EP1510871A3

Lithographic apparatus and device manufacturing method

Abstract

A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the final element of the projection system and the substrate W. Several methods are disclosed for protecting components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating (40) on the final element (20) of the projection system as well as providing sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

EP1510871A3, drawing sheet 1
Sheet 1 of 1

Term

Term ended

Projected expiry passed 17 August 2024, 2.1 years ago.

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