Lithographic apparatus comprising a positioning device having two object holders

Description: TECHNICAL FIELD [Detailed description of the invention]

Positioning device with two article holders Is the present invention the first position with the guide surface extending parallel to the X direction and parallel to the Y direction? Can be moved to the second position parallel to the X direction and squarely in the Y direction, respectively. , The first article holder and the second article holder that are guided on the guide surface, respectively, and these It is equipped with a moving system that moves the 1st article holder and the 2nd article holder onto the guide surface. It is related to a positioning device. Further, the present invention includes a radiation source, a mask holder, a focusing unit having a main axis, and the like. A lithograph device including a characterization unit and a positioning device, which is the above-mentioned spindle. Parallel to the X direction perpendicular to the line, and in the X direction and in the Y direction perpendicular to the main axis. A guide surface that extends in parallel and a guide surface that is guided on this guide surface, respectively, from the first position to the above At the second position near the focusing unit, parallel to the X direction and parallel to the Y direction, respectively. Movable first base material holder, second base material holder, and first base material holder on the guide surface The positioning device is equipped with a moving system that moves the second base material holder. It is related to a graph device. The types of positioning devices and lithograph devices mentioned in the first paragraph are European. It is known from Pappa Patent Publication No. 0687957. This known lithographic device is half integrated It is used for exposure of semiconductor substrates in the manufacturing process of conductor circuits, so-called It operates according to a step-and-repeat process. This known positioning device The placement moves the semiconductor substrate to the focusing unit and to the characterization unit. Therefore, it is used in this known lithographic device. Of this known positioning device In the first position, the semiconductor base material is loaded on the first article holder or the second article holder, or half. It is a load removal position where the conductor base material can be removed. The second position of this positioning device is focusing The semiconductor substrate on the first article holder or the second article holder via the unit It is an exposure position that can be exposed. , European Patent Publication No. 0687957 By the moving system of the positioning device, which is not described in detail, the first article holder, And the second article holder is from the first position to the second position, and vice versa, from the second position to the first You can move to a position. The 1st article holder is in the 2nd position and the 1st article holder The second article holder is in the first position when the semiconductor substrate on the data is being exposed. Therefore, the following semiconductor base material is first loaded on the second article holder. Next, the second article The holder moves from the first position to the characterization position, and at this characterization position, the second article holder The semiconductor substrate on top is characterized by a characterization unit. The second article holder When in the characterized position, the first article holder and the second article holder move closely. .. In this way, the exposure of the semiconductor substrate on the first article holder and the second article hole The characterization of the semiconductor substrate on the data is done at the same time, so this step and The output of equipment based on the repeat principle is high. The drawbacks of this known positioning device and this known lithographic device are described above. Since the first article holder and the second article holder are moved closely in this way, the second article holder Characterizing the semiconductor base material on the article holder and the semiconductor base material on the first article holder It is not possible to perform the exposure of the above independently of each other. As a result, the second article Exposure of the semiconductor substrate on the first article holder until the holder reaches the characterized position Cannot start. An object of the present invention is a first process including a series of first positioning steps of a first article holder. At the same time as the second process, which includes a series of second positioning steps for the second article holder. It can be carried out independently of the second process, and this first process can be carried out first. For 2 article holders, the 2nd process is independent for the 1st article holder at the same time To obtain a positioning device of the type described in the first paragraph that can be carried out. It is in. Another object of the present invention includes a series of first positioning steps of the first base material holder. The characterization process involves an exposure process that includes a series of second positioning steps for the second substrate holder. At the same time, it can be carried out independently and the characterization process can be carried out on the second substrate. The exposure process is carried out independently for the first substrate holder at the same time. It is possible to obtain a lithograph device of the form described in the second paragraph. For this purpose, the positioning device of the present invention includes the first article holder and the second article e. The first moving unit and the second moving unit, which can connect ruda alternately, are connected to each other. The stem is equipped, and the first moving unit is from the first position to the first position and the second position. Move the first article holder and the second article holder to an intermediate position between the positions. The second moving unit moves from the intermediate position to the second position. It is characterized by being suitable for moving the first article holder and the second article holder. To do. As a result of using the first moving unit and the second moving unit, the first article The first process, which includes a series of first positioning steps for the holder, is performed by the first moving unit. And can be carried out in the first position, a series of second positioning work of the second article holder The second process, including the process, is performed by the second mobile unit in the second position, the first process. At the same time, it can be implemented independently. The first process and the second process When completed, the 1st article holder is moved from the 1st position to the middle position by the 1st moving unit. Move the second article holder to the stand and move it from the second position to the middle by the second moving unit. Move to position. In the intermediate position, move the 1st article holder from the 1st moving unit Separate and connect to the 2nd moving unit, and connect the 2nd article holder to the 2nd moving unit. Separate from the knit and connect to the first moving unit. Next, the first article holder The second moving unit moves it from the intermediate position to the second position, and the second article holder Is moved from the intermediate position to the first position by the first moving unit. Next, the first At the location, the first process can be carried out for the second article holder, the same Sometimes, independently, in the second position, the second process is carried out for the first article holder. Can be given. Furthermore, as a result of using the two moving units, each individual The distance that the moving unit must move the article holder is reduced, and therefore The required dimensions of the moving unit are reduced. Furthermore, the movable part of the first moving unit It is necessary to make the structure so that the minute and the movable part of the second moving unit can pass through each other. Therefore, the structure of the moving unit can be made relatively simple. For this purpose, the lithograph device of the present invention is a lithograph device positioning device. The positioning device of the present invention, and each article holder of the positioning device is this lithograph. The base material holder of the device, and the first position of the article holder is the characterization unit. It is characterized in that it is a characterized position that exists close to. The present invention lithograph device As a result of using the invention positioning device, a series of first positioning steps of the first base material holder Including the characterization process in the first position, by the first moving unit of the positioning device The exposure process including a series of second positioning steps of the second base material holder is performed. Same as the first process in the second position by the second moving unit of the placement device Sometimes it can be done independently. 1st process in 1st position, 2nd It can be carried out on the substrate holder, and at the same time, independently, the second process It can be carried out for the first article holder in two positions. In a special embodiment of the positioning device of the present invention, each of the moving units has one X motor. , With two Y motors, the X motor extends parallel to the X direction, part 1 Minutes and the first article holder and second that can move along the first part of this X motor Each of the two Y motors has a second portion that can be alternately connected to the article holder. Along the first part extending parallel to the Y direction and this first part of the associated Y motor The first part of the X motor of each said moving unit has a second part that can move. , Connected to said second part of said two Y motors of the associated mobile unit It is characterized by that. The moving unit associated with the first part of the X motor of each moving unit Since it is connected to the second part of the two Y motors, the X motor with two Y motors A relatively rigid and stable support is obtained, which allows the positioning precision of the moving unit. It has the advantage of increasing the degree. Movement range from the 1st position to the intermediate position of the 1st movement unit The enclosure is limited, and the range of movement from the middle position to the second position of the second moving unit is limited. Therefore, the four Y motors of the two moving units can be arranged in two rows. As a result, the positioning device can be made into a compact and simple structure. Other embodiments of the positioning device of the present invention are parallel to the X direction and flat in the Y direction. Movable in a row and rotated around a rotation axis that extends perpendicular to the X and Y directions. A common balance unit guided to the base of this positioning device so that it can be rolled. The special feature is that the first part of the Y motor of the two moving units is connected to the knit. As a symptom. The first part of the Y motor of the moving unit is connected to the common balance unit. Since they are connected, the reaction force of the X motor and Y motor of the moving unit is the first of the Y motor. Conducted to the balance unit through one part, parallel to the X direction and flat in the Y direction The movement of the balance unit and the balance with respect to the base around the axis of rotation. This reaction force is converted to the rotation of the unit. In this way, the base, the guide surface, And the conduction of reaction forces to the article holder is prevented as much as possible, and therefore the positioning device Positioning accuracy is further improved. Another embodiment of the positioning device of the present invention is guided on the guide surface, and the moving unit To the base part that can be connected to the actuator unit and the actuator unit of the related article holder Therefore, each article holder has an article table that can move with respect to the base portion. It is characterized by that. In this embodiment of the positioning device, by the moving unit, Moved the article table of the article holder over a relatively long distance with relatively low accuracy In addition, the actuator unit keeps the article table at a relatively short distance. Move with relatively high accuracy over separation. In this way, the mobile units are compared It is relatively easy and can be of the usual type, and the actuator unit It is possible to avoid making the dimensions of the tongue as accurate as possible. A special embodiment of the positioning device of the present invention is parallel to the X direction and in the Y direction. In parallel, and in parallel with the Z direction extending perpendicularly to the X direction and the Y direction, each of the above The article table of the article holder is movable with respect to the base portion, and the front The first rotation axis extending parallel to the X direction and the second rotation extending parallel to the Y direction. Each said article hole around the moving axis and the third rotating axis extending parallel to the Z direction. The article table of Daiso is configured to be rotatable with respect to the base portion. To. In this way, the article table can be highly adjustable with respect to the base. Can be done. Next, the present invention will be described in more detail with reference to the accompanying drawings. FIG. 1 graphically shows the lithograph apparatus of the present invention. FIG. 2 shows the first embodiment of the positioning apparatus of the present invention suitable for use in the lithograph apparatus of FIG. It is a schematic plan view of an example. Fig. 3 shows the positioning of Fig. 2 with the two base material holders of the positioning device in the intermediate position. The device is shown. FIG. 4 shows the second embodiment of the positioning apparatus of the present invention suitable for use in the lithograph apparatus of FIG. It is a schematic plan view of an example. The lithograph device of the present invention shown graphically in Fig. 1 is used in the manufacturing process of integrated semiconductor circuits. Used for exposure of semiconductor substrates, this lithographic device is in the vertical Z direction. In parallel order, the positioning device 3, the focusing unit 5, the mask holder 7, and the present invention positioning device 3, and It has a frame 1 that supports the radiation source 9. This lithograph device is an optical lithograph It is a device, the source 9 of which has a light source 11. Mask holder 7 is vertical in the Z direction A support surface 13 extending to the surface is provided, and a mask 15 can be installed on the support surface 13. Ma The desk 13 has a pattern or sub-pattern of an integrated semiconductor circuit. Focusing unit G5 is an imaging system or projection system, and the main light extending parallel to the Z direction. It is equipped with an optical lens system 17 having an academic axis 19, and has an optical reduction such as 4, or 5. Has a small rate. The positioning device 3 includes a first base material holder 21 and the first base material holder. It has the same second base material holder 23 as 21. Base material holders 21 and 23 are respectively It has support surfaces 25 and 27 that extend perpendicular to the Z direction. In the state shown in Fig. 1, the first The semiconductor 29 is on the support surface 25 of the first base material holder 21, and the second semiconductor base material 31 is. It is on the support surface 27 of the second base material holder 23. Further, the positioning device 3 has a guide surface 33. However, this guide surface 33 extends parallel to the horizontal X direction perpendicular to the Z direction. It extends parallel to the horizontal Y direction, which is perpendicular to the X and Z directions. Base material holder 21 and 23 are guided on the guide surface 33, respectively, and the moving system of the positioning device 3 With 35, the substrate holders 21 and 23 are parallel to the X direction and parallel to the Y direction, respectively. It can move on the guide surface 33. In the state shown in FIG. 1, the first base material holder 21 is positioned together with the first semiconductor base material 29. It is in the second position of the determinant 3, and this second position is a lithograph close to the focusing unit 5. It corresponds to the exposure position of the device. At this position, the light beam generated by the light source 11 Guided through mask 15, focused unit 5 onto first semiconductor substrate 29 Focused, or focused, the pattern on the mask 15 is reduced in size. 1 An image is formed on the semiconductor base material 29. The first semiconductor substrate 29 has a large number of individual fields. Eh, the same semiconductor circuit is imaged on these fields. For this purpose, the first semi-lead The field of the body base material 29 is sequentially exposed through the mask 15. For the lithograph device in Figure 1 The exposure process used is the so-called step-and-repeat exposure process. By this process, during exposure of individual fields of the first semiconductor substrate 29, the first semiconductor group The material 29 and the mask 15 are in a fixed position with respect to the focusing unit 5, and this processor After the exposure of the first exposed field, the next field of the first semiconductor base material 29 is focused according to the above. Bring it in place with respect to the unit. That is, the moving system 3 of the positioning device 3 Transfer the first substrate holder 21 parallel to the X direction and / or parallel to the Y direction by 5. Dynamic Let me. This process is repeated many times for each different mask and has a layered structure Complex integrated semiconductor circuits can be manufactured. In the state shown in FIG. 1, the second base material holder 23 is positioned together with the second semiconductor base material 31. It is in the first position of the determinant 3, and this first position is in phase with the characterized position of the lithograph device. I'm right. In the illustrated state, it was completely exposed at the exposure position through the mask 15. The first semiconductor base material is removed from the second base material holder 23, and the semiconductor base material being manufactured It has been transferred to a deposit (not shown). The second semiconductor base material 31 shown in FIG. 1 is the next half. It is a conductor base material, and it is just picked up from the above-mentioned deposit part of the semiconductor base material and the second It has just been placed on the base material holder 23, and after the first semiconductor base material 29, the mass It is a semiconductor base material that needs to be exposed through the 15th. In this characterized position, Risograph device characterization unit 37, which is also supported by frame 1. Therefore, the second semiconductor base material 31 is characterized. The second semiconductor base material 31 is completely characteristic When the first semiconductor base material 29 is completely exposed, together with the second semiconductor base material 31 The second base material holder 23 is moved from the characterized position to the exposed position by the moving system 35. Move and move the 1st base material holder 21 together with the 1st semiconductor base material 29 by the moving system 35. Therefore, it is moved from the exposed position to the characterized position. This characterization unit 37 is, for example , A second semiconductor base material 3 relative to the second base material holder 23, equipped with a measurement system Use this measurement system to measure the position of one individual field. These ranks Since the placement has already been measured at the characterized position, then for focusing unit 5 By measuring the position of the second base material holder 23, the focus is set at the exposure position. The individual fields of the second semiconductor substrate 31 can be positioned with respect to the unit 5. To. In this way, at the exposure position, sequential semi-leading with respect to the focusing unit 5. The time required to position the individual fields of the body substrate is significantly shorter, lithograph The production volume of the equipment is significantly improved. The position of each individual field of the second semiconductor base material 31 is In the characterized position, the position because it must be measured in the characterized position By the mobile system 35 of the deciding device 3, the second base material e together with the second semiconductor base material 31 Make Ruda 23 move step by step. Two separate identical substrate holders 21, 23 As a result of using, the exposure process of the semiconductor substrate at the exposure position is carried out at the same time. , The process of removing the previous semiconductor substrate and the installation of the next semiconductor substrate at the characterized position Place Since the process and the characterization process will be carried out, the output of the lithograph equipment will be further improved. Be good. As shown in FIG. 2, the mobile system 35 of the positioning device 3 is the first mobile unit 3. 9 and 2nd moving unit 41. Base material holders 21 and 23 are static, respectively. It has legs 43, 45 that are aerostatically supported with gas bearings. This leg 43 , 45 guide the relevant substrate holders 21, 23 onto the guide surface 33. Draft The inner surface 33 is the upper surface of the granite block 47 fixed to the frame 1 of the lithograph device. Consists of. Further, the base material holders 21 and 23 are the first joint members 49 and 5, respectively. 1 and 2nd joint members 53 and 55 are provided, and the base material holder 2 is provided by these joint members. 1 and 23 are alternately connected to the joint member 57 of the first moving unit 39, and the second moving uni. It is connected to each of the joint members 59 of the t 41. In the state shown in Fig. 2, the first base material e Luda 21 is connected to the joint member 59 of the second moving unit 41, and the second base material e Luda 23 is coupled to the joint member 57 of the first moving unit 39. instead of, The first base material holder 21 is connected to the joint member 57 of the first moving unit 39, and the second base material is formed. The holder 23 can also be coupled to the joint member 59 of the second moving unit 41. Succession Hand members 49, 51, 53, 55, 57, 59, for example mechanical fittings, or electronic It can be of its own known form, such as a mechanical fitting member. As shown in FIG. 2, the first mobile unit 39 and the second mobile unit 41 are the same. Regular form of liner X motors 61, 63, and two liners, respectively known to themselves. Equipped with Y motors 65, 67, 69 and 71. X motors 61 and 63, respectively The first parts 73, 75 extending parallel to the X direction and the related X motors 61, 63 It has a second part 77, 79 that can move along the first part 73, 75. Also the first Two parts 77, 79 have fitting members 57, 59 of the associated X motors 61, 63 .. The Y motors 65, 67, 69, and 71 extend parallel to the Y direction, respectively. 1st Part 81, 83, 85, 87 and related Y motors 65, 67, 69, 71 One part 81, 83, 85, 87 can move along the second part 89, 91, 93, Equipped with 95. X motor 61 of the first moving unit 39 and two Y motors 65 , 67 are arranged in an H shape with each other, and the first part 73 of the first part 73 of the X motor 61 The end 97 and the second end 99 are the second part 89 and the Y motor of the Y motor 65, respectively. - It is attached to the second part 91 of Ta 67. Similarly, the X mode of the second mobile unit 41 The data 63 and the two Y motors 69 and 71 are arranged in an H shape with each other, and the X The first end 101 and the second end 103 of the first part 75 of the motor 63 are Y, respectively. It is coupled to the second part 93 of the motor 69 and the second part 95 of the Y motor 71. .. In the state shown in FIG. 2, the second base material holder 23 is in the first position, that is, the characterized position. , The characterization process including a series of first positioning steps of the second substrate holder 23 is transferred to the first Performed by dynamic unit 39. At the same time, the first base material holder 21 is in the second position, immediately. The exposure position is in the exposure position and includes a series of second positioning steps of the first base material holder 21. Rothes is performed by the second mobile unit 41. Therefore, the first mobile unit 3 As a result of the use of 9 and the second moving unit 41, the characterization process is the same as the exposure process. Sometimes it can be done independently of the exposure process. 1st base material holder Exposure process for 21 and characterization process for 2nd substrate holder 23 When the above is completed, the first base material holder 21 is exposed by the second moving unit 41. Moved from the position to the intermediate position M'between the exposure position and the characterization position as shown in Fig. 3. Then, the second base material holder 23 is exposed from the characterized position by the first moving unit 39. Move to the intermediate position M "between the optical position and the characterized position. The above intermediate position M', And M , the second joint member 53 of the first base material holder 21 is the second moving unit. The first joint member 5 of the second base material holder 23 is separated from the joint member 59 of the second base material holder 23. 1 is separated from the joint member 57 of the first moving unit 39. Next, as shown in Fig. 3. As described above, the joint member 57 of the first moving unit 39 is replaced with the first joint of the first base material holder 21. The joint member 59 of the second moving unit 41 is connected to the member 49, and the second base material holder 23 is attached. It is connected to the second joint member 55 of. Next, the first base material holder 21 is moved to the first moving unit. Moved from the intermediate position M'to the characterized position by 39, where the first substrate holder 2 1 Lower the base material on top, place the next base material, and characterize it. At the same time, again , Independently, the second base material holder 23 is placed in the middle position by the second moving unit 41. Move from the setting M to the exposure position, where the base material on the second base material holder 23 is exposed. It glows. The first moving unit 39 is in the intermediate position M'from the first position, that is, the characterized position. , And M , suitable for moving both substrate holders 21, 23, second The moving unit 41 has both substrate holders from the intermediate positions M'and M'to the exposed position. twenty one, Suitable for moving 23, each moving unit 39, 41 is a base material holder 21 , 23 will have to move less distance, so move units 39, 4 The required dimension of 1 is also reduced. As shown in Figure 2, move, especially when viewed parallel to the Y direction. The dimensions of Y motors 65, 67, 69, 71 of units 39, 41 are significantly reduced. .. In addition, by using two mobile units 39, 41, the mobile system 35 moving parts, especially X motors 61 and 63, need to be configured to pass through each other As a result, the mobile system 35 can be made into a relatively simple structure. .. 2 X motors 61, 63 and 4 Y motors 65, 67, 69, 71 By arranging the pieces in an H shape, the X motors 61 and 63 are associated with the Y motor 6 5, 67, 59, 71 support relatively rigidly and stably, thereby moving uni It has the advantage of improving the positioning accuracy of the 39 and 41. Move in parallel to the Y direction By limiting the range of movement of the moving units 39 and 41, four Y motors 65 , 67, 69, 71 with two Y motors 65, 69, and the other two Y motors 67 , 71 can be placed in two lines, which allows the positioning device 3 to be co-located. It can be compact and have a simple structure. FIG. 4 shows the position of the second embodiment of the present invention suitable for use in the lithograph apparatus according to the present invention. The placement device 105 is shown. Positioning of the second embodiment in FIGS. 2, 3 and 4 The device 105 has the same reference numerals as those of the positioning device 3 of the first embodiment. It is shown with. After that, the main differences between the positioning device 3 and the positioning device 105 Only explain. The base material holders 21 and 23 of the positioning device 105 are the base portions 107 and 1, respectively. With 09, each base is aerostatically supported by the associated substrate holders 21 and 23. Legs 43, 45, first joint members 49, 51, and second joint members 53, 55 To prepare. Further, the base material holders 21 and 23 of the positioning device 105 are the base material plates, respectively. With bulls 111, 113, each base table has associated base holders 21, 2 It has 3 support surfaces 25 and 27. The base material holders 21 and 23 are shown graphically in FIG. This actuator unit is equipped with the actuator units 115 and 117. The related substrate holders 21 and 23 are related to the substrate tables 111 and 113. It is made movable with respect to the base portions 107 and 109 of the connected base material holders 21 and 23. In this positioning device 105 of the second embodiment of the present invention, each actuator unit is used. Knits 115 and 117 have their own known non-contact Lorenzka power system With this system, with relatively high accuracy, in the direction parallel to the X direction, in the Y direction. Relevant over a relatively short distance in the direction parallel to and in the direction parallel to the Z direction. Base material holders 21 and 23 related base material holders 2 In addition to making it movable with respect to the bases 107 and 109 of 1 and 23, this The system allows the first rotation axis, Y, to extend parallel to the X direction with relatively high accuracy. A second rotation axis extending parallel to the direction and a third rotation axis extending parallel to the Z direction Around, at a relatively small angle, the base material table of the relevant base material holders 21, 23 111, 113 to the base parts 107, 109 of the related base material holders 21, 23 And make it rotatable. In this way, the mobile units 39 and 41 are so-called dense and dense. It constitutes a mobile unit, and the X motors 61, 63 of the mobile units 39, 41, And by Y motors 65, 67, 69, together with substrate tables 111, 113 Material holders 21 and 23 can move over a relatively large distance with relatively low accuracy. Also, the base material tables 111 and 113 are actuated by the mobile units 39 and 41. Base 1 of substrate holders 21 and 23 by user units 115 and 117 Move over a relatively short distance with relatively high accuracy compared to 07 and 109 It can be rotated with relatively high accuracy and at a relatively small angle. this Compare X motors 61, 63, and Y motors 65, 67, 69, 71 in this way It can be simple, ordinary, and inexpensive, and it is accurate and advanced. The required dimensions of the actuator units 115, 117, and therefore the cost Can be limited to as many as possible. Actuator unit as described here By using 115, 117, for focusing unit 5 and for lithograph equipment Highly adjustable substrate tables 111 and 113 for characterization unit 37 Can be As further shown in FIG. 4, the Y mode of the moving units 39 and 41 of the positioning device 105 The first part 81, 83, 85, 87 of data 65, 67, 69, 71 is two moving units It is fixed to the balance unit 119 common to knits 39 and 41. This rose The unit 119 is equipped with a first beam 121 and a second beam 123, and is equipped with a first beam. The room 121 extends almost parallel to the Y direction, and the Y-mo of the first moving unit 39 The first part 81 of the data 65 and the first part 85 of the Y motor 69 of the second moving unit 41 Is fixed to this first beam 121, while the second beam 123 is also in the Y direction. Extending almost parallel, the first part 83 of the Y motor 67 of the first moving unit 39 And the first part 87 of the Y motor 71 of the second moving unit 41 and this second beam 1 It is stuck to 23. By the first lateral beam 125 and the second lateral beam 127, Beams 121 and 12 are connected to each other by connecting the first beam 121 and the second beam 123. 3 and the lateral beams 125 and 127 are arranged in a rectangular shape to support the guide surface 33. The granite block 47 is surrounded by this rectangle. As shown graphically in Figure 4 , Provided on the base 133 of the positioning device 105, parallel to the X direction, Y Balance unit 119 on a separate guide surface 131 that extends parallel to the direction The first beam 121 of the is guided by a static gas bearing 129 and is balanced. The second beam 123 of the knit 119 is guided separately above by the static gas bearing 135. Guided on surface 131. Therefore, the balance unit 119 is parallel to the X direction. Can move in any direction and in a direction parallel to the Y direction, and further parallel to the Z direction. It can rotate around an extending axis of rotation. Parallel to the X direction when operating Actuators of moving units 39, 41 oriented parallel to and / or in the Y direction The reaction forces of the units 115 and 117 are the X motors 61 and 63, and the Y motors 65 and 6. It is transmitted to the balance unit 119 through 7, 69 and 71, parallel to the X direction, And / or X motors 61, 6 of moving units 39, 41 oriented parallel to the Y direction The reaction force of 3 is applied to the balance unit 119 through the Y motors 65, 67, 69 and 71. A moving unit that is transmitted and points parallel to the X direction and / or parallel to the Y direction 3 The reaction force of Y motors 65, 67, 69, 71 of 9, 41 is applied to the balance unit 119. Directly communicated. Balance unit 119 depends on static gas bearings 129, 135 Since it is guided on the separate guide surface 131, the reaction force is parallel to the X direction. A relatively small amount of balance unit 119 in the direction and / or in the direction parallel to the Y direction. Movement and balance unit 119 around the rotation axis extending parallel to the Z direction It is almost completely converted into a relatively slight rotation of. In this way, due to the above reaction force It occurs in the base 133, and the granite block 47 of the lithograph device 105, and And base material The mechanical vibrations conducted to Ludas 21 and 23 and also to the frame 1 of the lithograph device are Since it is prevented as much as possible, the positioning precision of the moving system 35 of the positioning device 105 The degree will be further improved. Instead of the mobile units 39, 41 used in the positioning devices 3, 105 described above. In addition, other types of mobile units can be used in the positioning device of the present invention. .. For example, as an alternative, the moving unit of the positioning device can hold the associated article holder. Equipped with a single linear X motor for moving a long distance and a single linear Y motor, X Lorentz force motor and Y b to move the article table related to -It can be equipped with an actuator that consists simply of a Lenz motor. Further, the present invention is a lithog that performs an exposure process based on the step-and-scan principle. It is about rough equipment. Such a lithograph device is a separate positioning device With this positioning device, for example, in the scanning direction parallel to the X direction, the mask ho Allow Luda to move. Exposure according to step and scan process During the process, the mask and semiconductor substrate are not in a fixed position with respect to the focusing unit. At the same time, it is moving in the scanning direction, so the pattern on the mask is scanned. To. Finally, the positioning device of the present invention is not only used for lithographic devices, Two article tables perform a series of positioning processes simultaneously and independently of each other It can also be used for devices other than the lithograph device that must be used. So As an example of, first of all, processing machines, machine tools, and articles to be machined or processed. Characterize the article holder at the characterization position and then mechanically add at the operating position There are other machines or devices that work or process.