EP1469701A3
Raised microstructures
Abstract
A raised micro-structure is disclosed for use in a silicon based device. The raised micro-structure comprises a generally planar film having a ribbed sidewall supporting the film.
Term
Term ended
Projected expiry passed 10 August 2021, 5.1 years ago.
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- Projected expiry
- Today
Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| US4360955A | Cites | United States of America | Y | Search report | 3 |
| US4776019A | Cites | United States of America | A | Search report | 1,6,7 |
| PATENT ABSTRACTS OF JAPAN vol. 2000, no. 09 13 October 2000 (2000-10-13) | Non-patent | – | – | Search report | – |
33 members in 10 offices
Priority claims5
| Document | Office | Kind | Date |
|---|---|---|---|
| 637401 | United States of America | – | |
| 63740100 | United States of America | A | |
| 910110 | United States of America | – | |
| 91011001 | United States of America | A | |
| 01959715 | European Patent Office (EPO) | A |
Members33
| Document | Office | Kind | |
|---|---|---|---|
| WO0215636A2 | World Intellectual Property Organization (WIPO) | A2 | |
| AU8124101A | Australia | A | |
| US2002067663A1 | United States of America | A1 | |
| WO0215636A3 | World Intellectual Property Organization (WIPO) | A3 | |
| US2003016839A1 | United States of America | A1 | |
| US6535460B2 | United States of America | B2 | |
| KR20030033026A | Republic of Korea | A | |
| EP1310136A2 | European Patent Office (EPO) | A2 | |
| JP2004506394A | Japan | A | |
| CN1498513A | China | A | |
| EP1469701A2 | European Patent Office (EPO) | A2 | |
| EP1469701A3This record | European Patent Office (EPO) | A3 | |
| US6987859B2 | United States of America | B2 | |
| EP1310136B1 | European Patent Office (EPO) | B1 | |
| AT321429T | Austria | T | |
| ATE321429T1 | Austria | T1 | |
| KR100571967B1 | Republic of Korea | B1 | |
| DE60118208D1 | Germany | D1 | |
| DK1310136T3 | Denmark | T3 | |
| DE60118208T2 | Germany | T2 | |
| JP2007116721A | Japan | A | |
| EP1469701B1 | European Patent Office (EPO) | B1 | |
| AT392790T | Austria | T | |
| ATE392790T1 | Austria | T1 | |
| DE60133679D1 | Germany | D1 | |
| DK1469701T3 | Denmark | T3 | |
| DE60133679T2 | Germany | T2 | |
| JP2009153203A | Japan | A | |
| JP4338395B2 | Japan | B2 | |
| CN1498513B | China | B | |
| CN101867858A | China | A | |
| CN101867858B | China | B | |
| JP5049312B2 | Japan | B2 |
50 legal events, as 6 offices reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | Office | |
|---|---|---|---|
| Expiry of rightR071 | R071 | DE | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed because of non-payment of the annual feeLapsedMM | MM | NL | |
| Ep patent lapsedLapsedEBP | EBP | DK | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Gb: european patent ceased through non-payment of renewal feeCeasedGBPC | GBPC | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Patent ceasedCeasedPL | PL | CH | |
| No opposition filedOpposition26N | 26N | EP | |
| Fr: translation not filedEN | EN | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA | STAA | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Nl: receipt of corrected translation in the netherlands language at the initiative of the proprietor of the patentNLR4 | NLR4 | EP | |
| Ep patent with danish claimsT3 | T3 | DK | |
| Corresponds to:REF | REF | EP | |
| European patents granted designating irelandGrantedFG4D | FG4D | IE | |
| European patent takes effect as a national patent in ch/liEP | EP | CH | |
| Divisional application: reference to earlier applicationAC | AC | EP | |
| Designated contracting statesAK | AK | EP | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| Grant fee paidORIGINAL CODE: EPIDOSNIGR3GRAS | GRAS | EP | |
| Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOSNIGR1GRAP | GRAP | EP | |
| First examination report despatched17Q | 17Q | EP | |
| Designation fees paidAKX | AKX | EP | |
| Designated contracting statesAK | AK | EP | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | EP | |
| Request for examination filed17P | 17P | EP | |
| Divisional application: reference to earlier applicationAC | AC | EP | |
| Designated contracting statesAK | AK | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 1469701
- Application
- 40760159
Titles3
- German
- Erhobene Mikrostrukturen
- English
- Raised microstructures
- French
- Microstructures en relief
Classification
- CPC, 4
- H04R19/005
- H04R19/04
- H04R31/00
- H04R31/006
- IPC, 5
- B06B1 04
- H04R19 04
- H04R19 00
- H04R31 00
- H10D48 50
Designated states1
- Contracting states, 1
- Türkiye