EP2244281A4
Curable composition for nanoimprint and pattern-forming method
Abstract
This record has no abstract on file.
Term
Projected expiry 9 February 2029.
- Priority
- Filed
- Published
- Today
- Projected expiry
Every citation, both ways
| Document | Relation | Office | Cited during |
|---|---|---|---|
| EP1840652A1 | Cites | European Patent Office (EPO) | Search report |
| US2003062638A1 | Cites | United States of America | Search report |
| US4413052A | Cites | United States of America | Search report |
| See also references of WO 2009101913A1 | Non-patent | – | Search report |
9 members in 5 offices
Priority claims5
| Document | Office | Kind | Date |
|---|---|---|---|
| 2008030854 | Japan | – | |
| 2008030854 | Japan | A | |
| 2008207844 | Japan | – | |
| 2008207844 | Japan | A | |
| 2009052139 | Japan | W |
Members9
| Document | Office | Kind | |
|---|---|---|---|
| WO2009101913A1 | World Intellectual Property Organization (WIPO) | A1 | |
| JP2009218550A | Japan | A | |
| US2009283937A1 | United States of America | A1 | |
| EP2244281A1 | European Patent Office (EPO) | A1 | |
| KR20100121462A | Republic of Korea | A | |
| US8025833B2 | United States of America | B2 | |
| EP2244281A4This record | European Patent Office (EPO) | A4 | |
| JP5243887B2 | Japan | B2 | |
| KR101534545B1 | Republic of Korea | B1 |
15 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Application deemed to be withdrawnWithdrawn18D | 18D | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA | STAA | |
| Supplementary search report drawn up and despatchedA4 | A4 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Request for extension of the european patent (deleted)DAX | DAX | |
| Request for examination filed17P | 17P | |
| Designated contracting statesAK | AK | |
| Request for extension of the european patentAX | AX | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI |
Numbers
- Publication
- 2244281
- Application
- 97102990
Titles3
- German
- HÄRTBARE ZUSAMMENSETZUNG FÜR EIN NANOIMPRINT- UND MUSTERFORMUNGSVERFAHREN
- English
- CURABLE COMPOSITION FOR NANOIMPRINT AND PATTERN-FORMING METHOD
- French
- COMPOSITION DURCISSABLE POUR NANO-IMPRESSION ET PROCÉDÉ DE FORMATION DE MOTIF
Classification
- CPC, 11
- G03F7/0002
- G03F7/028
- B82Y10/00
- B82Y40/00
- G03F7/027
- C08F222/102
- C08F220/303
- B29C2059/023
- C08F220/30
- C08F222/1006
- H10P76/00
- IPC, 7
- H01L21 027
- B29C59 02
- C08F12 32
- C08F20 10
- C08F26 12
- G03F7 00
- G03F7 027
Designated states35
- Contracting states, 35
- Austria
- Belgium
- Bulgaria
- Switzerland
- Cyprus
- Czechia
- Germany
- Denmark
- Estonia
- Spain
- Finland
- France
- United Kingdom
- Greece
- Croatia
- Hungary
- Ireland
- Iceland
- Italy
- Liechtenstein
- Lithuania
- Luxembourg
- Latvia
- Monaco
and 11 moreShow fewer
- North Macedonia
- Malta
- Netherlands (Kingdom of the)
- Norway
- Poland
- Portugal
- Romania
- Sweden
- Slovenia
- Slovakia
- Türkiye