EP1925444A4

Base with film and glass for film formation

Abstract

This record has no abstract on file.

EP1925444A4, drawing sheet 1 — Sheet 1 of 8

Term

Term ended

Projected expiry passed 14 August 2026, 0.1 years ago.

8 sheets

Sheet 1
Sheet 2
Sheet 3
Sheet 4
Sheet 5
Sheet 6
Sheet 7
Sheet 8

Every citation, both ways

Citations
Reference	Relation	Cited during
ENEVA J ET AL: "The fabrication of microrelief structures in evaporated Ag/a-Ge30S70 layers", JOURNAL OF MATERIALS SCIENCE: MATERIALS IN ELECTRONICS KLUWER ACADEMIC PUBLISHERS/CHAPMAN & HALL USA, vol. 10, no. 7, September 1999 (1999-09-01), pages 529 - 531, XP002530004, ISSN: 0957-4522	Non-patent	Search report

15 members in 7 offices; this record represents the family

This recordMember, by publication datePriority claim

Priority claims5

Priority claims
Document	Office	Kind	Date
2005244332	Japan	–	2005-08-25
2005244332	Japan	A	2005-08-25
2005263774	Japan	–	2005-09-12
2005263774	Japan	A	2005-09-12
2006316027	Japan	W	2006-08-14

Members15

Family members, oldest first
Document	Office	Kind
WO2007023708A1	World Intellectual Property Organization (WIPO)	A1	2007-03-01
TW200722287A	Taiwan Province of China	A	2007-06-16
KR20080038169A	Republic of Korea	A	2008-05-02
EP1925444A1	European Patent Office (EPO)	A1	2008-05-28
CN101247950A	China	A	2008-08-20
US2008226900A1	United States of America	A1	2008-09-18
JPWO2007023708A1	Japan	A1	2009-02-26
EP1925444A4This record	European Patent Office (EPO)	A4	2009-08-05
EP2180078A1	European Patent Office (EPO)	A1	2010-04-28
US7923115B2	United States of America	B2	2011-04-12
CN101247950B	China	B	2013-01-23
JP5136054B2	Japan	B2	2013-02-06
KR101296415B1	Republic of Korea	B1	2013-08-13
EP2180078B1	European Patent Office (EPO)	B1	2013-12-11
TWI429538B	Taiwan Province of China	B	2014-03-11

14 legal events, as the office reported them to INPADOC

Over the term

Point at a mark for the event

Events

Legal events, newest first
	Event	Code
2010-10-27	Application deemed to be withdrawnWithdrawn18D	18D
2010-09-24	Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA	STAA
2009-12-30	First examination report despatched17Q	17Q
2009-08-05	Supplementary search report drawn up and despatchedA4	A4
2009-07-29	Information provided on ipc code assigned before grantRIC1	RIC1
2009-07-29	Information provided on ipc code assigned before grantRIC1	RIC1
2009-07-29	Information provided on ipc code assigned before grantRIC1	RIC1
2009-07-29	Information provided on ipc code assigned before grantRIC1	RIC1
2009-07-29	Information provided on ipc code assigned before grantRIC1	RIC1
2009-07-29	Information provided on ipc code assigned before grantRIC1	RIC1
2009-07-29	Information provided on ipc code assigned before grantRIC1	RIC1
2008-05-28	Request for examination filed17P	17P
2008-05-28	Designated contracting statesAK	AK
2008-04-25	Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI	PUAI