Refractive projection objective for immersion lithography, projection exposure apparatus comprising such a projection objective, and device manufacturing method using such a projection objective
Abstract
A refractive projection objective with lens groups LG1-5 of negative, positive, negative, positive and positive refractive power respectively and a system screen between LG4 and LG5, forming a single-waist system with convexities on each side of a point (X) of minimum ray diameter and a ratio of not more than 0.4 between the object-X distance and the object-image distance. A refractive projection objective (RPO) for producing in the image plane an image of a pattern in the object plane, especially with the aid of an immersion medium between the last optical element in the RPO and the image plane. The RPO comprises (starting from the object plane) five lens groups (LG1, LG2, LG3, LG4 and LG5) with negative, positive, negative, positive and positive refractive powers respectively and a system screen (5) which is arranged in a transition zone between LG4 and LG5 so as to form a one-waist system with convexities on the object side (6) and on the image side (8) and a waist (7) between the two convexities with a neck (X) at the narrowest constriction of the light beam. The ratio AT/L = not more than 0.4, where AT is the distance between the object plane and point (X) and L is the distance between object and image. Independent claims are also included for (1) a projection lighting unit for microlithography comprising an RPO as above; (2) a method (M1) for the production of semiconductor elements and other fine-structured components by making a patterned mask, exposing the mask to UV light and projecting an image of the pattern onto a light-sensitive substrate in the image plane, using an RPO as above and passing the light through an immersion medium between the last optical surface and the substrate; (3) a method (M2) for the production of elements as above by placing a light-sensitive substrate in the image plane of the RPO, illuminating the mask with UV light, setting a finite working distance between an output surface for the RPO and an input surface for the substrate (this working distance being adjusted within the illumination time to a value which is smaller than a maximum dimension of an optical near-field of the emergent light) and projecting an image of the pattern on the substrate with the aid of the RPO.

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34 claims: 24 independent, 10 dependent
- 1Refractive projection objective for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective, in particular with the aid of an immersion medium, which is arranged between a last optical element of the projection objective and the image plane, with:a first lens group (LG1) with negative refractive power following the object plane;a second lens group (LG2) with positive refractive power following the first lens group;a third lens group (LG3) having a negative refractive power following the second lens group;a fourth lens group (LG4) of positive refractive power following the third lens group;a fifth lens group (LG5) of positive refractive power following the fourth lens group;and a system shutter (5) arranged in a transition region from the fourth lens group to the fifth lens group, such that a one-waist system with an object-side abdomen (6), an image-side abdomen (8) and a waist (7) arranged between the object-side abdomen and the image-side abdomen is formed with a constriction (X) narrowest constriction of a radiation bundle, wherein there is a waist distance AT between the object plane and the constriction, and for a distance ratio AT / L between the waist distance AT and an object image distance L of the projection lens, the following condition holds: AT / L ≦ 0.4.
- 4Projection objective according to one of the preceding claims, wherein in the third lens group (LG3) in front of the constriction (X) a front negative refractive power with magnitude VBK and behind the constriction a rear negative refractive power with amount HBK is arranged and applies to a refractive power ratio of the amounts:HBK / VBK ≥ 3.
- 5A projection lens according to any one of the preceding claims, wherein the third lens group (LG3) comprises a rear negative lens (19) and at least one front negative lens (16, 17, 18) located in front of the rear negative lens, the amount of negative refractive power of the rear negative lens being at least 20% greater than the amount of negative refractive power of the at least one front negative lens.
- 6A projection lens according to any one of the preceding claims, wherein the third lens group (LG3) comprises a rear negative lens (19) and at least one front negative lens (16, 17, 18) located in front of the rear negative lens, the amount of negative refractive power of the rear negative lens being at least 20% greater than the amount of the total power of the projection lens.
- 7Projection objective according to one of the preceding claims, wherein the first lens group (LG1) comprises at least one aspheric surface, wherein at least two aspherical surfaces are preferably provided in the first lens group.
- 8Projection objective according to one of the preceding claims, in which the first lens group (LG1) contains at least two lenses (11, 12) each with an aspherical surface.
- 9Projection objective according to one of the preceding claims, in which at least one aspheric surface is arranged in the second lens group (LG2),
- 11Projection objective according to one of the preceding claims, wherein in the third lens group (LG3) and / or in the fourth lens group (LG4) in each case at least one concave surface is designed as an aspherical surface.
- 12Projection objective according to one of the preceding claims, in which at least one aspherical surface is provided in the third lens group (LG3), preferably two aspherical surfaces being provided.
- 13Projection objective according to one of the preceding claims, in which at least one aspherical surface is arranged in each lens group.
- 14Projection objective according to one of the preceding claims, in which the second lens group (LG2) has at least two, preferably at least three, successive lenses with positive refractive power.
- 15Projection objective according to one of the preceding claims, in which the second lens group (LG2) has at least one meniscus lens of positive refractive power concave with respect to the image plane.
- 16Projection objective according to one of the preceding claims, in which the third lens group (LG3) has only lenses with negative refractive power.
- 17Projection objective according to one of the preceding claims, in which the fourth lens group (LG4) has at least one meniscus lens with positive refractive power concave in the object plane (2), wherein preferably several such meniscus lenses (20, 21, 22) are provided in succession.
- 18Projection objective according to one of the preceding claims, in which at least one meniscus lens (25) concave to the object plane is arranged in the fourth lens group (LG4).
- 23Projection lens according to one of the preceding claims, in which in the fourth lens group (LG4) at least one lens doublet (24, 25) with at least one, preferably biconvex, positive lens (24) and an immediately following, concave to the object plane negative meniscus lens (25) is.
- 24Projection objective according to one of the preceding claims, in which the fifth lens group (LG5) comprises at least one meniscus lens with positive refractive power and imagewise concave lens surfaces, wherein preferably several such meniscus lenses (26, 27, 28) are provided in succession.
- 25Projection objective according to one of the preceding claims, in which the fifth lens group (LG5) has as the last optical element a plano-convex lens (29) which preferably has a spherical or aspherically curved entrance surface and a substantially planar exit surface.
- 27Projection lens according to one of the preceding claims, in which the fifth lens group immediately follows the image plane, so that the projection lens has no further lens or lens group except the first to fifth lens group.
- 28Projection objective according to one of the preceding claims, wherein all the lenses are made of the same material, preferably using as the lens material for 193nm working wavelength synthetic quartz glass or as lens material for 157nm wavelength calcium fluoride.
- 29A projection lens according to any one of the preceding claims, having an image-side numerical aperture NA ≥ 1.0, wherein the image-side numerical aperture is preferably at least NA = 1.1 or at least NA = 1.2 or at least NA = 1.3.
- 30Projection objective according to one of the preceding claims, wherein the projection objective is adapted to an immersion medium (10) which has a refractive index n 1.3 at a working wavelength.
- 31Projection exposure machine for microlithography, marked by a refractive projection lens according to one of the preceding claims.
- 33Method for producing semiconductor components and other finely structured components, comprising the following steps:Providing a photosensitive substrate in the region of the image plane of the projection objective;Illumination of the mask with ultraviolet light of a predetermined operating wavelength;Setting a finite working distance between an exit surface associated with the projection objective and a coupling surface associated with the substrate, wherein the working distance within an exposure time interval is set, at least temporarily, to a value which is less than a maximum extent of a near optical field of the light emerging from the exit surface;Projecting an image of the pattern onto the photosensitive substrate using the projection lens.
Independent claims24
69 paragraphs, as filed
The invention relates to a refractive projection objective for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective, in particular with the aid of an immersion medium, which is arranged between a last optical element of the projection objective and the image plane.
Photolithographic projection lenses have been used for several decades for the production of semiconductor devices and other finely structured components. They serve to project patterns of photomasks or reticles, also referred to hereinafter as masks or reticles, onto a photosensitive layer-coated article at the highest resolution on a smaller scale.
For the production of ever finer structures on the order of 100 nm or less, three developments in parallel are the main contributors. First, an attempt is made to increase the image-side numerical aperture (NA) of the projection lenses beyond the current values to the range of NA = 0.8 or above. Second, increasingly shorter wavelengths of ultraviolet light are used, preferably wavelengths less than 260nm, for example 248nm, 193nm, 157nm or less. Finally, other measures are used to increase the resolution, for example, phase-shifting masks and / or oblique illumination.
There are also attempts to improve the achievable resolution by introducing a high refractive index immersion medium into the space between the last optical element of the projection objective and the substrate. This technique is referred to herein as immersion lithography. The appropriate projection lenses are referred to as Immersionsobjektive or immersion systems. By introducing the immersion medium results in an effective wavelength λ<sub>eff</sub> = λ<sub>0</sub>/ n, where λ<sub>0</sub> the vacuum working wavelength and n is the refractive index of the immersion medium. This results in a resolution R = k<sub>1</sub> (λ<sub>eff</sub>/N / A<sub>0</sub>) and a depth of field (DOF) DOF = ± k<sub>2</sub> (λ<sub>eff</sub>/N / A<sub>0</sub><sup>2</sup>), where NA<sub>0</sub> = sin Θ<sub>0</sub>, the "dry" numerical aperture and Θ<sub>0</sub> half the opening angle of the lens is. The empirical constants k<sub>1</sub> and k<sub>2</sub> are process dependent.
The theoretical advantages of immersion lithography lie in the reduction of the effective working wavelength and the resulting improved resolution. This can be achieved with an unchanged vacuum wavelength, so that for the corresponding wavelength established techniques for light generation, the choice of optical materials, coating technology, etc. can be adopted largely unchanged. However, measures are needed to provide projection lenses with highest numerical apertures in the range of NA = 1 or above. Furthermore, suitable immersion media must be available.
For 193nm, ultrapure water with n<sub>1</sub> ≈ 1.43 as a suitable immersion medium.
In the article "Immersion Lithography at 157nm" by M. Switkes and M. Rothschild, J. Vac. Sci. Technol. B 19 (6), Nov./Dec. 2001, pages 1ff, immersion fluids based on perfluoropolyethers (PFPE) are presented, which are sufficiently transparent for 157 nm operating wavelength and are compatible with some photoresist materials currently used in microlithography. A tested immersion liquid has a refractive index n at 157 nm<sub>I</sub> = 1.37. Also disclosed in the publication is a lens-free, immersion-interference lithography optical system employing calcium fluoride elements and silicon mirrors which, with a numerical aperture of NA = 0.86, is intended to image 60nm structures and below. The optical system may not be suitable for use in mass production of semiconductors or the like.
The patents US Pat. No. 4,480,910 and US Pat. No. 5,610,683 (corresponding to EP 0 605 103) describe projection exposure systems provided for immersion lithography with devices for introducing immersion fluid between the projection objective and the substrate. There are no designs for the projection optics.
Recently, some projection lenses suitable for immersion lithography have become known. The purely refractive projection objectives known from the international patent applications WO 03/077036 and WO 03/077037 A1 (corresponding to US 2003/3174408) of the Applicant are known as so-called single-waist systems or Two-belly systems with an abdominal close-to-the-subject, a belly close to the image and an intermediate waist, ie a constriction of the radiation beam diameter designed. Imagewise numerical apertures were achieved up to NA = 1.1.
Efforts to achieve even higher apertures are made more difficult by the fact that with increasing apertures the maximum lens diameters increase dramatically, making the production of the projection lenses complicated and expensive. In addition, the color errors, and in particular the transverse chromatic aberration, take on disturbing values. The lateral chromatic aberration (CHV) is also referred to as a color magnification error and causes sub-images to be imaged differently for different wavelengths. This has the consequence that the lateral chromatic aberration does not occur on the optical axis, but is increasingly noticeable to the edge of the image field (field dependence).
Usually, chromatic errors are reduced by using at least two optical materials with different dispersion within a projection objective. However, in the wavelength range of deep ultraviolet (DUV) light at working wavelengths less than 200 nm, only a few transparent optical materials with sufficiently low absorption are available. For applications at 193nm mainly synthetic quartz glass (SiO<sub>2</sub>) as a main material and as a second kind of material fluoride crystal materials such as calcium fluoride (CaF<sub>2</sub>) or barium fluoride (BaF<sub>2</sub>) used. At 157nm calcium fluoride is usually used as the main material and barium fluoride as the second material. However, the fluoride crystal materials mentioned are limited, expensive and difficult to process. Therefore, optical designs are desirable which manage with only one type of material, in particular with synthetic quartz glass. The chromatic aberrations must be minimized in any case so that when using suitable narrowband radiation sources caused by the chromatic aberration loss of contrast remain tolerable. Of particular importance here is the correction of the lateral chromatic aberration, since this produces a field-dependent loss of contrast.
The invention has for its object to provide a suitable in particular for immersion lithography, refractive projection lens, which has a compact size, with acceptable use of materials can be produced and has a good Korrektionszustand for color aberrations, especially for the lateral chromatic aberration.
This object is achieved by a projection objective having the features of claim 1. Advantageous further developments are specified in the dependent claims. The wording of all claims is incorporated herein by reference.
According to one aspect of the invention, a refractive projection objective for imaging a pattern arranged in an object plane of the projection objective into the image plane of the projection objective, especially with the help of an immersion medium, which is arranged between a last optical element of the projection lens and the image plane, a first lens group with negative refractive power following the object plane; a subsequent second lens group having positive refractive power; a subsequent third lens group with negative refractive power; a subsequent fourth lens group having positive refractive power; a subsequent fifth lens group with positive refractive power; and a system shutter, which is arranged in a transition region from the fourth lens group to the fifth lens group, so that a one-waist system with an object-side abdomen, an image-side abdomen and a waist arranged between the object-side abdomen and the image-side abdomen are formed with a constriction site of closest constriction of a radiation bundle, wherein there is a waist distance AT between the object plane and the constriction, and for a distance ratio AT / L between the waist distance AT and an object image distance L of the projection lens, the following condition holds: AT / L ≦ 0.4.
The mentioned refractive power distribution on the individual lens groups results in a projection lens with two bellies and an intermediate waist, whereby a good correction of field curvature is achieved (Petzvalkorrektur). In this case, the object - side abdomen is significantly shorter in relation to the total construction length (object - image distance) L than in known two - abdominal systems. The distance ratio ΔT / L may in particular be less than 0.38 or less than 0.36 or less than 0.34. It is thus advantageous if the waist is arranged very far in the front, near-object region of the projection lens.
The lateral chromatic aberration is a function of the marginal ray height and the principal ray height as well as the refractive power at each lens. The marginal beam height is the vertical distance of a marginal ray to the optical axis, wherein a marginal ray from the center of the object field leads to the diaphragm edge of determining the used for the numerical aperture system aperture. The main beam height is the vertical distance of the main beam to the optical axis, wherein the main beam in the context of this application is a beam which extends from an outer edge point of the object field parallel or at an acute angle to the optical axis and intersects the optical axis in the area of the system aperture.
The main jet height is greatest in a two-belly system (one-waist system) in the object-side belly. Here, the marginal ray heights have a significant value. The height of the main rays should be kept small by a suitable choice of the refractive powers in the object-side belly. A good compromise for the requirements to be met at the same time can be achieved if the waist is placed far in the front area near the object plane of the system.
Alternatively or additionally, it is particularly favorable for the correction of the lateral chromatic aberration, if a favorable ratio of the diameter of the bellies of the system is set. In a further development, the object-side abdomen has a first diameter D1 and the image-side abdomen has a second diameter D3 and for a abdominal diameter ratio D3 / D1 the following applies: D3 / D1> 1.5. It is particularly favorable if the tummy diameter ratio is more than 1.6 or more than 1.7. A small abdominal diameter in the abdomen corresponds with small marginal ray heights and additionally small main ray heights in the abdomen on the object side, from which the main contributions to the lateral chromatic aberration occur.
According to a further development, the waist has a waist diameter D2 at the point of constriction and for a diameter ratio D3 / D2 between the diameter of the image-side abdomen and the waist diameter: D3 / D2 ≥ 3. The waist is thus very slim and moderate in comparison to the image-side second abdomen marginal ray heights. As a result, inter alia, an effective correction of the field curvature is achieved.
The main contributions to the lateral chromatic aberration come from the object-side abdomen and are kept small by its small diameter. They can also be corrected by a skillful refractive power distribution in the waist. It has been found that especially the output-side lens or lens group of the third lens group has a very strong corrective effect. It should have a significantly stronger negative refractive power than the at least one input-side negative lens of the third lens group. In particular, it may be favorable if in the third lens group in front of the constriction a front negative refractive power with magnitude VBK and behind the constriction a rear negative refractive power with magnitude HBK is arranged and for a power ratio of the amounts: HBK / VBK ≥ 3.
It is particularly favorable if the third lens group comprises a rear negative lens and at least one front negative lens arranged in front of the rear negative lens, the amount of the negative refractive power of the rear negative lens being at least 20% greater than the amount of the negative refractive power of the at least one front negative lens third lens group. Therefore, the rear (last) negative lens of the third lens group should have by far the highest negative refractive power of the lenses in this group. In some embodiments, the amount of negative refractive power of the rear negative lens of the third lens group is at least 20% larger than the amount of the total refractive power of the projection lens. The negative refractive power in the region of the waist can exert a particularly strong correction effect on the lateral chromatic aberration in compliance with these conditions.
The correction of monochromatic aberrations can be optimized under the boundary condition of a minimum use of material by the use of aspherical surfaces.
In one embodiment, the first lens group includes at least one aspherical surface, wherein at least two aspherical surfaces are preferably provided in the first lens group. A near-field arrangement of aspheres in an area where the principal ray height is significantly greater than the marginal ray height can be used for effective distortion correction. In addition, at least approximately a telecentric beam path can be achieved on the object side. Preferably, the first lens group includes at least two lenses each having an aspherical surface. The distribution of aspheres on multiple lenses simplifies manufacturing, as large area deformations can be avoided.
Preferably, at least one aspherical surface is arranged in the second lens group, with which especially the tangential shell and the coma can be effectively corrected. It is convenient to arrange an aspherical surface on the surface with the largest principal ray height of the second lens group. In some embodiments, the correction effect is assisted by the arrangement of at least one aspherical surface in front of and at least one aspherical surface behind that aspheric surface.
It has been found that the correction of coma can be improved if in the third lens group and / or in the fourth lens group in each case at least one concave surface is designed as an aspherical surface.
Also in the fourth lens group and in the fifth lens group, at least one aspherical surface is preferably provided. The aspherical surfaces in the fourth lens group and in the fifth lens group contribute primarily to the correction of spherical aberration and have noticeable contributions to the coma correction.
It is thus particularly favorable if at least one aspherical surface is arranged in each lens group.
In a further development, at least one meniscus lens concave to the object plane is arranged in the fourth lens group. This is preferably designed as a negative meniscus lens. It can be arranged immediately in front of the system aperture in the region of very large marginal ray heights. Such a meniscus lens, in particular with negative refractive power, can make a substantial contribution to the correction of the spherical aberration, in the sense of a strong overcorrection. Thus, a large part of the spherical under-correction of the lenses behind the system aperture, ie of the lenses of the fifth lens group.
For the correction effect, it is favorable to have on the concave side of the meniscus lens large angles of incidence (angle of incidence) of the incident radiation. Preferably, the greatest angles of incidence occur in the entire system at this concave surface. Large angles of incidence are supported on the one hand by the concave shape of the surface on which, in preferred embodiments, an at least slightly divergent radiation beam is incident. Preferably, at least one lens with strong positive refractive power, in particular a biconvex lens, is provided directly in front of the meniscus lens. Through this lens, the angle of incidence on the subsequent concave surface can be increased still further. In preferred embodiments, therefore, at least one lens doublet is arranged in the fourth lens group with at least one, preferably biconvex, positive lens and an immediately following, negative to the object plane negative meniscus lens.
The system shutter can be a flat system shutter, in which the diaphragm edge remains independent of the set aperture diameter in a plane perpendicular to the optical axis level. In systems with aperture errors, it may be beneficial if the system aperture has a diaphragm diameter defining diaphragm edge whose axial position relative to the optical axis of the projection lens is variable as a function of the diaphragm diameter. This allows an optimal adaptation of the effective diaphragm position to the beam path as a function of the diaphragm diameter. The system diaphragm can be designed, for example, as a spherical diaphragm, in which the diaphragm edge can be moved along a spherical surface when the diaphragm diameter is adjusted. It is also possible to form the system diaphragm as a conical diaphragm, in which the diaphragm edge is movable on adjustment of the diaphragm diameter on a conical surface. This can be achieved for example by an axially displaceable planar aperture.
Projection systems according to the invention can be provided for a wide range of suitable working distances. Here, the object-side working distance or the working distance in the object space the (smallest) axial distance between the object plane and the entrance surface of the lens, while the image-side working distance or the working distance in the image space is the (smallest) axial distance between the exit surface of the objective and the image plane. The working space in the image space, which is filled with gas when used as a dry system, is filled with an immersion medium when used as immersion systems during operation.
When defining the working distance in the image space, special criteria must be taken into account for immersion systems. On the one hand, a large working distance causes both greater radiation losses due to the usually lower transmission of immersion liquids (compared to gases) and a higher aberration contribution of the surfaces lying on the image plane, especially for the spherical aberration. When intended for use as an immersion system, the image side working distance should be large enough to permit laminar flow of immersion fluid. If necessary, there should also be room for measuring technology and sensors. In preferred embodiments for immersion lithography, the image-side working distance is between approx. 1mm and approx 15mm, especially between approx. 1.5mm and approx 5mm.
One way to minimize the marginal heights in the first belly is to choose the smallest possible numerical aperture on the object side. This leads to the fact that the marginal ray heights in the object-side belly do not assume too high values. A small object-side numerical aperture can be controlled with a large image-side numerical aperture by choosing a favorable magnification β. Preferred embodiments are designed as reduction lenses. The amount | β | The reproduction scale is preferably in the range of 1/6 to 1/3, in particular between 1 / 5.5 and 1 / 3.5, so that in particular reductions of 5: 1 and 4: 1 are possible.
In some embodiments, all the lenses of the projection lens are made of the same material. As a material, for example, at working wavelengths of 193nm synthetic quartz glass and working at wavelengths of 157nm calcium fluoride can be used. The use of only one type of material facilitates manufacturing and allows easy adaptation of the lens design to other wavelengths. It is also possible to combine several types of material to assist, for example, the correction of chromatic aberrations. The use of other UV-transparent materials such as BaF<sub>2</sub>, NaF, LiF, SrF, MgF<sub>2</sub> or the like is possible.
The invention enables the construction of projection lenses whose image-side numerical aperture using suitable immersion media NA ≥ 1.0, wherein in some embodiments also NA> 1.1, in particular NA = 1.2, NA = 1.3 or above are possible , The projection objectives may be adapted to an immersion fluid which has a refractive index n at the operating wavelength<sub>I</sub> > 1.3 has. This can reduce the effective working wavelength by about 30% or more over systems without immersion.
The structural features of preferred embodiments allow use of the projection objective as an immersion objective. However, projection lenses according to the invention are not limited to this use. The optical design also allows use for non-contact near-field projection lithography. In this case, a coupling of sufficient light energy into the substrate to be exposed via a gas-filled gap is possible if a sufficiently low image-side working distance is maintained over the time average. This should be below four times the working wavelength used, in particular below the working wavelength. It is particularly favorable if the working distance is less than half the working wavelength, for example less than one third, one quarter or one fifth of the working wavelength. At these short working distances, a near-field optical image can be used in which evanescent fields existing in the immediate vicinity of the last optical surface of the imaging system are used for imaging.
If you want to use a projection lens instead of immersion lithography for contactless near-field lithography, this is easily possible by minor modifications. If the immersion medium, to which the optical design is adapted, has substantially the same refractive index as the last optical element of the objective, the solid is thickened to obtain a smaller image-side working distance. In this way, for example Working distances between 20 and 50nm can be achieved. Optionally, a visual correction is favorable, which can be carried out for example by means of suitable manipulators on one or more lens elements, for example for the adjustment of air gaps.
Thus, the invention also includes a non-contact projection exposure method, in which evanescent fields of the illumination light, which are located in the immediate vicinity of the exit surface, are made available for the lithographic process. In this case, at sufficiently low (finite) working distances, despite geometrical total reflection conditions on the last optical surface of the projection lens, a usable light fraction for the lithography from the exit surface of the lens coupled and coupled into a directly adjacent spaced coupling surface.
Embodiments for contactless near-field projection lithography preferably have typical working distances in the range of the working wavelength or below, for example between approximately 3nm and approx 200nm, especially between approx. 5nm and approx. 100nm. The working distance should be adapted to the other properties of the projection system (properties of the projection lens near the exit surface, properties of the substrate near the coupling surface) so that a coupling efficiency of at least 10% is achieved on average over time.
In the context of the invention, therefore, a method for the production of semiconductor components and the like is possible, in which a finite working distance is set between an exit surface for exposure light assigned to the projection objective and an exposure light coupling surface assigned to the substrate; wherein the working distance is set to a value at least temporarily within an exposure time interval, which is smaller than a maximum extension of a near optical field of light emerging from the exit surface.
Moreover, projection lenses according to the invention can also be used for conventional projection lithography as drying systems. For this purpose, the image-side working distance can be significantly greater than when used as an immersion system or as a near-field projection system. Since it may not be possible to exploit the full potential of very high image-side numerical apertures under certain circumstances, the system aperture can be set to a smaller aperture diameter, for example a numerical aperture used in the order of NA = 0.9 or NA = 0.8 or less adjust.
The foregoing and other features will become apparent from the claims and from the description and drawings, wherein the individual features each alone or more in the form of sub-combinations in embodiments of the invention and in other fields be realized and advantageous and protectable Can represent versions. Show it:<dl id="dl0001"><dt>Fig. 1</dt><dd>Figure 11 is a lens section through a first embodiment of a refractive projection lens designed for 193nm operating wavelength;</dd><dt>Fig. 2</dt><dd>is a diagram showing the relative contributions of each lens to the lateral chromatic aberration; and</dd><dt>Fig. 3</dt><dd>is a diagram showing normalized power of each lens.</dd></dl>
In the following description of preferred embodiments, the term "optical axis" denotes a straight line through the centers of curvature of the optical components. Directions and distances are described as image-side or image-wise, if they are in the direction of the image plane or are located there, to be exposed substrate are directed and as the object side or object-wise, if they are directed towards the object with respect to the optical axis. The object in the examples is a mask (reticle) with the pattern of an integrated circuit, but it can also be a different pattern, for example a grid. The image is formed in the examples on a wafer coated with a photoresist layer as a substrate, but other substrates are possible, for example, elements for liquid crystal displays or substrates for optical gratings. The specified focal lengths are focal lengths with respect to air.
With reference to FIG. 1 A typical construction of an embodiment of a purely refractive reduction objective 1 according to the invention is shown. It serves, with virtually homogeneous immersion, to image a pattern of a reticle or the like arranged in an object plane 2 in an image plane 3 on a reduced scale, for example at a scale of 5: 1 (magnification β = 0.2). It is a rotationally symmetrical single-waist system or Two-dive system with five consecutive lens groups arranged along the optical axis 4 perpendicular to the object plane and the image plane. The first lens group LG1 immediately following the object plane 2 has negative refractive power. An immediately following second lens group LG2 has positive refractive power. An immediately following third lens group LG3 has negative refractive power. An immediately following fourth lens group has positive refractive power. An immediately following fifth lens group LG5 has positive refractive power. The fifth lens group is immediately followed by the image plane, so that the projection lens has no further lens or lens group except for the first to fifth lens group. By this refractive power distribution, a two-shot system is provided which has an object-side first belly 6, a second-side image belly 8 and an intermediate waist 7 in which a necking-up location X of minimum beam diameter is located. In a transition region from the fourth lens group to the fifth lens group, the system shutter 5 lies in the region of relatively large beam diameter.
The possible with the projection lens illustration can be characterized by the course of their main rays and marginal rays. The principal ray A here is a ray which runs parallel or at an acute angle to the optical axis from an outer edge point of the object field and intersects the optical axis 4 in the region of the system aperture 5. A marginal ray B leads from the center of the object field, ie from an axial field point, to the diaphragm edge of an aperture diaphragm, which normally sits at the location of the system shutter 5 or in its immediate vicinity. A ray C which leads from an external field point to the opposite edge of the aperture stop is referred to herein as a coma ray. The vertical distance of these rays to the optical axis gives the corresponding beam heights h<sub>A</sub>, H<sub>B</sub> and hc
A first lens region LB1 starts at the object plane 2 and ends in the plane in which the marginal ray B and the coma ray C intersect, so that in the first lens region LB1 the condition | h<sub>B</sub>/H<sub>C</sub>| <1 is satisfied. In this lens region LB1, the main ray height is large against the marginal ray height. Here arranged lens surfaces are referred to as close to the field. A second lens area LB2 extends from the object plane 2 to the area in which the main beam height and the edge beam height are approximately equal in magnitude, in particular | h<sub>B</sub>/H<sub>A</sub>| <1.2 applies. The length of the second lens region LB2 is greater than a quarter and smaller than half of the distance L between the object plane 2 and image plane 3 in typical variants of projection systems according to the invention. This object-image distance is also referred to as the overall length of the projection objective.
In typical embodiments of inventive projection lenses, the first lens group LG1 has at least two negative lenses, the second lens group LG2 at least three positive lenses, the third lens group LG3 at least two negative lenses, the fourth lens group LG4 at least two positive lenses and the fifth lens group LG5 at least three positive lenses.
The first lens group LG1 following the object plane 2 is essentially responsible for the widening of the light bundles into the first, object-side belly 6. It has a thin biconcave negative lens 11 with aspheric entrance surface and spherical exit surface and a subsequent, further biconcave negative lens 12 with aspherical entrance surface and spherical exit surface. The near-field aspheres on the entry surfaces of the object closest lenses 11 and 12 contribute effectively to the good correction of distortion and astigmatism. Above all, they provide for an approximately telecentric beam path on the object side. For manufacturing reasons, it is avoided in the example system to place the two aspheres on a single lens, although this is possible in other embodiments.
The second lens group LG2 consists of three lenses 13, 14, 15. It opens with a thick positive meniscus lens 13 with an aspheric, object-side concave surface and spherical exit surface. An immediately following positive lens 14 has a slightly convex, aspherical entrance surface and a spherical exit surface. The following positive meniscus lens 15 has a spherical entrance surface and an aspherical, image side concave exit surface. The aspheric entrance surface of lens 14 is located in the region of greatest principal beam height of the second lens group and is therefore particularly effective for correction of the tangential shell and coma. The aspheres of the previously arranged lens 13 and the lens 15 arranged behind support this correction.
The third lens group LG3 consists of four negative lenses 16, 17, 18, 19. An entrance-side, thick, bispharic meniscus lens 16 with image-side concave surface has weak negative refractive power. The following meniscus lens 17 with a slightly curved, spherical entrance surface and on the image side concave, aspherical exit surface lies in the light path in front of the constriction X, in which the beam has its minimum diameter in the waist region. The lenses 16, 17 provide a front negative power VBK. Behind the constriction X follows a bilaterally spherical negative meniscus lens 18 with object-side concave surface. The last negative lens 19 of the third lens group has a strongly curved, object-side concave, spherical entrance surface and a weakly curved, aspherical exit surface. The two rear negative lenses 18, 19 together provide a strong rear negative refractive power HBK. It has been found that the concave, aspherical exit surface of the lens 17 effectively contributes to the correction of coma.
The fourth lens group LG4 consists of six lenses. It comprises on its entrance side three concave positive meniscus lenses 20, 21, 22 of which the first two are spherical and the largest-diameter positive meniscus lens 22 has an aspherical entrance surface concave to the object plane. The three positive meniscus lenses are followed by a biconvex, bis-spherical positive lens 23 with slightly curved lens surfaces. In the area of large beam diameters immediately in front of the system shutter 5, a lens doublet 24, 25 is arranged with an entry-side biconvex lens 24 of strong positive refractive power and a negative meniscus lens 25 with object-side, aspherical concave surface arranged immediately in front of the system shutter. The facing aspherical surfaces include an object plane concave air lens having the shape of a positive lens. The lens doublet has a strong overcorrection effect for the spherical aberration.
The fifth lens group LG5 behind the system shutter 5 is essentially responsible for generating the high numerical aperture. For this purpose, only collecting lenses are provided, namely three immediately successive positive meniscus lenses 26, 27, 28, each having a spherical entrance surface and a concave aspherical exit surface to the image plane, and a final non-hemispherical plano-convex lens 29 having a spherical entrance surface and a flat exit surface. The positive lenses are spherically strongly undercorrective and overcorrective regarding the coma.
The correction of spherical aberration and coma in this design is essentially borne by the balance between the lens doublet 24, 25 immediately in front of the system aperture and the lenses 26, 27, 28, 29 of the fifth lens group.
The system has an object-side working distance of 32mm with an object intercept of about 36.6mm and an image-side working distance of about 2mm, which can be filled by an immersion liquid 10. The system is designed to use deionized water (refractive index n≈1.435) or another suitable transparent liquid of comparable refractive index as the immersion fluid at 193nm.
Table 1 summarizes the specification of the design in a known manner in tabular form. Column 1 gives the number of a refracting or otherwise distinguished surface, Column 3 the radius r of the surface (in mm), Column 4 the distance d called the thickness to the following surface (in mm) and Column 5 the material of optical components. Column 6 shows the refractive index of the material and in column 7 are the usable free radii or half the free diameter of the lenses (in mm). The aspherical surfaces are marked in column 3 with "AS".
In the embodiment, thirteen of the surfaces are aspherical, namely the surfaces 1, 3, 5, 7, 10, 14, 18, 23, 28, 29, 33, 35 and 37. Table 2 gives the corresponding aspheric data, with the aspherical Calculate areas according to the following rule:<maths id="math0001" num=""><math display="block"><mrow><msup><mrow><mtext>p (h) = [((1 / r) h</mtext></mrow><mrow><mtext>2</mtext></mrow></msup><msup><mrow><mtext>) / (1 + SQRT (1- (1 + K) (1 / r)</mtext></mrow><mrow><mtext>2</mtext></mrow></msup><msup><mrow><mtext>H</mtext></mrow><mrow><mtext>2</mtext></mrow></msup><msup><mrow><mtext>)] + C1 * h</mtext></mrow><mrow><mtext>4</mtext></mrow></msup><msup><mrow><mtext>+ C2 * h</mtext></mrow><mrow><mtext>6</mtext></mrow></msup><mtext>+ ....</mtext></mrow></math><img file="EP1544676A2_D0001.tif" /></maths>
The reciprocal (1 / r) of the radius indicates the surface curvature and h the distance of a surface point from the optical axis (ie the beam height). Thus, p (h) gives the so-called arrow height, ie the distance of the surface point from the surface apex in the z-direction, ie in the direction of the optical axis. The constants K, C1, C2, ... are given in Table 2.
The reproducible with the help of these data optical system 1 is designed for a working wavelength of about 193nm, in which the synthetic quartz glass used for all lenses has a refractive index n = 1.5603. The image-side numerical aperture NA is 1.3. The object-side and image-side telecentric system is based on a refractive index of the immersion medium 10 of n<sub>I</sub> = 1.435 adjusted. The lens has a length L (distance between image plane and object plane) of about 1078mm. With an image size of 22.4 mm, a light conductance LLW (product of numerical aperture and image size) of approx. 29mm is achieved. The focal length Fg of the overall system is approximately 211 mm.
The maximum diameter D1 of the object-side first abdomen is 232mm, the diameter D2 at the minimum X-ray spot diameter X at the waist is 126mm, and the maximum diameter D3 of the second abdominal face is 400mm.
In Table 3, for the various lens groups and the overall system, the values for the focal length f ', the refractive powers F', the values for the parameters F '/ Fg (power normalized to the total refractive power Fg of the objective) and F' · LLW and the axial length specified.
Table 4 shows the values for various parameters for each of the lenses of the system labeled in column 1. Here, f 'is the focal length, F' is the refractive power (reciprocal of the focal length), LLW is the geometric light conductance (Etendue), CHV is the value for the contribution of the lens to the lateral chromatic aberration (CHV contribution) and CHV / CHVm normalized to the maximum value CHVm , relative CHV contribution of each lens.
The color magnification error CHV is a function of the marginal ray height and the principal ray height as well as the refractive power on each lens i. The post CHV<sub>i</sub> each lens is proportional to the marginal beam height h<sub>B</sub> , to the main beam height h<sub>A</sub> and the refractive power F 'and indirectly proportional to the Abbe number <i>v</i><sub>i</sub> according to: CHV<sub>i</sub>~h<sub>A</sub>·H<sub>B</sub>· (F 'i /<i>v</i><sub>i</sub>)
For a better illustration of the distribution of relevant values, FIG. 2 shows the relative contribution of the individual lenses to the lateral chromatic aberration (CHV contribution normalized to the maximum value CHVm in the case of lens 4) and FIG. 3 shows the normalized refractive powers (F '/ Fg ) of the lenses as a function of lens number.
Table 5 shows, for the lens surfaces given in column 1, the sine values sin (i), the angles of incidence i, the corresponding angles in degrees and the ratio of the sin (i) values to the image-side numerical aperture NA. The sin (i) values correspond to the maximum value of the sine of the angle of incidence or the angle of refraction on each surface. So they are always in air.
Some features of the projection lens are explained below. The lens opens with two aspherized negative lenses 11, 12, which are used for beam widening and correction of distortion and telecentricity. Due to NA's relatively small object-side numerical aperture<sub>O</sub> = 0.26 the marginal beam heights in the entrance area of the projection lens remain moderate. Within the first abdomen 6, the maximum marginal ray height in the region of the positive meniscus 15 is reached, where it is only 24.3% of the maximum marginal ray height that is achieved in the region of the system aperture 5. The maximum principal beam height is achieved in the area of the spherical exit surface of the fourth lens 14, where the marginal beam height has not yet reached its maximum value. The maximum principal ray height is only 40.8% of the maximum marginal ray height, which corresponds to the maximum aperture radius. Due to the proportionality of the CHV contribution to the marginal ray height and the principal ray height, the maximum CHV contribution is achieved by the lens with maximum principal ray height (lens 14) (cf. FIG. 2).
The contributions to the color magnification error CHV originating mainly from the first abdomen are compensated by the following lens groups. Particularly effective for this is the concentration of strong negative refractive power immediately before entering the object-side abdomen, which opens with the fourth lens group of positive refractive power. The strongly correcting effect of the negative refractive power in this area at the output of the third lens group can be partly explained by the fact that here the marginal ray heights already take noticeable values and on the other hand the principal ray height still has such great values that a strong correction effect is exerted on the main ray becomes.
The three object-plane concave positive meniscus lenses 20, 21, 22 initiate the radiation beam collation after the maximum expansion behind the negative lens 19, whereby a relaxed beam guidance with very low incidence angles (Tab. 5) is reached. Spherical undercorrection is introduced together with the following weakly positive biconvex lens 23. The negative meniscus lens 25 immediately in front of the system aperture provides a significant contribution to the correction of spherical aberration, in the sense of a strong overcorrection. Thus, a large part of the spherical sub-correction of the positive lenses 26 to 29 of the fifth lens group is compensated behind the system shutter 5. Also of great importance are the very large angles of incidence at the concave entrance side of the meniscus 25. These are generated on the one hand by the strong curvature of the concave side and on the other hand by the large positive force of the biconvex lens immediately in front of the meniscus. At the aspherical entrance surface of the negative meniscus 25, the largest angles of incidence occur throughout the system. The maximum sine of the incidence angle is approx. 99% of the image-side numerical aperture NA.
The four successive positive lenses 26 to 29 of the fifth lens group LG5 generate the high image-side numerical aperture at moderate angles of incidence and, overall, have a highly spherically underscoring effect and are overcorrective regarding coma. As a result, the respectively inverted contributions of the fourth lens group in front of the system aperture are compensated, so that an excellent correction state is present in the image plane 3 after passage of the radiation through the thin immersion layer 10.
The invention also relates to a projection exposure apparatus for microlithography, which is characterized in that it contains a refractive projection objective according to the invention. The projection exposure apparatus preferably also has means for introducing and holding an immersion medium, for example a liquid of suitable refractive index, between the last optical surface of the projection objective and the substrate to be exposed. Also included is a method for the production of semiconductor components and other finely structured components, in which an image of a pattern arranged in the object plane of a projection objective is imaged in the region of the image plane, with a light of the working wavelength being arranged between the projection objective and the substrate to be exposed transparent immersion medium is irradiated. <tables id="tabl0001" num="0001"><table frame="all"><title>Table 1</title><tgroup cols="7" colsep="1" rowsep="1"><colspec colnum="1" colname="col1" colwidth="22.50mm" /><colspec colnum="2" colname="col2" colwidth="22.50mm" /><colspec colnum="3" colname="col3" colwidth="22.50mm" /><colspec colnum="4" colname="col4" colwidth="22.50mm" /><colspec colnum="5" colname="col5" colwidth="22.50mm" /><colspec colnum="6" colname="col6" colwidth="22.50mm" /><colspec colnum="7" colname="col7" colwidth="22.50mm" /><thead valign="top"><row><entry namest="col1" nameend="col1" 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align="right">25</entry><entry namest="col2" nameend="col2" align="right">7198.266735077</entry><entry namest="col3" nameend="col3" /><entry namest="col4" nameend="col4" align="right">28.157625168</entry><entry namest="col5" nameend="col5" align="center">SIO2HL</entry><entry namest="col6" nameend="col6" align="right">1.56028890</entry><entry namest="col7" nameend="col7" align="right">181779</entry></row><row><entry namest="col1" nameend="col1" align="right">26</entry><entry namest="col2" nameend="col2" align="right">-1068.929463970</entry><entry namest="col3" nameend="col3" /><entry namest="col4" nameend="col4" align="right">1.000000000</entry><entry namest="col5" nameend="col5" align="center">N2VP950</entry><entry namest="col6" nameend="col6" align="right">1.00000300</entry><entry namest="col7" nameend="col7" align="right">183468</entry></row><row><entry namest="col1" nameend="col1" align="right">27</entry><entry namest="col2" nameend="col2" align="right">512.804453822</entry><entry namest="col3" nameend="col3" /><entry namest="col4" nameend="col4" align="right">85.879726018</entry><entry namest="col5" nameend="col5" align="center">SIO2HL</entry><entry namest="col6" nameend="col6" align="right">1.56028890</entry><entry namest="col7" nameend="col7" align="right">192485</entry></row><row><entry namest="col1" nameend="col1" align="right">28</entry><entry namest="col2" nameend="col2" align="right">-489.298237991</entry><entry namest="col3" nameend="col3" align="center">AS</entry><entry namest="col4" nameend="col4" align="right">48.000806847</entry><entry namest="col5" nameend="col5" align="center">N2VP950</entry><entry namest="col6" nameend="col6" align="right">1.00000300</entry><entry namest="col7" nameend="col7" align="right">192048</entry></row><row><entry namest="col1" nameend="col1" align="right">29</entry><entry namest="col2" nameend="col2" align="right">-255.199113275</entry><entry namest="col3" nameend="col3" align="center">AS</entry><entry namest="col4" nameend="col4" align="right">15.204316739</entry><entry namest="col5" nameend="col5" align="center">SIO2HL</entry><entry namest="col6" nameend="col6" align="right">1.56028890</entry><entry namest="col7" nameend="col7" align="right">190697</entry></row><row><entry namest="col1" nameend="col1" align="right">30</entry><entry namest="col2" nameend="col2" align="right">-408.017115393</entry><entry namest="col3" nameend="col3" /><entry namest="col4" nameend="col4" align="right">30.694150369</entry><entry namest="col5" nameend="col5" align="center">N2VP950</entry><entry namest="col6" nameend="col6" align="right">1.00000300</entry><entry namest="col7" nameend="col7" align="right">198843</entry></row><row><entry namest="col1" nameend="col1" align="right">31</entry><entry namest="col2" nameend="col2" align="right">0.000000000</entry><entry namest="col3" nameend="col3" /><entry namest="col4" nameend="col4" align="right">-14.622598208</entry><entry namest="col5" nameend="col5" align="center">N2VP950</entry><entry namest="col6" nameend="col6" align="right">1.00000300</entry><entry namest="col7" nameend="col7" align="right">196692</entry></row><row><entry namest="col1" nameend="col1" align="right">32</entry><entry namest="col2" nameend="col2" align="right">299.575126721</entry><entry namest="col3" nameend="col3" /><entry namest="col4" nameend="col4" align="right">81.075589692</entry><entry namest="col5" nameend="col5" align="center">SIO2HL</entry><entry namest="col6" nameend="col6" align="right">1.56028890</entry><entry namest="col7" nameend="col7" align="right">199963</entry></row><row><entry namest="col1" nameend="col1" align="right">33</entry><entry namest="col2" nameend="col2" align="right">1234.064936323</entry><entry namest="col3" nameend="col3" align="center">AS</entry><entry namest="col4" nameend="col4" align="right">1.043659212</entry><entry namest="col5" nameend="col5" align="center">N2VP950</entry><entry namest="col6" nameend="col6" align="right">1.00000300</entry><entry namest="col7" nameend="col7" align="right">196087</entry></row><row><entry namest="col1" nameend="col1" align="right">34</entry><entry namest="col2" nameend="col2" align="right">211.382655255</entry><entry namest="col3" nameend="col3" /><entry namest="col4" nameend="col4" align="right">76.486237035</entry><entry namest="col5" nameend="col5" align="center">SIO2HL</entry><entry namest="col6" nameend="col6" align="right">1.56028890</entry><entry namest="col7" nameend="col7" align="right">166835</entry></row><row><entry namest="col1" nameend="col1" align="right">35</entry><entry namest="col2" nameend="col2" align="right">945.579070441</entry><entry namest="col3" nameend="col3" align="center">AS</entry><entry namest="col4" nameend="col4" align="right">1.000000000</entry><entry namest="col5" nameend="col5" align="center">N2VP950</entry><entry namest="col6" nameend="col6" align="right">1.00000300</entry><entry namest="col7" nameend="col7" align="right">160232</entry></row><row><entry namest="col1" nameend="col1" align="right">36</entry><entry namest="col2" nameend="col2" align="right">124.953815758</entry><entry namest="col3" nameend="col3" /><entry namest="col4" nameend="col4" align="right">49.441802491</entry><entry namest="col5" nameend="col5" align="center">SIO2HL</entry><entry namest="col6" nameend="col6" align="right">1.56028890</entry><entry namest="col7" nameend="col7" align="right">109457</entry></row><row><entry namest="col1" nameend="col1" align="right">37</entry><entry namest="col2" nameend="col2" align="right">254.183893856</entry><entry namest="col3" nameend="col3" align="center">AS</entry><entry namest="col4" nameend="col4" align="right">1.000000000</entry><entry namest="col5" nameend="col5" align="center">N2VP950</entry><entry namest="col6" nameend="col6" align="right">1.00000300</entry><entry namest="col7" nameend="col7" align="right">97120</entry></row><row><entry namest="col1" nameend="col1" align="right">38</entry><entry namest="col2" nameend="col2" align="right">99.333101280</entry><entry namest="col3" nameend="col3" /><entry namest="col4" nameend="col4" align="right">76.128099196</entry><entry namest="col5" nameend="col5" align="center">SIO2HL</entry><entry namest="col6" nameend="col6" align="right">1.56028890</entry><entry namest="col7" nameend="col7" align="right">76544</entry></row><row><entry namest="col1" nameend="col1" align="right">39</entry><entry namest="col2" nameend="col2" align="right">0.000000000</entry><entry namest="col3" nameend="col3" /><entry namest="col4" nameend="col4" align="right">1.998587231</entry><entry namest="col5" nameend="col5" align="center">IMMERS</entry><entry namest="col6" nameend="col6" align="right">1.43500000</entry><entry namest="col7" nameend="col7" align="right">15560</entry></row><row rowsep="1"><entry namest="col1" nameend="col1" align="right">40</entry><entry namest="col2" nameend="col2" align="right">0.000000000</entry><entry namest="col3" nameend="col3" /><entry namest="col4" nameend="col4" align="right">0.00000 0000</entry><entry namest="col5" nameend="col5" /><entry namest="col6" nameend="col6" align="right">1.00000000</entry><entry namest="col7" nameend="col7" align="right">11216</entry></row></tbody></tgroup></table></tables><tables id="tabl0002" num="0002"><img file="EP1544676A2_D0002.tif" /></tables><tables id="tabl0003" num="0003"><img file="EP1544676A2_D0003.tif" /></tables><tables id="tabl0004" num="0004"><table frame="all"><title>Table 3</title><tgroup cols="7" colsep="1" rowsep="1"><colspec colnum="1" colname="col1" colwidth="22.50mm" /><colspec colnum="2" colname="col2" colwidth="22.50mm" /><colspec colnum="3" colname="col3" colwidth="22.50mm" /><colspec colnum="4" colname="col4" colwidth="22.50mm" /><colspec colnum="5" colname="col5" colwidth="22.50mm" /><colspec colnum="6" colname="col6" colwidth="22.50mm" /><colspec colnum="7" colname="col7" colwidth="22.50mm" /><thead valign="top"><row rowsep="1"><entry namest="col1" nameend="col1" /><entry namest="col2" nameend="col2" align="center"><b>LG1</b></entry><entry namest="col3" nameend="col3" align="center"><b>LG2</b></entry><entry namest="col4" nameend="col4" align="center"><b>LG3</b></entry><entry namest="col5" nameend="col5" align="center"><b>LG4</b></entry><entry namest="col6" nameend="col6" align="center"><b>LG5</b></entry><entry namest="col7" nameend="col7" align="center"><b>Total Fg</b></entry></row></thead><tbody valign="top"><row><entry namest="col1" nameend="col1" align="left">focal lengths</entry><entry namest="col2" nameend="col2" align="right">-1,47E + 02</entry><entry namest="col3" nameend="col3" align="right">1,36E + 02</entry><entry namest="col4" nameend="col4" align="right">-5,68E + 01</entry><entry namest="col5" nameend="col5" align="right">1,73E + 02</entry><entry namest="col6" nameend="col6" align="right">1,21E + 02</entry><entry namest="col7" nameend="col7" align="right">2,11E + 02</entry></row><row><entry namest="col1" nameend="col1" align="left">powers</entry><entry namest="col2" nameend="col2" align="right">-6,82E-03</entry><entry namest="col3" nameend="col3" align="right">7,35E-03</entry><entry namest="col4" nameend="col4" align="right">-1,76E-02</entry><entry namest="col5" nameend="col5" align="right">5,79E-03</entry><entry namest="col6" nameend="col6" align="right">8,29E-03</entry><entry namest="col7" nameend="col7" align="right">4,73E-03</entry></row><row><entry namest="col1" nameend="col1" align="left">F '/ Fg</entry><entry namest="col2" nameend="col2" align="right">-1,44E + 00</entry><entry namest="col3" nameend="col3" align="right">1,55E + 00</entry><entry namest="col4" nameend="col4" align="right">-3,72E + 00</entry><entry namest="col5" nameend="col5" align="right">1,22E + 00</entry><entry namest="col6" nameend="col6" align="right">1,75E + 00</entry><entry namest="col7" nameend="col7" align="right">1.00E + 00</entry></row><row><entry namest="col1" nameend="col1" align="left">F '* LLW</entry><entry namest="col2" nameend="col2" align="right">-1,99E-01</entry><entry namest="col3" nameend="col3" align="right">2,14E-01</entry><entry namest="col4" nameend="col4" align="right">-5,13E-01</entry><entry namest="col5" nameend="col5" align="right">1,69E-01</entry><entry namest="col6" nameend="col6" align="right">2,41E-01</entry><entry namest="col7" nameend="col7" /></row><row><entry namest="col1" nameend="col1" align="left">axial length</entry><entry namest="col2" nameend="col2" align="right">2,95E + 01</entry><entry namest="col3" nameend="col3" align="right">1,46E + 02</entry><entry namest="col4" nameend="col4" align="right">2,14E + 02</entry><entry namest="col5" nameend="col5" align="right">3,07E + 02</entry><entry namest="col6" nameend="col6" align="right">2,88E + 02</entry><entry namest="col7" nameend="col7" /></row><row rowsep="1"><entry namest="col1" nameend="col1" align="left">lenses</entry><entry namest="col2" nameend="col2" align="right">11-12</entry><entry namest="col3" nameend="col3" align="right">13-15</entry><entry namest="col4" nameend="col4" align="right">16-19</entry><entry namest="col5" nameend="col5" align="right">20-25</entry><entry namest="col6" nameend="col6" align="right">26-29</entry><entry namest="col7" nameend="col7" /></row></tbody></tgroup></table></tables><tables id="tabl0005" num="0005"><table frame="all"><title>Table 4</title><tgroup cols="8" colsep="1" rowsep="1"><colspec colnum="1" colname="col1" colwidth="19.68mm" /><colspec colnum="2" colname="col2" colwidth="19.68mm" /><colspec colnum="3" colname="col3" colwidth="19.68mm" /><colspec colnum="4" colname="col4" colwidth="19.68mm" /><colspec colnum="5" colname="col5" colwidth="19.68mm" /><colspec colnum="6" colname="col6" colwidth="19.68mm" /><colspec colnum="7" colname="col7" colwidth="19.68mm" /><colspec colnum="8" colname="col8" colwidth="19.68mm" /><thead valign="top"><row rowsep="1"><entry namest="col1" nameend="col1" align="left"><b>surfaces</b></entry><entry namest="col2" nameend="col2" align="center"><b>f</b></entry><entry namest="col3" nameend="col3" align="center"><b>F '</b></entry><entry namest="col4" nameend="col4" align="center"><b>IF'I</b></entry><entry namest="col5" nameend="col5" align="center"><b>IF'I * LLW</b></entry><entry namest="col6" nameend="col6" align="center"><b>F '/ Fg</b></entry><entry namest="col7" nameend="col7" align="center"><b>CHV</b></entry><entry namest="col8" nameend="col8" align="center"><b>CHV / CHVmax</b></entry></row></thead><tbody valign="top"><row><entry namest="col1" nameend="col1" align="left">F1..2)</entry><entry namest="col2" nameend="col2" align="right">-2,60E + 02</entry><entry namest="col3" nameend="col3" align="right">-3,84E-03</entry><entry namest="col4" nameend="col4" align="right">3,84E-03</entry><entry namest="col5" nameend="col5" align="right">1,12E-01</entry><entry namest="col6" nameend="col6" align="right">-8,11E-01</entry><entry namest="col7" nameend="col7" align="right">-5,00E-06</entry><entry namest="col8" nameend="col8" align="right">-2,38E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F3..4)</entry><entry namest="col2" nameend="col2" align="right">-3.61 E + 02</entry><entry namest="col3" nameend="col3" align="right">-2,77E-03</entry><entry namest="col4" nameend="col4" align="right">2,77E-03</entry><entry namest="col5" nameend="col5" align="right">8,06E-02</entry><entry namest="col6" nameend="col6" align="right">-5,85E-01</entry><entry namest="col7" nameend="col7" align="right">-5,00E-06</entry><entry namest="col8" nameend="col8" align="right">-2,38E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F5..6)</entry><entry namest="col2" nameend="col2" align="right">4,67E + 02</entry><entry namest="col3" nameend="col3" align="right">2,14E-03</entry><entry namest="col4" nameend="col4" align="right">2,14E-03</entry><entry namest="col5" nameend="col5" align="right">6,24E-02</entry><entry namest="col6" nameend="col6" align="right">4,52E-01</entry><entry namest="col7" nameend="col7" align="right">1,30E-05</entry><entry namest="col8" nameend="col8" align="right">6,19E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F7..8)</entry><entry namest="col2" nameend="col2" align="right">3,36E + 02</entry><entry namest="col3" nameend="col3" align="right">2,97E-03</entry><entry namest="col4" nameend="col4" align="right">2,97E-03</entry><entry namest="col5" nameend="col5" align="right">8,66E-02</entry><entry namest="col6" nameend="col6" align="right">6,28E-01</entry><entry namest="col7" nameend="col7" align="right">2,10E-05</entry><entry namest="col8" nameend="col8" align="right">1.00E + 00</entry></row><row><entry namest="col1" nameend="col1" align="left">F9..10)</entry><entry namest="col2" nameend="col2" align="right">4,87E + 02</entry><entry namest="col3" nameend="col3" align="right">2,05E-03</entry><entry namest="col4" nameend="col4" align="right">2,05E-03</entry><entry namest="col5" nameend="col5" align="right">5,98E-02</entry><entry namest="col6" nameend="col6" align="right">4,34E-01</entry><entry namest="col7" nameend="col7" align="right">1,60E-05</entry><entry namest="col8" nameend="col8" align="right">7,62E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F11..12)</entry><entry namest="col2" nameend="col2" align="right">-7,58E + 02</entry><entry namest="col3" nameend="col3" align="right">-1,32E-03</entry><entry namest="col4" nameend="col4" align="right">1,32E-03</entry><entry namest="col5" nameend="col5" align="right">3,84E-02</entry><entry namest="col6" nameend="col6" align="right">-2,78E-01</entry><entry namest="col7" nameend="col7" align="right">3.00E-06</entry><entry namest="col8" nameend="col8" align="right">1,43E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F13..14)</entry><entry namest="col2" nameend="col2" align="right">-2,14E + 02</entry><entry namest="col3" nameend="col3" align="right">-4,67E-03</entry><entry namest="col4" nameend="col4" align="right">4,67E-03</entry><entry namest="col5" nameend="col5" align="right">1,36E-01</entry><entry namest="col6" nameend="col6" align="right">-9,87E-01</entry><entry namest="col7" nameend="col7" align="right">-1,10E-05</entry><entry namest="col8" nameend="col8" align="right">-5,24E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F15..16)</entry><entry namest="col2" nameend="col2" align="right">-3,98E + 02</entry><entry namest="col3" nameend="col3" align="right">-2,51E-03</entry><entry namest="col4" nameend="col4" align="right">2,51E-03</entry><entry namest="col5" nameend="col5" align="right">7,32E-02</entry><entry namest="col6" nameend="col6" align="right">-5,31E-01</entry><entry namest="col7" nameend="col7" align="right">-6,00E-06</entry><entry namest="col8" nameend="col8" align="right">-2,86E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F17..18)</entry><entry namest="col2" nameend="col2" align="right">-1,45E + 02</entry><entry namest="col3" nameend="col3" align="right">-6,87E-03</entry><entry namest="col4" nameend="col4" align="right">6,87E-03</entry><entry namest="col5" nameend="col5" align="right">2.00E-01</entry><entry namest="col6" nameend="col6" align="right">-1,45E + 00</entry><entry namest="col7" nameend="col7" align="right">-1,60E-05</entry><entry namest="col8" nameend="col8" align="right">-7,62E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F19..20)</entry><entry namest="col2" nameend="col2" align="right">8,71E + 02</entry><entry namest="col3" nameend="col3" align="right">1,15E-03</entry><entry namest="col4" nameend="col4" align="right">1,15E-03</entry><entry namest="col5" nameend="col5" align="right">3,35E-02</entry><entry namest="col6" nameend="col6" align="right">2,43E-01</entry><entry namest="col7" nameend="col7" align="right">5.00E-06</entry><entry namest="col8" nameend="col8" align="right">2,38E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F21..22)</entry><entry namest="col2" nameend="col2" align="right">8,56E + 02</entry><entry namest="col3" nameend="col3" align="right">1,17E-03</entry><entry namest="col4" nameend="col4" align="right">1,17E-03</entry><entry namest="col5" nameend="col5" align="right">3,40E-02</entry><entry namest="col6" nameend="col6" align="right">2,47E-01</entry><entry namest="col7" nameend="col7" align="right">7,00E-06</entry><entry namest="col8" nameend="col8" align="right">3,33E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F23..24)</entry><entry namest="col2" nameend="col2" align="right">6,54E + 02</entry><entry namest="col3" nameend="col3" align="right">1,53E-03</entry><entry namest="col4" nameend="col4" align="right">1,53E-03</entry><entry namest="col5" nameend="col5" align="right">4,45E-02</entry><entry namest="col6" nameend="col6" align="right">3,23E-01</entry><entry namest="col7" nameend="col7" align="right">8,00E-06</entry><entry namest="col8" nameend="col8" align="right">3,81E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F25..26)</entry><entry namest="col2" nameend="col2" align="right">1,66E + 03</entry><entry namest="col3" nameend="col3" align="right">6.01 E-04</entry><entry namest="col4" nameend="col4" align="right">6.01 E-04</entry><entry namest="col5" nameend="col5" align="right">1,75E-02</entry><entry namest="col6" nameend="col6" align="right">1,27E-01</entry><entry namest="col7" nameend="col7" align="right">3.00E-06</entry><entry namest="col8" nameend="col8" align="right">1,43E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F27..28)</entry><entry namest="col2" nameend="col2" align="right">4.61 E + 02</entry><entry namest="col3" nameend="col3" align="right">2,17E-03</entry><entry namest="col4" nameend="col4" align="right">2,17E-03</entry><entry namest="col5" nameend="col5" align="right">6,32E-02</entry><entry namest="col6" nameend="col6" align="right">4,58E-01</entry><entry namest="col7" nameend="col7" align="right">9.00E-06</entry><entry namest="col8" nameend="col8" align="right">4,29E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F29..30)</entry><entry namest="col2" nameend="col2" align="right">-1,26E + 03</entry><entry namest="col3" nameend="col3" align="right">-7,93E-04</entry><entry namest="col4" nameend="col4" align="right">7,93E-04</entry><entry namest="col5" nameend="col5" align="right">2.31 E-02</entry><entry namest="col6" nameend="col6" align="right">-1,67E-01</entry><entry namest="col7" nameend="col7" align="right">-1,00E-06</entry><entry namest="col8" nameend="col8" align="right">-4,76E-02</entry></row><row><entry namest="col1" nameend="col1" align="left">F32..33)</entry><entry namest="col2" nameend="col2" align="right">6,85E + 02</entry><entry namest="col3" nameend="col3" align="right">1,46E-03</entry><entry namest="col4" nameend="col4" align="right">1,46E-03</entry><entry namest="col5" nameend="col5" align="right">4,25E-02</entry><entry namest="col6" nameend="col6" align="right">3,08E-01</entry><entry namest="col7" nameend="col7" align="right">-1,00E-06</entry><entry namest="col8" nameend="col8" align="right">-4,76E-02</entry></row><row><entry namest="col1" nameend="col1" align="left">F34..35)</entry><entry namest="col2" nameend="col2" align="right">4,68E + 02</entry><entry namest="col3" nameend="col3" align="right">2,14E-03</entry><entry namest="col4" nameend="col4" align="right">2,14E-03</entry><entry namest="col5" nameend="col5" align="right">6,22E-02</entry><entry namest="col6" nameend="col6" align="right">4,51E-01</entry><entry namest="col7" nameend="col7" align="right">-4,00E-06</entry><entry namest="col8" nameend="col8" align="right">-1,90E-01</entry></row><row><entry namest="col1" nameend="col1" align="left">F36..37)</entry><entry namest="col2" nameend="col2" align="right">3,86E + 02</entry><entry namest="col3" nameend="col3" align="right">2,59E-03</entry><entry namest="col4" nameend="col4" align="right">2,59E-03</entry><entry namest="col5" nameend="col5" align="right">7,55E-02</entry><entry namest="col6" nameend="col6" align="right">5,48E-01</entry><entry namest="col7" nameend="col7" align="right">-6,00E-06</entry><entry namest="col8" nameend="col8" align="right">-2,86E-01</entry></row><row rowsep="1"><entry namest="col1" nameend="col1" align="left">F38..39)</entry><entry namest="col2" nameend="col2" align="right">2,54E + 02</entry><entry namest="col3" nameend="col3" align="right">3,93E-03</entry><entry namest="col4" nameend="col4" align="right">3,93E-03</entry><entry namest="col5" nameend="col5" align="right">1,14E-01</entry><entry namest="col6" nameend="col6" align="right">8.30E-01</entry><entry namest="col7" nameend="col7" align="right">-9,00E-06</entry><entry namest="col8" nameend="col8" align="right">-4,29E-01</entry></row></tbody></tgroup></table></tables><tables id="tabl0006" num="0006"><table frame="all"><title>Table 5</title><tgroup cols="4" colsep="1" rowsep="1"><colspec colnum="1" colname="col1" colwidth="39.37mm" /><colspec colnum="2" colname="col2" colwidth="39.37mm" /><colspec colnum="3" colname="col3" colwidth="39.37mm" /><colspec colnum="4" colname="col4" colwidth="39.37mm" /><thead valign="top"><row rowsep="1"><entry namest="col1" nameend="col1" align="center"><b>SURFACE</b></entry><entry namest="col2" nameend="col2" align="center"><b>sin (i)</b></entry><entry namest="col3" nameend="col3" align="center"><b>(i) [°]</b></entry><entry namest="col4" nameend="col4" align="center"><b>sin (i) / NA</b></entry></row></thead><tbody valign="top"><row><entry namest="col1" nameend="col1" align="right">0</entry><entry namest="col2" nameend="col2" align="char" char=",">0.26</entry><entry namest="col3" nameend="col3" align="right">15.07</entry><entry namest="col4" nameend="col4" align="right">0.29</entry></row><row><entry namest="col1" nameend="col1" align="right">1</entry><entry namest="col2" nameend="col2" align="char" char=",">0,343</entry><entry namest="col3" nameend="col3" align="right">20,06</entry><entry namest="col4" nameend="col4" align="right">0.38</entry></row><row><entry namest="col1" nameend="col1" align="right">2</entry><entry namest="col2" nameend="col2" align="char" char=",">0.761</entry><entry namest="col3" nameend="col3" align="right">49.55</entry><entry namest="col4" nameend="col4" align="right">0.84</entry></row><row><entry namest="col1" nameend="col1" align="right">3</entry><entry namest="col2" nameend="col2" align="char" char=",">0.675</entry><entry namest="col3" nameend="col3" align="right">42.46</entry><entry namest="col4" nameend="col4" align="right">0.75</entry></row><row><entry namest="col1" nameend="col1" align="right">4</entry><entry namest="col2" nameend="col2" align="char" char=",">0.869</entry><entry namest="col3" nameend="col3" align="right">60.34</entry><entry namest="col4" nameend="col4" align="right">0.96</entry></row><row><entry namest="col1" nameend="col1" align="right">5</entry><entry namest="col2" nameend="col2" align="char" char=",">0.686</entry><entry namest="col3" nameend="col3" align="right">43.32</entry><entry namest="col4" nameend="col4" align="right">0.76</entry></row><row><entry namest="col1" nameend="col1" align="right">6</entry><entry namest="col2" nameend="col2" align="char" char=",">0.409</entry><entry namest="col3" nameend="col3" align="right">24.14</entry><entry namest="col4" nameend="col4" align="right">0.45</entry></row><row><entry namest="col1" nameend="col1" align="right">7</entry><entry namest="col2" nameend="col2" align="char" char=",">0.367</entry><entry namest="col3" nameend="col3" align="right">21.53</entry><entry namest="col4" nameend="col4" align="right">0.41</entry></row><row><entry namest="col1" nameend="col1" align="right">8th</entry><entry namest="col2" nameend="col2" align="char" char=",">0.453</entry><entry namest="col3" nameend="col3" align="right">26.94</entry><entry namest="col4" nameend="col4" align="right">0.50</entry></row><row><entry namest="col1" nameend="col1" align="right">9</entry><entry namest="col2" nameend="col2" align="char" char=",">0.662</entry><entry namest="col3" nameend="col3" align="right">41.45</entry><entry namest="col4" nameend="col4" align="right">0.73</entry></row><row><entry namest="col1" nameend="col1" align="right">10</entry><entry namest="col2" nameend="col2" align="char" char=",">0.264</entry><entry namest="col3" nameend="col3" align="right">15.31</entry><entry namest="col4" nameend="col4" align="right">0.29</entry></row><row><entry namest="col1" nameend="col1" align="right">11</entry><entry namest="col2" nameend="col2" align="char" char=",">0.687</entry><entry namest="col3" nameend="col3" align="right">43.39</entry><entry namest="col4" nameend="col4" align="right">0.76</entry></row><row><entry namest="col1" nameend="col1" align="right">12</entry><entry namest="col2" nameend="col2" align="char" char=",">0.834</entry><entry namest="col3" nameend="col3" align="right">56.51</entry><entry namest="col4" nameend="col4" align="right">0.92</entry></row><row><entry namest="col1" nameend="col1" align="right">13</entry><entry namest="col2" nameend="col2" align="char" char=",">0.406</entry><entry namest="col3" nameend="col3" align="right">23,95</entry><entry namest="col4" nameend="col4" align="right">0.45</entry></row><row><entry namest="col1" nameend="col1" align="right">14</entry><entry namest="col2" nameend="col2" align="char" char=",">0.595</entry><entry namest="col3" nameend="col3" align="right">36.51</entry><entry namest="col4" nameend="col4" align="right">0.66</entry></row><row><entry namest="col1" nameend="col1" align="right">15</entry><entry namest="col2" nameend="col2" align="char" char=",">0.618</entry><entry namest="col3" nameend="col3" align="right">38.17</entry><entry namest="col4" nameend="col4" align="right">0.68</entry></row><row><entry namest="col1" nameend="col1" align="right">16</entry><entry namest="col2" nameend="col2" align="char" char=",">0.345</entry><entry namest="col3" nameend="col3" align="right">20.18</entry><entry namest="col4" nameend="col4" align="right">0.38</entry></row><row><entry namest="col1" nameend="col1" align="right">17</entry><entry namest="col2" nameend="col2" align="char" char=",">0,785</entry><entry namest="col3" nameend="col3" align="right">51.72</entry><entry namest="col4" nameend="col4" align="right">0.87</entry></row><row><entry namest="col1" nameend="col1" align="right">18</entry><entry namest="col2" nameend="col2" align="char" char=",">0.776</entry><entry namest="col3" nameend="col3" align="right">50.90</entry><entry namest="col4" nameend="col4" align="right">0.86</entry></row><row><entry namest="col1" nameend="col1" align="right">19</entry><entry namest="col2" nameend="col2" align="char" char=",">0.573</entry><entry namest="col3" nameend="col3" align="right">34.96</entry><entry namest="col4" nameend="col4" align="right">0.63</entry></row><row><entry namest="col1" nameend="col1" align="right">20</entry><entry namest="col2" nameend="col2" align="char" char=",">0.16</entry><entry namest="col3" nameend="col3" align="right">9.21</entry><entry namest="col4" nameend="col4" align="right">0.18</entry></row><row><entry namest="col1" nameend="col1" align="right">21</entry><entry namest="col2" nameend="col2" align="char" char=",">0.41</entry><entry namest="col3" nameend="col3" align="right">24,21</entry><entry namest="col4" nameend="col4" align="right">0.45</entry></row><row><entry namest="col1" nameend="col1" align="right">22</entry><entry namest="col2" nameend="col2" align="char" char=",">0.306</entry><entry namest="col3" nameend="col3" align="right">17.82</entry><entry namest="col4" nameend="col4" align="right">0.34</entry></row><row><entry namest="col1" nameend="col1" align="right">23</entry><entry namest="col2" nameend="col2" align="char" char=",">0.281</entry><entry namest="col3" nameend="col3" align="right">16.32</entry><entry namest="col4" nameend="col4" align="right">0.31</entry></row><row><entry namest="col1" nameend="col1" align="right">24</entry><entry namest="col2" nameend="col2" align="char" char=",">0,483</entry><entry namest="col3" nameend="col3" align="right">28,88</entry><entry namest="col4" nameend="col4" align="right">0.53</entry></row><row><entry namest="col1" nameend="col1" align="right">25</entry><entry namest="col2" nameend="col2" align="char" char=",">0.406</entry><entry namest="col3" nameend="col3" align="right">23,95</entry><entry namest="col4" nameend="col4" align="right">0.45</entry></row><row><entry namest="col1" nameend="col1" align="right">26</entry><entry namest="col2" nameend="col2" align="char" char=",">0.126</entry><entry namest="col3" nameend="col3" align="right">7.24</entry><entry namest="col4" nameend="col4" align="right">0.14</entry></row><row><entry namest="col1" nameend="col1" align="right">27</entry><entry namest="col2" nameend="col2" align="char" char=",">0.608</entry><entry namest="col3" nameend="col3" align="right">37.45</entry><entry namest="col4" nameend="col4" align="right">0.67</entry></row><row><entry namest="col1" nameend="col1" align="right">28</entry><entry namest="col2" nameend="col2" align="char" char=",">0.65</entry><entry namest="col3" nameend="col3" align="right">40.54</entry><entry namest="col4" nameend="col4" align="right">0.72</entry></row><row><entry namest="col1" nameend="col1" align="right">29</entry><entry namest="col2" nameend="col2" align="char" char=",">0.895</entry><entry namest="col3" nameend="col3" align="right">63.51</entry><entry namest="col4" nameend="col4" align="right">0.99</entry></row><row><entry namest="col1" nameend="col1" align="right">30</entry><entry namest="col2" nameend="col2" align="char" char=",">0.51</entry><entry namest="col3" nameend="col3" align="right">30.66</entry><entry namest="col4" nameend="col4" align="right">0.56</entry></row><row><entry namest="col1" nameend="col1" align="right">32</entry><entry namest="col2" nameend="col2" align="char" char=",">0.706</entry><entry namest="col3" nameend="col3" align="right">44.91</entry><entry namest="col4" nameend="col4" align="right">0.78</entry></row><row><entry namest="col1" nameend="col1" align="right">33</entry><entry namest="col2" nameend="col2" align="char" char=",">0.367</entry><entry namest="col3" nameend="col3" align="right">21.53</entry><entry namest="col4" nameend="col4" align="right">0.41</entry></row><row><entry namest="col1" nameend="col1" align="right">34</entry><entry namest="col2" nameend="col2" align="char" char=",">0.503</entry><entry namest="col3" nameend="col3" align="right">30,20</entry><entry namest="col4" nameend="col4" align="right">0.56</entry></row><row><entry namest="col1" nameend="col1" align="right">35</entry><entry namest="col2" nameend="col2" align="char" char=",">0.584</entry><entry namest="col3" nameend="col3" align="right">35.73</entry><entry namest="col4" nameend="col4" align="right">0.64</entry></row><row><entry namest="col1" nameend="col1" align="right">36</entry><entry namest="col2" nameend="col2" align="char" char=",">0.276</entry><entry namest="col3" nameend="col3" align="right">16,02</entry><entry namest="col4" nameend="col4" align="right">0.30</entry></row><row><entry namest="col1" nameend="col1" align="right">37</entry><entry namest="col2" nameend="col2" align="char" char=",">0.586</entry><entry namest="col3" nameend="col3" align="right">35.87</entry><entry namest="col4" nameend="col4" align="right">0.65</entry></row><row><entry namest="col1" nameend="col1" align="right">38</entry><entry namest="col2" nameend="col2" align="char" char=",">0.364</entry><entry namest="col3" nameend="col3" align="right">21.35</entry><entry namest="col4" nameend="col4" align="right">0.40</entry></row><row><entry namest="col1" nameend="col1" align="right">39</entry><entry namest="col2" nameend="col2" align="char" char=",">0,836</entry><entry namest="col3" nameend="col3" align="right">56.72</entry><entry namest="col4" nameend="col4" align="right">0.92</entry></row><row rowsep="1"><entry namest="col1" nameend="col1" align="right">40</entry><entry namest="col2" nameend="col2" align="char" char=",">0.906</entry><entry namest="col3" nameend="col3" align="right">64.96</entry><entry namest="col4" nameend="col4" align="right">1.00</entry></row></tbody></tgroup></table></tables>
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| US2006012885A1 | United States of America | A1 | |
| WO2005059618A3 | World Intellectual Property Organization (WIPO) | A3 | |
| WO2006005547A1 | World Intellectual Property Organization (WIPO) | A1 | |
| US6995930B2 | United States of America | B2 | |
| WO2005059617A3 | World Intellectual Property Organization (WIPO) | A3 | |
| WO2005069055A3 | World Intellectual Property Organization (WIPO) | A3 | |
| EP1544676A3 | European Patent Office (EPO) | A3 | |
| EP1242843B1 | European Patent Office (EPO) | B1 | |
| US2006066962A1 | United States of America | A1 | |
| US2006077366A1 | United States of America | A1 | |
| WO2006045748A2 | World Intellectual Property Organization (WIPO) | A2 | |
| DE50012452D1 | Germany | D1 | |
| US2006109560A1 | United States of America | A1 | |
| WO2005059645A9 | World Intellectual Property Organization (WIPO) | A9 | |
| DE102005021341A1 | Germany | A1 | |
| US2006146411A1 | United States of America | A1 | |
| EP1697798A2 | European Patent Office (EPO) | A2 | |
| US2006198029A1 | United States of America | A1 | |
| EP1700163A1 | European Patent Office (EPO) | A1 | |
| US2006221456A1 | United States of America | A1 | |
| EP1709472A2 | European Patent Office (EPO) | A2 | |
| KR20060109935A | Republic of Korea | A | |
| EP1714192A1 | European Patent Office (EPO) | A1 | |
| US2006244938A1 | United States of America | A1 | |
| KR20060123226A | Republic of Korea | A | |
| WO2006045748A3 | World Intellectual Property Organization (WIPO) | A3 | |
| KR20060129379A | Republic of Korea | A | |
| KR20060129381A | Republic of Korea | A | |
| WO2006133801A1 | World Intellectual Property Organization (WIPO) | A1 | |
| US7154678B2 | United States of America | B2 | |
| CN1894632A | China | A | |
| CN1910494A | China | A | |
| CN1914563A | China | A | |
| US7187503B2 | United States of America | B2 | |
| KR20070030959A | Republic of Korea | A | |
| JP2007508591A | Japan | A | |
| US7203007B2 | United States of America | B2 | |
| EP1771771A1 | European Patent Office (EPO) | A1 | |
| US2007091451A1 | United States of America | A1 | |
| US2007109659A1 | United States of America | A1 | |
| JP2007514192A | Japan | A | |
| JP2007516613A | Japan | A | |
| US7239450B2 | United States of America | B2 | |
| EP1803036A2 | European Patent Office (EPO) | A2 | |
| JP2007518125A | Japan | A | |
| US2007165198A1 | United States of America | A1 | |
| EP1164399B1 | European Patent Office (EPO) | B1 | |
| JP2007522508A | Japan | A | |
| US2007195423A1 | United States of America | A1 |
16 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Application deemed to be withdrawnWithdrawn18D | 18D | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA | STAA | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOSNIGR1GRAP | GRAP | |
| Title (correction)REFRACTIVE PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY, PROJECTION EXPOSURE APPARATUS COMPRISING SUCH A PROJECTION OBJECTIVE, AND DEVICE MANUFACTURING METHOD USING SUCH A PROJRTI1 | RTI1 | |
| Party data changed (applicant data changed or rights of an application transferred)RAP1 | RAP1 | |
| First examination report despatched17Q | 17Q | |
| Designation fees paidAKX | AKX | |
| Request for examination filed17P | 17P | |
| Designated contracting statesAK | AK | |
| Request for extension of the european patentAX | AX | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | |
| Designated contracting statesAK | AK | |
| Request for extension of the european patentAX | AX | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI |
Numbers
- Publication
- 1544676
- Publication, DOCDB
- 1544676
- Publication, EPODOC
- EP1544676
- Application
- 4029279
- Application, DOCDB
- 04029279
- Application, EPODOC
- EP20040029279
Titles4
- German
- Refraktives Projektionsobjektiv für Immersions-Lithographie
- English
- Refractive projection objective for immersion lithography
- French
- Objectif de projection refractif pour lithographie par immersion
- English
- Refractive projection objective for immersion lithography, projection exposure apparatus comprising such a projection objective, and device manufacturing method using such a projection objective
Classification
- CPC, 4
- G03F7/70958
- G02B13/143
- G03F7/70241
- G03F7/70341
- IPC, 7
- G02B13 24
- G03F7 20
- G02B1 10
- G02B13 14
- G02B13 18
- G02B21 02
- H01L21 027
Designated states2
- Contracting states, 1
- Türkiye
- Extension states, 1
- Yugoslavia, later Serbia and Montenegro (until 2006)