EP3319915B2

Glass substrate with increased weathering and chemcial resistance

Abstract

This record has no abstract on file.

EP3319915B2, drawing sheet 1
Sheet 1 of 6

Term

9.8 yearsleft in the term

Expires 1 July 2036.

  1. Priority
  2. Filed
  3. Granted
  4. Today
  5. Expires

12 claims: 9 independent, 3 dependent

  1. 1
    Glass substrate comprising an SiOxCy coating chemically resistant to weathering and with no perceptible yellow edge color wherein the O/Si atomic ratio is comprised between 1.85 and 1.95 and the SiOxCy coating thickness is comprised between 10 nm and 80 nm, wherein the water contact angle is comprised between 35° and 45° and wherein there is no additional essentially inorganic coating on the SiOxCy coating and wherein the SiOxCy coating is the only coating deposited on the SiOxCy coated side of the glass substrate and wherein the glass substrate is a clear or an extra-clear soda lime glass substrate and wherein the colors in transmission a* and b* are such that a* < 0 and b* ≤ [0.90 + 0.20 x In(0.02-a*)], and wherein the C/Si atomic ratio is comprised between 0.1 and 0.8 and wherein the SiOxCy coating is deposited directly on the glass.
  2. 3
    Glass substrate comprising an SiOxCy coating according to any of the preceding claims wherein the SiOxCy coated glass substrates are heat treated.
  3. 4
    Glass substrate comprising an SiOxCy coating according to any of the preceding claims wherein the SiOxCy coating thickness is comprised between 10 nm and 50 nm, preferably between 10 and 30 nm, preferably between 20 nm and 30 nm.
  4. 5
    Glass substrate comprising an SiOxCy coating according to any of the preceding claims wherein the SiOxCy coating is deposited by chemical vapor deposition from a gaseous mixture comprising a silane precursor, an unsaturated hydro-carbon based radical scavenger, an oxygen source and a carrier gas.
  5. 7
    Process for obtaining a glass substrate with increased chemical and mechanical resistance with low levels of yellow edge color, comprising a. providing a glass substrate, b. coating the glass substrate by chemical vapor deposition performed at a glass substrate temperature comprised between 650 and 720°C, with a gaseous mixture comprising monosilane SiH4, carbon dioxide CO2, ethylene C2H4, and nitrogen as carrier gas, wherein the total flow rate of the gases is comprised between 41 and 70 standard liters per minute per meter of coating beam length, the SiH4 molar concentration in the total gas flow is comprised between 2 and 6 mol%, the C2H4 to SiH4 molar ratio is comprised between 7 and 10, and the CO2 to SiH4 molar ratio is comprised between 9 and 24, the remainder of the total gas flow being made up of the carrier gas nitrogen.
  6. 9
    Process according to claims 7to 8 comprising, after coating the glass substrate by chemical vapor deposition, heat treating the glass substrate.
  7. 10
    Process according to claims 7 to 9 comprising, after coating the glass substrate by chemical vapor deposition and possibly heat treating the glass substrate, coating with a hydrophobic layer.
  8. 11
    Use of SiOxCy coating wherein the O/Si atomic ratio is comprised between 1.2 and 1.95 and the SiOxCy coating thickness is comprised between 10 nm and 80 nm for increasing the weathering and chemical resistance of a glass substrate and wherein there is no additional essentially inorganic coating on the SiOxCy coating.
  9. 12
    Use of a glass substrate according to claims 1 to 6 as a substrate with increased weathering and chemical resistance and low level of yellow edge color.