EP1540047A4
Oh and h resistant silicon material
Abstract
This record has no abstract on file.
Term
Term ended
Projected expiry passed 8 October 2022, 4 years ago.
- Priority
- Filed
- Published
- Projected expiry
- Today
11 sheets
Sheet 1 Sheet 2 Sheet 3 Sheet 4 Sheet 5 Sheet 6 Sheet 7 Sheet 8 Sheet 9 Sheet 10 Sheet 11
Every citation, both waysCites: the store holds 7 of 8
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| US2002080474A1 | Cites | United States of America | A | Search report | 15-23 |
| US4738831A | Cites | United States of America | X | Search report | 1,7,10,13 |
| US5692087A | Cites | United States of America | A | Search report | 15 |
| WO9933758A2 | Cites | World Intellectual Property Organization (WIPO) | A | Search report | – |
| US4738831A1 | Cites | United States of America | – | – | – |
| US5692087A1 | Cites | United States of America | – | – | – |
| WO9933758A | Cites | World Intellectual Property Organization (WIPO) | – | – | – |
| KAZUHISA TAKETOSHI AND FUMIHIKO ANDOH: "Structural Studies on Silicon Ditelluride (SiTe2)", JPN. J. APPL. PHYS., vol. 34, June 1995 (1995-06-01), pages 3192 - 3197, XP002424228 | Non-patent | – | – | Search report | – |
| See also references of WO 2004005203A1 | Non-patent | – | – | Search report | – |
26 members in 11 offices
Priority claims9
| Document | Office | Kind | Date |
|---|---|---|---|
| 393829 | United States of America | – | |
| 39382902 | United States of America | P | |
| 39382902 | United States of America | P | |
| 0232003 | United States of America | W | |
| 0232003 | United States of America | W | |
| 393829 | – | – | – |
| US2002032003 | – | – | – |
| US20020393829P | – | – | – |
| WO2002US32003 | – | – | – |
Members26
| Document | Office | Kind | |
|---|---|---|---|
| CA2491964A1 | Canada | A1 | |
| WO2004005203A1 | World Intellectual Property Organization (WIPO) | A1 | |
| AU2002348527A1 | Australia | A1 | |
| US2004159647A1 | United States of America | A1 | |
| US2004165858A1 | United States of America | A1 | |
| KR20050025315A | Republic of Korea | A | |
| EP1540047A1 | European Patent Office (EPO) | A1 | |
| WO2005068680A2 | World Intellectual Property Organization (WIPO) | A2 | |
| CN1656029A | China | A | |
| EA200500166A1 | Eurasian Patent Organization (EAPO) | A1 | |
| WO2005068680A3 | World Intellectual Property Organization (WIPO) | A3 | |
| US2006011603A2 | United States of America | A2 | |
| US2006076324A1 | United States of America | A1 | |
| US7067006B2 | United States of America | B2 | |
| ZA200500164B | South Africa | B | |
| EP1704265A2 | European Patent Office (EPO) | A2 | |
| US7161110B2 | United States of America | B2 | |
| CN1902335A | China | A | |
| NZ537551A | New Zealand | A | |
| EP1540047A4This record | European Patent Office (EPO) | A4 | |
| EA008276B1 | Eurasian Patent Organization (EAPO) | B1 | |
| US7214903B2 | United States of America | B2 | |
| JP2007517658A | Japan | A | |
| AU2002348527B2 | Australia | B2 | |
| CA2491964C | Canada | C | |
| CN1902335B | China | B |
13 legal events, as 2 offices reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | Office | |
|---|---|---|---|
| Applications withdrawn, deemed to be withdrawn, or refused after publication in hong kongWithdrawnWD | WD | HK | |
| Application deemed to be withdrawnWithdrawn18D | 18D | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA | STAA | EP | |
| First examination report despatched17Q | 17Q | EP | |
| Supplementary search report drawn up and despatchedA4 | A4 | EP | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | EP | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | EP | |
| Requests to designate patent in hong kongDE | DE | HK | |
| Request for extension of the european patent (deleted)DAX | DAX | EP | |
| Request for examination filed17P | 17P | EP | |
| Designated contracting statesAK | AK | EP | |
| Request for extension of the european patentAX | AX | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 1540047
- Publication, DOCDB
- 1540047
- Publication, EPODOC
- EP1540047
- Application
- 2782128
- Application, DOCDB
- 02782128
- Application, EPODOC
- EP20020782128
Titles3
- German
- OH- UND H-BESTÄNDIGES SILICIUMMATERIAL
- English
- OH AND H RESISTANT SILICON MATERIAL
- French
- MATERIEAU DE SILICIUM RESISTANT A OH ET H
Classification
- CPC, 11
- C30B1/12
- C03B5/08
- C23C14/24
- C30B1/00
- F27B5/04
- F27B14/04
- C30B9/06
- C30B35/002
- C30B29/46
- C03B13/14
- C03B13/08
- IPC, 8
- C30B1 00
- C23C14 24
- C30B1 12
- C30B9 00
- C30B11 00
- C30B29 46
- F27B5 04
- F27B14 04
Designated states1
- Contracting states, 1
- Türkiye