JP2011237802A

Production method for antireflection laminate

Abstract

Problem to be solved.To provide a production method for an antireflection laminate having low refractive index and excellent mechanical strength where a coating layer of an ionizing radiation curable resin composition containing hollow silica fine particles is formed.

Solution.Silica fine particles are prepared through the following steps: a first step to form colloidal particles comprising a complex oxide; a second step to selectively remove at least some of elements other than silicon and oxygen from the colloidal particles by dissolving and removing using a mineral acid or an organic acid or by contacting with a cation exchange resin to remove by ion exchange; a third step to coat the surface of the colloidal particles with a hydrolyzable organic silicon compound or a polymer of a silicic acid liquid to prepare silica fine particles; and a fourth step to hydrothermally treat the silica fine particles in the range of 50 to 300°C so that the amounts of alkali metal oxide and ammonia contained in the silica fine particles are 10 ppm and 2000 ppm or less, respectively.

JP2011237802A, drawing sheet 1
Sheet 1 of 4

Term

4.6 yearsto projected expiry

Projected expiry 16 May 2031, counted from filing; an application has no term until it is granted.

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  2. Filed
  3. Published
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  5. Projected expiry

17 claims: 3 independent, 14 dependent

  1. 1
    A method for producing an antireflection laminate in which a low-refractive-index layer having a refractive index of at least 1.45 or less is provided on a light-transmitting base material, which comprises an ionizing radiation-curable resin composition and an outer shell layer. Then, a composition for forming a low refractive index layer containing silica fine particles having a porous or hollow inside is prepared, and the composition for forming a low refractive index layer is applied onto a light-transmitting substrate. After drying, it is cured by irradiation with ionizing radiation and / or heating, and the silica fine particles are subjected to the following steps, that is, the first step:alkali of silica raw material and inorganic oxide raw material other than silica. A step of preparing an aqueous solution individually or preparing a mixed aqueous solution of both to form colloidal particles composed of a composite oxide. Second step: At least a part of elements other than silicon and oxygen from the colloidal particles. Is selectively removed by dissolving and removing the particles with a mineral acid or an organic acid, or by contacting the particles with a cation exchange resin and removing the particles by ion exchange. Third step: A hydrolyzable organic silicon compound or a silicic acid solution is added to the colloidal particles made of the composite oxide from which some of the elements have been removed, and the surface of the colloidal particles is surfaced with the hydrolyzable organic silicon compound or. Step of preparing silica fine particles by coating with a polymer of silicic acid solution, 4th step: The silica fine particles are hydrothermally treated in the range of 50 to 300 ° C, and alkali metal oxide and ammonia contained in the silica fine particles are obtained. A method, which is prepared through each step of setting the amount of the particles to 10 ppm and 2000 ppm or less, respectively. 光透過性基材上に、少なくとも屈折率が1.45以下の低屈折率層が設けられてなる反射防止積層体を製造する方法であって、 電離放射線硬化型樹脂組成物と、外殻層を有し、内部が多孔質または空洞であるシリカ微粒子とを含んでなる低屈折率層形成用組成物を調製し、 前記低屈折率層形成用組成物を、光透過性基材上に塗布し、乾燥した後、電離放射線の照射および/または加熱することにより硬化させる、ことを含んでなり、 前記シリカ微粒子が、下記の工程、即ち 第1工程:シリカ原料およびシリカ以外の無機酸化物原料のアルカリ水溶液を個別に調製するか、または、両者の混合水溶液を調製して、複合酸化物からなるコロイド粒子を形成する工程、 第2工程:前記コロイド粒子から、珪素と酸素以外の元素の少なくとも一部を、鉱酸もしくは有機酸を用いて溶解除去するか、または、陽イオン交換樹脂と接触させてイオン交換除去することにより、選択的に除去する工程、 第3工程:前記一部の元素が除去された複合酸化物からなるコロイド粒子に、加水分解性の有機ケイ素化合物またはケイ酸液を加えて、前記コロイド粒子の表面を加水分解性有機ケイ素化合物またはケイ酸液の重合物で被覆してシリカ微粒子を調製する工程、 第4工程:前記シリカ微粒子を50~300°Cの範囲で水熱処理して、シリカ微粒子中に含まれるアルカリ金属酸化物およびアンモニアの量を、それぞれ10ppmおよび2000ppm以下とする工程、の各工程を経て調製されるものであることを特徴とする、方法。
  2. 10
    Any of claims 1 to 9, wherein the silica fine particles are contained in the composition for forming a low refractive index layer by 70 to 250 parts by weight with respect to 100 parts by weight of the ionizing radiation curable resin composition. The method described in item 1. 前記低屈折率層形成用組成物中に、前記シリカ微粒子が、前記電離放射線硬化型樹脂組成物100重量部に対して、70~250重量部含まれてなる、請求項1~9のいずれか1項に記載の方法。
  3. 11
    Claims 1 to 10 wherein the composition for forming a low refractive index layer contains a fluorine-based and / or silicon-based compound having compatibility with any of the ionizing radiation curable composition and the silica fine particles. The method described in any one of the above. 前記低屈折率層形成用組成物が、前記電離放射線硬化型組成物および前記シリカ微粒子の何れに対しても相溶性を有するフッ素系および/またはケイ素系化合物を含んでなる、請求項1~10のいずれか1項に記載の方法。