Nova Patents
EP1580651A1

Acoustic wave type contact detector

Abstract

Two groups of inclined lines 40, 42, which are included in a spurious wave scattering means 50, are formed at opposite angles with respect to each other in the vicinity of an upper edge 24 of a substrate 2. The angles of the inclined lines are such that they are close to perpendicular toward the central portion of the substrate, and gradually decrease toward the edges thereof. In a similar manner, two other groups inclined lines 46, 48, which are also included in the spurious wave scattering means 50, are formed at opposite angles with respect to each other, with gradually changing angles. The spurious waves that reach these regions are diffused by the inclined lines 40, 42, 46, 48, so that they are not propagated to converters 12, 14 (sensors). Three rectangular spurious wave scattering means 34, 36, 38, formed by inclined lines, inclined at angles other than 45°, also function to diffuse and eliminate spurious waves that propagate along the front surface of the substrate 2.

EP1580651A1, drawing sheet 1
Sheet 1 of 12

Term

Term ended

Projected expiry passed 11 November 2023, 2.9 years ago.

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  2. Filed
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  4. Projected expiry
  5. Today

4 claims: 3 independent, 1 dependent

  1. 1
    An acoustic wave contact detecting apparatus(1) comprising:a substrate(2) having a surface along which acoustic waves propagate;an acoustic wave generating means(78, 80);a reflection array(18, 22, 28, 32, 33) for causing the generated acoustic waves to propagate along the surface of the substrate (2) ;a detector (12, 14) for detecting changes in the acoustic wave caused by an object contacting the surface of the substrate;anda controller(6) for determining the geometric coordinates of the object;wherein: a spurious wave scattering means(34, 36, 38, 43, 49) for diffusing spurious waves, which are generated accompanying the generation of the acoustic waves, is formed on the substrate(2).
  2. 2
    An acoustic wave contact detecting apparatus (1) as defined in claim 1, wherein:the spurious wave scattering means(34, 36, 38, 43, 49) comprises a reflection array(18, 22, 28, 32, 33) formed of the same material as that of the substrate.
  3. 4
    An acoustic wave contact detecting apparatus (1) as defined in claim 1, wherein:the acoustic wave generating means(78, 80) and the spurious wave scattering means(34, 36, 38, 43, 49) are formed by etching.