EP1540665A4
Photolithography mask repair
Abstract
This record has no abstract on file.
Term
Term ended
Projected expiry passed 18 September 2023, 3 years ago.
- Priority
- Filed
- Published
- Projected expiry
- Today
3 sheets
Sheet 1 Sheet 2 Sheet 3
Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| DE10253073A1 | Cites | Germany | E | Search report | 1-12 |
| US2004151992A1 | Cites | United States of America | E | Search report | 1-12 |
| US2004157134A1 | Cites | United States of America | E | Search report | 1-12 |
| US4548883A | Cites | United States of America | XY | Search report | 1,3-5,8 |
| US5945237A | Cites | United States of America | XY | Search report | 1,3-5,8 |
| US6016357A | Cites | United States of America | XY | Search report | 9 |
| JPH07219211A | Cites | Japan | XY | Search report | 1,3-5,8 |
| JP7219211A | Cites | Japan | – | – | – |
49 members in 8 offices
Priority claims9
| Document | Office | Kind | Date |
|---|---|---|---|
| 411699P | United States of America | – | |
| 41169902 | United States of America | P | |
| 41169902 | United States of America | P | |
| 0329521 | United States of America | W | |
| 0329521 | United States of America | W | |
| 411699P | – | – | – |
| US20020411699P | – | – | – |
| US2003029521 | – | – | – |
| WO2003US29521 | – | – | – |
Members49
| Document | Office | Kind | |
|---|---|---|---|
| WO2004027684A2 | World Intellectual Property Organization (WIPO) | A2 | |
| WO2004027808A2 | World Intellectual Property Organization (WIPO) | A2 | |
| WO2004027809A2 | World Intellectual Property Organization (WIPO) | A2 | |
| AU2003275028A1 | Australia | A1 | |
| AU2003275028A8 | Australia | A8 | |
| AU2003276900A1 | Australia | A1 | |
| AU2003276900A8 | Australia | A8 | |
| AU2003299002A1 | Australia | A1 | |
| AU2003299002A8 | Australia | A8 | |
| US2004124356A1 | United States of America | A1 | |
| WO2004027808A3 | World Intellectual Property Organization (WIPO) | A3 | |
| WO2004027809A3 | World Intellectual Property Organization (WIPO) | A3 | |
| US2004151991A1 | United States of America | A1 | |
| WO2004027684A3 | World Intellectual Property Organization (WIPO) | A3 | |
| WO2004027684B1 | World Intellectual Property Organization (WIPO) | B1 | |
| KR20050050658A | Republic of Korea | A | |
| KR20050054948A | Republic of Korea | A | |
| EP1540665A2 | European Patent Office (EPO) | A2 | |
| EP1540692A2 | European Patent Office (EPO) | A2 | |
| EP1540693A2 | European Patent Office (EPO) | A2 | |
| EP1577927A2 | European Patent Office (EPO) | A2 | |
| JP2005268224A | Japan | A | |
| CN1695222A | China | A | |
| US6972412B2 | United States of America | B2 | |
| JP2005539273A | Japan | A | |
| JP2005539359A | Japan | A | |
| JP2005539360A | Japan | A | |
| US2005279934A1 | United States of America | A1 | |
| US6979822B1 | United States of America | B1 | |
| EP1540665A4This record | European Patent Office (EPO) | A4 | |
| EP1577927A3 | European Patent Office (EPO) | A3 | |
| US7504182B2 | United States of America | B2 | |
| EP1540692A4 | European Patent Office (EPO) | A4 | |
| US2009111036A1 | United States of America | A1 | |
| CN100521062C | China | C | |
| US7662524B2 | United States of America | B2 | |
| EP1540693A4 | European Patent Office (EPO) | A4 | |
| JP4520303B2 | Japan | B2 | |
| JP4616938B2 | Japan | B2 | |
| KR101015116B1 | Republic of Korea | B1 | |
| EP1577927B1 | European Patent Office (EPO) | B1 | |
| AT511206T | Austria | T | |
| ATE511206T1 | Austria | T1 | |
| EP2372743A2 | European Patent Office (EPO) | A2 | |
| KR101077980B1 | Republic of Korea | B1 | |
| EP1540692B1 | European Patent Office (EPO) | B1 | |
| EP2372743A3 | European Patent Office (EPO) | A3 | |
| JP5586118B2 | Japan | B2 | |
| EP2372743B1 | European Patent Office (EPO) | B1 |
12 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Application deemed to be withdrawnWithdrawn18D | 18D | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA | STAA | |
| First examination report despatched17Q | 17Q | |
| Supplementary search report drawn up and despatchedA4 | A4 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Request for extension of the european patent (deleted)DAX | DAX | |
| Designated contracting states (corrected)RBV | RBV | |
| Request for examination filed17P | 17P | |
| Designated contracting statesAK | AK | |
| Request for extension of the european patentAX | AX | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI |
Numbers
- Publication
- 1540665
- Publication, DOCDB
- 1540665
- Publication, EPODOC
- EP1540665
- Application
- 3756838
- Application, DOCDB
- 03756838
- Application, EPODOC
- EP20030756838
Titles3
- German
- FOTOLITHOGRAPHIEMASKENREPARATUR
- English
- PHOTOLITHOGRAPHY MASK REPAIR
- French
- REPARATION DE MASQUES PHOTOLITHOGRAPHIQUES
Classification
- CPC, 4
- G03F1/74
- G03F9/00
- G03F1/72
- G21G5/00
- IPC, 9
- G21G5 00
- A61N5 00
- C23C14 00
- G03F1 00
- G03F9 00
- G06K
- G06K9 00
- H01J37 00
- H01L21 027
Designated states1
- Contracting states, 1
- United Kingdom