Coating liquid for pattern formed body

The present invention relates to a coating liquid for a pattern forming body used for forming a pattern forming body having a pattern having different characteristics on the surface, which can be used for various purposes such as a color filter.

Conventionally, various methods for manufacturing a pattern forming body for forming various patterns such as designs, images, characters, and circuits on a base material have been manufactured.

For example, taking printing as an example, a lithographic printing plate used for lithographic printing, which is a kind of printing method, has a lithographic printing plate having a pattern consisting of an oil-based part that receives ink and a part that does not receive printing ink. It is manufactured, and an image of ink to be printed is formed on an oil-based part using this lithographic plate, and the formed image is transferred to paper or the like for printing. In such printing, a printing plate, which is a pattern forming body, is manufactured by forming patterns such as characters and figures on the printing plate original plate in this way, and is used by mounting it on a printing machine. A large number of original printing plates for offset printing, which is a typical lithographic printing plate, have been proposed.

A printing plate for offset printing is produced by a method of exposing and developing through a mask on which a pattern is drawn on the printing plate original plate, or a method of directly exposing by an electrophotographic method and directly making a plate on the printing plate original plate. can do. In the electrophotographic offset printing plate original plate, a photoconducting layer containing photoconducting particles such as zinc oxide and a binder resin as main components is provided on a conductive base material, and this is used as a photoconductor and exposed by an electrophotographic method. It is produced by a method of obtaining an offset original plate, that is, a pattern-forming body by forming an image having high oil solubility on the surface of the photoconductor and then treating the non-image portion with a xerographic liquid to make the non-image portion hydrophilic. The hydrophilic portion is immersed in water or the like to make it oleophobic, and the printing ink is received by the lipophilic image portion and transferred to paper or the like. However, in forming the pattern, various post-exposure treatments such as treatment with a desensitizing liquid are required.

In addition, a method for producing a lithographic printing master plate using a heat mode recording material capable of forming a pattern consisting of a portion having high receptivity to ink and a portion having ink repellency by laser irradiation has also been proposed. There is. The heat mode recording material does not require a process such as development, and has a feature that a printing plate can be manufactured simply by forming an image with a laser beam. However, the intensity of the laser is adjusted and the quality is altered by the laser. There were problems in the treatment of residues such as solid substances and printing resistance.

Further, as a method of forming a high-definition pattern, a pattern exposure is performed on a photoresist layer coated on a substrate, and after the exposure, the photoresist is developed and further etched, or a substance having functionality in the photoresist. There is known a method for producing a pattern-forming body by photolithography, such as directly forming a target pattern by exposure to a photoresist.

The formation of high-definition patterns by photolithography is used for the formation of colored patterns for color filters used in liquid crystal display devices, the formation of microlenses, the manufacture of fine electric circuit boards, the manufacture of chrome masks used for pattern exposure, etc. However, some of these methods have problems such as the need to treat waste liquid because it is necessary to use a photoresist and to develop or etch with a liquid developer after exposure. Further, when a functional substance is used as the photoresist, there is a problem that it is deteriorated by an alkaline solution or the like used at the time of development.

High-definition patterns such as color filters are also formed by printing or the like, but the patterns formed by printing have problems such as position accuracy, and it is difficult to form high-precision patterns. ..

Therefore, a layer is formed on the base material using a coating liquid for forming a characteristic change pattern containing a photocatalyst and a material whose characteristics change due to the action of the photocatalyst accompanying energy irradiation, and the layer is exposed in a pattern. , A method for producing a pattern-forming body that forms a pattern having changed characteristics has been studied by the present inventors (Patent Document 1). According to this method, it is possible to easily form a functional portion such as a colored layer by utilizing the characteristics of the characteristic changing layer. The coating liquid for forming a characteristic change pattern used in such an invention is usually applied by a spin coating method, and has quick-drying property from the viewpoint of production efficiency and the like. Therefore, when this coating liquid for forming a characteristic change pattern is applied by, for example, a die coating method or a bead coating method, the tip of the head becomes dry and clogged, or the dry portion peels off and falls on the coating film. , There was a problem that a uniform coating film could not be formed.

<patcit num="1"><text>Japanese Unexamined Patent Publication No. 11-344804</text></patcit>

<p> Therefore, it is desired to provide a coating liquid for a pattern forming body, which is used in the production of a pattern forming body in which patterns having different characteristics are efficiently formed and can be applied by, for example, a die coating method or a bead coating method. There is.</p>

<p> The present invention provides a coating liquid for a pattern-forming body, which comprises a photocatalyst, a drying inhibitor, and a property-imparting agent.</p><p> According to the present invention, since the drying inhibitor is contained in the coating liquid for the pattern-forming body, it is possible to adjust the drying speed of the coating liquid for the pattern-forming body. As a result, even when the coating liquid for the pattern forming body is applied by, for example, the die coating method or the bead coating method, it is possible to prevent the head from being clogged due to the drying of the coating liquid for the pattern forming body, and the head is uniformly formed. Layers can be formed. Further, since the coating liquid for a pattern-forming body of the present invention contains a photocatalyst and a property-imparting agent, the coating liquid for a pattern-forming body is applied to form a layer, and energy is formed in a pattern. By irradiating, a pattern-forming body having a pattern in which the property-imparting agent is decomposed or modified by the action of a photocatalyst and the property is changed can be obtained.</p><p> In the above invention, it is preferable to contain metal fine particles. Thereby, for example, even when the sensitivity of the photocatalyst is lowered by the drying inhibitor or the like, the sensitivity of the photocatalyst can be improved, and the sensitivity of the photocatalyst of the layer coated with the coating liquid for the pattern-forming body can be improved. This is because it can be made good.</p><p> Further, in the above invention, it is preferable that the drying inhibitor is a solvent having a vapor pressure of 10 mmHg or less at 20 ° C. By using such a solvent, it is possible to adjust the drying of the coating liquid for the pattern-forming body.</p><p> Further, in the above invention, the content of the solvent in the coating liquid for the pattern-forming body is preferably in the range of 1% by weight to 60% by weight. If it is less than the above range, the solvent cannot exert its effect as a drying inhibitor, and if it is more than the above range, the coating liquid for the pattern forming body is poorly dried and the coating film performance is poor. This is because it will be inferior.</p><p> At this time, it is preferable that the solvent has at least one of an ether bond and a secondary alcohol in the molecular structure. By using such a solvent, it becomes possible to unevenly distribute the property-imparting agent on the surface of the layer coated with the coating liquid for the pattern-forming body, and the difference in properties when energy is applied to this layer is large. This is because it is possible to make it.</p><p> Further, in the above invention, the solvent is one or 2 selected from diethylene glycol monoethyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, and propylene glycol monobutyl ether. It is preferable to use a substance of more than a seed. This is because such a solvent can adjust the drying speed of the coating liquid for the pattern-forming body.</p><p> In the above invention, the property-imparting agent is preferably an organopolysiloxane. As a result, the layer coated with the coating liquid for the pattern-forming body can be made into a layer whose characteristics change due to the action of the photocatalyst accompanying energy irradiation, and the property-imparting agent functions as a binder. Because it can also be done.</p><p> In this case, the organopolysiloxane is Y_nSiX_(4-n)(Here, Y is an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group, a chloroalkyl group, an isocyanate group, or an epoxy group, or an organic group containing these, and X is an alkoxyl group or a halogen. . N is an integer from 0 to 3.) It is preferably an organopolysiloxane which is a hydrolyzed condensate or co-hydrolyzed condensate of one or more of the silicon compounds represented by). This is because by using such an organopolysiloxane, it is possible to make a large difference in the characteristics as described above between the layers coated with the coating liquid for the pattern-forming body.</p><p> Further, in the above invention, the property-imparting agent may be a liquid-repellent agent that has liquid repellency and is decomposed or modified by the action of a photocatalyst associated with energy irradiation. As a result, in the layer coated with the coating liquid for the pattern-forming body, the region not irradiated with energy can be designated as a liquid-repellent region, and the region irradiated with energy can be designated as a liquid-based region. ..</p><p> The present invention also comprises a coating liquid preparation step of mixing a photocatalyst, a drying inhibitor, and a property-imparting agent to prepare a coating liquid for a pattern-forming body, and coating for the pattern-forming body on a substrate. The coating liquid coating step of applying the liquid, the drying step of drying the coating liquid for the pattern-forming body applied by the coating liquid coating step to form the characteristic change layer, and irradiating the characteristic change layer with energy. The present invention provides a method for producing a pattern-forming body, which comprises a characteristic change pattern forming step of forming a characteristic change pattern in which the characteristics of the characteristic change layer are changed.</p><p> According to the present invention, since the coating liquid for the pattern-forming body prepared by the coating liquid preparation step contains the drying inhibitor, the drying speed of the coating liquid for the pattern-forming body is adjusted. Can be done. As a result, the range of choice of the coating apparatus used in the coating liquid coating step is widened, and a pattern forming body that can be used for various purposes can be manufactured.</p><p> Furthermore, the present invention is characterized by having a functional portion forming step of forming a functional portion on the characteristic change pattern of the pattern forming body manufactured by the manufacturing method of the pattern forming body. Providing a manufacturing method for.</p><p> According to the present invention, by using the pattern forming body, the functional portion forming step can be easily performed by utilizing the difference in the characteristics of the characteristic changing layer, and a high-definition functional portion is formed. The functional element can be manufactured by a simple process.</p><p> The present invention provides a method for manufacturing a color filter, characterized in that the step for forming a functional portion in the method for manufacturing a functional element is a step for forming a pixel portion.</p><p> According to the present invention, the pixel portion can be easily formed by using the characteristic change pattern, for example, by an inkjet method or the like, so that a color filter can be efficiently manufactured.</p><p> The present invention provides a method for manufacturing a conductive pattern, characterized in that the step for forming a functional portion in the method for manufacturing a functional element is a step for forming a metal wiring.</p><p> According to the present invention, it is possible to form a high-definition metal wiring in a desired pattern by, for example, an electrolytic jet method or the like by utilizing the difference in the characteristics of the characteristic change layer, so that high-quality conductivity is obtained. The pattern can be manufactured.</p><p> The present invention is characterized in that the functional portion forming step of the method for manufacturing a functional element is a step of forming an organic electroluminescent (hereinafter, also referred to as organic EL) layer. Provide a method.</p><p> According to the present invention, since the organic EL layer can be formed in a high-definition pattern by utilizing the difference in the characteristics of the characteristic changing layer, a high-quality organic EL element can be manufactured.</p><p> Further, the present invention is a method for producing a base material for a biochip, wherein the functional portion forming step of the method for producing a functional element is a step of forming a functional portion having adhesion to a biological substance. I will provide a.</p><p> According to the present invention, it is possible to form a functional portion having adhesion to a biological substance in a high-definition pattern by utilizing the difference in characteristics of the characteristic change layer, and thus a high-quality biochip group. The material can be manufactured.</p>

<p> According to the present invention, since the above-mentioned drying inhibitor is contained in the coating liquid for the pattern-forming body, the coating liquid for the pattern-forming body can be coated even when the coating is applied by, for example, a die coating method or a bead coating method. It is possible to prevent clogging of the head due to drying and to form a uniform layer. Further, by applying this coating liquid for a pattern-forming body to form a layer and irradiating energy in a pattern, a pattern-forming body having a pattern in which the property-imparting agent is decomposed or modified by the action of a photocatalyst is obtained. It has the effect of being able to do it.</p>

The present invention is a coating liquid for a pattern forming body used for producing a pattern forming body having a pattern having different characteristics on the surface, which can be used for various purposes including a color filter, and a coating liquid for the pattern forming body. The present invention relates to a method for producing a pattern-forming body using. Each will be described below.

A. Coating liquid for pattern-forming body First, the coating liquid for pattern-forming body of the present invention will be described. The coating liquid for a pattern-forming body of the present invention contains a photocatalyst, a drying inhibitor, and a property-imparting agent.

The coating liquid for a pattern-forming body of the present invention contains the photocatalyst and the property-imparting agent, and by irradiating the layer coated with the coating liquid for the pattern-forming body with energy, the property-imparting agent Can be a pattern-forming body having a pattern in which the properties are changed by being decomposed or modified by the action of a photocatalyst. In the present invention, since the drying inhibitor is contained in such a coating liquid for a pattern-forming body, it is possible to adjust the drying speed of the coating liquid for a pattern-forming body. As a result, for example, even when the coating liquid for the pattern forming body is applied by the bead coating method, the die coating method, or the like, the coating liquid for the pattern forming body is dried and the slit of the head is clogged or dried. It is possible to prevent peeling and falling onto the coating film, and it is possible to produce a high-quality pattern-forming body. Further, since the range of selection of the device or the like used when applying the coating liquid for the pattern forming body is widened, the pattern forming body as described above can be used for various purposes. Hereinafter, each configuration of the coating liquid for the pattern-forming body of the present invention will be described in detail.

1. Drying inhibitor First, the drying inhibitor used in the coating liquid for a pattern-forming body of the present invention will be described. As the drying inhibitor used in the coating liquid for the pattern-forming body of the present invention, for example, the drying speed of the coating liquid for the pattern-forming body is suppressed by suppressing volatilization of the solvent contained in the coating liquid for the pattern-forming body. It is not particularly limited as long as it adjusts.

Examples of such a drying inhibitor include a solvent having a low vapor pressure, a surfactant that exudes to the surface when a coating liquid for a pattern-forming body is applied, and suppresses the drying of the solvent.

For example, when the drying inhibitor is a solvent, the drying inhibitor is used by partially replacing, completely replacing, or adding to the solvent usually used in the pattern forming coating liquid, and the drying inhibitor is surface active. If it is an agent, it will be added and used. In the present invention, as such a drying inhibitor, a tack free time of 5 minutes or more when a coating liquid for a pattern-forming body is applied on a glass substrate at 20 ° C. with a wet film thickness of 10 μm. Is preferably used. By using a drying inhibitor capable of drying the pattern-forming body coating solution in this way, for example, the pattern-forming body coating solution can also be applied by a die coating method, a bead coating method, or the like. Because it can be done.

Here, in the present invention, it is preferable to use a solvent having a low vapor pressure as the drying inhibitor among the above. The vapor pressure of such a solvent is preferably a solvent having a vapor pressure at 20 ° C. of 10 mmHg or less, particularly 5 mmHg or less, particularly 1 mmHg or less. Further, the lower limit of the vapor pressure of such a solvent varies depending on the type of solvent and the like, but is usually about 0.01 mmHg. This is because the drying speed of the coating liquid for the pattern-forming body can be adjusted by using a solvent having such a vapor pressure. When two or more kinds of solvents are mixed and used as a drying inhibitor in the coating liquid for a pattern forming body, the vapor pressure of each solvent may be within the above range. preferable.

Further, in the present invention, it is particularly preferable that such a solvent has an ether bond and / or a secondary alcohol in the molecular structure. That is, it is preferable to have an ether bond or a secondary alcohol structure in the molecular structure of the solvent, and it is particularly preferable to have an ether bond and a secondary alcohol structure. By using a solvent having such a structure, the property-imparting agent described later is likely to be unevenly distributed on the surface of the layer formed by applying the coating liquid for the pattern-forming body. As a result, when the layer coated with the coating liquid for the pattern-forming body is irradiated with energy, the difference in characteristics between the energy-irradiated region and the non-energy-irradiated region can be made large.

As such a solvent, specifically, one or two selected from diethylene glycol monoethyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, and propylene glycol monobutyl ether. The above substances can be used, and among them, diethylene glycol monoethyl ether and diethylene glycol monomethyl ether are preferably used.

Further, in the present invention, such a solvent is contained in the coating liquid for the pattern forming body in the range of 1% by weight to 60% by weight, particularly 5% by weight to 45% by weight, particularly 10% by weight to 35% by weight. It is preferable to add it. This is because when the addition amount is smaller than the above range, it becomes difficult to adjust the drying speed or the like of the solvent in the coating liquid for the pattern forming body, and when the addition amount is larger than the above range, it becomes difficult. This is because the coating liquid for the pattern-forming body dries poorly, and the performance of the coating film may be inferior.

2. Photocatalyst Next, the photocatalyst used in the present invention will be described. The photocatalyst used in the present invention is not particularly limited as long as it can be excited by energy irradiation to decompose or modify the property-imparting agent described later. The mechanism of action of a photocatalyst typified by titanium dioxide as described later is not always clear, but carriers generated by irradiation with light react directly with nearby compounds, or in the presence of oxygen and water. It is believed that the generated reactive oxygen species change the chemical structure of organic matter. In the present invention, it is considered that this carrier acts on the property-imparting agent described later.

The photocatalyst used in the present invention includes, for example, titanium dioxide (TiO) known as a photosemiconductor.₂), Zinc oxide (ZnO), Tin oxide (SnO)₂), Strontium titanate (SrTiO)₃), Tungsten trioxide (WO₃), Bismuth oxide (Bi₂O₃), And iron oxide (Fe)₂O₃), And one or a mixture of two or more can be used by selecting from these.

In the present invention, titanium dioxide is particularly preferably used because it has a high bandgap energy, is chemically stable, is not toxic, and is easily available. Titanium dioxide includes anatase type and rutile type, both of which can be used in the present invention, but anatase type titanium dioxide is preferable. The anatase-type titanium dioxide has an excitation wavelength of 380 nm or less.

Examples of such anatase-type titanium dioxide include hydrochloric acid-freezing-type anatase-type titaniasol (STS-02 (average particle size 7 nm) manufactured by Ishihara Sangyo Co., Ltd., ST-K01 manufactured by Ishihara Sangyo Co., Ltd.), and nitrate solution. Glue-type anatase-type titania sol (TA-15 manufactured by Nissan Chemical Co., Ltd. (average particle size 12 nm)) and the like can be mentioned. The smaller the particle size of the photocatalyst, the more effectively the photocatalytic reaction occurs. Therefore, the average particle size is preferably 50 nm or less, and it is particularly preferable to use a photocatalyst of 20 nm or less.

Further, as the titanium oxide, a visible light responsive type may be used. The visible light responsive titanium oxide is also excited by the energy of visible light, and examples of such a visible light responsive method include a method of nitriding titanium oxide.

Titanium oxide (TiO₂) Is titanium oxide (TiO) by nitriding.₂), A new energy level is formed inside the bandgap, narrowing the bandgap. As a result, it is usually titanium oxide (TiO₂) Has an excitation wavelength of 380 nm, but it can also be excited by visible light having a wavelength longer than that excitation wavelength. As a result, the wavelength of the visible light region of energy irradiation by various light sources is also titanium oxide (TiO).₂), It is possible to further increase the sensitivity of titanium oxide.

Here, the nitriding treatment of titanium oxide referred to in the present invention is titanium oxide (TiO).₂) Crystals are partially replaced with nitrogen atoms, and titanium oxide (TiO)₂) Doping nitrogen atoms between crystal lattices, or titanium oxide (TiO)₂) Refers to the process of arranging nitrogen atoms at the grain boundaries of polycrystalline aggregates of crystals.

Titanium oxide (TiO₂The nitriding treatment method of) is not particularly limited. For example, fine particles of crystalline titanium oxide are doped with nitrogen by heat treatment at 700 ° C. in an ammonia atmosphere, and the nitrogen-doped fine particles and inorganic particles are doped with nitrogen. Examples thereof include a method of preparing a dispersion using a binder, a solvent, or the like.

Such a photocatalyst is preferably contained in the solid content of the coating liquid for a pattern-forming body of the present invention in an amount of 0.01% by weight to 50% by weight, particularly 0.1% by weight to 10% by weight. As a result, when energy is applied to the layer coated with the coating liquid for the pattern-forming body, the property-imparting agent described later can be decomposed or modified, and the properties of the layer can be changed. Is.

3. Property-imparting agent Next, the property-imparting agent used in the coating liquid for the pattern-forming body of the present invention will be described. The property-imparting agent used in the coating liquid for a pattern-forming body of the present invention is, for example, decomposed or decomposed by the action of a photocatalyst accompanying energy irradiation when the coating liquid for a pattern-forming body is applied to form a layer. The type or the like is not particularly limited as long as it is modified or the like to change the characteristics of the layer surface and the characteristics can be changed in this way. For example, it may be a material having a liquid-repellent functional group, and the wettability of the surface may be changed by decomposing or substituting the functional group on the surface by the action of a photocatalyst accompanying energy irradiation. Further, it may be a molecule having a functional group protected by a photosensitive protecting group, which is deprotected by the action of a photocatalyst accompanying energy irradiation and whose adhesiveness to cells changes.

In the present invention, it is preferable that the property-imparting agent is also used as a binder. A binder may be separately contained in the coating liquid for the pattern-forming body of the present invention, but it is not necessary to contain such a binder because the above-mentioned property-imparting agent functions as a binder. .. Further, when a binder is contained, the layer can have a higher strength.

The property-imparting agent that is also used as such a binder is not particularly limited as long as it has a main chain that is not easily deteriorated or decomposed by the action of a photocatalyst, but an organopolysiloxane is particularly used. preferable. This is because the inclusion of organopolysiloxane in the coating liquid for the pattern-forming body makes it possible to form a layer that causes the above-mentioned characteristic changes.

Examples of the organopolysiloxane used in the present invention include (a) an organopolysiloxane that hydrolyzes and polycondenses chloro or alkoxysilane by a sol-gel reaction or the like to exhibit high strength, and (b) water repellency or repellency. Examples thereof include organopolysiloxanes such as organopolysiloxanes in which reactive silicones having excellent oiliness are crosslinked.

In the case of (a) above, the general formula: Y_nSiX_(4-n)(Here, Y is an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group, a chloroalkyl group, an isocyanate group, or an epoxy group, or an organic group containing these, and X is an alkoxyl group, an acetyl group or an organic group. It indicates halogen. N is an integer from 0 to 3), and is preferably an organopolysiloxane which is a hydrolyzate or co-hydrolysis condensate of one or more of the silicon compounds represented by). The alkoxy group represented by X here is preferably a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. Further, the total number of carbon atoms of the organic group represented by Y is preferably in the range of 1 to 20, and more preferably in the range of 5 to 10.

As a result, when a coating liquid for a pattern-forming body is applied to form a layer, for example, when a material having a fluoroalkyl group having a liquid-repellent property is used as Y, the surface is made liquid-repellent by the Y. This is because the Y is decomposed by the action of the photocatalyst accompanying the energy irradiation, and it becomes possible to make the Y liquid-friendly. Further, for example, when a substance having an amino group or the like having adhesiveness to cells is used as Y, the surface can be made to have adhesiveness to cells by the Y, and it is accompanied by energy irradiation. This is because the Y is decomposed by the action of the photocatalyst, and the Y can be made to have no adhesiveness to cells.

Moreover, as the above-mentioned reactive silicone of (b), a compound having a skeleton represented by the following general formula can be mentioned.

<chemistry num="1"><img file="JP2005156739A_D0001.tif" /></chemistry>

However, n is an integer greater than or equal to 2, and R¹, R²Are substituted or unsubstituted alkyl, alkenyl, aryl or cyanoalkyl groups having 1 to 10 carbon atoms, respectively, and 40% or less of the total is vinyl, phenyl, or phenyl halide in terms of molar ratio. Also, R¹, R²However, the one having a methyl group has the smallest surface energy, and is preferable, and the methyl group is preferably 60% or more in terms of molar ratio. Further, the chain end or side chain has at least one or more reactive groups such as hydroxyl groups in the molecular chain.

Further, a stable organosilicon compound that does not undergo a cross-linking reaction such as dimethylpolysiloxane may be mixed with the above-mentioned organopolysiloxane.

It is preferable that such a property-imparting agent is contained in the solid content of the coating liquid for the pattern-forming body in an amount of 0.01% by weight to 50% by weight, particularly 0.1% by weight to 10% by weight.

Here, the property-imparting agent used in the present invention is particularly preferably a liquid-repellent agent having liquid repellency and being decomposed or modified by the action of a photocatalyst accompanying energy irradiation. By using such a liquid-repellent imparting agent, the energy-unirradiated region of the layer coated with the pattern-forming body coating liquid is a liquid-repellent region having liquid repellency and an energy-irradiated region. Can be a lyophilized region in which the repellency-imparting agent is decomposed or modified to have positivity. This makes it possible to easily form a functional portion by utilizing the difference in wettability between the energy-irradiated region and the energy-unirradiated region. Hereinafter, such a liquid repellent imparting agent will be described.

As described above, the liquid-repellent imparting agent used in the present invention is not particularly limited as long as it has liquid-repellent properties and is decomposed or modified by the action of a photocatalyst accompanying energy irradiation. However, for example, when a coating liquid for a pattern forming body is applied to form a layer, the binder may or may not function as a binder as described above. May be good. Further, these may be mixed and used.

Here, having liquid repellency means that when the coating liquid for a pattern-forming body is applied to form a layer, the coating for forming a functional portion is applied to form a functional portion with this layer. It means that the wettability with the working liquid can be made low. Specifically, it is preferable that the contact angle with the coating liquid for forming the functional portion can be 30 ° or more, particularly 40 ° or more, particularly 50 ° or more in the region where the energy is not irradiated. .. If the contact angle with the coating liquid for forming a functional part is small in a region where energy is not irradiated, the liquid repellency is not sufficient and the coating liquid for forming a functional part may remain. Is.

On the other hand, when energy is irradiated, it is preferable that the wettability with the above-mentioned coating liquid for forming a functional portion can be improved. Specifically, it is preferable that the contact angle with the coating liquid for forming the functional portion can be 20 ° or less, particularly 10 ° or less. If the contact angle with the functional part forming coating liquid in the energy-irradiated part is high, the spread of the functional part forming coating liquid in this part may be inferior, and the functional part may be chipped. This is because problems can occur. The contact angle with the coating liquid for forming the functional part referred to here is the coating liquid for forming the functional part with the layer coated with the coating liquid for the pattern forming body, or an inspection liquid having the same surface tension. The contact angle with the above is measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) (30 seconds after dropping a droplet from a microsyringe), and from the result or the result. Was obtained as a graph.

Here, among the liquid-repellent imparting agents used in the present invention, those having no function as a binder have a liquid-repellent functional group, and when a coating liquid for a pattern-forming body is applied. Examples of such surfactants include surfactants that are oriented on the surface and exhibit liquid repellency. Examples of such surfactants include NIKKOL BL, BC, BO, and BB series manufactured by Nikko Chemicals Co., Ltd. Hydrocarbons, Dupont ZONYL FSN, FSO, Asahi Glass Co., Ltd. Surfron S-141, 145, Dainippon Ink and Chemicals Co., Ltd. Megafuck F-141, 144, Neos Co., Ltd. Surfactant F- Examples thereof include fluorine-based or silicone-based nonionic surfactants such as 200, F251, Unidyne DS-401, 402 manufactured by Daikin Industries, Ltd., and Florard FC-170, 176 manufactured by 3M Co., Ltd. Further, a cationic surfactant, an anionic surfactant, and an amphoteric surfactant can also be used.

Such a liquid-repellent imparting agent having no function as a binder is contained in the solid content of the coating liquid for the pattern-forming body in an amount of 0.01% by weight to 10% by weight, particularly 0.1% by weight to 1% by weight. Is preferable.

On the other hand, as the liquid-repellent imparting agent having a function as a binder, the above-mentioned organopolysiloxane or the like can be used. In particular, when an organopolysiloxane having a fluoroalkyl group is used, the layer before energy irradiation can be made particularly highly liquid-repellent. Therefore, when high liquid-repellent property is required, etc. It is preferable to use an organopolysiloxane having these fluoroalkyl groups. Specific examples of such an organopolysiloxane include hydrolyzed condensates of one or more types of fluoroalkylsilanes and co-hydrolyzed condensates, which are generally known as fluorosilane coupling agents. For example, those described in JP-A-2003-195029 can be used.

The liquid-repellent imparting agent having such a function as a binder is contained in the solid content of the coating liquid for the pattern-forming body in an amount of 0.01% by weight to 50% by weight, particularly 0.1% by weight to 10% by weight. Is preferable.

4. Coating liquid for pattern-forming body Next, the coating liquid for pattern-forming body of the present invention will be described. The coating liquid for a pattern-forming body of the present invention is not particularly limited as long as it contains the above-mentioned drying inhibitor, photocatalyst, and property-imparting agent, and is not particularly limited as long as it contains additives, solvents, etc. as necessary. May be contained.

Here, in the present invention, it is particularly preferable that an additive that increases the sensitivity of the photocatalyst is contained. This is because the sensitivity of the photocatalyst may decrease when, for example, a solvent having a low vapor pressure is used as the drying inhibitor, and even in such a case, the sensitivity of the photocatalyst can be improved. This is because it is possible.

Examples of the method for increasing the sensitivity of the photocatalyst include a method of incorporating a metal element in the coating liquid for a pattern-forming body. Examples of such a method include a method of dissolving a salt of a metal element having a lower ionization tendency than iron, a method of containing metal fine particles, and the like.

In the present invention, it is particularly preferable that the method contains metal fine particles. This is because the sensitivity of the photocatalyst can be greatly improved. In this case, depending on the type of metal, the color of the energy-irradiated region of the layer coated with the pattern-forming body coating liquid can be changed, and the energy-irradiated region can be identified. Because it becomes. Further, depending on the content of the metal fine particles and the like, the metal fine particles can also function as a binder when forming a layer.

As such metal fine particles, it is preferable to use a metal having a lower ionization tendency than chromium. For example, gold, silver, copper, platinum, lead, tin, nickel, cobalt, cadmium, iron and the like can be mentioned, and one or a mixture of two or more of these can be used. In the present invention, among the above, gold, platinum, silver, or copper having a low ionization tendency is preferable.

The average particle size of the metal fine particles is preferably in the range of 1 nm to 100 nm, particularly in the range of 5 nm to 50 nm, and particularly preferably in the range of 10 nm to 20 nm. This is because when the particle size is within such a range, the sensitivity of the photocatalyst described above can be further improved. Here, in the present invention, it is preferable that the metal fine particles are added as a metal colloidal liquid in the coating liquid for the pattern-forming body in order to allow the metal fine particles to have such an average particle size. .. This is because the dispersion stability of the metal fine particles can be improved even in the coating liquid for the pattern forming body. When metal fine particles are added as the metal colloidal liquid, the metal fine particles may have an organic component attached to the surface thereof, or the surface thereof may be coated with the organic component. You may.

Further, in the present invention, when the weight% of the photocatalyst contained in the coating liquid for the pattern-forming body is 1, the weight% of the metal fine particles is preferably in the range of 0.0001 to 10. Further, it is preferable that the metal fine particles are contained in the solid content of the coating liquid for the pattern forming body in an amount of 0.001% by weight to 1% by weight. This is because the sensitivity of the photocatalyst can be improved by containing the metal fine particles within such a range.

B. Method for producing a pattern-forming body Next, a method for producing a pattern-forming body of the present invention will be described. The method for producing a pattern-forming body of the present invention includes a coating liquid preparation step of mixing a photocatalyst, a drying inhibitor, and a property-imparting agent to prepare a coating liquid for a pattern-forming body, and the above-mentioned method on a substrate. A coating liquid coating step of applying a coating liquid for a pattern-forming body, a drying step of drying the coating liquid for a pattern-forming body applied by the coating liquid coating step to form a characteristic change layer, and the above-mentioned characteristics. It has a characteristic change pattern forming step of irradiating the changing layer with energy to form a characteristic changing pattern in which the characteristics of the characteristic changing layer are changed.

According to the present invention, since the drying inhibitor is contained in the coating liquid for the pattern-forming body prepared by the coating liquid preparation step, the drying speed of the coating liquid for the pattern-forming body is adjusted. be able to. As a result, even when the coating liquid for the pattern forming body is applied by, for example, the die coating method or the bead coating method, the coating liquid for the pattern forming body dries during the coating, and the slit of the head is clogged, for example. This can be prevented and a uniform layer can be formed. In addition, since the range of choices for the coating liquid coating device and the like is widened, there is an advantage that it is possible to manufacture a pattern-forming body in which patterns having different surface characteristics are easily formed in various modes. Have. Hereinafter, each step of the present invention will be described in detail.

1. Coating liquid preparation step First, the coating liquid preparation step in the method for producing a pattern-forming body of the present invention will be described. The coating liquid preparation step in the present invention is a step of mixing a photocatalyst, a drying inhibitor, and a property-imparting agent to prepare a coating liquid for a pattern-forming body, and these are stably mixed and prepared. If possible, the method and the like are not particularly limited. In addition to the above materials, other additives, solvents, and the like may be added as needed to prepare the material.

Here, in the present invention, it is preferable that the photocatalyst is used in the state of a sol solution, for example, a titanium oxide sol solution or the like. This is because the photocatalyst can be stably dispersed in the coating liquid for the pattern-forming body.

Further, in the present invention, it is particularly preferable that metal fine particles are contained as an additive. As a result, the sensitivity of the photocatalyst can be improved, and even if the drying inhibitor reduces the sensitivity of the photocatalyst, the sensitivity of the formed characteristic change layer can be improved. is there. It is preferable that such metal fine particles are added in the state of a metal colloidal liquid. This is because the metal fine particles are stably dispersed even in the coating liquid for the pattern forming body.

The types and amounts of photocatalysts, drying inhibitors, property-imparting agents, metal fine particles, etc. used in this step are the same as those described in the above-mentioned "A. Coating liquid for pattern-forming body". Therefore, detailed description here will be omitted.

2. Coating Liquid Coating Step Next, the coating liquid coating step in the method for producing the pattern-forming body of the present invention will be described. This step is a step of applying the coating liquid for a pattern-forming body adjusted by the coating liquid adjusting step on the substrate.

The application of the coating liquid for the pattern forming body in this step is not particularly limited as long as it is a method capable of applying the coating liquid for the pattern forming body, but in the present invention, it is particularly spin coating. Examples thereof include a method, a slit coating method, a bead coating method, a spray coating method, a dip coating method, a die coating method, or a method of applying a combination of a slit coating method and a spin coating method. According to the present invention, since the drying inhibitor is contained in the coating liquid for the pattern-forming body, the coating liquid for the pattern-forming body dries when the coating liquid is applied, and the slit of the head is formed. It is possible to prevent clogging and the like, and it is possible to uniformly apply the pattern-forming coating liquid.

Here, the base material used in this step is not particularly limited as long as it is possible to apply the coating liquid for a pattern-forming body to form a characteristic change layer, and the object is not particularly limited. It is appropriately selected depending on the use and type of the pattern forming body. In addition, transparency and flexibility are appropriately selected.

In the present invention, an anchor layer is formed on the base material in order to improve the adhesion between the surface of the base material and the characteristic change layer formed by applying the coating liquid for the pattern-forming body. It may be. Examples of such an anchor layer include silane-based and titanium-based coupling agents. Further, a light-shielding portion, a primer layer, or the like, which will be described later, may be provided on the base material.

3. Drying step Next, the drying step in the method for producing the pattern-forming body of the present invention will be described. The drying step in the present invention is a step of drying the coating liquid for a pattern-forming body applied by the coating liquid coating step described above to form a characteristic change layer.

In this step, the method is not particularly limited as long as it is possible to form a characteristic change layer by drying or curing the pattern-forming coating liquid, for example, a hot plate, an infrared heater, an oven, or the like. Can be done using.

When the metal fine particles are contained in the pattern-forming coating liquid, the pattern-forming coating liquid is particularly within the range of 50 ° C to 400 ° C, especially 100 ° C to 300 ° C. It is preferable to carry out the drying step by heating so as to become. This is because the sensitivity of the photocatalyst can be further improved by the action of the metal fine particles.

Here, the property changing layer formed by this step contains at least the photocatalyst and the property-imparting agent. As a result, by irradiating energy in the characteristic change pattern forming step described later, the characteristic imparting agent is decomposed or modified by the action of the photocatalyst, and a pattern in which the characteristics of the characteristic change layer is changed is formed.

4. Characteristic change pattern forming step Next, the characteristic change pattern forming step in the method for producing the pattern forming body of the present invention will be described. The characteristic change pattern forming step in the method for producing a pattern-forming body of the present invention is a step of forming a characteristic change pattern with changed characteristics on the characteristic change layer by irradiating the characteristic change layer with energy in a pattern. Is.

As shown in FIG. 1A, for example, such a characteristic change pattern can be obtained by irradiating the characteristic change layer 2 formed on the base material 1 with energy 5 using, for example, a photomask 4. As shown in FIG. 1 (b), the characteristic change pattern 3 with changed characteristics can be formed on the characteristic change layer 2 by decomposing or modifying the property-imparting agent in the irradiated region.

Here, the energy irradiation method is not particularly limited as long as it is a method of irradiating energy capable of changing the characteristics of the characteristic change layer. The energy irradiation (exposure) referred to in the present invention is a concept including irradiation of any energy ray capable of changing the characteristics of the characteristic changing layer, and is not limited to irradiation with visible light.

Usually, the wavelength of light used for such energy irradiation is set in the range of 400 nm or less, preferably 380 nm or less. This is because, as described above, the preferred photocatalyst used in the coating liquid for the pattern-forming body is titanium dioxide, and as the energy for activating the photocatalytic action by the titanium dioxide, light having the above-mentioned wavelength is preferable.

Examples of the light source that can be used for such energy irradiation include a mercury lamp, a metal halide lamp, a xenon lamp, an excima lamp, and various other light sources. Further, in addition to the method of performing pattern irradiation through a photomask using a light source as described above, it is also possible to use a method of drawing and irradiating in a pattern using a laser such as excimer or YAG.

The amount of energy to be irradiated at the time of energy irradiation is an amount necessary for changing the characteristics of the characteristic changing layer by the action of the photocatalyst in the characteristic changing layer, that is, necessary for decomposing or modifying the above-mentioned property-imparting agent. Irradiation amount. At this time, by irradiating energy while heating the characteristic change layer, the sensitivity can be further increased, which is preferable in that the characteristic change can be performed efficiently. Specifically, it is preferable to heat within the range of 30 ° C to 80 ° C.

As for the energy irradiation direction in the present invention, when the above-mentioned base material is transparent, pattern energy irradiation via a photomask or laser drawing irradiation may be performed from either the base material side or the characteristic change layer side. .. On the other hand, when the base material is opaque, it is necessary to irradiate energy from the characteristic change layer side, and when, for example, a light-shielding portion as described later is formed on the base material, energy irradiation is performed from the base material side. Need to be done.

5. Others In the present invention, in addition to each of the above steps, other steps may be appropriately provided, for example, those having a step of forming a light-shielding portion, a primer layer, etc. on the base material. It may be.

When a step of forming a light-shielding portion on the base material is provided, the light-shielding portion is provided by irradiating energy from the base material side without using a mask or drawing with a laser in the above-mentioned characteristic change pattern forming step. It is possible to change the characteristics of the surface of the characteristic change layer that has not been applied. Therefore, since it is not necessary to align with a photomask or the like, it is possible to perform a simple process, and since an expensive device required for drawing irradiation is not required, it is advantageous in terms of cost. It has the advantage of.

The position of forming such a light-shielding portion includes a case where a light-shielding portion is formed on a base material and a characteristic change layer is formed on the base material, that is, a case where the light-shielding portion is formed between the base material and the characteristic change layer, and a case where the base material is formed. In some cases, it is formed in a pattern on the surface on the side where the characteristic change layer is not formed.

The method for forming such a light-shielding portion is not particularly limited, and is appropriately selected and used according to the characteristics of the surface on which the light-shielding portion is formed, the shielding property against the required energy, and the like.

For example, it may be formed by forming a metal thin film such as chromium having a thickness of about 1000 to 2000 Å by a sputtering method, a vacuum vapor deposition method, or the like, and patterning the thin film. As this patterning method, a normal patterning method such as sputtering can be used.

Further, a method of forming a layer in which light-shielding particles such as carbon fine particles, metal oxides, inorganic pigments, and organic pigments are contained in the resin binder in a pattern may be used. As the resin binder used, one or a mixture of one or more kinds of resins such as polyimide resin, acrylic resin, epoxy resin, polyacrylamide, polyvinyl alcohol, gelatin, casein and cellulose, photosensitive resin, and O / A W emulsion type resin composition, for example, an emulsion of reactive silicone or the like can be used. The thickness of such a resin light-shielding portion can be set within the range of 0.5 to 10 μm. As a method for patterning such a resin light-shielding portion, a commonly used method such as a photolithography method or a printing method can be used.

Further, when a light-shielding portion is formed between the base material and the light-shielding portion, it is preferable to have a step of forming a primer layer between the characteristic-changing layer and the light-shielding portion. The action and function of this primer layer is not always clear, but by forming the primer layer, it is possible to prevent the decomposition or denaturation of the property-imparting agent from the light-shielding portion and the opening existing between the light-shielding portions. It is considered to exhibit impurities, particularly residues generated when patterning the light-shielding portion, and a function of preventing the diffusion of impurities. Therefore, by forming the primer layer, the property-imparting agent can be decomposed or modified with high sensitivity, and as a result, a high-resolution pattern can be obtained.

In the present invention, the primer layer prevents impurities existing not only in the light-shielding portion but also in the openings formed between the light-shielding portions from affecting the action of the photocatalyst. Therefore, the primer layer includes the openings. It is preferable to form the light-shielding portion over the entire surface.

The primer layer in the present invention is not particularly limited as long as it has a structure in which the primer layer is formed so that the light-shielding portion and the characteristic change layer do not come into contact with each other.

The material constituting the primer layer is not particularly limited, but an inorganic material that is not easily decomposed by the action of a photocatalyst is preferable. Specific examples include amorphous silica. When such amorphous silica is used, the precursor of this amorphous silica is the general formula SiX.₄Indicated by, X is a silicon compound such as a halogen, a methoxy group, an ethoxy group, or an acetyl group, and silanol, which is a hydrolyzate thereof, or a polysiloxane having an average molecular weight of 3000 or less is preferable.

The thickness of the primer layer is preferably formed in the range of 0.001 μm to 1 μm, and particularly preferably in the range of 0.001 μm to 0.1 μm.

C. Manufacturing method of functional element Next, the manufacturing method of the functional element of the present invention will be described. The method for manufacturing a functional element of the present invention includes a functional portion forming step for forming a functional portion on a characteristic change pattern of the pattern forming body formed by the method for manufacturing a pattern forming body.

According to the present invention, since the pattern-forming body is formed with a characteristic change pattern in which the characteristics are changed, the functional portion for easily forming the functional portion by utilizing the difference in the characteristics of the characteristic change pattern. The forming process can be performed.

Here, the functionality means optical (light selective absorption, reflectivity, polarization, light selective transmission, non-linear optics, luminescence such as fluorescence or phosphorescence, photochromic property, etc.), magnetic (hard magnetism, soft magnetism, etc.). , Non-magnetic, permeable, etc.), electrical / electronic (conductive, insulating, piezoelectric, pyroelectric, dielectric, etc.), chemical (adsorption, desorption, catalytic, water-absorbing, ionic conductivity, etc.) , Oxidation-reducing properties, electrochemical properties, electrochromic properties, etc.), mechanical (wear resistance, etc.), thermal (heat transfer properties, heat insulating properties, infrared radiation, etc.), biofunctional (biocompatibility, antithrombotic properties, etc.) ) Means various functions.

As described above, the coating liquid for forming a functional portion used in the process for forming a functional portion in the present invention varies greatly depending on the type of the functional element, the method for forming the functional element, and the like. A composition that is not diluted with a solvent represented by a curable monomer or the like, a liquid composition diluted with a solvent, or the like can be used. Further, as a coating liquid for forming a functional portion, the lower the viscosity, the shorter the pattern can be formed, which is particularly preferable. However, in the case of a liquid composition diluted with a solvent, it is desirable that the solvent has low volatility because the viscosity increases and the surface tension changes due to the volatility of the solvent during pattern formation.

Further, the coating liquid for forming a functional portion used in the present invention may be a functional portion by being arranged by adhering to the above-mentioned characteristic change pattern, or is arranged on the characteristic change pattern. After being treated with a chemical, or after being treated with ultraviolet rays, heat, etc., it may become a functional part. In this case, when the binder of the coating liquid for forming the functional part contains a component that is cured by ultraviolet rays, heat, electron beam, etc., the functional part can be formed quickly by performing the curing treatment. Is preferable.

The functional portion forming step in the present invention is carried out by using means such as a coating means such as dip coating, roll coating, blade coating and spin coating, and a nozzle ejection means including a method using an inkjet, an electric field jet and a dispenser. Is preferable. This is because by using these methods, it is possible to form the functional portion uniformly and with high definition.

Here, in the present invention, among the methods for manufacturing the functional element, in particular, a method for manufacturing a color filter in which the functional part is a pixel part, a method for manufacturing a conductive pattern in which the functional part is a metal wiring, and functionality. It is preferable that the part is a method for manufacturing a base material for a biochip having adhesion to a biological substance, and the functional part is a method for manufacturing an organic EL element having an organic EL layer. This is because the functional portion of these functional elements can be easily formed by utilizing the difference in the characteristics of the pattern-forming body described above.

D. Manufacturing method of color filter The manufacturing method of the color filter of the present invention will be described. In the method for manufacturing a color filter of the present invention, the step of forming a functional portion in the method for manufacturing a functional element is a step of forming a pixel portion.

According to the present invention, when the characteristic change layer in the pattern forming body is, for example, a wettability change layer in which the wettability of the surface changes, a wettability change pattern in which the wettability changes is formed on the wettability change layer. Has been done. Therefore, it is possible to easily form a pixel portion by an inkjet method or the like by utilizing this difference in wettability of the surface, and it is possible to manufacture a color filter having a high-definition pixel portion. The materials and forming methods of each member used in the method for manufacturing the color filter in the present invention are the same as those in the general color filter, and thus the description thereof will be omitted here.

E. Method for manufacturing a conductive pattern Next, a method for manufacturing a conductive pattern of the present invention will be described. In the method for manufacturing a conductive pattern of the present invention, the step of forming a functional portion in the method for manufacturing a functional element is a step of forming a metal wiring.

According to the present invention, a conductive pattern in which high-definition metal wiring is formed is manufactured by applying a metal paste or the like by, for example, an electric field jet method or the like by utilizing the difference in characteristics of the above-mentioned characteristic change pattern. can do.

In the present invention, since the metal wiring is formed on the characteristic change layer, the electrical resistance of the characteristic change layer is 1 × 10.⁸Ω cm ~ 1 × 10¹⁸Ω cm, especially 1 × 10¹²Ω cm ~ 1 × 10¹⁸It is preferably within the range of Ω · cm. This makes it possible to obtain an excellent conductive pattern. Here, the materials, forming methods, and the like of each member used in the method for producing the conductive pattern of the present invention are the same as those in the general conductive pattern, and thus the description thereof will be omitted here.

F. Manufacturing method of organic EL device Next, the manufacturing method of the organic EL device of the present invention will be described. The method for manufacturing an organic EL device of the present invention is characterized in that the step of forming a functional portion in the above-described method for manufacturing a functional device is a step of forming an organic EL layer.

According to the present invention, an organic EL device in which a high-definition organic EL layer is formed can be manufactured by easily painting the organic EL layer or the like by utilizing the difference in the characteristics of the characteristic change pattern. It becomes possible.

Further, in the present invention, it is particularly preferable that the metal fine particles are contained in the characteristic change layer. As a result, for example, even when the characteristic changing layer is formed on the base material on which the first electrode layer is formed on the surface, the characteristic changing layer can pass holes and the like, and the characteristic changing layer can pass through. This is because it is possible to measure conduction between the organic EL layer formed by utilizing the characteristic change pattern of the above and the first electrode layer. The organic EL device of the present invention can be obtained by forming a second electrode layer on the organic EL layer. The materials, forming methods, and the like of each member used in the method for manufacturing an organic EL device of the present invention are the same as those in a general organic EL device, and thus the description thereof will be omitted here.

G. Method for producing a base material for a biochip Next, a method for producing a base material for a biochip in the present invention will be described. The method for producing a base material for a biochip of the present invention is characterized in that the functional portion forming step in the method for producing a functional element described above forms a functional portion having adhesion to a biological substance. .. The functional portion forming step of the present invention can be, for example, a step of adhering a material having adhesiveness to a biological substance on the above-mentioned characteristic change pattern. As a result, it can be used as a base material for a biochip having adhesion to a biological substance in a pattern.

Here, a biochip can be obtained by immobilizing a biological substance on such a base material for a biochip. On the surface of such a biochip, the functional thin film acts as an immobilization layer, on which biological substances such as DNA and proteins are immobilized and used for various purposes.

Such immobilization technology for biological substances can be applied to the immobilization technology that has been actively studied in the research and development of bioreactors in which an enzyme is immobilized on an insoluble carrier. For details on the technical contents, see, for example, Ichiro Chihata, "Immmobilized Enzymes", Kodansha Scientific, 1975, and its references.

An electrical reading method may be used for the biochip, and in such a case, it is necessary to form an electrode on the surface of the base material for the biochip. In this case, the electrode may be formed by the method described in the above-mentioned column of the method for producing a conductive pattern, or may be formed by a general photoresist method or the like.

Here, in the present invention, a molecule having a functional group protected by a photosensitive protecting group is used as a property-imparting agent for the property-changing layer, and the molecule is deprotected by the action of a photocatalyst accompanying energy irradiation to adhere to cells. It is also possible to make a biochip by adhering cells in a pattern having adhesiveness to the cells. The materials, forming methods, and the like of each member used in the method for producing a base material for a biochip in the present invention are the same as those in a general substrate for a biochip, and thus the description thereof will be omitted here.

The present invention is not limited to the above embodiment. The above embodiment is an example, and any one having substantially the same configuration as the technical idea described in the claims of the present invention and exhibiting the same effect and effect is the present invention. It is included in the technical scope of the invention.

Examples and comparative examples are shown below, and the present invention will be described in more detail.

[Example 1]

&lt;Preparation method of coating liquid for pattern forming body&gt; Fluoroalkylsilane (TSL8233 GE Toshiba Silicone) 1.5g, Tetramethoxysilane (TSL8114 GE Toshiba Silicone) 5.0g, and 0.1N Hydrochloride 3g are stirred at room temperature for 24 hours. To prepare a liquid-repellent imparting agent. Next, titania sol (STS-01 manufactured by Ishihara Sangyo) is TiO in a mixed solution of water and isopropanol (weight ratio 1: 1).₂Diluted to a concentration of 0.5 wt%. To 30 g of this diluted solution, 15 g of diethylene glycol monomethyl ether (vapor pressure of 20 ° C, 0.18 mmHg) and 5 g of silver colloidal aqueous dispersion (average particle size of 20 nm, silver solid content: 0.3 wt%) were added as a drying inhibitor, and 10 Stirred for minutes. 0.3 g of a liquid-repellent imparting agent was added to this liquid, and the mixture was stirred for 10 minutes to prepare a coating liquid for a pattern-forming body.

&lt;Method for producing pattern-forming body&gt; When 100 sheets of the coating liquid for the pattern-forming body were continuously applied on the glass substrate with a die coater, the coating was possible without clogging in the head flow path. After that, it was dried at 200 ° C. to form a uniform characteristic change layer with a thickness of 0.15 μm. When the contact angle of this characteristic change layer with water was measured, it was 97 °. Next, an ultra-high pressure mercury lamp (365nm 30mW / cm)²), The contact angle of water became 10 ° or less in 20 seconds.

[Comparative example 1]

A liquid-repellent imparting agent was prepared in the same manner as in Example 1. Next, titania sol (STS-01 manufactured by Ishihara Sangyo) is TiO in a mixed solution of water and isopropanol (weight ratio 1: 1).₂Diluted to a concentration of 0.5 wt%. To 30 g of this diluted solution, 5 g of a silver colloidal aqueous dispersion (average particle size of 20 nm, silver solid content: 0.3 wt%) and 15 g of isopropanol (vapor pressure of 20 ° C, 32 mmHg) were added, and the mixture was stirred for 10 minutes. 0.3 g of a liquid-repellent imparting agent was added to this liquid, and the mixture was stirred for 10 minutes to prepare a coating liquid for a pattern-forming body. When the characteristic change layer was formed on the glass substrate in the same manner as in Example 1, the flow path was clogged and an uneven and non-uniform film was formed on the tenth and subsequent substrates. In addition, a large number of precipitates were observed on this characteristic change layer.

[Example 2]

A liquid-repellent imparting agent was prepared in the same manner as in Example 1. Next, titania sol (STS-01 manufactured by Ishihara Sangyo) is TiO in a mixed solution of water and isopropanol (weight ratio 1: 1).₂Diluted to a concentration of 0.5 wt%. To 10 g of this diluted solution, 35 g of diethylene glycol monomethyl ether (vapor pressure of 20 ° C, 0.18 mmHg) and 5 g of silver colloidal aqueous dispersion (average particle size of 20 nm, silver solid content: 0.3 wt%) were added as a drying inhibitor, and 10 g was added. Stir for minutes. 0.3 g of a liquid-repellent imparting agent was added to this liquid, and the mixture was stirred for 10 minutes to prepare a coating liquid for a pattern-forming body. When the characteristic change layer was formed on the glass substrate in the same manner as in Example 1, a uniform film could be produced. The contact angle of this characteristic change layer with water was measured and found to be 80 °. Next, an ultra-high pressure mercury lamp (365nm 30mW / cm)²), The contact angle with water was 65 ° in 20 seconds, and the contact angle with water was 10 ° or less in 30 seconds.

[Example 3]

A liquid-repellent imparting agent was prepared in the same manner as in Example 1. Next, titania sol (STS-01 manufactured by Ishihara Sangyo) is TiO in a mixed solution of water and isopropanol (weight ratio 1: 1).₂Diluted to a concentration of 0.5 wt%. To 30 g of this diluted solution, 15 g of normal butanol (vapor pressure at 20 ° C, 4.39 mmHg) and 5 g of silver colloidal aqueous dispersion (average particle size of 20 nm, silver solid content: 0.3 wt%) were added as a drying inhibitor for 10 minutes. Stirred. 0.3 g of a liquid-repellent imparting agent was added to this liquid, and the mixture was stirred for 10 minutes to prepare a coating liquid for a pattern-forming body. When the characteristic change layer was formed on the glass substrate in the same manner as in Example 1, a uniform film could be produced. When the contact angle of this characteristic change layer with water was measured, it was 79 °. Next, an ultra-high pressure mercury lamp (365nm 30mW / cm)²), The contact angle with water was 63 ° in 20 seconds, and the contact angle with water was 10 ° or less in 29 seconds.

<figref num="1">It is explanatory drawing which shows an example of the formation method of the characteristic change pattern of the pattern forming body of this invention.</figref>

Code description

1 ... Base material 2 ... Characteristic change layer 3 ... Characteristic change pattern