Tap drill with enhanced performance

0001The present invention relates to a tap drill with enhanced performance, comprising a wear resistance layer of Al-Cr-N and a friction reduction layer deposited atop the wear resistance layer and to a method for producing a tap drill.

State of the art

0002In the document <patcit id="pcit0001" dnum="US9540726B2"><text>US 9540726 B2</text></patcit> it is proposed to improve performance of drills, in particular of tap drills and micro drills by coating at least the head of the drill. The coating comprises at least one HiPIMS coating that is applied directly onto the drill substrate and which includes at least one layer of at least one nitride and/or carbide and/or oxide, and an amorphous carbon or DLC layer provided on the HiPIMS layer. The HiPIMS coating can be a (AI,Cr)N layer and the DLC layer can be a metalliferous DLC layer. The drill shown in <patcit id="pcit0002" dnum="US9540726B2"><text>US 9540726 B2</text></patcit> can be used in drilling operations of stainless steel workpieces, however the tool life is relatively short.

0003<patcit id="pcit0003" dnum="EP1726390A1"><text>EP 1 726 390 A1</text></patcit> describes a surface-coated cutting tool which includes a base material on which formed an inner layer composed of a compound containing Al, at least one of elements Cr and V and at least one element selected from the group consisting of nitrogen, carbon and oxygen, and an outermost layer composed of a carbonitride of TiSi is further formed on the inner layer. The surface-coated cutting tool is appropriately used for such tools as drill, end mill, throwaway tips for milling and turning, metal saw, gear cutting tool, reamer, and tap. The surface-coated cutting tool improved in peeling resistance and wear resistance as compared with conventional tools can thus be provided.

0004<patcit id="pcit0004" dnum="US2005003239A1"><text>US 2005/003239 A1</text></patcit> describes a work piece or structural component which is coated with a system of film layers at least one of which is composed of (AlyCr1-y) X, where X=N, C, B, CN, BN, CBN, NO, CO, BO, CNO, BNO or CBNO and 0.2&lt;=y&lt;0.7, with the composition within said film being either essentially constant or varying over the thickness of the film continually or in steps, as well as a process for producing it.

0005<patcit id="pcit0005" dnum="US2014248100A1"><text>US 2014/248100 A1</text></patcit> relates to a method for coating a substrate, preferably a drill, wherein at least one first HiPIMS layer is applied by means of a HiPIMS process. Preferably, at least one second layer is applied to the first HiPIMS layer by means of a coating process that does not contain a HiPIMS process.

Objective of the present invention

0006The objective of the present invention is to provide a coated tap drill and a method for producing a tap drill that may exhibit better performance and relative tool life in drilling operations of stainless steel workpieces in comparison with the state of the art. In particular, better performance in relation to friction reduction and cold-welding reduction properties.

Description of the present invention

0007The invention is defined by the appended claims.

0008The objective of the present invention is attained by providing a tap drill comprising a substrate and a coating, wherein the coating is deposited on at least a portion of the substrate comprising the head of the drill, the coating comprising a first layer deposited directly on the substrate and a second layer deposited atop the first layer, wherein the first layer is a wear resistant layer of (AI,Cr)N deposited by HiPIMS and the second layer is a friction reduction layer, characterized in that: <ul id="ul0001" list-style="bullet" compact="compact"><li>The second layer (5) is a titanium carbide layer deposited by using a physical vapor deposition (PVD) process of the type magnetron sputtering.</li></ul>

0009HiPIMS methods are also known as HPPMS methods because of the terminology high power pulsed magnetron sputtering.

0010Coatings produced by sputtering, in particular by HiPIMS show much better performance compared to coatings produced by arc, in particular if arc-deposited coating is without post-treatment.

0011HiPIMS provides the possibility to produce dense and smooth coatings. The non-inventive AICrN+WC/C coating shown in <figref idref="f0001">figure 1</figref> can be produced in one deposition run.

0012The non-inventive friction reduction layer is carbon-containing titanium nitride or titan carbonitride or diamond like carbon doped with tungsten carbide or a tungsten carbide layer.

0013According to the present invention the metal carbide layer is a titanium carbide layer.

0014The objective of the present invention is attained by providing a method for producing a tap drill according to claim 3.

0015According to the invention the second layer is a titanium carbide comprising layer and is deposited by sputtering of Ti orTiC targets in an atmosphere comprising argon and a carbon-containing gas, preferably acetylene gas.

0016HiPIMS techniques are used for sputtering of the Ti of TiC targets.

0017<figref idref="f0001">Figure 1</figref> shows a non-inventive coating for tap drill.

0018<figref idref="f0002">Figure 2</figref> shows the tool life for different coatings.

0019<figref idref="f0001">Figure 1</figref> shows in the upper part a picture of a non-inventive tap drill.

0020The tap drill 1 comprises a substrate 2 and a coating 3. The coating 3 is deposited on at least a portion of the substrate 2 comprising the head of the drill 1.

0021The coating 3 comprises a first layer 4. The first layer 4 is deposited directly on the substrate 2. The coating 3 comprises a second layer 5. The second layer 5 is deposited atop the first layer 4.

0022The first layer 4 is a wear resistant layer of (AI,Cr)N. The first layer 4 is deposited by HiPIMS. The second layer 5 is a friction reducing layer. The second layer 5 is a metal carbide layer or a metal-carbide comprising layer. It can also be preferably of carbon-containing titanium nitride or titan carbonitride or diamond like carbon doped with tungsten or a tungsten carbide layer. The second layer 5 is deposited using physical a vapor deposition (PVD) process, preferably of the type magnetron sputtering, preferably of the type HiPIMS.

0023This can be seen in <figref idref="f0002">figure 2</figref>, which shows in a diagram the relative tool life of different coatings and/or depositing methods. The tool life of the Benchmark tool is defined to 100 %. In <figref idref="f0002">figure 2</figref> the Benchmark tool has been deposited with TiN. An AlCrN coating shows the same tool life of 100 % compared to the Benchmark. An AlCrN + TiN coating, which has been deposited by Arc deposition and post-treated in order to reduce roughness shows a tool life of 160 % compared to the Benchmark. A significant tool life increase can be seen. An AlCrN + WC/C coating that has been deposited by Arc deposition shows a tool life of 3 % compared to the Benchmark. An AlCrN + WC/C coating deposited by HiPIMS deposition shows a tool life of 710 % compared to the Benchmark.

0024AICrN+TiN coating (deposited by arc plus post-treatment in order to reduce roughness) show significant tool life increase vs. Benchmark.

0025Smooth coating surface has advantage.

0026Coatings produced by sputtering, in particular by HiPIMS show much better performance compared to coatings produced by arc, in particular if arc-deposited coating is without post-treatment.

0027HiPIMS provides the possibility to produce dense and smooth coatings. Coating like the AICrN+WC/C coating shown in <figref idref="f0001">figure 1</figref> can be produced in one deposition run. <ul id="ul0002" list-style="none" compact="compact"><li>▪ AICrN+Ti(CN) coating shows increase in the tool life.</li></ul>

0028Preferably the first layer 4 is deposited by sputtering of Cr targets in a nitrogen reactive atmosphere (comprising argon and nitrogen or only nitrogen) by using HiPIMS techniques.

0029According to the present invention, the second layer 5 is a titanium carbide comprising layer which can be deposited by sputtering of Ti or TiC targets in an atmosphere comprising argon and a carbon-containing gas, preferably acetylene gas (i.e. preferably in an atmosphere comprising argon and acetylene gas). According to a variant of this preferred embodiment instead of conventional sputtering techniques HiPIMS techniques are used for sputtering of the Ti or TiC targets.