EP3555700A4
Patterning of liquid crystals using soft-imprint replication of surface alignment patterns
Abstract
This record has no abstract on file.
Term
11.2 yearsto projected expiry
Projected expiry 13 December 2037, counted from filing; an application has no term until it is granted.
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99 sheets
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Every citation, both ways
| Document | Relation | Office | Cited during |
|---|---|---|---|
| US2004150141A1 | Cites | United States of America | Search report |
| US2011194058A1 | Cites | United States of America | Search report |
| US2012021140A1 | Cites | United States of America | Search report |
| WO2016205249A1 | Cites | World Intellectual Property Organization (WIPO) | Search report |
| US6680767B2 | Cites | United States of America | Search report |
| RONGSHENG LIN ET AL: "Molecular-Scale Soft Imprint Lithography for Alignment Layers in Liquid Crystal Devices", NANO LETTERS, vol. 7, no. 6, 23 May 2007 (2007-05-23), US, pages 1613 - 1621, XP055446393, ISSN: 1530-6984, DOI: 10.1021/nl070559y | Non-patent | – | Search report |
| See also references of WO 2018112101A1 | Non-patent | – | Search report |
30 members in 9 offices
Priority claims3
| Document | Office | Kind | Date |
|---|---|---|---|
| 201662434343P | United States of America | – | |
| 201662434343 | United States of America | P | |
| 2017066211 | United States of America | W |
Members30
| Document | Office | Kind | |
|---|---|---|---|
| US2018164645A1 | United States of America | A1 | |
| CA3046328A1 | Canada | A1 | |
| WO2018112101A1 | World Intellectual Property Organization (WIPO) | A1 | |
| AU2017376453A1 | Australia | A1 | |
| KR20190091532A | Republic of Korea | A | |
| IL267141A | Israel | A | |
| IL267141D0 | Israel | D0 | |
| CN110291453A | China | A | |
| EP3555700A1 | European Patent Office (EPO) | A1 | |
| JP2020502565A | Japan | A | |
| EP3555700A4This record | European Patent Office (EPO) | A4 | |
| US2020285120A1 | United States of America | A1 | |
| US10895784B2 | United States of America | B2 | |
| AU2017376453B2 | Australia | B2 | |
| CN110291453B | China | B | |
| JP7164525B2 | Japan | B2 | |
| CN115657363A | China | A | |
| US11567371B2 | United States of America | B2 | |
| AU2022283674A1 | Australia | A1 | |
| IL267141B | Israel | B | |
| IL267141B1 | Israel | B1 | |
| IL301448A | Israel | A | |
| KR102550742B1 | Republic of Korea | B1 | |
| IL267141B2 | Israel | B2 | |
| EP3555700B1 | European Patent Office (EPO) | B1 | |
| EP4307039A1 | European Patent Office (EPO) | A1 | |
| IL301448B1 | Israel | B1 | |
| IL301448B2 | Israel | B2 | |
| EP4307039B1 | European Patent Office (EPO) | B1 | |
| CN115657363B | China | B |
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Numbers
- Publication
- 3555700
- Application
- 178802674
Titles3
- German
- STRUKTURIERUNG VON FLÜSSIGKRISTALLEN UNTER VERWENDUNG VON WEICHDRUCK-REPLIKATION VON OBERFLÄCHENAUSRICHTUNGSMUSTERN
- English
- PATTERNING OF LIQUID CRYSTALS USING SOFT-IMPRINT REPLICATION OF SURFACE ALIGNMENT PATTERNS
- French
- FORMATION DE MOTIFS DE CRISTAUX LIQUIDES À L'AIDE D'UNE RÉPLICATION D'EMPREINTE DOUCE DE MOTIFS D'ALIGNEMENT DE SURFACE
Classification
- CPC, 17
- C09K19/00
- G02F1/133788
- G02F1/133365
- G02B27/017
- G02B27/0172
- G02F1/13378
- G02F2202/023
- B32B2305/55
- B32B43/006
- C09K2323/02
- B32B38/10
- Y10T156/1994
- Y10T156/1153
- Y10T156/1195
- Y10T156/1917
- Y10T156/1911
- Y10T156/1158
- IPC, 7
- G02F1 1334
- G02F1 135
- G02B5 30
- G02B27 01
- C09K19 00
- B32B43 00
- G02F1 1337
Designated states1
- Contracting states, 1
- Türkiye