EP1544680A3
Feature optimisation using interference mapping lithography
Abstract
Disclosed concepts include a method of, and program product for, optimising an illumination profile of a pattern to be formed in a surface of a substrate relative to a given mask. Steps include mathematically representing resolvable feature(s) from the given mask, generating an interference map representation from the previous step, modifying the interference map representation to maximize intensity corresponding to the resolvable features, and determining assist feature size(s) such that intensity side lobes do not print.
Term
Term ended
Projected expiry passed 16 December 2024, 1.8 years ago.
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1 sheet
Sheet 1
Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| EP1439419A2 | Cites | European Patent Office (EPO) | PX | Search report | 1-4,14-19,29-31 |
| EP1439420A1 | Cites | European Patent Office (EPO) | PX | Search report | 1-31 |
| SOCHA R J ET AL: "Contact hole reticle optimization by using interference mapping lithography (IML(TM))", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING SPIE-INT. SOC. OPT. ENG USA, vol. 5446, no. 1, 14 April 2004 (2004-04-14), pages 516 - 534, XP002353564, ISSN: 0277-786X | Non-patent | – | – | Search report | – |
| BROEKE VAN DEN D ET AL: "MODEL-BASED RET USING INTERFERENCE MAPS, ALGORITHMS FOR RANDOM CONTACTS AT 65NM", SOLID STATE TECHNOLOGY, PENNWELL CORPORATION, TULSA, OK, US, vol. 47, no. 9, September 2004 (2004-09-01), pages 63 - 64,66, XP001200935, ISSN: 0038-111X | Non-patent | – | – | Search report | – |
| VAN DEN BROEKE ET AL: "Near 0.3 k1 full pitch range contact hole patterning using Chromeless Phase Lithography (CPL)", PROCEEDINGS OF SPIE, vol. 5256, 9 September 2003 (2003-09-09), SPIE, Bellingham, WA, 2003, pages 297 - 308, XP002353565 | Non-patent | – | – | Search report | – |
23 members in 7 offices; this record represents the family
Priority claims6
| Document | Office | Kind | Date |
|---|---|---|---|
| 530656P | United States of America | – | |
| 53065603 | United States of America | P | |
| 756829 | United States of America | – | |
| 75682904 | United States of America | A | |
| 975342 | United States of America | – | |
| 97534204 | United States of America | A |
Members23
| Document | Office | Kind | |
|---|---|---|---|
| EP1439420A1 | European Patent Office (EPO) | A1 | |
| KR20040065185A | Republic of Korea | A | |
| JP2004221594A | Japan | A | |
| US2004229133A1 | United States of America | A1 | |
| TW200502705A | Taiwan Province of China | A | |
| CN1573554A | China | A | |
| EP1544680A2 | European Patent Office (EPO) | A2 | |
| KR20050062409A | Republic of Korea | A | |
| US2005142470A1 | United States of America | A1 | |
| JP2005183981A | Japan | A | |
| CN1680878A | China | A | |
| TW200534047A | Taiwan Province of China | A | |
| EP1544680A3This record | European Patent Office (EPO) | A3 | |
| SG125970A1 | Singapore | A1 | |
| TWI277827B | Taiwan Province of China | B | |
| KR100719154B1 | Republic of Korea | B1 | |
| JP3992688B2 | Japan | B2 | |
| SG139530A1 | Singapore | A1 | |
| US7506299B2 | United States of America | B2 | |
| US7594199B2 | United States of America | B2 | |
| CN100561348C | China | C | |
| KR100927455B1 | Republic of Korea | B1 | |
| TWI326002B | Taiwan Province of China | B |
14 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Application deemed to be withdrawnWithdrawn18D | 18D | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA | STAA | |
| Grant fee paidORIGINAL CODE: EPIDOSNIGR3GRAS | GRAS | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOSNIGR1GRAP | GRAP | |
| Designation fees paidAKX | AKX | |
| Request for examination filed17P | 17P | |
| Designated contracting statesAK | AK | |
| Request for extension of the european patentAX | AX | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | |
| Designated contracting statesAK | AK | |
| Request for extension of the european patentAX | AX | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI |
Numbers
- Publication
- 1544680
- Application
- 42578666
Titles3
- German
- Maskenstrukturoptimierung mittels lithographischer Interferenzabbildung
- English
- Feature optimisation using interference mapping lithography
- French
- Optimisation des structures de masque en utilisant de la cartographie d'interférence lithographique
Classification
- CPC, 4
- G03F7/70125
- G03F7/70441
- G03F1/36
- G03F7/2039
- IPC, 5
- G03F7 20
- G03F1 14
- G03F1 00
- G03F1 36
- H01L21 027
Designated states36
- Contracting states, 30
- Austria
- Belgium
- Bulgaria
- Switzerland
- Cyprus
- Czechia
- Germany
- Denmark
- Estonia
- Spain
- Finland
- France
- United Kingdom
- Greece
- Hungary
- Ireland
- Iceland
- Italy
- Liechtenstein
- Lithuania
- Luxembourg
- Monaco
- Netherlands (Kingdom of the)
- Poland
and 6 moreShow fewer
- Portugal
- Romania
- Sweden
- Slovenia
- Slovakia
- Türkiye
- Extension states, 6
- Albania
- Bosnia and Herzegovina
- Croatia
- Latvia
- North Macedonia
- Yugoslavia, later Serbia and Montenegro (until 2006)