EP2632849A2

Synthesis, capping and dispersion of nanocrystals

Abstract

This record has no abstract on file.

Term

Projected expiry 26 October 2031.

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25 claims: 7 independent, 18 dependent

  1. 1
    Claims of equivalent WO 2012058271 A2 We Claim:1 . A method of making nanocrystals comprising dissolving or mixing precursors of said nanocrystals in at least one solvent to produce a solution, optionally at least one of heating and increasing pressure of said solution, and reacting said precursors or said precursors and said at least one solvent of said solution to form said nanocrystals.
  2. 13
    The method of any of claims 6-12 wherein said nanocrystals or at least partially capped nanocrystals are dispersed in a further material.
  3. 15
    Nanocrystals or at least partially capped nanocrystals formed by a method of any of claims 1- 14.
  4. 19
    The method of claims 1 -14 or 16-18 wherein said nanocrystals or said at least partially capped nanocrystals are comprised of zinc oxide, hafnium oxide, zirconium oxide, hafnium-zirconium oxide, titanium-zirconium oxide and/or yttrium oxide or other semiconductor material.
  5. 20
    The method of claims 1 -14 or 16-18 wherein said at least one solvent comprises benzyl alcohol, phenol, oleyl alcohol, toluene, butanol, propanol, isopropanol, ethanol, methanol, water, propylene glycol monomethyl ether (PGME), propylene glycol methyl ether acetate (PGMEA), ethyl lactate (EL), and 2-propoxy-propanol (PnP), acetonitrile, acetone, tetrahydrofuran, cyclic ketones and mixtures thereof.
  6. 21
    The method of any of claims 2-5, 7, 8, 10, 12-14 or 16-20 wherein said at least one agent comprises at least one of n-propyltrimethoxysilane, n-propyltriethoxysilane, n-octyltrimethoxysilane, n- octyltriethoxysilane, phenytrimethoxysilane, 2-[methoxy(polyethyleneoxy)propyl]-trimethoxysilane, methoxytri(ethyleneoxy)propyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3- mercaptopropyltrimethoxysilane, 3-(methacryloyloxy)propyl trimethoxysilane, 3- isocyanatopropyltriethoxysilane, 3-isocyanatopropyltrimethoxysilane, and glycidoxypropyltrimethoxysilane, heptanol, hexanol, octanol, benzyl alcohol, phenol, ethanol, propanol, butanol, oleylalcohol, dodecylalcohol, octadecanol and triethylene glycol monomethyl ether, octanoic acid, acetic acid, propionic acid, 2-[2-(2-methoxyethoxy)ethoxy] acetic acid, oleic acid, benzoic acid or a mixture thereof.
  7. 22
    The method of any of claims 13-21 wherein said further material comprises a matrix material such as a polymer, poly(acrylonitrile-butadiene-styrene) (ABS), poly(methyl methacrylate) (PMMA), celluloid, cellulose acetate, poly(ethylene-vinyl acetate) (EVA), poly(ethylene vinyl alcohol) (EVOH), fluoroplastics, polyacrylates (Acrylic), polyacrylonitrile (PAN), polyamide (PA or Nylon), polyamide-imide (PAI), polyaryletherketone (PAEK), polybutadiene (PBD), polybutylene (PB), polybutylene terephthalate (PBT), polycaprolactone (PCL), polychlorotrifluoroethylene (PCTFE), polyethylene terephthalate (PET), polycyclohexylene dimethylene terephthalate (PCT), polycarbonate (PC), polyhydroxyalkanoates (PHAs), polyketone (PK), polyester, polyethylene (PE), polyetheretherketone (PEEK), polyetherketoneketone (PEKK), polyetherimide (PEI), polyethersulfone (PES), polyethylenechlorinates (PEC) , polyimide (PI), polylactic acid (PLA), polymethylpentene (PMP), polyphenylene oxide (PPO), polyphenylene sulfide (PPS), polyphthalamide (PPA), polypropylene (PP), polystyrene (PS), polysulfone (PSU), polytrimethylene terephthalate (PTT), polyurethane (PU), polyvinyl acetate (PVA), polyvinyl chloride (PVC), polyvinylidene chloride (PVDC), poly(styrene-acrylonitrile) (SAN), a spin-on-glass (SOG) polymer, Siloxane-spin-on polymers in Ethanol, Propylene Glycol Methyl Ether Acetate (PGMEA), isopropyl alcohol or mixture of these solvents, JSR Micro topcoat (NFC TCX 014 in 4-methyl-2-pentanol), JSR Micro photoresist (ARF 1682J-19), silicones, or mixtures thereof.