EP1569263A3

Method for joining two wafers and wafer assembly

Abstract

The invention relates to a method for connecting two wafers (11, 12), in which a contact region (15) is formed between the wafers (11, 12) by overlaying the two wafers (11, 12) and in which the contact region (15) is formed. is heated locally and temporarily. Furthermore, the invention relates to a wafer arrangement in which two superimposed wafers (11, 12), between whose opposite surfaces a contact region (15) is located, are connected to each other at selected regions (21) of their contact region. The method for connecting two wafers (11, 12), as well as the wafer arrangement, are particularly suitable for processing particularly temperature-sensitive components.

EP1569263A3, drawing sheet 1
Sheet 1 of 1

Term

Term ended

Projected expiry passed 8 February 2025, 1.6 years ago.

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