EP1540716A4
Replication and transfer of microstructures and nanostructures
16 sheets
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Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| WO02068167A1 | Cites | World Intellectual Property Organization (WIPO) | X | Search report | 1-3,60 |
| EP1003078A2 | Cites | European Patent Office (EPO) | X | Search report | 1,4,8,9,21-25,60-67 |
| US2002071943A1 | Cites | United States of America | – | Search report | – |
| US6027595A | Cites | United States of America | – | Search report | – |
| JPS62211145A | Cites | Japan | Y | Search report | 10-20,33-37 |
| EP1003078A | Cites | European Patent Office (EPO) | – | – | – |
| WO02068167A | Cites | World Intellectual Property Organization (WIPO) | – | – | – |
| JP62211145A | Cites | Japan | – | – | – |
| XIAO PENGFENG ET AL: "Fabrication of microstamps used for oligonucleotide arrays synthesis", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, SPIE, BELLINGHAM, VA; US, vol. 4601, 1 January 2001 (2001-01-01), pages 401 - 405, XP002380795 | Non-patent | – | – | Search report | – |
31 members in 8 offices
Priority claims3
| Document | Office | Kind | Date |
|---|---|---|---|
| 246379 | United States of America | – | |
| 24637902 | United States of America | A | |
| 0329040 | United States of America | W |
Members31
| Document | Office | Kind | |
|---|---|---|---|
| US2003219992A1 | United States of America | A1 | |
| WO2004027460A2 | World Intellectual Property Organization (WIPO) | A2 | |
| AU2003278818A1 | Australia | A1 | |
| AU2003278818A8 | Australia | A8 | |
| WO2004027460A3 | World Intellectual Property Organization (WIPO) | A3 | |
| US6849558B2 | United States of America | B2 | |
| KR20050019128A | Republic of Korea | A | |
| EP1540716A2 | European Patent Office (EPO) | A2 | |
| CN1659691A | China | A | |
| JP2005539396A | Japan | A | |
| HK1076197A | Hong Kong, China | A | |
| HK1076197A1 | Hong Kong, China | A1 | |
| US2006035164A1 | United States of America | A1 | |
| KR100700238B1 | Republic of Korea | B1 | |
| US7345002B2 | United States of America | B2 | |
| CN101231473A | China | A | |
| CN100446192C | China | C | |
| EP1540716A4This record | European Patent Office (EPO) | A4 | |
| JP2008311674A | Japan | A | |
| CN101398617A | China | A | |
| JP2009218616A | Japan | A | |
| US2010044837A1 | United States of America | A1 | |
| EP2177950A1 | European Patent Office (EPO) | A1 | |
| JP4671690B2 | Japan | B2 | |
| US7981814B2 | United States of America | B2 | |
| CN101231473B | China | B | |
| JP5102809B2 | Japan | B2 | |
| EP2177950B1 | European Patent Office (EPO) | B1 | |
| CN101398617B | China | B | |
| JP5525707B2 | Japan | B2 | |
| EP1540716B1 | European Patent Office (EPO) | B1 |
66 legal events, as 9 offices reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | Office | |
|---|---|---|---|
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Gb: european patent ceased through non-payment of renewal feeCeasedGBPC | GBPC | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal feeWithdrawnR119 | R119 | DE | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Fee paymentPLFP | PLFP | FR | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Fee paymentPLFP | PLFP | FR | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Fee paymentPLFP | PLFP | FR | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Patent lapsedLapsedMM4A | MM4A | IE | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Patent ceasedCeasedPL | PL | CH | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| No opposition filedOpposition26N | 26N | EP | |
| Fee paymentPLFP | PLFP | FR | |
| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA | STAA | EP | |
| No opposition filed against granted patent, or epo opposition proceedings concluded without decisionGrantedR097 | R097 | DE | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Standard patents granted in hong kongGrantedGR | GR | HK | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Discontinued in the netherlands as no translation has been filedVDEP | VDEP | NL | |
| Deletion acc. to par. 5 (withdrawal of the translation of the ep patent)MK05 | MK05 | AT | |
| Dpma publication of mentioned ep patent grantGrantedR096 | R096 | DE | |
| European patents granted designating irelandGrantedFG4D | FG4D | IE | |
| Reference to at number (ep patent enters austrian national phase)REF | REF | AT | |
| European patent takes effect as a national patent in ch/liEP | EP | CH | |
| Designated contracting statesAK | AK | EP | |
| European patent grantedGrantedFG4D | FG4D | GB | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| Grant fee paidORIGINAL CODE: EPIDOSNIGR3GRAS | GRAS | EP | |
| Intention to grant announcedINTG | INTG | EP | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOSNIGR1GRAP | GRAP | EP | |
| First examination report despatched17Q | 17Q | EP | |
| Supplementary search report drawn up and despatchedA4 | A4 | EP | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | EP | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | EP | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | EP | |
| Requests to designate patent in hong kongDE | DE | HK | |
| Request for extension of the european patent (deleted)DAX | DAX | EP | |
| Request for examination filed17P | 17P | EP | |
| Designated contracting statesAK | AK | EP | |
| Request for extension of the european patentAX | AX | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 1540716
- Application
- 37703360
Titles3
- German
- DUPLIKATION UND TRANSFER VON MIKROSTRUKTUREN UND NANOSTRUKTUREN
- English
- REPLICATION AND TRANSFER OF MICROSTRUCTURES AND NANOSTRUCTURES
- French
- REPRODUCTION ET TRANSFERT DE MICROSTRUCTURES ET DE NANOSTRUCTURES
Classification
- CPC, 8
- B81C1/0046
- G03F7/0002
- B29C33/52
- B82Y10/00
- B82Y40/00
- G03F7/091
- Y10S438/942
- B82B3/0004
- IPC, 8
- G03F7 00
- H01L21 31
- H01L21 469
- B82B3 00
- B81C1 00
- G03F7 09
- H01L21 027
- H10D62 00
Designated states1
- Contracting states, 1
- Türkiye
