Nova Patents
EP1528433A3

Lithographic apparatus

Abstract

Liquid is supplied to a reservoir (10) between the final element of the projection system (PS) and the substrate by an inlet (21,22). An overflow removes the liquid above a given level. The overflow is arranged above the inlet and thus the liquid is constantly refreshed and the pressure in the liquid remains substantially constant.

EP1528433A3, drawing sheet 1
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Term

Term ended

Projected expiry passed 26 October 2024, 1.9 years ago.

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