EP1522385A3
Polishing Pad
Abstract
A polishing pad is useful planarizing semiconductor substrates. The polishing pad comprises a polymeric material having a porosity of at least 0.1 volume percent, a KEL energy loss factor at 40°C and 1 rad/sec of 385 to 750 1/Pa and a modulus E' at 40°C and 1 rad/sec of 100 to 400 MPa.
Term
Term ended
Projected expiry passed 6 October 2024, 2 years ago.
- Priority
- Filed
- Published
- Projected expiry
- Today
Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| WO0191971A1 | Cites | World Intellectual Property Organization (WIPO) | X | Search report | 1-10 |
| US6239188B1 | Cites | United States of America | A | Search report | 1,3,6,9 |
| US6454634B1 | Cites | United States of America | DX | Search report | 1,3,6,9 |
| US6627671B1 | Cites | United States of America | A | Search report | 1,3,6,9 |
16 members in 8 offices; this record represents the family
Priority claims4
| Document | Office | Kind | Date |
|---|---|---|---|
| 682158 | United States of America | – | |
| 68215803 | United States of America | A | |
| 937914 | United States of America | – | |
| 93791404 | United States of America | A |
Members16
| Document | Office | Kind | |
|---|---|---|---|
| EP1522385A2 | European Patent Office (EPO) | A2 | |
| KR20050034554A | Republic of Korea | A | |
| US2005079806A1 | United States of America | A1 | |
| JP2005136400A | Japan | A | |
| SG111222A1 | Singapore | A1 | |
| CN1638056A | China | A | |
| TW200528233A | Taiwan Province of China | A | |
| EP1522385A3This record | European Patent Office (EPO) | A3 | |
| US7074115B2 | United States of America | B2 | |
| CN100353502C | China | C | |
| EP1522385B1 | European Patent Office (EPO) | B1 | |
| DE602004010871D1 | Germany | D1 | |
| DE602004010871T2 | Germany | T2 | |
| TWI329045B | Taiwan Province of China | B | |
| JP4722446B2 | Japan | B2 | |
| KR101092944B1 | Republic of Korea | B1 |
33 legal events, as 4 offices reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | Office | |
|---|---|---|---|
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Gb: european patent ceased through non-payment of renewal feeCeasedGBPC | GBPC | EP | |
| Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal feeWithdrawnR119 | R119 | DE | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Fee paymentPLFP | PLFP | FR | |
| Fee paymentPLFP | PLFP | FR | |
| Fee paymentPLFP | PLFP | FR | |
| No opposition filedOpposition26N | 26N | EP | |
| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA | STAA | EP | |
| Corresponds to:REF | REF | EP | |
| European patent grantedGrantedFG4D | FG4D | GB | |
| Designated contracting statesAK | AK | EP | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| Grant fee paidORIGINAL CODE: EPIDOSNIGR3GRAS | GRAS | EP | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOSNIGR1GRAP | GRAP | EP | |
| First examination report despatched17Q | 17Q | EP | |
| Designation fees paidAKX | AKX | EP | |
| Party data changed (applicant data changed or rights of an application transferred)RAP1 | RAP1 | EP | |
| Designated contracting statesAK | AK | EP | |
| Request for extension of the european patentAX | AX | EP | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | EP | |
| Request for examination filed17P | 17P | EP | |
| Designated contracting statesAK | AK | EP | |
| Request for extension of the european patentAX | AX | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 1522385
- Application
- 42561704
Titles3
- German
- Polierscheibe
- English
- Polishing Pad
- French
- Disque de polissage
Classification
- CPC, 6
- C08G18/4854
- B24D3/32
- B24D3/26
- B24D13/147
- C08G18/10
- H10P52/00
- IPC, 10
- B24B37 04
- B24D13 14
- B24D3 26
- C08G18 83
- B24B37 00
- B24D3 28
- C08G18 10
- C08G18 48
- C08J5 14
- H01L21 304
Designated states33
- Contracting states, 28
- Austria
- Belgium
- Bulgaria
- Switzerland
- Cyprus
- Czechia
- Germany
- Denmark
- Estonia
- Spain
- Finland
- France
- United Kingdom
- Greece
- Hungary
- Ireland
- Italy
- Liechtenstein
- Luxembourg
- Monaco
- Netherlands (Kingdom of the)
- Poland
- Portugal
- Romania
and 4 moreShow fewer
- Sweden
- Slovenia
- Slovakia
- Türkiye
- Extension states, 5
- Albania
- Croatia
- Lithuania
- Latvia
- North Macedonia