EP1543451A4
Method and system for context-specific mask writing
6 sheets
Sheet 1 Sheet 2 Sheet 3 Sheet 4 Sheet 5 Sheet 6
Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| WO0184237A2 | Cites | World Intellectual Property Organization (WIPO) | X | Search report | 1-36 |
| WO0198830A2 | Cites | World Intellectual Property Organization (WIPO) | X | Search report | 1-36 |
| WO0229491A1 | Cites | World Intellectual Property Organization (WIPO) | X | Search report | 1-36 |
| US5792581A | Cites | United States of America | X | Search report | 1-36 |
| US5994009A | Cites | United States of America | X | Search report | 1-36 |
| US6180293B1 | Cites | United States of America | X | Search report | 1-36 |
| OTTO O W ET AL: "INTEGRATING PROXIMITY EFFECTS CORRECTIONS WITH PHOTOMASK DATA PREPARATION", OPTICAL / LASER MICROLITHOGRAPHY 8. SANTA CLARA, FEB. 22 - 24, 1995; [PROCEEDINGS OF SPIE. OPTICAL / LASER MICROLITHOGRAPHY], BELLINGHAM, SPIE, US, vol. VOL. 2440, 22 February 1995 (1995-02-22), pages 184 - 191, XP000988729, ISBN: 978-0-8194-1788-6 | Non-patent | – | – | Search report | – |
13 members in 5 offices
Priority claims3
| Document | Office | Kind | Date |
|---|---|---|---|
| 395415P | United States of America | – | |
| 39541502 | United States of America | P | |
| 0321996 | United States of America | W |
Members13
| Document | Office | Kind | |
|---|---|---|---|
| WO2004008246A2 | World Intellectual Property Organization (WIPO) | A2 | |
| AU2003256531A1 | Australia | A1 | |
| AU2003256531A8 | Australia | A8 | |
| US2004107412A1 | United States of America | A1 | |
| WO2004008246A3 | World Intellectual Property Organization (WIPO) | A3 | |
| EP1543451A2 | European Patent Office (EPO) | A2 | |
| US2005216877A1 | United States of America | A1 | |
| JP2005533283A | Japan | A | |
| US7249342B2 | United States of America | B2 | |
| US2007266364A1 | United States of America | A1 | |
| US7302672B2 | United States of America | B2 | |
| US7784016B2 | United States of America | B2 | |
| EP1543451A4This record | European Patent Office (EPO) | A4 |
9 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Application deemed to be withdrawnWithdrawn18D | 18D | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA | STAA | |
| First examination report despatched17Q | 17Q | |
| Supplementary search report drawn up and despatchedA4 | A4 | |
| Request for extension of the european patent (deleted)DAX | DAX | |
| Request for examination filed17P | 17P | |
| Designated contracting statesAK | AK | |
| Request for extension of the european patentAX | AX | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI |
Numbers
- Publication
- 1543451
- Application
- 37646346
Titles3
- German
- VERFAHREN UND SYSTEM ZUM KONTEXTSPEZIFISCHEN MASKENSCHREIBEN
- English
- METHOD AND SYSTEM FOR CONTEXT-SPECIFIC MASK WRITING
- French
- PROCEDE ET SYSTEME DE GRAVURE DE MASQUE SPECIFIQUE AU CONTEXTE
Classification
- CPC, 3
- G03F1/68
- G03F1/36
- G03F1/78
- IPC, 8
- G03F
- G03F1 00
- G03F1 36
- G03F1 78
- G03F7 20
- G03F9 00
- G06F17 50
- H01L21 027
Designated states27
- Contracting states, 27
- Austria
- Belgium
- Bulgaria
- Switzerland
- Cyprus
- Czechia
- Germany
- Denmark
- Estonia
- Spain
- Finland
- France
- United Kingdom
- Greece
- Hungary
- Ireland
- Italy
- Liechtenstein
- Luxembourg
- Monaco
- Netherlands (Kingdom of the)
- Portugal
- Romania
- Sweden
and 3 moreShow fewer
- Slovenia
- Slovakia
- Türkiye
