EP2377832A1

Method for producing glass substrate having silicon oxide film attached thereto

Abstract

To provide a process for producing a glass substrate provided with a silicon oxide film having a low light reflectance and a high light transmittance, with good production efficiency, with which a silicon oxide film can be directly formed on a glass substrate or a glass ribbon at high temperature. (1) A process for producing a glass substrate provided with a silicon oxide film, which comprises applying an organopolysiloxane to a glass substrate within a temperature range of from 400 to 650°C, which is thermally decomposed on the glass substrate to form a silicon oxide film, and (2) a process for producing a glass substrate provided with a silicon oxide film, which is a process for producing a glass substrate comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein an organopolysiloxane is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650°C to form a silicon oxide film on the glass ribbon.

EP2377832A1, drawing sheet 1
Sheet 1 of 6

Term

Projected expiry 10 December 2029.

  1. Priority
  2. Filed
  3. Published
  4. Today
  5. Projected expiry

18 claims: 5 independent, 13 dependent

  1. 1
    A process for producing a glass substrate provided with a silicon oxide film, which comprises applying an organopolysiloxane to a glass substrate within a temperature range of from 400 to 650°C to form a silicon oxide film on the glass substrate.
  2. 2
    The production process according to Claim 1, wherein, as the organopolysiloxane, an organopolysiloxane having a main exothermic peak when heated at a heating rate of 10 °C/min within a range of at least 300°C and less than the temperature of the glass substrate when the organopolysiloxane is applied, is used.
  3. 3
    The production process according to Claim 2, wherein the difference between the main exothermic peak temperature of the organopolysiloxane when heated at a heating rate of 10 °C/min and the temperature of the glass substrate when the organopolysiloxane is applied, is at least 50°C.
  4. 4
    The production process according to any one of Claims 1 to 3, wherein a coating liquid containing the organopolysiloxane and a liquid medium is applied to the glass substrate.
  5. 5
    The production process according to Claim 4, wherein the boiling point of the liquid medium is at least 60°C.
  6. 6
    The production process according to any one of Claims 1 to 5, wherein the organopolysiloxane is a silicone oil.
  7. 7
    A process for producing a glass substrate provided with a silicon oxide film, which comprises applying a coating liquid containing a silicone oil and a solvent to a glass substrate heated to a temperature of from 400 to 650°C to form a silicon oxide film.
  8. 8
    The production process accruing to Claim 7, wherein the boiling point of the solvent is at least 60°C.
  9. 9
    The production process according to Claim 6 or 7, wherein the viscosity average molecular weight of the silicone oil is from 3,500 to 130,000.
  10. 10
    A process for producing a glass substrate provided with a silicon oxide film, which is a process for producing a glass substrate comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein an organopolysiloxane is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650°C to form a silicon oxide film on the glass ribbon.
  11. 11
    The production process according to Claim 10, wherein the process for producing a glass substrate is a process for producing glass by the float process, the molten glass is formed into a glass ribbon in a float bath in the procedure for production of glass by the float process, and the organopolysiloxane is applied between the float bath and the annealing step or in the annealing step.
  12. 12
    The production process according to Claim 10 or 11, wherein, as the organopolysiloxane, an organopolysiloxane having a main exothermic peak when heated at a heating rate of 10 °C/min within a range of at least 300°C and less than the temperature of the glass ribbon at a position where the organopolysiloxane is applied, is used.
  13. 13
    The production process according to Claim 12, wherein the difference between the main exothermic peak temperature of the organopolysiloxane when heated at a heating rate of 10 °C/min and the temperature of the glass ribbon at a position where the organopolysiloxane is applied, is at least 50°C.
  14. 14
    The production process according to any one of Claims 10 to 13, wherein a coating liquid containing the organopolysiloxane and a liquid medium is applied to the glass ribbon.
  15. 15
    The production process according to Claim 14, wherein the boiling point of the liquid medium is at least 60°C.
  16. 16
    The production process according to any one of Claims 10 to 15, wherein the organopolysiloxane is a silicone oil.
  17. 17
    The production process according to Claim 16 , wherein the viscosity average molecular weight of the silicone oil is from 3,500 to 130,000.
  18. 18
    A process for producing a glass substrate provided with a silicon oxide film, which comprises, between a step of forming molten glass by the float process to obtain a glass substrate and an annealing step of annealing the glass substrate, or in the annealing step, applying the coating liquid as defined in any one of Claims 7 to 9 to the glass substrate.
Independent claims18