filter. In one embodiment, the center wavelength of the bandpass varies linearly from one end of the linear variable filter to the other. In other embodiments, the center wavelength of the bandpass varies logarithmically along the length of the linear variable filter. In one embodiment, the linear variable filter comprises three different layers, a bandpass coating, a substrate and a blocker coating, configured to allow light reflected from the substrate surface to pass through. In one embodiment, the linear variable filter realizes its spectral performance by a film (eg, bandpass coating) that varies in thickness over its surface.
0021The linear variable filter used in the present disclosure is shown in FIG. As shown in FIG. 2, radiation 200 from a source (eg, a luminaire) that produces a wide and continuous spectrum of frequency is incident on the linear variable filter 202. In one embodiment, the radiation 200 is referred to as broadband radiation. The graph in FIG. 2 shows the spectrum measured using the linear variable filter 202. The graph in FIG. 2 shows the transmittance at a rate along the vertical Y-axis. On the horizontal X-axis, the graph shows wavelengths in nanometers.
0022Suitable linear variable filters of this type used in this disclosure are available from JDS Uniphase (JDSU) in Milpitas, CA. The characteristics or specifications of non-limiting examples of such linear variable filters are disclosed as follows. The spectral range of the linear variable filter is 400 to 700 nanometers. The half width of the linear variable filter is 1.5% or less of the center wavelength. The linear filter dispersion of the linear variable filter is 39.5 nanometers / millimeter, and the linear filter dispersion is in the range of +/- 0.8 nanometers / millimeter. The peak transmittance of a linear variable filter is more than 40% of the bandpass between 400 and 700 nanometers. The out-of-band blocking T of the linear variable filter has an average of 0.1% or less and an absolute value of 0.5% or less for a bandpass of 400 nanometers to 700 nanometers. The total filter length of the linear variable filter is 8.87 mm and the total filter length is in the range of +/- 0.05 mm. The length of the active region of the linear variable filter is nominally 7.6 mm (about 180 pixels) around the component. The total filter width of the linear variable filter is 1.00 mm and the total filter width is in the range of +/- 0.05 mm. The filter thickness of the linear variable filter is 1.1 mm and the filter thickness is in the range of +/- 0.1 mm.
0023Referring again to FIGS. 3A and 3B, in one embodiment, the linear sensor 308 is, for example, a full width array (FWA) image sensor. A full-width array sensor is defined as a sensor that extends the overall width (perpendicular to the direction of movement) of a substantially moving substrate surface. While depositing the film on the web, the full width array sensor is configured to detect any desired portion of the deposited film. The full-width array sensor can include multiple sensors evenly spaced at predetermined intervals in the cross-process (or fast scanning) direction (eg, every 1/600 inch (600 spots per inch)). See, for example, US Pat. No. 6,975,949. It is understood that other linear array sensors such as contact image sensors, CMOS array sensors or CCD array sensors can also be used.
0024The present disclosure contemplates the use of image sensor chips that are significantly smaller than the width of the image-bearing surface. The sensor chip is configured to detect only a portion of the printed image rather than the full width of the printed image. In one embodiment, the detection system 300 of the present disclosure can be a spot or patch spectrophotometer for making spot measurements. Figure 3A shows a spot sensor architecture where the linear sensor is a single chip sensor. In the spot sensor architecture, the chip sensor contains a single row containing M pixels in a row. In the spot sensor architecture, the wedge orientation of the linear variable filter is along the length of the linear sensor or chip sensor, and each pixel of the chip sensor corresponds to a different color of the tinted patch. It is contemplated that the present disclosure can also be used for page width spatial resolution spectral imaging. In such an embodiment, the full-width array sensor comprises N rows, and each row of the full-width array sensor corresponds to each color of the tinted patch. Each row contains M pixels. In the full-width array sensor architecture, the wedge orientation of the linear variable filter is perpendicular to the wedge orientation of the linear variable filter in the spot sensor architecture. In other words, the wedge orientation of the linear variable filter is along the N rows of the full width array sensor.
0025In one embodiment, when used by illumination from a luminaire, the output of the linear sensor exhibits reflectance over the spectrum. In one embodiment, the processor can be provided to calibrate the linear sensor and process the reflectance data detected by the linear sensor. It can be a combination of dedicated hardware, software or dedicated hardware and software such as an ASIC or FPGA.
0026The final result of the system is that the nominal bandpass characteristics of the linear variable filter 306 are effectively widened due to the gap between the linear variable filter 306 and the linear sensor 308. However, as described above, in the present disclosure, when the gap G between the linear variable filter 306 and the linear sensor 308 is sufficiently small and the spread of the angle of light imaged by the refractive index distributed lens 304 is sufficiently small, these We propose that the effect of is acceptable.
0027In one embodiment, as shown in FIGS. 3A-3C, the linear variable filter 306 and the linear sensor 308 are separated by a gap G. In one embodiment, the gap G is kept as small as 1 millimeter, for example, as described in detail in the examples below. In other embodiments, the gap G may be greater than or less than 1 millimeter. In one embodiment, the acceptable gap between the linear variable filter 306 and the linear sensor 308 depends on the desired resolution in the end user's spectral measurement, while the nominal bandpass characteristics of the linear variable filter allowed. Further maintain the effect of spreading effectively. For example, if the first end user requires only half the spectral resolution of the second end user, then up to the zeroth, the first end user has a second between the linear variable filter 306 and the linear sensor 308. Can have twice the gap G of the end user. In one embodiment, the gap is reduced to the point where the residual error induced by the gap is acceptable for the image quality of the system. In other words, the redemption of image quality is negligible for rational gaps. In one embodiment, the gap G between the linear variable filter 306 and the linear sensor 308 is about 1 mm so that the end user can place a cover glass or the like between the linear variable filter and the linear sensor. It is maintained in the order of.
0028With reference to FIGS. 3A and 3B, in one embodiment, as described above, the object to be imaged can be a vapor-deposited film containing a film that forms part of the belt photoconductor or is uniform. A thin-film film 302A that can even be a toner image such as a colored patch. In one embodiment, different parts of the film 302A are imaged on different pixels of the linear sensor 308. In one embodiment, what is placed on each pixel of the linear sensor 308 is a particular portion of the linear variable filter 306 and its spectral bandpass characteristics. Therefore, each pixel of the linear sensor 308 responds to light that is only contained in the bandpass of the adjacent linear variable filter section. Therefore, the aggregate of pixel outputs represents the spectral components of film 302A, including contributions from illumination. In one embodiment, the calibration technique can be used later to separate from the contribution of illumination, thus leaving the very spectral reflectance information of the film 302A.
0029The light beam reflected from the film 302A is imaged on the linear sensor 308 by the refractive index distribution lens 304. When the linear variable filter is placed in close proximity to the linear sensor, the pixel output from the linear sensor corresponds to a light beam wavelength filtered by the linear variable filter. For example, assuming that the spectral range of a linear variable filter is 400 nanometers to 700 nanometers, the output of pixel # 1 of the linear sensor corresponds to a light intensity of 400 nanometers, and the output of pixel #n of the linear sensor is. , Corresponds to 700 nanometers of light, etc.
0030This can lead to mixing problems if the linear variable filter is not preferably located on the image plane or preferably not at the focal point of the lens. If the linear variable filter is not preferably under perfect imaging conditions, there are two situations of interest described in more detail below regarding the mixing of information between the spatial range of the patch of interest and the linear variable filter. ..
0031In the first situation, the light beam reflected from the point of the object surface (for example, the plane on which the film 302A is arranged) included in the permissible angle α of the self-focused refractive index distributed lens 304 is on the linear sensor 308. It is imaged. Preferably, if the linear variable filter 306 is not placed on the linear sensor 308, the various parts of the cone light will pass through slightly different parts of the linear variable filter 306 and thus the linear sensor in the image at that particular point. Pixels focus a light beam that represents a weighted average of light with slightly different bandpass characteristics.
0032In the second situation, there is a light beam from a different object (eg, film 302A) point passing through the nominal bandpass position of the pixel of interest on the linear sensor. Therefore, adjacent pixels on the linear sensor have their spectral components responding to the light beam intended for different pixels on the linear sensor 308. The second situation may not be important if the light beam reflected from the uniformly colored patch is imaged on a linear sensor by a self-focused index lens (eg, a Selfock® lens). Absent.
0033In one embodiment, a reasonable gap may be maintained between the linear variable filter and the linear sensor to maintain the mixed conditions described above, which are small enough to obtain acceptable image quality performance of the system. it can.
0034It is described below that, for example, a small gap G on the order of about 1 millimeter between a linear variable filter and a linear sensor retains the effect of effectively widening the nominal bandpass characteristics of an acceptable linear variable filter. This is an example showing.
0035A typical self-focused index of refraction distribution lens used for imaging (eg, Selfock® lens) suppresses all imaged light to a +/- 9 degree cone. In other words, a self-focused index of refraction distributed lens (eg, a Selfock® lens) has a light receiving angle α of about +/- 9 degrees. In one embodiment, imaging conditions are not necessarily required for the spot sensor, but a spatially resolved page sensor does require imaging.
0036If the nominal distance or gap G between the linear variable filter and the linear sensor is 1 mm, then the "circle of confusion" of the linear variable filter (or equivalent in the linear sensor) is +/- 0.16 mm. In one embodiment, the "circle of confusion" is obtained by calculating the tangent of the light receiving angle of the self-focused index of refraction distribution lens. For example, the tangent of the receptive angle α (eg, about +/- 9 degrees) of a self-focused refractive index distributed lens is +/- 0.16 mm.
0037As disclosed above, the full width at half maximum (HPBW) of a linearly variable filter is less than or equal to 1.5% of the center wavelength (CWL) of the bandpass of the linearly variable filter. As shown in FIG. 2, the central wavelength of the bandpass of the linear variable filter is 550 nm. Since the center wavelength of the bandpass of the linear variable filter is equal to 550 nm, the half width of the linear variable filter is 8.3 nm or less. Also, as mentioned above, the linear filter dispersion of the linear variable filter is 39.5 nanometers / millimeter, in which case the linear filter dispersion is in the range of +/- 0.8 nanometers / millimeter. As such, the circle of confusion forms an additional weighted wavelength spread of +/- 6 nm. This is obtained by calculating the product of the linear filter variance of the linear variable filter (eg, 39.5 nanometers / millimeter) and the circle of confusion in the linear variable filter.
0038Therefore, the effective bandpass of the linear variable filter is slightly widened by the convolution of the full width at half maximum and the angle-weighted confusion circle inherent in the linear variable filter, but it is not unacceptable. Even if the full width at half maximum of the linear variable filter is 16 nanometers, it represents more (700-400) / 16 = 19 different wavelength samples than the sample size of other in-line spectrophotometers. Moreover, since each "different" wavelength sample is composed of multiple pixels at slightly different wavelength shifts, even more spectral information is available for analysis.
0039Therefore, the present disclosure provides a detection system for film deposition film imaging on a linear variable filter and linear sensor assembly, in which case the pixel output of the detection system is the color performance and / or color performance of the image printing system or film manufacturing system. Corresponds to the relative spectral reflectance of the tinted patch that can be subsequently used to determine and influence the deposition parameters (eg, thickness of the vapor deposition film). As mentioned above, the concepts described in this disclosure can be used for both spot measurement and page width spatial resolution spectral imaging. A linear variable filter placed between the linear sensor and the refractive index distribution lens forms a compact, low cost spectrophotometer for in-line measurement of vapor deposition films such as photoconductor or toner image layers, and the measured values. Includes thickness measurements or color output print measurements. One of the advantages of the present disclosure is to provide a spectrophotometer for in-line color output print measurements and / or thickness output measurements, which are far more than other options for in-line spectrophotometers. Has a low cost.
0040FIG. 4 is a simplified elevation view of the basic elements of an image printing system showing the context of the present disclosure. Specifically, a continuous primary color image is deposited on an image-bearing surface (for example, a photoconductor belt), and the deposited superimposed image is directly transferred to an output sheet as a full-color image in one step "image on-on". Image "Xerographic color printer is shown. In one implementation, the iGen3® digital press from Xerox® is available. However, any image printing system, such as a monochrome machine using any technology, a device that prints on a photosensitive substrate, an electrophotographic device having a plurality of photoconductors, or an inkjet-based device, similarly makes good use of the present disclosure. It is understood that it can be done.
0041Specifically, the embodiment of FIG. 4 is an image in which one set for each primary color to be printed and a series of stations are arranged along it, as is generally well known in the technical field of electrophotographic. Includes a supporting surface 425 (eg, a belt photoconductor). For example, a charged corotron 412C, an imaging laser 414C and a developing unit 416C are used to place the cyan separated image on the image-carrying surface 425. For continuous color separation, equivalent elements 412M, 414M, 416M (for magenta), 412Y, 414Y, 416Y (for yellow) and 412K, 414K, 416K (for black) are provided. The continuous color separation is constructed overlaid on the surface of the image-carrying surface 425, after which the combined full-color image is transferred to the output sheet at the transfer station 420. The output sheet then moves through the fuser 430, as is well known in electrophotographic. The printing process can be controlled, for example, by the print controller 410.
0042As is well known in the art of "laser printing", especially by adjusting the modulation of various lasers by the operation of the image-bearing surface 425 and other hardware (such as rotating mirrors not shown). After these regions have been developed by the respective development units 416C, 416M, 416Y, 416K, the laser discharge regions on the image bearing surface 425 form the desired print.
0043In one embodiment, the detection system 300 or detection system 310 of the present disclosure (as shown in FIGS. 3A-3C), for example, at location 452, prints images as they leave the device. It can be placed in an image printing system that is directly monitored. In other embodiments, the detection system 300 or detection system 310 of the present disclosure (as shown in FIGS. 3A-3C) can be placed immediately before or after the transfer station 420 and the toner is image-bearing. The image is transferred to a sheet or medium, eg, at locations 456, 458, to monitor the image directly on the surface or other intermediate transfer member. The detection system 300 or detection system 310 of the present disclosure (as shown in FIGS. 3A-3C) is transferred onto an image-bearing surface 425 (such as locations 456 and 458) or onto an output sheet (eg, location 452). It is possible to measure the toner image formed on the printed image. Not only the illustrated location but also any number of detection devices arranged at any location in the printer may be provided, if necessary.
0044Detection systems located at 452, 456 and 458 provide feedback to controller 454 to take action in response to significant measurements made. The information collected from it is used by the controller 454 and / or the print controller 410 in various ways to assist the printer in operation in real-time feedback loops, offline calibration processes, registration systems, and so on. Although the controller 454 is illustrated as a separate element, it will be appreciated that in some implementations the controller 454 can be part of the print controller 410.
0045FIG. 5 is a simplified elevation view of the basic elements of a film deposition apparatus showing the context of the present disclosure. Specifically, a continuous supply configuration is shown in which a continuous film is deposited on the surface of the substrate (eg, the web while the substrate is moving, and the deposited film is at least a belt photoconductor. Form a part). In one embodiment, the film deposition system can be utilized to produce a photoconductor. Photoreceptors can be manufactured in a roll-to-roll process. Multiple continuous layers are deposited on the substrate in liquid form, allowing them to cure. The thickness of some or all of the multiple layers requires careful monitoring to ensure that the photoconductor functions properly. Thus, in such embodiments, layer thickness measurements can be made by using sensors in place, such as those described in the detection system 300 or detection system 310 of the present disclosure, which can be utilized as position sensors. Can be done. For example, a full-width array imaging sensor modified by a linear variable filter allows the capture of spectral data reflected or transmitted from different layers (ie, film) and is individual along different layers and / or substrates. It is possible to capture the spectrum of the site of. The sensors can be placed in the vicinity of each layer as they are manufactured in a continuous feed or roll-to-roll configuration. Each spectrum capture site can monitor the film thickness by analyzing the spectrum detected by the sensor. The sensor can include multiple capture sites, including up to one site per inch. Therefore, the sensor systems of the present disclosure may be useful for maintaining quality control in the manufacture of photoconductors or anchoring roll devices or any articles manufactured by a layer deposition process.
0046Thus, in one implementation for use of the detection system 300 or detection system 310 of the present disclosure for the manufacture of photoconductors, the embodiment of FIG. 5 is as is generally well known in the art of film deposition. , The surface of which comprises a continuous substrate 525 (eg, web) fed beyond a series of stations 514, 515, one station for each film deposited. For example, a film deposition station 514 is used to place / deposit the first film 526 on the surface of the substrate. For continuous film, an equivalent station such as 515 is provided to place / deposit the second film 527. The continuous film is constructed overlaid on the surface of the substrate 525 to form part of the final device (not shown). The film deposition process can be controlled, for example, by the deposition control device 510.
0047As is well known in the art of continuous feed film deposition or roll-to-roll film deposition, the deposition station 514, by the movement of the substrate 525 and other hardware (pulleys, feedstock rollers, etc., not shown). By adjusting the start-up of 515, the film deposition station ejects the film material onto the surface of the substrate to form the desired film. The right-pointing arrow indicates the movement of the substrate.
0048The detection system 300 or detection system 310 of the present disclosure (as shown in FIGS. 3A-3C) can measure the deposited film on the substrate surface 302. In one embodiment, the detection system 300 or detection system 310 of the present disclosure (as shown in FIGS. 3A-3C) is for directly monitoring the incident surface of a substrate, such as a web substrate, at location 558, for example. Can be placed in a film deposition system. The detection system 300 or detection system 310 of the present disclosure (as shown in FIGS. 3A-3C) can be placed immediately after the vapor deposition system station 514, in which case the color and / of the first film 526. Alternatively, parameters such as thickness can be analyzed at location 556, for example. The detection system 300 or detection system 310 of the present disclosure (as shown in FIGS. 3A-3C) can be placed immediately after the vapor deposition system station 515, in which case the color and / of the second film 527. Alternatively, parameters such as thickness can be analyzed at location 552, for example. Any number of detection systems, such as detection systems 300 and / or 310, may be provided at any location in the deposition system as needed, as well as at the locations shown.
0049Detection systems 300 or 310 at locations 552, 556 and 558 reflect from at least one of the substrate and / or layers deposited on the substrate as measured by the detector of detection system 300 or 310, respectively. It provides feedback to the controller 510 to take action in response to measurements such as spectral measurements of light that has passed or passed through it. The information collected from it is used by controller 510, which can control the deposition stations 514 and 515 in various ways to assist the operation of the deposition system, such as real-time feedback loops, offline calibration processes, registration systems, etc. Will be done. The controller 510 can include an onboard controller (not shown), or the controller 510 and the corresponding controller (not shown) can be separate elements. Therefore, one embodiment of the present disclosure is a method of operating the implementation of FIG. The method can provide scanning of layers deposited on a substrate using the detection system 300 disclosed above. The scanning speed can be defined by the scanning time, and the time between the emission of the light beam and the determination of the film thickness based on the spectral reflectance of the film received from the linear sensor defines the scanning time. In the example, the scan time can be a rate of about 90 μs or less per scan. Thus, the operation of the substrate (indicated by the arrows) can be fast because the measurements are taken in-line as the layers are deposited on the substrate and because of the fast scanning time. The thickness determined / measured based on the spectral reflectance collected by the detection system 300 or 310 is compared with a predetermined thickness value stored in a memory communicating with the processor, such as by a processor executing software instructions. Can be done. If the difference between the determined / measured thickness and the predetermined thickness value is greater than the predetermined allowable value, the controller determines the substrate feed rate, deposition time, deposition amount (ie, the material deposited on the substrate). Amount) and so on
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Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
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| JP2004247113A | Cites | Japan | Y | Search report | 1-13 |
| JP2008186815A | Cites | Japan | Y | Search report | 1-13 |
| JP2009047544A | Cites | Japan | Y | Search report | 1-13 |
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| US2013095577A1 | Cites | United States of America | A | Search report | – |
| JPH0292898A | Cites | Japan | Y | Search report | 1-13 |
13 members in 6 offices
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|---|---|---|---|
| DE102016210367A1 | Germany | A1 | |
| US2016370174A1 | United States of America | A1 | |
| CN106257234A | China | A | |
| KR20160150004A | Republic of Korea | A | |
| JP2017009586AThis record | Japan | A | |
| US9702689B2 | United States of America | B2 | |
| US2017241771A1 | United States of America | A1 | |
| RU2016122191A | Russian Federation | A | |
| US9976845B2 | United States of America | B2 | |
| CN106257234B | China | B | |
| RU2016122191A3 | Russian Federation | A3 | |
| RU2717384C2 | Russian Federation | C2 | |
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Numbers
- Publication
- 2017009586
- Application
- 109394
Titles2
- Japanese
- フィルム製造装置におけるリアルタイムのフィルム厚測定のための全幅アレイイメージセンサの使用
- English
- Use of full-width array image sensors for real-time film thickness measurements in filmmaking equipment
Classification
- CPC, 9
- G01B11/06
- G01B11/0683
- G01B11/0616
- G01B11/0633
- G01B11/0691
- G01B9/00
- G01J3/0208
- G01J3/0229
- C23C16/52
- IPC, 6
- G01B11 06
- G01J3 36
- G01J3 26
- G01N21 25
- G02B5 28
- G01J3 50