EP1510106B1

Industrial apparatus for applying radio-frequency electromagnetic fields to semiconductive dielectric materials

Abstract

Industrial apparatus for applying radio-frequency electromagnetic fields to semiconductive dielectric materials comprises a radio-frequency voltage generator and an applicator device for applying radio-frequency electromagnetic fields. The applicator device comprises a plurality of electrodes electrically connected to the electrical generator for generating between then a radio-frequency electromagnetic field with electrical and magnetic components arranged in a preferential direction. The applicator device further comprises at least one pair of equipotential electrodes substantially aligned in the preferential direction and material transportation means for housing and transporting semiconductive dielectric material within the applicator device in a direction substantially parallel to the preferential direction.

EP1510106B1, drawing sheet 1
Sheet 1 of 2

Term

Term ended

Expired 28 May 2022, 4.3 years ago.

  1. Priority and filed
  2. Granted
  3. Expired
  4. Today

19 claims: 5 independent, 14 dependent

  1. 1
    Applicator device for applying radio-frequency electromagnetic fields to semiconductive dielectric materials, of the type comprising a plurality of electrodes (12, 13, 14, 15) which are connected, in use, to an electrical generator (10) for generating between them a radio-frequency electromagnetic field comprising electrical and magnetic components arranged in a preferential direction, and material transportation means (32) for housing and transporting semiconductive dielectric material, at least one pair of equipotential electrodes (12, 14) being arranged substantially in alignment in the preferential direction, the transportation means (32) transporting the material, within the applicator device (1), in a direction substantially parallel to the preferential direction, characterized in that each electrode (12, 13, 14, 15) comprises an electrically-conductive plate in which at least one opening (30) is formed, and the transportation means (32) being inserted in the opening (30) in order to extend through the plates in the preferential direction, application means (40) being engaged with at least one of the pairs of electrodes (12, 13, 14, 15) and disposed in the vicinity of the transportation means (32).
  2. 2
    Applicator device according to Claim 1, characterized in that it comprises at least one first pair of electrodes (13, 15) which can be connected electrically to the earth potential in use, at least one second pair of electrodes (12, 14) which can be connected electrically to the electrical generator (10) in use, and connecting elements (16) connected to the second pair of electrodes (12, 14) so as to keep both of the electrodes at the same potential the second pair of electrodes (12, 14) being arranged between the electrodes of the first pair of electrodes (13, 15).
  3. 3
    Applicator device according to Claim 2, characterized in that the application means comprise metal cylinders (40).
  4. 6
    Applicator device according to Claim 5, characterized in that the reinforcing means comprise cylinders made of insulating material (50) disposed between the application means (40).
  5. 7
    Applicator device according to Claim 6, characterized in that it can contain several transportation means (32) connectible to one another in series or in parallel.
  6. 8
    Applicator device according to any one of the preceding claims, characterized in that it further comprises support means (22, 24, 26) for supporting the pairs of electrodes, the support means enabling the relative distance of the electrodes to be varied selectively, in use.
  7. 9
    Industrial apparatus for applying radio-frequency electromagnetic fields to semiconductive materials, of the type comprising a radio-frequency voltage generator (10) and an applicator device (1) for the application of radio-frequency electromagnetic fields to semiconductive dielectric materials, characterized in that the applicator device is defined by any one of the preceding claims.
  8. 10
    industrial apparatus according to Claim 9, characterized in that selectively adjustable phase-modification means are disposed between at least one pair of electrodes (12, 13) for displacing the phase of the electrical potentials of the at least one pair of electrodes relative to one another in use.
  9. 11
    Industrial apparatus according to Claim 9, characterized in that each electrode of the applicator device can be connected to a load-adaptation network constructed by means of passive resistive, inductive, and/or capacitive electrical elements, and disposed between the electrical generator (10) and the applicator device (1).
  10. 12
    Industrial apparatus according to Claim 9, characterized in that the voltage generator can generate a radio-frequency voltage or current with a frequency of between 1 kHz and 1 GHz at its terminals.
  11. 13
    Industrial apparatus according to Claim 9, characterized in that it comprises at least one first pair of electrodes (13, 15) electrically connected to an earth potential, at least one second pair of electrodes (12, 14) electrically connected to the voltage generator (10), and connecting elements (16) connected to the second pair of electrodes (12, 14) in a manner such as to keep both of the electrodes at the same potential, the second pair of electrodes (12, 14) being disposed between the electrodes of the first pair of electrodes (13, 15), each electrode (12, 13, 14, 15) comprising an electrically-conductive plate in which at least one opening (30) is formed, and the transportation means (32) being inserted in the opening (30) in order to extend through the plates in the preferential direction.
  12. 18
    Applicator device according to any of the preceding claims, characterised in that the distance between the upper two electrode plate (12, 13) is greater than the distance between the first electrode plate (12, 14) of each electrode.
  13. 19
    Applicator device according to any of the preceding claims, characterised in that the distance between the lower two electrode plate (14, 15) is greater than the distance between the first electrode plate (12, 14) of each electrode.