EP1575343A4
Plasma generation device, plasma control method, and substrate manufacturing method
Abstract
This record has no abstract on file.
Term
Term ended
Projected expiry passed 12 December 2023, 2.8 years ago.
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- Filed
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- Projected expiry
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15 sheets
Sheet 1 Sheet 2 Sheet 3 Sheet 4 Sheet 5 Sheet 6 Sheet 7 Sheet 8 Sheet 9 Sheet 10 Sheet 11 Sheet 12 Sheet 13 Sheet 14 Sheet 15
Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| EP1324371A1 | Cites | European Patent Office (EPO) | PA | Search report | 1,26 |
| US2001008171A1 | Cites | United States of America | – | Search report | – |
| US6027601A | Cites | United States of America | – | Search report | – |
| US6158384A | Cites | United States of America | – | Search report | – |
| US6181069B1 | Cites | United States of America | – | Search report | – |
| US6323595B1 | Cites | United States of America | – | Search report | – |
| WO9716946A2 | Cites | World Intellectual Property Organization (WIPO) | X | Search report | 1,26 |
| WO9801893A1 | Cites | World Intellectual Property Organization (WIPO) | X | Search report | 1,26 |
| JPH1074597A | Cites | Japan | X | Search report | 1 |
| WO9801893A | Cites | World Intellectual Property Organization (WIPO) | – | – | – |
| WO9716946A | Cites | World Intellectual Property Organization (WIPO) | – | – | – |
| JP10074597A | Cites | Japan | – | – | – |
| EP1324371A | Cites | European Patent Office (EPO) | – | – | – |
| See also references of WO 2004056159A1 | Non-patent | – | – | Search report | – |
38 members in 7 offices; this record represents the family
Priority claims7
| Document | Office | Kind | Date |
|---|---|---|---|
| 2002363988 | Japan | – | |
| 2002363989 | Japan | – | |
| 2002363988 | Japan | A | |
| 2002363989 | Japan | A | |
| 2003014718 | Japan | – | |
| 2003014718 | Japan | A | |
| 0316007 | Japan | W |
Members38
| Document | Office | Kind | |
|---|---|---|---|
| WO2004056159A1 | World Intellectual Property Organization (WIPO) | A1 | |
| JP2004200232A | Japan | A | |
| JP2004200233A | Japan | A | |
| JP2004228354A | Japan | A | |
| TW200420201A | Taiwan Province of China | A | |
| JP3618333B2 | Japan | B2 | |
| KR20050088438A | Republic of Korea | A | |
| EP1575343A1 | European Patent Office (EPO) | A1 | |
| CN1726745A | China | A | |
| US2006049138A1 | United States of America | A1 | |
| JP3920209B2 | Japan | B2 | |
| EP1575343A4This record | European Patent Office (EPO) | A4 | |
| CN101127305A | China | A | |
| CN101128083A | China | A | |
| CN101128084A | China | A | |
| CN100413382C | China | C | |
| CN100546005C | China | C | |
| US7785441B2 | United States of America | B2 | |
| TW201041455A | Taiwan Province of China | A | |
| TW201041456A | Taiwan Province of China | A | |
| US2010304046A1 | United States of America | A1 | |
| EP2259663A2 | European Patent Office (EPO) | A2 | |
| KR20110106947A | Republic of Korea | A | |
| KR20110106948A | Republic of Korea | A | |
| KR20110106949A | Republic of Korea | A | |
| KR101090726B1 | Republic of Korea | B1 | |
| CN101128084B | China | B | |
| CN101128083B | China | B | |
| TWI362901B | Taiwan Province of China | B | |
| TWI368463B | Taiwan Province of China | B | |
| KR101186822B1 | Republic of Korea | B1 | |
| KR101199994B1 | Republic of Korea | B1 | |
| KR101199995B1 | Republic of Korea | B1 | |
| TWI391035B | Taiwan Province of China | B | |
| EP2259663A3 | European Patent Office (EPO) | A3 | |
| US8444806B2 | United States of America | B2 | |
| EP2259663B1 | European Patent Office (EPO) | B1 | |
| EP1575343B1 | European Patent Office (EPO) | B1 |
35 legal events, as 4 offices reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | Office | |
|---|---|---|---|
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Patent expired after termination of 20 yearsExpiredPE20 | PE20 | GB | |
| Expiry of rightR071 | R071 | DE | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Change of representativeR082 | R082 | DE | |
| Fee paymentPLFP | PLFP | FR | |
| Fee paymentPLFP | PLFP | FR | |
| Fee paymentPLFP | PLFP | FR | |
| Fee paymentPLFP | PLFP | FR | |
| No opposition filedOpposition26N | 26N | EP | |
| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA | STAA | EP | |
| No opposition filed against granted patent, or epo opposition proceedings concluded without decisionGrantedR097 | R097 | DE | |
| Change of representativeR082 | R082 | DE | |
| Dpma publication of mentioned ep patent grantGrantedR096 | R096 | DE | |
| Designated contracting statesAK | AK | EP | |
| European patent grantedGrantedFG4D | FG4D | GB | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| Grant fee paidORIGINAL CODE: EPIDOSNIGR3GRAS | GRAS | EP | |
| Intention to grant announcedINTG | INTG | EP | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | EP | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOSNIGR1GRAP | GRAP | EP | |
| Amendment of ipc main classPREVIOUS MAIN CLASS: H05H0001460000R079 | R079 | DE | |
| First examination report despatched17Q | 17Q | EP | |
| Supplementary search report drawn up and despatchedA4 | A4 | EP | |
| Designated contracting states (corrected)RBV | RBV | EP | |
| Party data changed (applicant data changed or rights of an application transferred)RAP1 | RAP1 | EP | |
| Party data changed (applicant data changed or rights of an application transferred)RAP1 | RAP1 | EP | |
| Party data changed (applicant data changed or rights of an application transferred)RAP1 | RAP1 | EP | |
| Request for examination filed17P | 17P | EP | |
| Designated contracting statesAK | AK | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 1575343
- Application
- 37807484
Titles3
- German
- PLASMAERZEUGUNGSVORRICHTUNG, PLASMASTEUERVERFAHREN UND VERFAHREN ZUR SUBSTRATHERSTELLUNG
- English
- PLASMA GENERATION DEVICE, PLASMA CONTROL METHOD, AND SUBSTRATE MANUFACTURING METHOD
- French
- DISPOSITIF DE GENERATION DE PLASMA, PROCEDE DE COMMANDE DE PLASMA, ET PROCEDE DE FABRICATION DE SUBSTRAT
Classification
- CPC, 3
- H01J37/321
- H05H1/46
- H05H1/4652
- IPC, 7
- H05H1 46
- H01L21 3065
- H01L21 205
- C23C14 54
- H01J37 32
- H10P14 24
- H10P95 00
Designated states1
- Contracting states, 1
- United Kingdom