Method of manufacturing single-crystal GaN substrate, and single-crystal GaN substrate
Abstract
Manufacture at lower cost of off-axis GaN single-crystal freestanding substrates having a crystal orientation that is displaced from (0001) instead of (0001) exact. With an off-axis (111) GaAs wafer as a starting substrate, GaN is vapor-deposited onto the starting substrate, which grows GaN crystal that is inclined at the same off-axis angle and in the same direction as is the starting substrate. Misoriented freestanding GaN substrates may be manufactured, utilizing a misoriented (111) GaAs baseplate as a starting substrate, by forming onto the starting substrate a mask having a plurality of apertures, depositing through the mask a GaN single-crystal layer, and then removing the starting substrate. The manufacture of GaN crystal having a misorientation of 0.1° to 25° is made possible.
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Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| WO0168955A1 | Cites | World Intellectual Property Organization (WIPO) | X | Search report | 10-16 |
| KIRILYUK V ET AL: "Photoluminescence study of homoepitaxial N-polar GaN grown on differently misoriented single crystal substrates", JOURNAL OF CRYSTAL GROWTH, ELSEVIER, AMSTERDAM, NL, vol. 230, no. 3-4, 1 September 2001 (2001-09-01), pages 477 - 480, XP004296555, ISSN: 0022-0248 | Non-patent | – | – | Search report | – |
| GEORGAKILAS A ET AL: "MBE GROWTH OF DIFFERENT HEXAGONAL GAN CRYSTAL STRUCTURES ON VICINAL (100) GAAS SUBSTRATES", MATERIALS SCIENCE AND ENGINEERING B, ELSEVIER SEQUOIA, LAUSANNE, CH, vol. B82, no. 1-03, 22 May 2001 (2001-05-22), pages 16 - 18, XP001150270, ISSN: 0921-5107 | Non-patent | – | – | Search report | – |
| MOTOKI K ET AL: "Preparation of large GaN substrates", MATERIALS SCIENCE AND ENGINEERING B, ELSEVIER SEQUOIA, LAUSANNE, CH, vol. 93, no. 1-3, 30 May 2002 (2002-05-30), pages 123 - 130, XP004351260, ISSN: 0921-5107 | Non-patent | – | – | Search report | – |
| ZAUNER A R A ET AL: "Homo-epitaxial GaN growth on exact and misoriented single crystals: suppression of hillock formation", JOURNAL OF CRYSTAL GROWTH, ELSEVIER, AMSTERDAM, NL, vol. 210, no. 4, 1 March 2000 (2000-03-01), pages 435 - 443, XP004191355, ISSN: 0022-0248 | Non-patent | – | – | Search report | – |
| ZAUNER A R A ET AL: "Homo-epitaxial growth on the N-face of GaN single crystals: the influence of the misorientation on the surface morphology", JOURNAL OF CRYSTAL GROWTH, ELSEVIER, AMSTERDAM, NL, vol. 240, no. 1-2, 1 April 2002 (2002-04-01), pages 14 - 21, XP004351387, ISSN: 0022-0248 | Non-patent | – | – | Search report | – |
14 members in 6 offices; this record represents the family
Priority claims4
| Document | Office | Kind | Date |
|---|---|---|---|
| 2004075674 | Japan | – | |
| 2004075674 | Japan | A | |
| 2004276337 | Japan | – | |
| 2004276337 | Japan | A |
Members14
| Document | Office | Kind | |
|---|---|---|---|
| CN1670918A | China | A | |
| EP1577933A2 | European Patent Office (EPO) | A2 | |
| US2005208687A1 | United States of America | A1 | |
| TW200532776A | Taiwan Province of China | A | |
| JP2005298319A | Japan | A | |
| KR20060043770A | Republic of Korea | A | |
| JP2006306722A | Japan | A | |
| JP3888374B2 | Japan | B2 | |
| JP2007063121A | Japan | A | |
| US2008219910A1 | United States of America | A1 | |
| EP1577933A3This record | European Patent Office (EPO) | A3 | |
| JP4479706B2 | Japan | B2 | |
| JP2010168277A | Japan | A | |
| KR20110088483A | Republic of Korea | A |
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Numbers
- Publication
- 1577933
- Application
- 52514627
Titles3
- German
- Verfahren zur Herstellung eines einkristallinen GaN-Substrats und so hergestelltes einkristalline GaN-Substrat
- English
- Method of manufacturing single-crystal GaN substrate, and single-crystal GaN substrate
- French
- Procédé de production d'un substrat monocristallin de GaN et substrat monocristallin de GaN ainsi produit
Classification
- CPC, 5
- C30B25/02
- E05B47/026
- C30B25/183
- C30B29/406
- E05B17/2084
- IPC, 8
- C30B25 18
- C30B29 40
- C30B25 02
- H01L21 205
- C30B29 38
- H01L33 16
- H01L33 32
- H10P14 24
Designated states2
- Contracting states, 1
- Türkiye
- Extension states, 1
- Yugoslavia, later Serbia and Montenegro (until 2006)