Nova Patents
IL234539B

Metrology method and apparatus, lithographic system and device manufacturing method

Abstract

This record has no abstract on file.

Term

No projected expiry on record.

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  3. Published
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10 members in 5 offices

This recordMember, by publication datePriority claim

Priority claims2

Priority claims
DocumentOfficeKindDate
201261616398United States of AmericaP
2013054504European Patent Office (EPO)W

Members10

Family members, oldest first
DocumentOfficeKind
NL2010401ANetherlands (Kingdom of the)A
US2013258310A1United States of AmericaA1
WO2013143814A1World Intellectual Property Organization (WIPO)A1
KR20140139080ARepublic of KoreaA
US9134256B2United States of AmericaB2
US2015346116A1United States of AmericaA1
KR101761735B1Republic of KoreaB1
US9719945B2United States of AmericaB2
IL234539AIsraelA
IL234539BThis recordIsraelB