Nova Patents
EP2017368A3

Precursor Compositions And Methods

Abstract

Compositions including an amido-group-containing vapor deposition precursor and a stabilizing additive are provided. Such compositions have improved thermal stability and increased volatility as compared to the amido-group-containing vapor deposition precursor itself. These compositions are useful in the deposition of thin films, such as by atomic layer deposition.

Term

1.8 yearsto projected expiry

Projected expiry 11 July 2028, counted from filing; an application has no term until it is granted.

  1. Priority
  2. Filed
  3. Published
  4. Today
  5. Projected expiry

Every citation, both ways

Citations
DocumentRelationOfficeCategoryCited duringRelevant claims
EP1640475A2CitesEuropean Patent Office (EPO)ASearch report1,7
WO2006021850A2CitesWorld Intellectual Property Organization (WIPO)ASearch report1,7
WO2007005088A2CitesWorld Intellectual Property Organization (WIPO)ASearch report1,7
WO2007015436A1CitesWorld Intellectual Property Organization (WIPO)ASearch report1,7
WO2008128141A2CitesWorld Intellectual Property Organization (WIPO)ESearch report1-10
US6984591B1CitesUnited States of AmericaASearch report1,7