Nova Patents
IL238963B

Improved control over hydrogen fluoride levels in oxide etchant

Abstract

This record has no abstract on file.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Published
  4. Today

23 members in 7 offices

This recordMember, by publication datePriority claim

Priority claims3

Priority claims
DocumentOfficeKindDate
201213731296United States of AmericaA
201314082448United States of AmericaA
2013077328United States of AmericaW

Members23

Family members, oldest first
DocumentOfficeKind
US2008245134A1United States of AmericaA1
WO2009126148A1World Intellectual Property Organization (WIPO)A1
IL201339A0IsraelA0
GB201018800D0United KingdomD0
GB2471627AUnited KingdomA
US8372651B2United States of AmericaB2
US2013183773A1United States of AmericaA1
US2014073060A1United States of AmericaA1
US8716028B2United States of AmericaB2
WO2014105765A1World Intellectual Property Organization (WIPO)A1
US2014315320A1United States of AmericaA1
TW201443991ATaiwan Province of ChinaA
US8932874B2United States of AmericaB2
US8945939B2United States of AmericaB2
IL238963A0IsraelA0
CN104903996AChinaA
EP2939263A1European Patent Office (EPO)A1
EP2939263A4European Patent Office (EPO)A4
CN104903996BChinaB
TWI598956BTaiwan Province of ChinaB
IL238963AIsraelA
IL238963BThis recordIsraelB
EP2939263B1European Patent Office (EPO)B1