EP1577929A3
Electron beam exposure apparatus
Abstract
An electron beam exposure apparatus comprising: column 1 for irradiating an electron beam to wafer 10 serving as a sample; sample chamber 3 having vacuum pump 40 as a vacuum exhaustion unit for controlling the internal unit to a vacuum atmosphere; stage 4A arranged in the sample chamber 3 for holding and moving the wafer 10; and first mounting 5A for elastically supporting the column 1 with respect to the sample chamber 3.
Term
Term ended
Projected expiry passed 8 March 2025, 1.5 years ago.
- Priority
- Filed
- Published
- Projected expiry
- Today
1 sheet
Sheet 1
Every citation, both waysCites: the store holds 6 of 7
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| EP0797236A2 | Cites | European Patent Office (EPO) | Y | Search report | 4 |
| EP1143492A1 | Cites | European Patent Office (EPO) | Y | Search report | 2,3 |
| EP1215805A2 | Cites | European Patent Office (EPO) | A | Search report | 13,14 |
| GB1458778A | Cites | United Kingdom | Y | Search report | 5 |
| US2004145715A1 | Cites | United States of America | PA | Search report | 13 |
| US5508518A | Cites | United States of America | XAY | Search report | 1,19,20,6,10,13,17,18 |
| PATENT ABSTRACTS OF JAPAN vol. 016, no. 513 (E - 1283) 22 October 1992 (1992-10-22) | Non-patent | – | – | Search report | – |
| PATENT ABSTRACTS OF JAPAN vol. 1999, no. 09 30 July 1999 (1999-07-30) | Non-patent | – | – | Search report | – |
| PATENT ABSTRACTS OF JAPAN vol. 2003, no. 12 5 December 2003 (2003-12-05) | Non-patent | – | – | Search report | – |
| PATENT ABSTRACTS OF JAPAN vol. 2003, no. 01 14 January 2003 (2003-01-14) | Non-patent | – | – | Search report | – |
7 members in 4 offices
Priority claims5
| Document | Office | Kind | Date |
|---|---|---|---|
| 2004074209 | Japan | A | |
| 2004074209 | Japan | A | |
| 2004074209 | Japan | – | |
| 2004074209 | – | – | – |
| JP20040074209 | – | – | – |
Members7
| Document | Office | Kind | |
|---|---|---|---|
| EP1577929A2 | European Patent Office (EPO) | A2 | |
| US2005205809A1 | United States of America | A1 | |
| JP2005268268A | Japan | A | |
| EP1577929A3This record | European Patent Office (EPO) | A3 | |
| US7230257B2 | United States of America | B2 | |
| EP1577929B1 | European Patent Office (EPO) | B1 | |
| DE602005016740D1 | Germany | D1 |
23 legal events, as 3 offices reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | Office | |
|---|---|---|---|
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed because of non-payment of the annual feeLapsedMM | MM | NL | |
| Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal feeWithdrawnR119 | R119 | DE | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| No opposition filedOpposition26N | 26N | EP | |
| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA | STAA | EP | |
| Corresponds to:REF | REF | EP | |
| Designated contracting statesAK | AK | EP | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| Grant fee paidORIGINAL CODE: EPIDOSNIGR3GRAS | GRAS | EP | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOSNIGR1GRAP | GRAP | EP | |
| First examination report despatched17Q | 17Q | EP | |
| Designation fees paidAKX | AKX | EP | |
| Request for examination filed17P | 17P | EP | |
| Designated contracting statesAK | AK | EP | |
| Request for extension of the european patentAX | AX | EP | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | EP | |
| Designated contracting statesAK | AK | EP | |
| Request for extension of the european patentAX | AX | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 1577929
- Publication, DOCDB
- 1577929
- Publication, EPODOC
- EP1577929
- Application
- 5005017
- Application, DOCDB
- 05005017
- Application, EPODOC
- EP20050005017
Titles3
- German
- Elektronenstrahlbelichtungsapparat
- English
- Electron beam exposure apparatus
- French
- Appareil d'exposition pour faisceau d'électrons
Classification
- CPC, 6
- H01J37/3174
- B82Y10/00
- B82Y40/00
- H01J37/023
- H01J2237/0216
- H01J2237/0245
- IPC, 7
- H01J37 317
- H01J37 02
- G03F7 20
- H01J37 16
- H01J37 20
- H01L21 027
- H01L21 68
Designated states2
- Contracting states, 1
- Türkiye
- Extension states, 1
- Yugoslavia, later Serbia and Montenegro (until 2006)