EP0904422A4
Reduction of scatter in thick sputtered coatings
Abstract
This record has no abstract on file.
Term
Term ended
Projected expiry passed 12 March 2017, 9.5 years ago.
- Priority
- Filed
- Published
- Projected expiry
- Today
Every citation, both ways
| Document | Relation | Office | Category | Cited during | Relevant claims |
|---|---|---|---|---|---|
| US5114556A | Cites | United States of America | Y | Search report | 1-6,10-14 |
| US5441615A | Cites | United States of America | A | Search report | 1-18 |
| WO9217621A1 | Cites | World Intellectual Property Organization (WIPO) | Y | Search report | 1-6,10-14 |
| WO9217621A | Cites | World Intellectual Property Organization (WIPO) | – | – | – |
| PATENT ABSTRACTS OF JAPAN vol. 004, no. 129 (C - 024) 10 September 1980 (1980-09-10) | Non-patent | – | – | Search report | – |
| PATENT ABSTRACTS OF JAPAN vol. 010, no. 117 (E - 400) 2 May 1986 (1986-05-02) | Non-patent | – | – | Search report | – |
5 members in 4 offices
Priority claims3
| Document | Office | Kind | Date |
|---|---|---|---|
| 19960617678 | United States of America | – | |
| 61767896 | United States of America | A | |
| 9704216 | United States of America | W |
Members5
| Document | Office | Kind | |
|---|---|---|---|
| US5670030A | United States of America | A | |
| WO9735042A1 | World Intellectual Property Organization (WIPO) | A1 | |
| EP0904422A1 | European Patent Office (EPO) | A1 | |
| JP2000507000A | Japan | A | |
| EP0904422A4This record | European Patent Office (EPO) | A4 |
15 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Information on inventor provided before grant (corrected)RIN1 | RIN1 | |
| Information on inventor provided before grant (corrected)RIN1 | RIN1 | |
| Information on inventor provided before grant (corrected)RIN1 | RIN1 | |
| Information on inventor provided before grant (corrected)RIN1 | RIN1 | |
| Application deemed to be withdrawnWithdrawn18D | 18D | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA | STAA | |
| Supplementary search report drawn up and despatchedA4 | A4 | |
| Designated contracting statesAK | AK | |
| Information on inventor provided before grant (corrected)RIN1 | RIN1 | |
| Information on inventor provided before grant (corrected)RIN1 | RIN1 | |
| Information on inventor provided before grant (corrected)RIN1 | RIN1 | |
| Information on inventor provided before grant (corrected)RIN1 | RIN1 | |
| Request for examination filed17P | 17P | |
| Designated contracting statesAK | AK | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI |
Numbers
- Publication
- 0904422
- Application
- 979160250
Titles3
- English
- REDUCTION OF SCATTER IN THICK SPUTTERED COATINGS
- French
- REDUCTION DE LA DISPERSION DANS DES REVETEMENTS EPAIS DEPOSES PAR PULVERISATION
- German
- REDUZIERUNG DER STREUUNG IN DICK GESPUTTERTEN BESCHICHTUNGEN
Classification
- CPC, 4
- C23C14/225
- C23C14/0078
- C23C14/044
- C23C14/34
- IPC, 5
- C23C14 00
- C23C14 04
- G02B5 28
- C23C14 22
- C23C14 34
Designated states18
- Contracting states, 18
- Austria
- Belgium
- Switzerland
- Germany
- Denmark
- Spain
- Finland
- France
- United Kingdom
- Greece
- Ireland
- Italy
- Liechtenstein
- Luxembourg
- Monaco
- Netherlands (Kingdom of the)
- Portugal
- Sweden