EP1595005A1

METHOD OF FORMING A Ta2O5 COMPRISING LAYER

Abstract

This record has no abstract on file.

Term

Term ended

Projected expiry passed 3 February 2024, 2.6 years ago.

  1. Priority
  2. Filed
  3. Published
  4. Projected expiry
  5. Today

13 members in 7 offices

This recordMember, by publication datePriority claim

Priority claims3

Priority claims
DocumentOfficeKindDate
358764United States of America
35876403United States of AmericaA
2004003046United States of AmericaW

Members13

Family members, oldest first
DocumentOfficeKind
US2004152254A1United States of AmericaA1
WO2004070078A1World Intellectual Property Organization (WIPO)A1
TW200424339ATaiwan Province of ChinaA
WO2004070078B1World Intellectual Property Organization (WIPO)B1
US6863725B2United States of AmericaB2
KR20050103210ARepublic of KoreaA
EP1595005A1This recordEuropean Patent Office (EPO)A1
TWI248983BTaiwan Province of ChinaB
CN1748043AChinaA
JP2006516809AJapanA
KR100743312B1Republic of KoreaB1
JP4366696B2JapanB2
CN1748043BChinaB