Method for producing glass substrate having silicon oxide film attached thereto
Abstract
To provide a process for producing a glass substrate provided with a silicon oxide film having a low light reflectance and a high light transmittance, with good production efficiency, with which a silicon oxide film can be directly formed on a glass substrate or a glass ribbon at high temperature. (1) A process for producing a glass substrate provided with a silicon oxide film, which comprises applying an organopolysiloxane to a glass substrate within a temperature range of from 400 to 650°C, which is thermally decomposed on the glass substrate to form a silicon oxide film, and (2) a process for producing a glass substrate provided with a silicon oxide film, which is a process for producing a glass substrate comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein an organopolysiloxane is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650°C to form a silicon oxide film on the glass ribbon.

Term
Projected expiry 10 December 2029.
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18 claims: 5 independent, 13 dependent
- 1A process for producing a glass substrate provided with a silicon oxide film, which comprises applying an organopolysiloxane to a glass substrate within a temperature range of from 400 to 650°C to form a silicon oxide film on the glass substrate.
- 2The production process according to Claim 1, wherein, as the organopolysiloxane, an organopolysiloxane having a main exothermic peak when heated at a heating rate of 10 °C/min within a range of at least 300°C and less than the temperature of the glass substrate when the organopolysiloxane is applied, is used.
- 3The production process according to Claim 2, wherein the difference between the main exothermic peak temperature of the organopolysiloxane when heated at a heating rate of 10 °C/min and the temperature of the glass substrate when the organopolysiloxane is applied, is at least 50°C.
- 5The production process according to Claim 4, wherein the boiling point of the liquid medium is at least 60°C.
- 7A process for producing a glass substrate provided with a silicon oxide film, which comprises applying a coating liquid containing a silicone oil and a solvent to a glass substrate heated to a temperature of from 400 to 650°C to form a silicon oxide film.
- 8The production process accruing to Claim 7, wherein the boiling point of the solvent is at least 60°C.
- 10A process for producing a glass substrate provided with a silicon oxide film, which is a process for producing a glass substrate comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein an organopolysiloxane is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650°C to form a silicon oxide film on the glass ribbon.
- 11The production process according to Claim 10, wherein the process for producing a glass substrate is a process for producing glass by the float process, the molten glass is formed into a glass ribbon in a float bath in the procedure for production of glass by the float process, and the organopolysiloxane is applied between the float bath and the annealing step or in the annealing step.
- 12The production process according to Claim 10 or 11, wherein, as the organopolysiloxane, an organopolysiloxane having a main exothermic peak when heated at a heating rate of 10 °C/min within a range of at least 300°C and less than the temperature of the glass ribbon at a position where the organopolysiloxane is applied, is used.
- 13The production process according to Claim 12, wherein the difference between the main exothermic peak temperature of the organopolysiloxane when heated at a heating rate of 10 °C/min and the temperature of the glass ribbon at a position where the organopolysiloxane is applied, is at least 50°C.
- 15The production process according to Claim 14, wherein the boiling point of the liquid medium is at least 60°C.
- 17The production process according to Claim 16 , wherein the viscosity average molecular weight of the silicone oil is from 3,500 to 130,000.
- 18A process for producing a glass substrate provided with a silicon oxide film, which comprises, between a step of forming molten glass by the float process to obtain a glass substrate and an annealing step of annealing the glass substrate, or in the annealing step, applying the coating liquid as defined in any one of Claims 7 to 9 to the glass substrate.
Independent claims18
86 paragraphs in 16 sections, as filed
TECHNICAL FIELD
0001The present invention relates to a process for producing a glass substrate provided with a silicon oxide film.
BACKGROUND ART
0002In order to adjust optical properties (such as the reflectance and the transmittance) of a glass substrate, formation of a thin film of an inorganic oxide on a glass substrate has been conducted.
0003As a method of forming a thin film of an inorganic oxide at a low cost, a method has been known wherein a coating liquid containing a precursor to be an inorganic oxide by thermal decomposition is sprayed over a glass substrate at high temperature so that the precursor is thermally decomposed to form a thin film of an inorganic oxide on the glass substrate. The thin film having a low reflectance and a high transmittance to be formed by this method is theoretically preferably a thin film consisting substantially solely of silicon oxide (hereinafter referred to as a silicon oxide film) in view of the refractive index.
0004Here, there is a problem such that no coating film will be formed if an organic silicon compound alone is contained in a coating liquid. Accordingly, in the coating liquid, a titanium compound or an organic metal compound to increase the reactivity of the organic silicon compound is added (Patent Document 1).
0005However, a thin film formed by applying a coating liquid containing an organic silicon compound and a titanium compound or an organic metal compound to a glass substrate at high temperature contains a metal oxide other than silicon oxide and thereby has a high refractive index, and accordingly the reflectance of the glass substrate is not sufficiently low.
0006Here, there is a problem such that if the sprayed precursor is vaporized before it reaches the glass substrate, a silicon oxide film will not be formed on the glass substrate. Further, there is also such a problem that if the thermal decomposition temperature of the precursor is too low, the precursor will be converted to a powder of silicon oxide before it reaches the glass substrate, and a continuous silicon oxide film will not be formed on the glass substrate. Therefore, it is considered to use a precursor having a high thermal decomposition temperature.
0007However, if the thermal decomposition temperature of the precursor is too high, vaporization will occur by priority rather than the film formation reaction on the glass substrate. Thus, no sufficient film deposition efficiency will be obtained, such being disadvantages in view of the cost and the process.
PRIOR ART DOCUMENT
PATENT DOCUMENT
0008Patent Document 1: <patcit id="pcit0001" dnum="JP7097237A"><text>JP-A-7-097237</text></patcit>
DISCLOSURE OF INVENTION
TECHNICAL PROBLEM
0009The present invention provides a process for producing a glass substrate provided with a silicon oxide film having a low light reflectance and a high light transmittance, with good production efficiency, with which a silicon oxide film can be directly formed on a glass substrate at high temperature.
0010The present invention further provides a process for producing a glass substrate via a glass ribbon (a sheet-form continuous formed product of glass), which comprises directly forming a silicon oxide film on the glass ribbon at high temperature.
SOLUTION TO PROBLEM
0011The process for producing a glass substrate having a silicon oxide film of the present invention relates to the following embodiments (1) and (2). <ol id="ol0001" compact="compact"><li>(1) A process for producing a glass substrate provided with a silicon oxide film, which comprises applying an organopolysiloxane to a glass substrate within a temperature range of from 400 to 650°C to form a silicon oxide film on the glass substrate. In the embodiment (1), it is preferred to use, as the organopolysiloxane, an organopolysiloxane having a main exothermic peak when heated at a heating rate of 10°C/min within a range of at least 300°C and less than the temperature of the glass substrate when the organopolysiloxane is applied. Further, it is preferred that the difference between the main exothermic peak temperature of the organopolysiloxane when heated at a heating rate of 10°C/min and the temperature of the glass substrate when the organopolysiloxane is applied, is at least 50°C. Further, it is preferred that a coating liquid containing the organopolysiloxane and a liquid medium is applied to the glass substrate. Further, it is preferred that the boiling point of the liquid medium is at least 60°C. Further, it is preferred that the organopolysiloxane is a silicone oil. Further, it is preferred that the viscosity average molecular weight of the silicone oil is from 3,500 to 130,000.</li><li>(2) A process for producing a glass substrate provided with a silicon oxide film, which is a process for producing a glass substrate comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein an organopolysiloxane is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650°C to form a silicon oxide film on the glass ribbon. In the embodiment (2), it is preferred that the molten glass is formed into a glass ribbon in a float bath, and the organopolysiloxane is applied between the float bath and the annealing step or in the annealing step. Further, it is preferred to use, as the organopolysiloxane, an organopolysiloxane having a main exothermic peak when heated at a heating rate of 10°C/min within a range of at least 300°C and less than the temperature of the glass ribbon when the organopolysiloxane is applied. Further, it is preferred that the difference between the main exothermic peak temperature of the organopolysiloxane when heated at a heating rate of 10°C/min and the temperature of the glass ribbon at a position where the organopolysiloxane is applied, is at least 50°C. Further, it is preferred that a coating liquid containing the organopolysiloxane and a liquid medium is applied to the glass ribbon. Further, it is preferred that the boiling point of the liquid medium is at least 60°C. Further, it is preferred that the organopolysiloxane is a silicone oil. Still further, it is preferred that the viscosity average molecular weight of the silicone oil is from 3,500 to 130,000.</li></ol>
ADVANTAGEOUS EFFECTS OF INVENTION
0012According to the process for producing a glass substrate provided with a silicon oxide film of the present invention, a silicon oxide film can be directly formed on a glass substrate or a glass ribbon at high temperature, and a glass substrate provided with a silicon oxide film having a low light reflectance and a high light transmittance can be produced with good production efficiency.
BRIEF DESCRIPTION OF DRAWINGS
0013<ul id="ul0001" list-style="none" compact="compact"><li><figref idref="f0001">Fig. 1</figref> is a perspective view illustrating one example of the application method in Examples.</li><li><figref idref="f0001">Fig. 2</figref> is a graph illustrating the reflectances of glass substrates in Examples.</li><li><figref idref="f0002">Fig. 3</figref> is a view schematically illustrating one example of a glass production apparatus.</li></ul>
DESCRIPTION OF EMBODIMENTS
0014The process for producing a glass substrate provided with a silicon oxide film of the present invention is a process which comprises applying an organopolysiloxane to a glass substrate or a glass ribbon to be a glass substrate and thermally decomposing the organopolysiloxane to form a silicon oxide film on the glass substrate or the glass ribbon.
0015As a method of applying the organopolysiloxane, preferred is a spray method of spraying a coating liquid containing the organopolysiloxane and a liquid medium by using a nozzle (such as a spray gun).
0016As a specific application method by the spray method, the following methods (i) and (ii) may, for example, be mentioned, and the method (ii) is preferred in view of the small number of steps and with a view to producing a glass substrate having a silicon oxide film with good production efficiency. <ol id="ol0002" compact="compact"><li>(i) A method of spraying a coating liquid over a glass substrate from a nozzle while the nozzle is moved over the fixed glass substrate.</li><li>(ii) A method of spraying a coating liquid over a glass ribbon from a nozzle provided at a position where the glass ribbon moving in one direction is within the aftermentioned temperature range. It is particularly preferred to spray the coating liquid over a glass ribbon obtained by forming molten glass in a float bath in a process for producing a glass plate by the float process, between the float bath and an annealing step or in the annealing step.</li></ol>
0017The temperature of the glass substrate when the coating liquid is applied is from 400 to 650°C, and the organopolysiloxane is thermally decomposed on the glass substrate within the above temperature range and converted to silicon oxide. The temperature of the glass substrate when the coating liquid is applied is more preferably from 500 to 650°C. If the temperature of the glass substrate is less than 400°C, it will take long until the organopolysiloxane on the glass substrate is thermally decomposed to silicon oxide, thus leading to low productivity. When the temperature of the glass substrate is at most 650°C, since no glass ribbon is present in the molten bath, the atmosphere in the bath will hardly be contaminated during the spraying. Likewise, also in a case where the coating liquid is applied to the glass ribbon, the coating liquid is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650°C. The position where the coating liquid is to be applied is more preferably a position where the glass ribbon is within a temperature range of from 500 to 650°C. In a case where a glass substrate is produced by the float process, the temperature of the glass ribbon at a position immediately after the float bath is usually at a level of 650°C, although it depends on the glass composition of the glass substrate. The glass ribbon which has left the float bath is annealed in the annealing step and cooled to at most 400°C during the annealing step. Here, the temperature of the glass substrate or the glass ribbon means a surface temperature on a side to which the coating liquid is applied.
0018The material of the glass substrate may, for example, be soda lime silica glass, borosilicate glass or aluminosilicate glass. Further, the glass substrate is preferably a raw glass substrate which is not reinforced.
0019In the present invention, the organopolysiloxane means a polymer having siloxane bonds (-Si-O-Si-) as a skeleton and having organic groups bonded to the silicon atoms. Each organic group is an organic group in which the atom bonded to the silicon atom is a carbon atom. To some of the silicon atoms, an atom or a group (for example, a hydrogen atom, a hydroxy group or a hydrolyzable group) other than the organic group may be bonded. A hydrolyzable group is a group capable of being converted to a hydroxy group by reaction with water. For example, a halogen atom (such as a chlorine atom), a group in which the atom bonded to the silicon atom is an oxygen atom (such as an alkoxy group or an acyl group) or a group in which the atom bonded to the silicon atom is a nitrogen atom (such as an amino group) may, for example, be mentioned. Unlike the hydrolyzable group, the above organic group is nonhydrolyzable.
0020The organic group which is a nonhydrolyzable group is preferably a hydrocarbon group (an organic group comprising carbon atoms and hydrogen atoms). Further, the organic group may be an organic group having a hetero atom (such as an oxygen atom or a nitrogen atom), an organic group having a halogen atom (such as a fluorine atom) or the like. The hetero atom may be part of a reactive group (such as an epoxy group, a carboxy group or an amino group). The hydrocarbon group may, for example, be an alkyl group (such as a methyl group or an ethyl group), an alkenyl group (such as a vinyl group, an allyl group or an ethynyl group) or an aryl group (such as a phenyl group).
0021The organopolysiloxane may, for example, be a linear polymer in which the skeleton of the siloxane bonds has a linear structure, a branched polymer in which the skeleton has a branched structure, a crosslinked polymer having the skeleton has a network structure, or a three-dimensional crosslinked polymer in which the skeleton has a three-dimensional network structure. Further, as another organopolysiloxane, a crosslinked polymer in which at least two skeletons of the siloxane bonds having a linear structure are connected with a bivalent or higher valent organic group (such as an alkylene group), a polymer in which the skeleton of the siloxane bonds and an organic polymer skeleton having no siloxane bond are bonded, may, for example, be mentioned.
0022As the organopolysiloxane in the present invention, any of the above-mentioned organopolysiloxanes may be used so long as it is thermally decomposed and converted to silicon oxide on the glass substrate or the glass ribbon at a temperature within the above temperature range. Particularly, an organopolysiloxane which is liquid by itself, one which can be soluble in a liquid medium to be a solution, or one which can be dispersed in a liquid medium to be a dispersion is preferred.
0023As the organopolysiloxane used in the present invention, in the case of application to a glass substrate, an organopolysiloxane having a main exothermic peak when heated at a heating rate of 10°C/min within a range of at least 300°C and less than the temperature of the glass substrate when the organopolysiloxane is applied, is preferred. Further, in the case of application to a glass ribbon, it is preferably an organopolysiloxane having a main exothermic peak when heated at a heating rate of 10°C/min within a range of at least 300°C and less than the temperature of the glass ribbon at a position where the organopolysiloxane is applied. The temperature at a position where the main exothermic peak appears when the organopolysiloxane is heated at a heating rate of 10°C/min will hereinafter be referred to as an exothermic peak temperature.
0024At the exothermic peak temperature or higher, the organopolysiloxane is thermally decomposed to be converted to silicon oxide. Accordingly, an organopolysiloxane having an exothermic peak temperature lower than the temperature of the glass substrate or the temperature of the glass ribbon at the organopolysiloxane application position is used. In other words, when an organopolysiloxane having a certain exothermic peak temperature is used, the temperature of the glass substrate to which this organopolysiloxane is applied is set to be a temperature exceeding the exothermic peak temperature, and the position at which the organopolysiloxane is applied to a glass ribbon is set to be a position at which the temperature of the glass ribbon exceeds the exothermic peak temperature.
0025As described above, the temperature of the glass substrate to which the organopolysiloxane is applied or the temperature of the glass ribbon at a position where the organopolysiloxane is applied is from 400 to 650°C. Accordingly, the organopolysiloxane used in the present invention is selected from ones having an exothermic peak temperature less than 650°C.
0026Further, if the temperature of the glass substrate or the glass ribbon and the exothermic peak temperature of the organopolysiloxane are close to each other, the rate of the thermal decomposition reaction by which the organopolysiloxane is converted to silicon oxide tends to be low. Accordingly, byproducts such as carbides may remain, and the productivity may be insufficient. The difference between both the temperatures is preferably at least 30°C, more preferably at least 50°C, and in order to obtain a sufficient reaction rate, it is further preferably at least 100°C. Considering these conditions, the organopolysiloxane to be used in the present invention is preferably selected from organopolysiloxanes having an exothermic peak temperature within a range of at least 300°C and less than the temperature of the glass substrate or the glass ribbon when the organopolysiloxane is applied.
0027By the exothermic peak temperature being at least 300°C, in a case where the organopolysiloxane is applied e.g. by spraying by means of a spray method, the organopolysiloxane is less likely to be thermally decomposed before it reaches the surface of the glass substrate or the glass ribbon. When the exothermic peak temperature is less than the temperature of the glass substrate or the glass ribbon when the organopolysiloxane is applied, film-deposition reaction will take place immediately after the organopolysiloxane reaches the surface of the glass substrate or the glass ribbon, whereby a silicon oxide film can be formed on the glass substrate or the glass ribbon with a good film deposition efficiency.
0028The organopolysiloxane in the present invention is preferably a linear polymer, particularly preferably a linear diorganopolysiloxane among the above organopolysiloxanes. A diorganopolysiloxane is a polymer having silyloxy groups to which two organic groups are bonded as repeating units, and in a linear diorganopolysiloxane, three organic groups are bonded to the silicon atom at each terminal. Some of the organic groups may be a hydrogen atom. Each organic group is usually an alkyl group (particularly a methyl group) having at most 4 carbon atoms, and some of the organic groups may be an alkenyl group or a phenyl group. Further, each organic group may be an organic group having a hetero atom (such as an oxygen atom or a nitrogen atom), an organic group having a halogen atom (such as a fluorine atom) or the like, as mentioned above.
0029The organopolysiloxane in the present invention is particularly preferably a silicone oil. The silicone oil in the present invention means a linear organopolysiloxane which is an oily compound having fluidity at room temperature.
0030The silicone oil is usually represented by the following formula (1): <chemistry id="chem0001" num="0001"><img file="EP2377832A1_D0001.tif" /></chemistry> In the formula (1), each of R<sup>1</sup> to R<sup>5</sup> is an organic group or a hydrogen atom, and n is an integer of at least 1. In a case where each of R<sup>1</sup> to R<sup>5</sup> is an organic group, such organic groups may be the same or different from each other. The bifunctional unit in the bracket [ ] is usually called D unit, and each of monofunctional units outside the bracket [ ] at both terminals is called M unit. In a case where n is an integer of at least 2 (that is, in a case where there are two or more D units), such D units may be different from each other. The two M units may also be different from each other. D units being different from each other means that they are different in at least one of R<sup>1</sup> and R<sup>2</sup>. M units being different from each other means that they are different in at least one of R<sup>3</sup>, R<sup>4</sup> and R<sup>5</sup>.
0031The silicone oil represented by the formula (1) is preferably a silicone oil wherein all R<sup>1</sup> to R<sup>5</sup> are a methyl group, or a silicone oil wherein some of R<sup>1</sup> to R<sup>5</sup> are a hydrogen atom or an organic group other than a methyl group, and the others are a methyl group. Hereinafter, in a case where all R<sup>1</sup> to R<sup>5</sup> are a methyl group, such D unit will be referred to as D<sup>1</sup> unit and such M unit will be referred to as M<sup>1</sup> unit. On the other hand, D unit wherein one of R<sup>1</sup> and R<sup>2</sup> is a methyl group and the other is a hydrogen atom or an organic group other than a methyl group will be referred to as D<sup>2</sup> unit, and M unit wherein two of R<sup>3</sup> to R<sup>5</sup> are a methyl group and the other one is a hydrogen atom or another organic group will be referred to as M<sup>2</sup> unit. According to this representation, a silicone oil represented by the formula (1) wherein all R<sup>1</sup> to R<sup>5</sup> are a methyl group can be represented by M<sup>1</sup>(D<sup>1</sup>)<sub>n</sub>M<sup>1</sup>. In a case where the silicone oil represented by the formula (1) has a hydrogen atom or an organic group other than a methyl group, bonded to a silicon atom, preferred is a silicone oil represented by M<sup>1</sup>(D<sup>1</sup>)<sub>p</sub>(D<sup>2</sup>)<sub>q</sub>M<sup>1</sup> a silicone oil represented by M<sup>2</sup>(D<sup>1</sup>)<sub>n</sub>M<sup>2</sup> or a silicone oil represented by M<sup>2</sup>(D<sup>1</sup>)<sub>p</sub>(D<sup>2</sup>)<sub>q</sub>M<sup>2</sup> (wherein each of p and q is an integer of at least 1, and p+q=n). The organic group other than a methyl group is preferably an alkyl group (such as an ethyl group) having at least 2 carbon atoms, a polyfluoroalkyl group, a phenyl group, an organic group having a hetero atom (such as an oxygen atom or a nitrogen atom) (particularly an organic group having a reactive group (such as an epoxy group or an amino group)) or the like.
0032A silicone oil wherein all R<sup>1</sup> to R<sup>5</sup> are a methyl group is called dimethyl silicone oil. Further, a silicone oil wherein some of R<sup>1</sup> to R<sup>5</sup> are a phenyl group and the others are a methyl group is called methyl phenyl silicone oil, and a silicone oil wherein some of R<sup>1</sup> to R<sup>5</sup> are a hydrogen atom and the others are a methyl group is called methyl hydrogen silicone oil. Further, a silicone oil wherein some of R<sup>1</sup> to R<sup>5</sup> are a long chain alkyl group (preferably a C<sub>6-22</sub> linear alkyl group), an organic group having a hetero atom (such as an oxygen atom or a nitrogen atom) or an organic group having a halogen atom (such as a fluorine atom) and the others are a methyl group is called a modified silicone oil. The modified silicone oil is called, for example, epoxy-modified silicone oil, carboxy-modified silicone oil, long chain alkyl-modified silicone oil, amino-modified silicone oil or polyether-modified silicone oil, depending on the type of the organic group other than a methyl group or the type of a reactive group which this organic group has. The silicone oil in the present invention is preferably such a silicone oil, particularly preferably a long chain alkyl-modified silicone oil.
0033n in the formula (1) represents the degree of polymerization, and among silicone oils wherein R<sup>1</sup> to R<sup>5</sup> are the same, usually the higher n is, the higher the viscosity is. Accordingly, the value of n (i.e. the molecular weight) can be measured by the viscosity of a silicone oil, and such a molecular weight is called viscosity average molecular weight. The silicone oil in the present invention is preferably a silicone oil having a viscosity average molecular weight of from 3,500 to 130,000, more preferably a silicone oil of from 3,500 to 100,000, further preferably a silicone oil of from 6,000 to 55,000.
0034When the silicone oil has a viscosity average molecular weight of at least 3,500, it will hardly be vaporized before it is attached to the glass substrate or the glass ribbon, whereby the formation efficiency of a silicon oxide film will be good. When the silicone oil has a viscosity average molecular weight of at most 130,000, the haze can be suppressed low, and a transmittance can be maintained high. Further, the viscosity of the silicone oil will not be too high, whereby good handling efficiency will be obtained.
0035The viscosity average molecular weight of a silicone oil is obtained by the following procedure. <ol id="ol0003" compact="compact"><li>(I) The kinematic viscosity η (25°C) of the silicone oil is obtained.</li><li>(II) When the kinematic viscosity η is at least 100 mm<sup>2</sup>/sec, the molecular weight M is obtained from Barry's formula of the following formula (2). When the kinematic viscosity η is less than 100 mm<sup>2</sup>/sec, the molecular weight M is obtained from Warrik's formula of the following formula (3). <maths id="math0001" num="(2)"><math display="block"><msup><mi mathvariant="normal">log η</mi><mrow><mi>cs</mi><mo mathvariant="normal">/</mo><mn mathvariant="normal">25</mn><mo></mo><mi mathvariant="normal">°C</mi></mrow></msup><mo mathvariant="normal">=</mo><mn mathvariant="normal">1.00</mn><mo mathvariant="normal">+</mo><mn mathvariant="normal">0.0123</mn><mo></mo><msup><mi mathvariant="normal">M</mi><mn mathvariant="normal">0.5</mn></msup></math><img file="EP2377832A1_D0002.tif" /></maths><maths id="math0002" num="(3)"><math display="block"><msup><mi mathvariant="normal">log η</mi><mrow><mi mathvariant="normal">p</mi><mo mathvariant="normal">/</mo><mn mathvariant="normal">40</mn><mo></mo><mi mathvariant="normal">°C</mi></mrow></msup><mo mathvariant="normal">=</mo><mn mathvariant="normal">1.43</mn><mo mathvariant="normal">+</mo><mi>logM</mi><mo mathvariant="normal">-</mo><mn mathvariant="normal">5.54</mn></math><img file="EP2377832A1_D0003.tif" /></maths> wherein η<sup>cs/25°C</sup>: the kinematic viscosity at 25°C, η<sup>p/40°C</sup>: the viscosity at 50°C, M: molecular weight.</li></ol>
0036As described above, the silicone oil is particularly preferably selected from silicone oils having an exothermic peak temperature within a range of at least 300°C and less than the temperature of the glass substrate or the glass ribbon when the organopolysiloxane is applied. Such silicone oils may, for example, be dimethyl silicone oil, methyl hydrogen silicone oil, epoxy-modified silicone oil, carboxy-modified silicone oil and long chain alkyl-modified silicone oil.
0037As described above, as the organopolysiloxane in the present invention, in addition to the silicone oil, an organopolysiloxane which can be thermally decomposed to be converted to silicon oxide on a glass substrate or a glass ribbon within a temperature range of from 400 to 650°C. Such an organopolysiloxane may, for example, be a silicone resin, a silicone rubber, a silicone elastomer or a compound having a siloxane bond as a skeleton which is a material therefor.
0038A silicone resin is a curable organopolysiloxane comprising, as the main constituting units, trifunctional units represented by R<sup>6</sup>SiO<sub>3/2</sub> (wherein R<sup>6</sup> is the same organic group as for the above R<sup>1</sup> to R<sup>5</sup>) in which one organic group is bonded to a silicone atom, called T units. The silicone resin may have the above D unit in addition to T units. Further, it may have a tetrafunctional unit (represented by SiO<sub>4/2</sub>) called Q unit or the above M unit. The silicone resin before curing may be used as the organopolysiloxane in the present invention. A silicone rubber and a silicone elastomer are polymers obtainable by crosslinking a crosslinkable organopolysiloxane (an organopolysiloxane having a crosslinkable organic group (such as a vinyl group), an organopolysiloxane having a silicon atom to which a silanol group or a hydrolyzable group is bonded or the like), and the crosslinked polymer or the crosslinkable organopolysiloxane as the material may be used as the organopolysiloxane in the present invention.
0039Application of the organopolysiloxane is carried out by applying a liquid organopolysiloxane or an organopolysiloxane powder directly to the glass substrate or the glass ribbon. More particularly, it is carried out by applying a coating liquid comprising a solution or a dispersion of the organopolysiloxane to the glass substrate or the glass ribbon. The liquid medium in the coating liquid may be removed by evaporation before the coating liquid reaches the surface of the glass substrate or the glass ribbon in the case of e.g. spraying, but usually it is removed by evaporation after the coating liquid reached the surface of the glass substrate or the glass ribbon at high temperature. In order to form a uniform silicon oxide film on the glass substrate or the glass ribbon, it is preferred to form a film of the organopolysiloxane on the glass substrate or the glass ribbon and then thermally decompose the organopolysiloxane. For that purpose, it is preferred that a liquid medium having a relatively high boiling point is used to form a film of the organopolysiloxane containing the liquid medium on the glass substrate or the glass ribbon, and then the liquid medium is evaporated.
0040The liquid medium to be used for the solution of the organopolysiloxane may be a solvent in which the organopolysiloxane is dissolved, and it may, for example, be a hydrocarbon (such as a saturated aliphatic hydrocarbon or an aromatic hydrocarbon), an unsaturated hydrocarbon, dichloroethane, trichloroethylene, chlorobenzene, dimethylformamide, methanol, ethanol, acetone, cyclohexanone or acetylacetone. The liquid medium to be used for the dispersion (including an emulsion) of the organopolysiloxane may be one in which the organopolysiloxane is not soluble, and specifically, water may be mentioned. Further, depending on the type of the organopolysiloxane, an organic solvent in which the organopolysiloxane is not soluble may be used, and as the organic solvent, the above solvent may be mentioned.
0041The boiling point of the liquid medium is preferably at least 60°C, more preferably at least 65°C. When the boiling point of the liquid medium is at least 60°C, the liquid medium is less likely to be vaporized before it is attached to the surface of the glass substrate or the glass ribbon at high temperature, whereby a good formation efficiency of a silicon oxide film will be obtained. The upper limit of the boiling point of the liquid medium is not limited so long as the liquid medium has a boiling point lower than the temperature of the surface of the glass substrate or the glass ribbon to which the liquid medium is applied. However, usually a liquid medium having a boiling point less than 300°C is used. In order to quickly remove the liquid medium by evaporation on the glass substrate or the glass ribbon, the boiling point of the liquid medium is preferably at most 250°C. The boiling point of the liquid medium is more preferably from 80 to 200°C.
0042The solid content concentration (the concentration of the organopolysiloxane in the coating liquid, the same applies hereinafter) of the coating liquid is preferably from 5 to 60 mass%, more preferably from 10 to 50 mass% in view of the formation efficiency of a silicon oxide film and the viscosity (handling efficiency) of the coating liquid.
0043The amount of application of the coating liquid is preferably such an amount that the thickness of the silicon oxide film at the thinnest portion is from 10 to 300 nm, and there may be a protruded portion of at least 300 nm.
0044The organopolysiloxane is thermally decomposed on the glass substrate or the glass ribbon and converted to silicon oxide. On that occasion, presence of oxygen is necessary in the thermal decomposition atmosphere. In an atmosphere without oxygen, the organopolysiloxane tends to be depolymerized into a low molecular weight organopolysiloxane, and such a low molecular weight organopolysiloxane, which is a low boiling point compound, is likely to be vaporized. Accordingly, in an atmosphere without oxygen, the organopolysiloxane will not be converted to silicon oxide but is likely to be vaporized and disappear. Accordingly, thermal decomposition of the organopolysiloxane is carried out in an oxygen-containing atmosphere (such as in the air). In a case where the organopolysiloxane is applied to a glass ribbon formed by the float process, the application position is at the downstream of the float bath outlet. Since the interior of the float bath is usually kept in a reducing atmosphere, a silicon oxide film will hardly form even if the organopolysiloxane is applied to the glass ribbon in the interior of the float bath. At the downstream of the float bath outlet, even if a reducing gas discharged from the float bath is included in the air, usually oxygen in a sufficient amount for formation of silicon oxide is present in the atmosphere. Further, the glass ribbon after the float bath outlet moves to an annealing apparatus (such as an annealing furnace), and the atmosphere in the interior of the annealing apparatus is also usually in a heated air atmosphere. Accordingly, the position at which the organopolysiloxane is applied to the glass ribbon is preferably at a position between the float bath and the annealing step, or at a position in the annealing step.
0045The thickness of the silicon oxide film is preferably from 10 to 300 nm. A silicon oxide film having a thickness within such a range is useful as an antireflection film. However, in a case where a silicon oxide film to be used for a purpose other than antireflection is to be formed, the thickness is not necessarily limited to such a range.
0046By the above-described process for producing a glass substrate provided with a silicon oxide film of the present invention, the organopolysiloxane is applied to a heated glass substrate or glass ribbon, and accordingly a silicon oxide film can be formed with good production efficiency as compared with a sputtering method or a CVD method. Further, since an organopolysiloxane is used, a silicon oxide film can be formed without using an organic metal compound. Accordingly, a glass substrate having a silicon oxide film with a low light reflectance and a high light transmittance, can be produced with good production efficiency.
EXAMPLES
0047Now, the present invention will be described in further detail with reference to Examples. However, it should be understood that the present invention is by no means restricted to such specific Examples.
0048Examples 1 to 13 and 16 to 21 are Examples of the present invention, and Examples 14 and 15 are Comparative Examples.
(Exothermic peak temperature)
0049Exothermic peaks which appeared when a silicone oil was heated from 25°C to 700°C at a heating rate of 10°C/min were measured by TG-DTA (manufactured by Bruker AXS, ASC 7000S). The temperature at which the highest exothermic peak among the exothermic peaks appeared was regarded as the main exothermic peak temperature.
(Kinematic viscosity)
0050The kinematic viscosity (25°C) of a silicone oil was measured by an Ubbellohde viscometer as specified in JIS Z8803 (1991).
(Reflectance)
0051With respect to the reflectance of a glass substrate, the one surface reflectance of a glass substrate was measured with respect to a light having a wavelength of from 300 to 1,200 nm by using a spectrophotometer (manufactured by Hitachi High-Technologies Corporation, U4100). In a case where a coating liquid was applied, the one surface reflectance of the glass substrate on the applied side was measured.
(Reduction in reflectance)
0052The difference in the reflectance (the reduction in the reflectance) was obtained by subtracting the average of reflectances at wavelengths of from 550 to 650 nm of a glass substrate on which a silicon oxide film was formed from the average of reflectances at wavelengths of from 550 to 650 nm of a glass substrate on which no silicon oxide film was formed.
(Haze)
0053The haze of a glass substrate was measured by using a haze meter (manufactured by BYK-Gardener, Haze-gard plus E-4725).
EXAMPLE 1
0054A silicone oil (dimethyl silicone oil as identified in Table 1, manufactured by Shin-Etsu Silicones, viscosity average molecular weight: 15,000, 25°C kinematic viscosity: 300 mm<sup>2</sup>/s) was dissolved in n-hexane to obtain a coating liquid having a solid content concentration of 10 mass%.
0055As an application apparatus, KM-100 (manufactured by SPD Laboratory Inc.) was used. As a glass substrate, soda lime glass (manufactured by Asahi Glass Company, Limited) of 10 cm x 10 cm x 3 mm was used.
0056The glass substrate was placed on a stage, and a heater was provided on the rear side of the stage not to be in contact with the stage. The glass substrate was heated to 600°C via the stage by the radiant heat of the heater. The temperature of the glass substrate was measured by bringing a thermocouple in contact with one side surface of the glass substrate. Since the glass substrate was heated for a sufficient time before the coating liquid was sprayed by a spray gun, the temperature measured here can be considered to be substantially the same as the surface temperature of the glass substrate.
0057After the glass substrate was heated to 600°C, as shown in <figref idref="f0001">Fig. 1</figref>, the coating liquid was sprayed over the glass substrate 10 from a spray gun 12 while the spray gun 12 was moved in three steps S1 to S3 above the glass substrate 10. Regarding three steps S1 to S3 as one cycle, application was carried out in five cycles. Further, when the coating liquid was sprayed from the spray gun 12, the liquid-sending pressure to the spray gun 12 was adjusted so that the liquid-sending rate would be from 0.4 to 0.6 mL/sec, and the spraying pressure was set to 0.1 MPa. The application time in each step was 10 seconds. Spraying was carried out in a state where the stage, the glass substrate and the spray gun were surrounded by an explosion-proof apparatus, and the ambient temperature was not adjusted.
0058Of the glass substrate on which a silicon oxide film was formed, the reduction in the reflectance and the haze were measured. The results are shown in Table 1.
EXAMPLES 2 to 8
0059A glass substrate on which a silicon oxide film was formed was obtained in the same manner as in Example 1 except that the silicone oil was changed to a silicone oil (dimethyl silicone oil as identified in Table 1, manufactured by Shin-Etsu Silicones) having a 25°C kinematic viscosity and a viscosity average molecular weight as identified in Table 1.
0060Of the glass substrate on which a silicon oxide film was formed, the reduction in the reflectance and the haze were measured. The results are shown in Table 1. <tables id="tabl0001" num="0001"><table frame="all"><title>TABLE 1</title><tgroup cols="8"><colspec colnum="1" colname="col1" colwidth="18mm" /><colspec colnum="2" colname="col2" colwidth="21mm" /><colspec colnum="3" colname="col3" colwidth="22mm" /><colspec colnum="4" colname="col4" colwidth="21mm" /><colspec colnum="5" colname="col5" colwidth="23mm" /><colspec colnum="6" colname="col6" colwidth="23mm" /><colspec colnum="7" colname="col7" colwidth="23mm" /><colspec colnum="8" colname="col8" colwidth="18mm" /><thead><row><entry align="center" valign="middle">Example</entry><entry align="center" valign="middle">Silicone oil</entry><entry align="center" valign="middle">25°C kinematic viscosity (mm<sup>2</sup>/s)</entry><entry align="center" valign="middle">Viscosity average molecular weight (x1000)</entry><entry align="center" valign="middle">Liquid medium</entry><entry align="center" valign="middle">Application cycle (number)</entry><entry align="center" valign="middle">Reduction in reflectance (%)</entry><entry align="center" valign="middle">Haze (%)</entry></row></thead><tbody><row><entry align="center" valign="middle">2</entry><entry align="center" valign="middle">Dimethyl silicone oil</entry><entry align="center" valign="middle">50</entry><entry align="center" valign="middle">3.5</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">0.6</entry><entry align="center" valign="middle">0.23</entry></row><row><entry align="center" valign="middle">3</entry><entry align="center" valign="middle">Dimethyl silicone oil</entry><entry align="center" valign="middle">100</entry><entry align="center" valign="middle">6</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">0.9</entry><entry align="center" valign="middle">0.45</entry></row><row><entry align="center" valign="middle">1</entry><entry align="center" valign="middle">Dimethyl silicone oil</entry><entry align="center" valign="middle">300</entry><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">1.7</entry><entry align="center" valign="middle">0.61</entry></row><row><entry rowsep="0" align="center" valign="middle" /><entry rowsep="0" align="center" valign="middle">Dimethyl</entry><entry rowsep="0" align="center" valign="middle" /><entry rowsep="0" align="center" valign="middle" /><entry rowsep="0" align="center" valign="middle" /><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">1.58</entry><entry align="center" valign="middle">0.29</entry></row><row><entry rowsep="0" align="center" valign="middle">4</entry><entry rowsep="0" align="center" valign="middle">silicone oil</entry><entry rowsep="0" align="center" valign="middle">1000</entry><entry rowsep="0" align="center" valign="middle">25</entry><entry rowsep="0" align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">1.46</entry><entry align="center" valign="middle">-</entry></row><row><entry align="center" valign="middle" /><entry align="center" valign="middle" /><entry align="center" valign="middle" /><entry align="center" valign="middle" /><entry align="center" valign="middle" /><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">1.43</entry><entry align="center" valign="middle">0.72</entry></row><row><entry rowsep="0" align="center" valign="middle">5</entry><entry rowsep="0" align="center" valign="middle">Dimethyl silicone oil</entry><entry rowsep="0" align="center" valign="middle">10000</entry><entry rowsep="0" align="center" valign="middle">55</entry><entry rowsep="0" align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">1.74</entry><entry align="center" valign="middle">0.97</entry></row><row><entry align="center" valign="middle" /><entry align="center" valign="middle" /><entry align="center" valign="middle" /><entry align="center" valign="middle" /><entry align="center" valign="middle" /><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">2.1</entry><entry align="center" valign="middle">-</entry></row><row><entry align="center" valign="middle">6</entry><entry align="center" valign="middle">Dimethyl silicone oil</entry><entry align="center" valign="middle">30000</entry><entry align="center" valign="middle">80</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">2.46</entry><entry align="center" valign="middle">1.51</entry></row><row><entry align="center" valign="middle">7</entry><entry align="center" valign="middle">Dimethyl silicone oil</entry><entry align="center" valign="middle">100000</entry><entry align="center" valign="middle">100</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">1.91</entry><entry align="center" valign="middle">2.33</entry></row><row><entry align="center" valign="middle">8</entry><entry align="center" valign="middle">Dimethyl silicone oil</entry><entry align="center" valign="middle">300000</entry><entry align="center" valign="middle">130</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">3.45</entry><entry align="center" valign="middle">6.58</entry></row></tbody></tgroup></table></tables>
EXAMPLES 9 to 11
0061A glass substrate on which a silicon oxide film was formed was obtained in the same manner as in Example 1 except that the liquid medium was changed to a solvent as identified in Table 2 and the number of application cycles was as identified in Table 2.
0062Of the glass substrate on which a silicon oxide film was formed, the reduction in the reflectance and the haze were measured. The results are shown in Table 2. <tables id="tabl0002" num="0002"><table frame="all"><title>TABLE 2</title><tgroup cols="9"><colspec colnum="1" colname="col1" colwidth="18mm" /><colspec colnum="2" colname="col2" colwidth="18mm" /><colspec colnum="3" colname="col3" colwidth="19mm" /><colspec colnum="4" colname="col4" colwidth="19mm" /><colspec colnum="5" colname="col5" colwidth="23mm" /><colspec colnum="6" colname="col6" colwidth="15mm" /><colspec colnum="7" colname="col7" colwidth="21mm" /><colspec colnum="8" colname="col8" colwidth="21mm" /><colspec colnum="9" colname="col9" colwidth="15mm" /><thead><row valign="middle"><entry align="center">Example</entry><entry align="center">Silicone oil</entry><entry align="center">25°C kinematic viscosity (mm<sup>2</sup>/s)</entry><entry align="center">Viscosity average molecular weight (×1000)</entry><entry align="center">Liquid medium</entry><entry align="center">Boiling point of solvent (°C)</entry><entry align="center">Application cycle (number)</entry><entry align="center">Reduction in reflectance (%)</entry><entry align="center">Haze (%)</entry></row></thead><tbody><row valign="middle"><entry align="center">9</entry><entry align="center">Dimethyl silicone oil</entry><entry align="center">300</entry><entry align="center">15</entry><entry align="center">n-Pentane</entry><entry align="center">36</entry><entry align="center">5</entry><entry align="center">0.2</entry><entry align="center">0.16</entry></row><row valign="middle"><entry align="center">1</entry><entry align="center">Dimethyl silicone oil</entry><entry align="center">300</entry><entry align="center">15</entry><entry align="center">n-Hexane</entry><entry align="center">68.74</entry><entry align="center">5</entry><entry align="center">1.7</entry><entry align="center">0.61</entry></row><row valign="middle"><entry align="center">10</entry><entry align="center">Dimethyl silicone oil</entry><entry align="center">300</entry><entry align="center">15</entry><entry align="center">n-Decane</entry><entry align="center">174</entry><entry align="center">5</entry><entry align="center">1.61</entry><entry align="center">0.89</entry></row><row valign="middle"><entry align="center">11</entry><entry align="center">Dimethyl silicone oil</entry><entry align="center">300</entry><entry align="center">15</entry><entry align="center">n-Hexadecane</entry><entry align="center">286.5</entry><entry align="center">1</entry><entry align="center">3.38</entry><entry align="center">3.32</entry></row></tbody></tgroup></table></tables>
EXAMPLES 12 and 13
0063A glass substrate on which a silicon oxide film was formed was obtained in the same manner as in Example 1 except that the silicone oil was changed to a silicone oil (manufactured by Shin-Etsu Silicones) as identified in Table 3.
0064Of the glass substrate on which a silicon oxide film was formed, the reduction in the reflectance and the haze were measured. The results are shown in Table 3. Further, the reflectance of the glass substrate in Example 13 is shown in <figref idref="f0001">Fig. 2</figref>. <tables id="tabl0003" num="0003"><table frame="all"><title>TABLE 3</title><tgroup cols="8"><colspec colnum="1" colname="col1" colwidth="18mm" /><colspec colnum="2" colname="col2" colwidth="21mm" /><colspec colnum="3" colname="col3" colwidth="22mm" /><colspec colnum="4" colname="col4" colwidth="21mm" /><colspec colnum="5" colname="col5" colwidth="23mm" /><colspec colnum="6" colname="col6" colwidth="23mm" /><colspec colnum="7" colname="col7" colwidth="23mm" /><colspec colnum="8" colname="col8" colwidth="18mm" /><thead><row><entry align="center" valign="middle">Example</entry><entry align="center" valign="middle">Silicone oil</entry><entry align="center" valign="middle">25°C kinematic viscosity (mm<sup>2</sup>/s)</entry><entry align="center" valign="middle">Viscosity average molecular weight (×1000)</entry><entry align="center" valign="middle">Liquid medium</entry><entry align="center" valign="middle">Application cycle (number)</entry><entry align="center" valign="middle">Reduction in reflectance (%)</entry><entry align="center" valign="middle">Haze (%)</entry></row></thead><tbody><row><entry align="center" valign="middle">1</entry><entry align="center" valign="middle">Dimethyl silicone oil</entry><entry align="center" valign="middle">300</entry><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">1.7</entry><entry align="center" valign="middle">0.61</entry></row><row><entry align="center" valign="middle">12</entry><entry align="center" valign="middle">Methyl phenyl-modified silicone oil</entry><entry align="center" valign="middle">300</entry><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">1.10</entry><entry align="center" valign="middle">0.15</entry></row><row><entry align="center" valign="middle">13</entry><entry align="center" valign="middle">Mercapto-modified silicone oil</entry><entry align="center" valign="middle">300</entry><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">1.95</entry><entry align="center" valign="middle">0.61</entry></row></tbody></tgroup></table></tables>
EXAMPLE 14
0065A coating stock solution comprising 80.4 mass% of a solvent (manufactured by Japan Alcohol Trading Co., Ltd., SOLMIX AP-11), 12.0 mass% of 0.07 mol/L HNO<sub>3</sub> and 7.67 mass% of tetraethoxysilane was prepared. The stock solution was diluted with water to obtain a coating liquid having a solid content concentration of 1 mass%.
0066Application of one cycle was carried in the same manner as in Example 1 except that this coating liquid was used. The glass substrate was observed by a scanning electron microscope and as a result, no silicon oxide film was formed. The reflectance of the glass substrate is shown in <figref idref="f0001">Fig. 2</figref>. As compared with the reflectance of the glass substrate alone before application of the coating liquid, substantially no decrease in the reflectance was observed.
EXAMPLES 15 to 17
0067A glass substrate on which a silicon oxide film was formed was obtained in the same manner as in Example 13 except that the temperature of the glass substrate was changed to the temperature as identified in Table 4, and the number of application cycles was as identified in Table 4.
0068The solidified state of the coating liquid on the surface of the glass substrate was observed. The results are shown in Table 4. With respect to a glass substrate on which the coating liquid was solidified and formation of a silicon oxide film was confirmed, the reduction in the reflectance and the haze were measured. The results are shown in Table 4.
0069With respect to the sample applied to the glass substrate at a temperature of 300°C, the coating liquid was not solidified, and no silicon oxide film was formed. <tables id="tabl0004" num="0004"><table frame="all"><title>TABLE 4</title><tgroup cols="10"><colspec colnum="1" colname="col1" colwidth="18mm" /><colspec colnum="2" colname="col2" colwidth="25mm" /><colspec colnum="3" colname="col3" colwidth="26mm" /><colspec colnum="4" colname="col4" colwidth="26mm" /><colspec colnum="5" colname="col5" colwidth="26mm" /><colspec colnum="6" colname="col6" colwidth="26mm" /><colspec colnum="7" colname="col7" colwidth="27mm" /><colspec colnum="8" colname="col8" colwidth="26mm" /><colspec colnum="9" colname="col9" colwidth="18mm" /><colspec colnum="10" colname="col10" colwidth="27mm" /><thead><row><entry align="center" valign="middle">Example</entry><entry align="center" valign="middle">Silicone oil</entry><entry align="center" valign="middle">25°C kinematic viscosity (mm<sup>2</sup>/s)</entry><entry align="center" valign="middle">Viscosity average molecular weight (×1000)</entry><entry align="center" valign="middle">Liquid medium</entry><entry align="center" valign="middle">Application cycle (number)</entry><entry align="center" valign="middle">Temperature of glass substrate (°C)</entry><entry align="center" valign="middle">Reduction in reflectance (%)</entry><entry align="center" valign="middle">Haze (%)</entry><entry align="center" valign="middle">Solidified state of coating liquid</entry></row></thead><tbody><row><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">Mercapto-modified silicone oil</entry><entry align="center" valign="middle">300</entry><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">1</entry><entry align="center" valign="middle">300</entry><entry align="center" valign="middle">-</entry><entry align="center" valign="middle">-</entry><entry align="center" valign="middle">Not solidified</entry></row><row><entry align="center" valign="middle">16</entry><entry align="center" valign="middle">Mercapto-modified silicone oil</entry><entry align="center" valign="middle">300</entry><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">1</entry><entry align="center" valign="middle">400</entry><entry align="center" valign="middle">2.13</entry><entry align="center" valign="middle">1.43</entry><entry align="center" valign="middle">Partially not solidified</entry></row><row><entry align="center" valign="middle">17</entry><entry align="center" valign="middle">Mercapto-modified silicone oil</entry><entry align="center" valign="middle">300</entry><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">1</entry><entry align="center" valign="middle">500</entry><entry align="center" valign="middle">1.35</entry><entry align="center" valign="middle">0.84</entry><entry align="center" valign="middle">Solidified</entry></row><row><entry align="center" valign="middle">13</entry><entry align="center" valign="middle">Mercapto-modified silicone oil</entry><entry align="center" valign="middle">300</entry><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">n-Hexane</entry><entry align="center" valign="middle">5</entry><entry align="center" valign="middle">600</entry><entry align="center" valign="middle">1.95</entry><entry align="center" valign="middle">0.61</entry><entry align="center" valign="middle">Solidified</entry></row></tbody></tgroup></table></tables>
EXAMPLE 18
0070Using a glass production apparatus shown in <figref idref="f0002">Fig. 3</figref>, a glass substrate on which a silicon oxide film is formed is produced. The glass production apparatus 20 comprises a melting furnace 22 which melts glass raw materials into molten glass 30, a float bath 26 which forms the molten glass 30 into a glass ribbon 32 to be a glass substrate by floating the molten glass 30 supplied from the melting furnace 22 on the surface of molten tin 24, an annealing furnace 28 to anneal the glass ribbon 32, and an air spray gun 34 provided between the outlet of the float bath 26 and the inlet of the annealing furnace 28 with a height of 570 mm above the glass ribbon 32. The glass ribbon 32 which has left the annealing furnace 28 is cut by a cutting apparatus not shown to be a glass substrate.
0071A coating liquid comprising 50 mass% of n-decane (manufactured by Japan Energy Corporation) and 50 mass% of a long chain alkyl-modified silicone oil (manufactured by Shin-Etsu Chemical Co., Ltd., model: KF-412, viscosity average molecular weight: 18,000, exothermic peak temperature: 490°C) is prepared.
0072The coating liquid is sprayed from a spray gun 34 over the glass ribbon 32 moving at a transfer rate of 4.2 m/min, at a position between the float bath 26 and the annealing furnace 28 at which the surface temperature of the glass ribbon 32 is 600°C, at a liquid-sending rate of 36 kg/hr under a spraying pressure of 4.5 kg/cm<sup>2</sup> to form a film of the silicone oil on the glass ribbon 32, and then the silicone oil is thermally decomposed to form a silicon oxide film on the glass ribbon 32.
EXAMPLES 19 to 23
0073A glass substrate on which a silicon oxide film is formed is obtained in the same manner as in Example 1 except that the application time in each step was 0.3 second, the number of cycles of application of the silicone oil is as identified in Table 5, and the type of the silicone oil and the liquid medium are changed. The results are shown in Table 5. <tables id="tabl0005" num="0005"><table frame="all"><title>TABLE 5</title><tgroup cols="9"><colspec colnum="1" colname="col1" colwidth="18mm" /><colspec colnum="2" colname="col2" colwidth="38mm" /><colspec colnum="3" colname="col3" colwidth="28mm" /><colspec colnum="4" colname="col4" colwidth="29mm" /><colspec colnum="5" colname="col5" colwidth="26mm" /><colspec colnum="6" colname="col6" colwidth="30mm" /><colspec colnum="7" colname="col7" colwidth="30mm" /><colspec colnum="8" colname="col8" colwidth="30mm" /><colspec colnum="9" colname="col9" colwidth="18mm" /><thead><row><entry align="center" valign="middle">Example</entry><entry valign="middle">Silicone oil</entry><entry align="center" valign="middle">25°C kinematic viscosity (mm<sup>2</sup>/s)</entry><entry align="center" valign="middle">Viscosity average molecular weight (×1000)</entry><entry align="center" valign="middle">Liquid medium</entry><entry align="center" valign="middle">Application cycle (number)</entry><entry align="center" valign="middle">Exothermic peak temperature (°C)</entry><entry align="center" valign="middle">Reduction in reflectance (%)</entry><entry align="center" valign="middle">Haze (%)</entry></row></thead><tbody><row><entry align="center" valign="middle">19</entry><entry align="center" valign="middle">Dimethyl silicone oil</entry><entry align="center" valign="middle">300</entry><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">n-Decane</entry><entry align="center" valign="middle">30</entry><entry align="center" valign="middle">540</entry><entry align="center" valign="middle">0.1</entry><entry align="center" valign="middle">0.16</entry></row><row><entry align="center" valign="middle">20</entry><entry align="center" valign="middle">Long chain alkyl-modified silicone oil</entry><entry align="center" valign="middle">500</entry><entry align="center" valign="middle">18</entry><entry align="center" valign="middle">n-Decane</entry><entry align="center" valign="middle">30</entry><entry align="center" valign="middle">490</entry><entry align="center" valign="middle">1.51</entry><entry align="center" valign="middle">0.86</entry></row><row><entry align="center" valign="middle">21</entry><entry align="center" valign="middle">Epoxy-modified silicone oil</entry><entry align="center" valign="middle">1500</entry><entry align="center" valign="middle">30</entry><entry align="center" valign="middle">n-Toluene</entry><entry align="center" valign="middle">30</entry><entry align="center" valign="middle">460</entry><entry align="center" valign="middle">1.15</entry><entry align="center" valign="middle">0.82</entry></row><row><entry align="center" valign="middle">22</entry><entry align="center" valign="middle">Long chain alkyl-modified silicone oil</entry><entry align="center" valign="middle">500</entry><entry align="center" valign="middle">18</entry><entry align="center" valign="middle">n-Decane</entry><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">440</entry><entry align="center" valign="middle">2.20</entry><entry align="center" valign="middle">0.18</entry></row><row><entry align="center" valign="middle">23</entry><entry align="center" valign="middle">Triethoxysilylethyl polydimethylsiloxyethyl hexyl dimethicone</entry><entry align="center" valign="middle">45</entry><entry align="center" valign="middle">3.5</entry><entry align="center" valign="middle">n-Decane</entry><entry align="center" valign="middle">15</entry><entry align="center" valign="middle">540</entry><entry align="center" valign="middle">1.51</entry><entry align="center" valign="middle">0.23</entry></row></tbody></tgroup></table></tables>
INDUSTRIAL APPLICABILITY
0074The glass substrate having a silicon oxide film obtained by the production process of the present invention is useful as a cover glass for a solar cell, a protective plate for a display, glass for an automobile, glass for a railway vehicle, glass for shipping, glass for a building material, etc.
0075The entire disclosures of Japanese Patent Application No. <patcit id="pcit0002" dnum="JP2008317407A"><text>2008-317407 filed on December 12, 2008</text></patcit> and Japanese Patent Application No. <patcit id="pcit0003" dnum="JP2009256068A"><text>2009-256068 filed on November 9,2009</text></patcit> including specifications, claims, drawings and summaries are incorporated herein by reference in their entireties.
REFERENCE SYMBOLS
0076<dl id="dl0001" compact="compact"><dt>10:</dt><dd>glass substrate</dd><dt>26:</dt><dd>float bath</dd><dt>28:</dt><dd>annealing furnace</dd><dt>30:</dt><dd>molten glass</dd><dt>32:</dt><dd>glass ribbon</dd><dt>34:</dt><dd>air spray gun</dd></dl>
Contents16
6 sheets
Sheet 1 Sheet 2 Sheet 3 Sheet 4 Sheet 5 Sheet 6
Every citation, both ways
| Document | Relation | Office | Cited during |
|---|---|---|---|
| US9309148B2 | Cited by | United States of America | Applicant |
| CN110183110A | Cited by | China | Search report |
| WO2019100049A1 | Cited by | World Intellectual Property Organization (WIPO) | International search |
| US11603328B2 | Cited by | United States of America | Applicant |
| EP0911301A1 | Cites | European Patent Office (EPO) | Search report |
| DE102007025590A1 | Cites | Germany | Search report |
| JP2001151536A | Cites | Japan | Search report |
| JP3475460B2 | Cites | Japan | Search report |
6 members in 4 offices
Priority claims5
| Document | Office | Kind | Date |
|---|---|---|---|
| 2008317407 | Japan | – | |
| 2008317407 | Japan | A | |
| 2009256068 | Japan | – | |
| 2009256068 | Japan | A | |
| 2009070706 | Japan | W |
Members6
| Document | Office | Kind | |
|---|---|---|---|
| WO2010067850A1 | World Intellectual Property Organization (WIPO) | A1 | |
| TW201033148A | Taiwan Province of China | A | |
| EP2377832A1This record | European Patent Office (EPO) | A1 | |
| JPWO2010067850A1 | Japan | A1 | |
| JP5545221B2 | Japan | B2 | |
| EP2377832A4 | European Patent Office (EPO) | A4 |
12 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Application deemed to be withdrawnWithdrawn18D | 18D | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA | STAA | |
| Supplementary search report drawn up and despatchedA4 | A4 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Request for extension of the european patent (deleted)DAX | DAX | |
| Party data changed (applicant data changed or rights of an application transferred)RAP1 | RAP1 | |
| Request for examination filed17P | 17P | |
| Designated contracting statesAK | AK | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI |
Numbers
- Publication
- 2377832
- Application
- 98319544
Titles3
- German
- VERFAHREN ZUR HERSTELLUNG VON GLASSUBSTRAT MIT DARAN GEBUNDENEM SILICIUMOXIDFILM
- English
- METHOD FOR PRODUCING GLASS SUBSTRATE HAVING SILICON OXIDE FILM ATTACHED THERETO
- French
- PROCÉDÉ POUR LA FABRICATION D'UN SUBSTRAT EN VERRE AYANT UN FILM D'OXYDE DE SILICIUM FIXÉ SUR CELUI-CI
Classification
- IPC, 4
- C03C17 30
- C03C17 00
- C03C17 25
- C09D183 04
Designated states36
- Contracting states, 36
- Austria
- Belgium
- Bulgaria
- Switzerland
- Cyprus
- Czechia
- Germany
- Denmark
- Estonia
- Spain
- Finland
- France
- United Kingdom
- Greece
- Croatia
- Hungary
- Ireland
- Iceland
- Italy
- Liechtenstein
- Lithuania
- Luxembourg
- Latvia
- Monaco
and 12 moreShow fewer
- North Macedonia
- Malta
- Netherlands (Kingdom of the)
- Norway
- Poland
- Portugal
- Romania
- Sweden
- Slovenia
- Slovakia
- San Marino
- Türkiye