Nova Patents
ID23905A

Photoresist compositions comprising polycyclic polymers with acid labile pendant groups

Abstract

This record has no abstract on file.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Published
  4. Today

39 members in 14 offices

This recordMember, by publication datePriority claim4 more offices are in the list below

Priority claims3

Priority claims
DocumentOfficeKindDate
92857397United States of AmericaA
08928573–––
US19970928573–––

Members39

Family members, oldest first
DocumentOfficeKind
WO9733198A1World Intellectual Property Organization (WIPO)A1
AU2327297AAustraliaA
EP0885405A1European Patent Office (EPO)A1
WO9914256A1World Intellectual Property Organization (WIPO)A1
AU9376698AAustraliaA
CN1216618AChinaA
WO9914256A8World Intellectual Property Organization (WIPO)A8
HK1017442A1Hong Kong, ChinaA1
KR19990087581ARepublic of KoreaA
ID23905AThis recordIndonesiaA
JP2000508080AJapanA
EP1021477A1European Patent Office (EPO)A1
CN1269810AChinaA
AU725653B2AustraliaB2
US6136499AUnited States of AmericaA
KR20010023941ARepublic of KoreaA
HK1030425A1Hong Kong, ChinaA1
US6232417B1United States of AmericaB1
TW457401BTaiwan Province of ChinaB
JP2001516780AJapanA
AU748214B2AustraliaB2
US2002128408A1United States of AmericaA1
US2002136982A1United States of AmericaA1
TW507115BTaiwan Province of ChinaB
RU2194295C2Russian FederationC2
RU2199552C2Russian FederationC2
US6723486B2United States of AmericaB2
CN1148396CChinaC
US6790579B1United States of AmericaB1
CN1198181CChinaC
EP0885405B1European Patent Office (EPO)B1
AT297562TAustriaT
ATE297562T1AustriaT1
DE69733469D1GermanyD1
MY121339AMalaysiaA
KR100536824B1Republic of KoreaB1
DE69733469T2GermanyT2
MY127927AMalaysiaA
JP3962432B2JapanB2