EP1586008A4
Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
29 sheets
Sheet 1 Sheet 2 Sheet 3 Sheet 4 Sheet 5 Sheet 6 Sheet 7 Sheet 8 Sheet 9 Sheet 10 Sheet 11 Sheet 12 Sheet 13 Sheet 14 Sheet 15 Sheet 16 Sheet 17 Sheet 18 Sheet 19 Sheet 20 Sheet 21 Sheet 22 Sheet 23 Sheet 24 Sheet 25 Sheet 26 Sheet 27 Sheet 28 Sheet 29
Every citation, both waysCites: the store holds 3 of 4
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| US2003138706A1 | Cites | United States of America | XP | Search report | 1-149 |
| US5310623A | Cites | United States of America | X | Search report | 61-73,121-133 |
| US6335151B1 | Cites | United States of America | X | Search report | 61-73,121-133 |
| HENKE W ET AL: "Simulation and process design of gray-tone lithography for the fabrication of arbitrarily shaped surfaces", JAPANESE JOURNAL OF APPLIED PHYSICS, PART 1 (REGULAR PAPERS & SHORT NOTES) JAPAN, vol. 33, no. 12B, December 1994 (1994-12-01), pages 6809 - 6815, XP002409096, ISSN: 0021-4922 | Non-patent | – | – | Search report | – |
13 members in 7 offices
Priority claims9
| Document | Office | Kind | Date |
|---|---|---|---|
| 349629 | United States of America | – | |
| 34962903 | United States of America | A | |
| 34962903 | United States of America | A | |
| 2004001752 | United States of America | W | |
| 2004001752 | United States of America | W | |
| 349629 | – | – | – |
| US20030349629 | – | – | – |
| US2004001752 | – | – | – |
| WO2004US01752 | – | – | – |
Members13
| Document | Office | Kind | |
|---|---|---|---|
| WO2004066358A2 | World Intellectual Property Organization (WIPO) | A2 | |
| WO2004066358A3 | World Intellectual Property Organization (WIPO) | A3 | |
| US6828068B2 | United States of America | B2 | |
| TW200502706A | Taiwan Province of China | A | |
| US2005118515A1 | United States of America | A1 | |
| KR20050095857A | Republic of Korea | A | |
| EP1586008A2 | European Patent Office (EPO) | A2 | |
| CN1705915A | China | A | |
| JP2006516751A | Japan | A | |
| US7074530B2 | United States of America | B2 | |
| US2006210891A1 | United States of America | A1 | |
| EP1586008A4This record | European Patent Office (EPO) | A4 | |
| US7473500B2 | United States of America | B2 |
11 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Application deemed to be withdrawnWithdrawn18D | 18D | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA | STAA | |
| Information related to observations by third parties deletedORIGINAL CODE: EPIDOSDTIPATPAB | TPAB | |
| Observations by third partiesORIGINAL CODE: EPIDOSNTIPATPAC | TPAC | |
| First examination report despatched17Q | 17Q | |
| Supplementary search report drawn up and despatchedA4 | A4 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Request for examination filed17P | 17P | |
| Designated contracting statesAK | AK | |
| Request for extension of the european patentAX | AX | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI |
Numbers
- Publication
- 1586008
- Publication, DOCDB
- 1586008
- Publication, EPODOC
- EP1586008
- Application
- 4704433
- Application, DOCDB
- 04704433
- Application, EPODOC
- EP20040704433
Titles3
- German
- BINÄRE HALBTONFOTOMASKEN UND MIKROSKOPISCHE DREIDIMENSIONALE EINRICHTUNGEN UND VERFAHREN ZU IHRER HERSTELLUNG
- English
- BINARY HALF TONE PHOTOMASKS AND MICROSCOPIC THREE-DIMENSIONAL DEVICES AND METHOD OF FABRICATING THE SAME
- French
- MASQUES PHOTOGRAPHIQUES A DEMI-TEINTE BINAIRE, DISPOSITIFS TRIDIMENSIONNELS MICROSCOPIQUES ET PROCEDES DE FABRICATION ASSOCIES
Classification
- CPC, 9
- B82Y10/00
- G03F1/62
- G03C5/00
- B82Y40/00
- G03F7/0002
- G03F7/0005
- G03F1/50
- G03F1/38
- G03F9/00
- IPC, 10
- G03C5 00
- G03F1 00
- G03F7 00
- G03F9 00
- G06F17 50
- G06K15 00
- H01L
- H01L21 027
- H04N1 405
- G03F1 14
Designated states2
- Contracting states, 1
- Türkiye
- Extension states, 1
- North Macedonia
