System and method of manufacturing semicustom integrated circuits using reticle primitives and interconnect reticles

A system for, and method of, manufacturing an integrated circuit (IC) and an IC manufactured by the method. In one embodiment, the system includes: (1) a library of reticle primitives, at least two of the reticle primitives containing patterns corresponding to circuit modules to be contained in the IC, (2) an interconnect reticle containing patterns corresponding to interconnecting conductors for electrically coupling the circuit modules and (3) lithographic equipment that employs the at least two of the recticle primitives and the interconnect reticle to create a lithograph of the circuit modules and the interconnecting conductors.