IL240009B
193nm laser and inspection system
Abstract
This record has no abstract on file.
Term
No projected expiry on record.
- Priority
- Filed
- Published
- Today
21 members in 8 offices
Priority claims3
| Document | Office | Kind | Date |
|---|---|---|---|
| 201361756209 | United States of America | P | |
| 201414158615 | United States of America | A | |
| 2014012902 | United States of America | W |
Members21
| Document | Office | Kind | |
|---|---|---|---|
| US2014204963A1 | United States of America | A1 | |
| WO2014116922A1 | World Intellectual Property Organization (WIPO) | A1 | |
| TW201448384A | Taiwan Province of China | A | |
| US8929406B2 | United States of America | B2 | |
| US2015155680A1 | United States of America | A1 | |
| IL240009A0 | Israel | A0 | |
| KR20150109472A | Republic of Korea | A | |
| EP2949015A1 | European Patent Office (EPO) | A1 | |
| CN105191026A | China | A | |
| JP2016508620A | Japan | A | |
| US9318869B2 | United States of America | B2 | |
| EP2949015A4 | European Patent Office (EPO) | A4 | |
| TWI590549B | Taiwan Province of China | B | |
| EP2949015B1 | European Patent Office (EPO) | B1 | |
| CN105191026B | China | B | |
| IL240009A | Israel | A | |
| IL240009BThis record | Israel | B | |
| JP6479683B2 | Japan | B2 | |
| JP2019095801A | Japan | A | |
| KR102169060B1 | Republic of Korea | B1 | |
| JP6790144B2 | Japan | B2 |
2 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Patent grantedGrantedFF | FF | |
| Patent renewedKB | KB |
Numbers
- Publication
- 240009
- Application
- 240009
Titles2
- English
- 193nm laser and inspection system
- Hebrew
- לייזר 193 ננו–מטר ומערכת בדיקה
Classification
- CPC, 14
- H01S3/0092
- H01S3/1083
- G01N21/9501
- H01S3/0078
- G01N21/956
- G01N2021/95676
- G02F2201/16
- G02F1/3534
- G02F1/39
- G02F1/3536
- G02F1/3507
- H01S3/067
- H01S3/0602
- G01N21/84