IL264953B
Cleaning formulation for removing residues on surfaces
Abstract
This record has no abstract on file.
Term
No projected expiry on record.
- Priority
- Filed
- Published
- Today
60 members in 8 offices
Priority claims3
| Document | Office | Kind | Date |
|---|---|---|---|
| 201361912697 | United States of America | P | |
| 201461936999 | United States of America | P | |
| 2014068294 | United States of America | W |
Members60
| Document | Office | Kind | |
|---|---|---|---|
| US2015159124A1 | United States of America | A1 | |
| WO2015084921A1 | World Intellectual Property Organization (WIPO) | A1 | |
| TW201527523A | Taiwan Province of China | A | |
| IL245724A0 | Israel | A0 | |
| IL245724D0 | Israel | D0 | |
| KR20160096095A | Republic of Korea | A | |
| CN105873691A | China | A | |
| EP3077129A1 | European Patent Office (EPO) | A1 | |
| EP3104398A1 | European Patent Office (EPO) | A1 | |
| JP2017504190A | Japan | A | |
| US9562211B2 | United States of America | B2 | |
| US2017101608A1 | United States of America | A1 | |
| EP3077129A4 | European Patent Office (EPO) | A4 | |
| TWI609958B | Taiwan Province of China | B | |
| TW201811996A | Taiwan Province of China | A | |
| CN105873691B | China | B | |
| CN108485840A | China | A | |
| TWI653332B | Taiwan Province of China | B | |
| KR101964901B1 | Republic of Korea | B1 | |
| JP6494627B2 | Japan | B2 | |
| KR20190035959A | Republic of Korea | A | |
| US10253282B2 | United States of America | B2 | |
| TW201920641A | Taiwan Province of China | A | |
| JP2019116634A | Japan | A | |
| US2019241845A1 | United States of America | A1 | |
| US2019256807A1 | United States of America | A1 | |
| US10415005B2 | United States of America | B2 | |
| US2020048584A1 | United States of America | A1 | |
| EP3104398B1 | European Patent Office (EPO) | B1 | |
| TWI687515B | Taiwan Province of China | B | |
| KR20200034830A | Republic of Korea | A | |
| US10696933B2 | United States of America | B2 | |
| TW202026413A | Taiwan Province of China | A | |
| EP3719105A1 | European Patent Office (EPO) | A1 | |
| EP3077129B1 | European Patent Office (EPO) | B1 | |
| IL264953A | Israel | A | |
| IL264953BThis record | Israel | B | |
| US2020377829A1 | United States of America | A1 | |
| CN108485840B | China | B | |
| US10927329B2 | United States of America | B2 | |
| JP6856684B2 | Japan | B2 | |
| KR20210088018A | Republic of Korea | A | |
| JP2021102773A | Japan | A | |
| US11286444B2 | United States of America | B2 | |
| US2022145222A1 | United States of America | A1 | |
| US11401487B2 | United States of America | B2 | |
| US2022275313A1 | United States of America | A1 | |
| TWI781379B | Taiwan Province of China | B | |
| JP7171800B2 | Japan | B2 | |
| JP2023014099A | Japan | A | |
| US2023066300A1 | United States of America | A1 | |
| US2023100080A1 | United States of America | A1 | |
| US11618867B2 | United States of America | B2 | |
| US11639487B2 | United States of America | B2 | |
| TW202330893A | Taiwan Province of China | A | |
| KR102573354B1 | Republic of Korea | B1 | |
| KR20230129193A | Republic of Korea | A | |
| EP3719105B1 | European Patent Office (EPO) | B1 | |
| JP7491497B2 | Japan | B2 | |
| TWI862992B | Taiwan Province of China | B |
2 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Patent renewedKB | KB | |
| Patent grantedGrantedFF | FF |
Numbers
- Publication
- 264953
- Application
- 26495319
Titles2
- English
- Cleaning formulation for removing residues on surfaces
- Hebrew
- תכשיר ניקוי להסרת משקעים ממשטחים
Classification
- CPC, 14
- C11D3/0073
- H10P70/23
- C11D7/3281
- C11D7/3245
- C11D7/5022
- C11D7/3218
- C23G1/18
- C11D2111/22
- H10P70/234
- H10P70/273
- H10P50/287
- H10P70/27
- H10P70/15
- H10P76/204