EP1632813A3
Exposure system and pattern formation method
Abstract
An exposure system includes an exposure section (50) provided within a chamber (30) for irradiating a resist film formed on a wafer (40) with exposing light through a mask (41) with an immersion liquid (42) provided on the resist film. It further includes a drying section (54) for drying the surface of the resist film after the irradiation.
Term
Term ended
Projected expiry passed 19 August 2025, 1.1 years ago.
- Priority
- Filed
- Published
- Projected expiry
- Today
1 sheet
Sheet 1
Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| EP0605103A1 | Cites | European Patent Office (EPO) | X | Search report | 1,2,4,5,7,11-15,18-20 |
| EP1598705A1 | Cites | European Patent Office (EPO) | E | Search report | 1-3,5,6,9,11-16,19,20,22-24 |
| EP1601008A1 | Cites | European Patent Office (EPO) | E | Search report | 1,2,4,5,10-15,17,19,20,25-27 |
| EP1672682A1 | Cites | European Patent Office (EPO) | E | Search report | 1-5,7-20,22-27 |
| WO2005024325A2 | Cites | World Intellectual Property Organization (WIPO) | PX | Search report | 1,5,11,13,14 |
7 members in 4 offices; this record represents the family
Priority claims2
| Document | Office | Kind | Date |
|---|---|---|---|
| 2004259769 | Japan | – | |
| 2004259769 | Japan | A |
Members7
| Document | Office | Kind | |
|---|---|---|---|
| EP1632813A2 | European Patent Office (EPO) | A2 | |
| US2006051709A1 | United States of America | A1 | |
| CN1746774A | China | A | |
| JP2006080143A | Japan | A | |
| EP1632813A3This record | European Patent Office (EPO) | A3 | |
| US7470501B2 | United States of America | B2 | |
| US2009091719A1 | United States of America | A1 |
11 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Application withdrawnWithdrawn18W | 18W | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION HAS BEEN WITHDRAWNSTAA | STAA | |
| Party data changed (applicant data changed or rights of an application transferred)RAP1 | RAP1 | |
| Designation fees paidAKX | AKX | |
| Request for examination filed17P | 17P | |
| Designated contracting statesAK | AK | |
| Request for extension of the european patentAX | AX | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | |
| Designated contracting statesAK | AK | |
| Request for extension of the european patentAX | AX | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI |
Numbers
- Publication
- 1632813
- Application
- 50181064
Titles3
- German
- Belichtungsanlage und Verfahren zur Herstellung von Mustern
- English
- Exposure system and pattern formation method
- French
- Système d'exposition et procédé pour la formation de motifs
Classification
- CPC, 4
- G03F7/70341
- G03F7/70733
- G03F7/70866
- Y10S430/146
- IPC, 1
- G03F7 20
Designated states36
- Contracting states, 31
- Austria
- Belgium
- Bulgaria
- Switzerland
- Cyprus
- Czechia
- Germany
- Denmark
- Estonia
- Spain
- Finland
- France
- United Kingdom
- Greece
- Hungary
- Ireland
- Iceland
- Italy
- Liechtenstein
- Lithuania
- Luxembourg
- Latvia
- Monaco
- Netherlands (Kingdom of the)
and 7 moreShow fewer
- Poland
- Portugal
- Romania
- Sweden
- Slovenia
- Slovakia
- Türkiye
- Extension states, 5
- Albania
- Bosnia and Herzegovina
- Croatia
- North Macedonia
- Yugoslavia, later Serbia and Montenegro (until 2006)