EP1510871A3
Lithographic apparatus and device manufacturing method
Abstract
A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the final element of the projection system and the substrate W. Several methods are disclosed for protecting components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating (40) on the final element (20) of the projection system as well as providing sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Term
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Projected expiry passed 17 August 2024, 2.1 years ago.
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1 sheet
Sheet 1
Every citation, both waysCites: the store holds 12 of 13
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| WO02093209A2 | Cites | World Intellectual Property Organization (WIPO) | Y | Search report | 20-22,24 |
| WO03077034A2 | Cites | World Intellectual Property Organization (WIPO) | PX | Search report | 1,29 |
| EP0605103A1 | Cites | European Patent Office (EPO) | XY | Search report | 1,29 |
| EP1316849A2 | Cites | European Patent Office (EPO) | Y | Search report | 2-4 |
| EP1420302A1 | Cites | European Patent Office (EPO) | PX | Search report | 14,15,17,18,30 |
| EP1429190A2 | Cites | European Patent Office (EPO) | PX | Search report | 1,18,29 |
| US2002163629A1 | Cites | United States of America | Y | Search report | 20-22,24 |
| US2003137733A1 | Cites | United States of America | A | Search report | 21 |
| WO2004053956A1 | Cites | World Intellectual Property Organization (WIPO) | PX | Search report | 1,29 |
| WO2004053959A1 | Cites | World Intellectual Property Organization (WIPO) | PX | Search report | 1,29 |
| DD224448A1 | Cites | German Democratic Republic (until 1990) | X | Search report | 14-17,30 |
| US6466365B1 | Cites | United States of America | A | Search report | 1,4,5,8,11 |
42 members in 7 offices
Priority claims10
| Document | Office | Kind | Date |
|---|---|---|---|
| 03255377 | European Patent Office (EPO) | A | |
| 03255377 | European Patent Office (EPO) | A | |
| 03255377 | European Patent Office (EPO) | – | |
| 69801203 | United States of America | A | |
| 69801203 | United States of America | A | |
| 04254940 | European Patent Office (EPO) | A | |
| 03255377 | – | – | – |
| EP20030255377 | – | – | – |
| EP20040254940 | – | – | – |
| US20030698012 | – | – | – |
Members42
| Document | Office | Kind | |
|---|---|---|---|
| EP1510871A2 | European Patent Office (EPO) | A2 | |
| KR20050021872A | Republic of Korea | A | |
| CN1591197A | China | A | |
| JP2005079589A | Japan | A | |
| SG109610A1 | Singapore | A1 | |
| EP1510871A3This record | European Patent Office (EPO) | A3 | |
| JP2005093997A | Japan | A | |
| US2005094116A1 | United States of America | A1 | |
| US2005094119A1 | United States of America | A1 | |
| TW200519529A | Taiwan Province of China | A | |
| US6954256B2 | United States of America | B2 | |
| US2006007421A1 | United States of America | A1 | |
| TWI254189B | Taiwan Province of China | B | |
| US7113259B2 | United States of America | B2 | |
| KR100659259B1 | Republic of Korea | B1 | |
| JP2007165934A | Japan | A | |
| JP3946212B2 | Japan | B2 | |
| US2007201012A1 | United States of America | A1 | |
| SG136134A1 | Singapore | A1 | |
| JP2009016871A | Japan | A | |
| CN100495213C | China | C | |
| JP2010153923A | Japan | A | |
| JP4586032B2 | Japan | B2 | |
| EP2261740A2 | European Patent Office (EPO) | A2 | |
| EP2261740A3 | European Patent Office (EPO) | A3 | |
| SG173309A1 | Singapore | A1 | |
| US2012013868A1 | United States of America | A1 | |
| EP1510871B1 | European Patent Office (EPO) | B1 | |
| US8208123B2 | United States of America | B2 | |
| US8208124B2 | United States of America | B2 | |
| JP2012151513A | Japan | A | |
| JP5170790B2 | Japan | B2 | |
| JP5414839B2 | Japan | B2 | |
| US2014071420A1 | United States of America | A1 | |
| EP2261740B1 | European Patent Office (EPO) | B1 | |
| US8804097B2 | United States of America | B2 | |
| US2014347642A1 | United States of America | A1 | |
| US9442388B2 | United States of America | B2 | |
| US9606448B2 | United States of America | B2 | |
| US2017160650A1 | United States of America | A1 | |
| US10146142B2 | United States of America | B2 | |
| US2019086819A1 | United States of America | A1 |
31 legal events, as 5 offices reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | Office | |
|---|---|---|---|
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal feeWithdrawnR119 | R119 | DE | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Fee paymentPLFP | PLFP | FR | |
| Fee paymentPLFP | PLFP | FR | |
| Fee paymentPLFP | PLFP | FR | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| No opposition filed against granted patent, or epo opposition proceedings concluded without decisionGrantedR097 | R097 | DE | |
| Gb: european patent ceased through non-payment of renewal feeCeasedGBPC | GBPC | EP | |
| No opposition filedOpposition26N | 26N | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA | STAA | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Discontinued in the netherlands as no translation has been filedVDEP | VDEP | NL | |
| Dpma publication of mentioned ep patent grantGrantedR096 | R096 | DE | |
| Designated contracting statesAK | AK | EP | |
| European patent grantedGrantedFG4D | FG4D | GB | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| Grant fee paidORIGINAL CODE: EPIDOSNIGR3GRAS | GRAS | EP | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOSNIGR1GRAP | GRAP | EP | |
| Designation fees paidAKX | AKX | EP | |
| Request for examination filed17P | 17P | EP | |
| Designated contracting statesAK | AK | EP | |
| Request for extension of the european patentAX | AX | EP | |
| Designated contracting statesAK | AK | EP | |
| Request for extension of the european patentAX | AX | EP | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 1510871
- Publication, DOCDB
- 1510871
- Publication, EPODOC
- EP1510871
- Application
- 4254940
- Application, DOCDB
- 04254940
- Application, EPODOC
- EP20040254940
Titles3
- German
- Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
- English
- Lithographic apparatus and device manufacturing method
- French
- Appareil lithographique et méthode de fabrication d'un dispositif
Classification
- CPC, 5
- G03F7/70966
- G03F7/70341
- G03F7/70958
- G03F7/70983
- Y10S430/162
- IPC, 3
- H01L21 027
- G02B1 10
- G03F7 20
Designated states33
- Contracting states, 28
- Austria
- Belgium
- Bulgaria
- Switzerland
- Cyprus
- Czechia
- Germany
- Denmark
- Estonia
- Spain
- Finland
- France
- United Kingdom
- Greece
- Hungary
- Ireland
- Italy
- Liechtenstein
- Luxembourg
- Monaco
- Netherlands (Kingdom of the)
- Poland
- Portugal
- Romania
and 4 moreShow fewer
- Sweden
- Slovenia
- Slovakia
- Türkiye
- Extension states, 5
- Albania
- Croatia
- Lithuania
- Latvia
- North Macedonia