EP1535116A4
Improved photomask having an intermediate inspection film layer
Abstract
This record has no abstract on file.
Term
Term ended
Projected expiry passed 8 July 2023, 3.2 years ago.
- Priority
- Filed
- Published
- Projected expiry
- Today
12 sheets
Sheet 1 Sheet 2 Sheet 3 Sheet 4 Sheet 5 Sheet 6 Sheet 7 Sheet 8 Sheet 9 Sheet 10 Sheet 11 Sheet 12
Every citation, both waysCites: the store holds 6 of 7
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| EP0872767A2 | Cites | European Patent Office (EPO) | X | Search report | 1-72 |
| EP1176466A1 | Cites | European Patent Office (EPO) | Y | Search report | 1-72 |
| US6387573B1 | Cites | United States of America | A | Search report | 1-72 |
| US6395433B1 | Cites | United States of America | X | Search report | 1-72 |
| EP0872767A | Cites | European Patent Office (EPO) | – | – | – |
| EP1176466A | Cites | European Patent Office (EPO) | – | – | – |
| ANONYMOUS: "Optical Poperties of Thin Films for DUV and VUV Microlithography", INTERNET ARTICLE, 6 December 2001 (2001-12-06), XP002360532, Retrieved from the Internet <URL:http://www.rit.edu/%7E635dept5/thinfilms/thinfilms.htm> [retrieved on 20051220] | Non-patent | – | – | Search report | – |
| EUNAH KIM ET AL: "Simulation of optical constants range of high-transmittance attenuated phase-shifting masks used in KrF laser and ArF laser", JAPANESE JOURNAL OF APPLIED PHYSICS, PART 1 (REGULAR PAPERS, SHORT NOTES & REVIEW PAPERS) JAPAN SOC. APPL. PHYS JAPAN, vol. 39, no. 11, November 2000 (2000-11-01), pages 6321 - 6328, XP002360533, ISSN: 0021-4922 | Non-patent | – | – | Search report | – |
21 members in 8 offices
Priority claims9
| Document | Office | Kind | Date |
|---|---|---|---|
| 229830 | United States of America | – | |
| 22983002 | United States of America | A | |
| 22983002 | United States of America | A | |
| 0321078 | United States of America | W | |
| 0321078 | United States of America | W | |
| 229830 | – | – | – |
| US20020229830 | – | – | – |
| US2003021078 | – | – | – |
| WO2003US21078 | – | – | – |
Members21
| Document | Office | Kind | |
|---|---|---|---|
| US2004043303A1 | United States of America | A1 | |
| WO2004021082A2 | World Intellectual Property Organization (WIPO) | A2 | |
| AU2003253797A1 | Australia | A1 | |
| AU2003253797A8 | Australia | A8 | |
| WO2004021082A3 | World Intellectual Property Organization (WIPO) | A3 | |
| TW200424752A | Taiwan Province of China | A | |
| US2005026053A1 | United States of America | A1 | |
| US6855463B2 | United States of America | B2 | |
| US2005053847A1 | United States of America | A1 | |
| TW200514135A | Taiwan Province of China | A | |
| WO2005036264A2 | World Intellectual Property Organization (WIPO) | A2 | |
| KR20050043920A | Republic of Korea | A | |
| TWI233001B | Taiwan Province of China | B | |
| EP1535116A2 | European Patent Office (EPO) | A2 | |
| WO2005036264A8 | World Intellectual Property Organization (WIPO) | A8 | |
| CN1678962A | China | A | |
| JP2005537508A | Japan | A | |
| EP1535116A4This record | European Patent Office (EPO) | A4 | |
| US7049034B2 | United States of America | B2 | |
| TWI296126B | Taiwan Province of China | B | |
| WO2005036264A3 | World Intellectual Property Organization (WIPO) | A3 |
10 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Application deemed to be withdrawnWithdrawn18D | 18D | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA | STAA | |
| Supplementary search report drawn up and despatchedA4 | A4 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Information provided on ipc code assigned before grantRIC1 | RIC1 | |
| Request for extension of the european patent (deleted)DAX | DAX | |
| Request for examination filed17P | 17P | |
| Designated contracting statesAK | AK | |
| Request for extension of the european patentAX | AX | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI |
Numbers
- Publication
- 1535116
- Publication, DOCDB
- 1535116
- Publication, EPODOC
- EP1535116
- Application
- 3791567
- Application, DOCDB
- 03791567
- Application, EPODOC
- EP20030791567
Titles3
- German
- VERBESSERTE FOTOMASKE MIT EINER ZWISCHENUNTERSUCHUNGSFILMSCHICHT
- English
- IMPROVED PHOTOMASK HAVING AN INTERMEDIATE INSPECTION FILM LAYER
- French
- MASQUE PHOTOGRAPHIQUE AMELIORE A COUCHE D'EXAMEN INTERMEDIAIRE
Classification
- CPC, 4
- G03F1/32
- G03F1/38
- G03F1/54
- G03F1/84
- IPC, 7
- G03F1 32
- G03F1 38
- G03F1 54
- G03F1 84
- H01L21 027
- G03F1 00
- G03F1 08
Designated states1
- Contracting states, 1
- Türkiye