EP0877293A3

Positive photosensitive composition

Abstract

Disclosed is a positive photosensitive composition capable of giving good sensitivity, resolution and resist pattern and exhibiting sufficiently high dry etching resistance on use of an exposure light source of 250 nm or less, particularly 220 nm or less, which composition comprises (A) a compound generating an acid on irradiation of an active light ray or radiation and (B) a resin having (i) at least one polycyclic-type alicyclic group, (ii) at least one ester group which decomposes by the action of an acid and increases the solubility in an alkali developer and (iii) at least one acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer, or comprises (A) a compound generating an acid on irradiation of an active light ray or radiation, (C) a resin having a polycyclic-type alicyclic group and an ester group which decomposes by the action of an acid and increases the solubility in an alkali developer, and (D) a resin having a polycyclic-type alicyclic group and an acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer.

Term

Term ended

Projected expiry passed 8 May 2018, 8.4 years ago.

Every citation, both waysCites: the store holds 10 of 11

Citations
Document	Relation	Office	Category	Cited during	Relevant claims
EP0663616A2	Cites	European Patent Office (EPO)	X	Search report	1-3,5-9,12
EP0689098A1	Cites	European Patent Office (EPO)	A	Search report	1-12
EP0849634A1	Cites	European Patent Office (EPO)	E	Search report	1-3,5-9,12
EP0856773A1	Cites	European Patent Office (EPO)	E	Search report	1-3,5-9,12
DE19525221A1	Cites	Germany	X	Search report	1-3,5-9,11,12
DE19626003A1	Cites	Germany	X	Search report	1-3,5-9,12
US5252427A	Cites	United States of America	A	Search report	1-12
US5585222A	Cites	United States of America	X	Search report	1-3,5-9,12
US5621019A	Cites	United States of America	X	Search report	1-3,5-9,12
WO9733198A1	Cites	World Intellectual Property Organization (WIPO)	XP	Search report	1-3,5-9,12
PATENT ABSTRACTS OF JAPAN vol. 18, no. 36 (P - 1678) 19 January 1994 (1994-01-19)	Non-patent	–	–	Search report	–

12 members in 5 offices

This recordMember, by publication datePriority claim

Priority claims6

Priority claims
Document	Office	Kind	Date
11977297	Japan	–	1997-05-09
11977297	Japan	A	1997-05-09
11977397	Japan	–	1997-05-09
11977397	Japan	A	1997-05-09
JP19970119772	–	–	–
JP19970119773	–	–	–

Members12

Family members, oldest first
Document	Office	Kind
EP0877293A2	European Patent Office (EPO)	A2	1998-11-11
JPH10307397A	Japan	A	1998-11-17
JPH10307398A	Japan	A	1998-11-17
KR19980086901A	Republic of Korea	A	1998-12-05
EP0877293A3This record	European Patent Office (EPO)	A3	1999-06-23
US6479209B1	United States of America	B1	2002-11-12
EP0877293B1	European Patent Office (EPO)	B1	2004-01-14
DE69821049D1	Germany	D1	2004-02-19
DE69821049T2	Germany	T2	2004-10-21
JP3731776B2	Japan	B2	2006-01-05
KR100516702B1	Republic of Korea	B1	2006-01-27
JP3755690B2	Japan	B2	2006-03-15

28 legal events, as 3 offices reported them to INPADOC

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Events

Legal events, newest first
	Event	Code	Office
2017-04-28	Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25	PG25	EP
2016-12-01	Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal feeWithdrawnR119	R119	DE
2016-08-31	Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25	PG25	EP
2015-08-31	Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP	PGFP	EP
2015-07-31	Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP	PGFP	EP
2014-02-02	Change of representativeR082	R082	DE
2014-01-30	Change of representativeR082	R082	DE
2014-01-30	Change of representativeR082	R082	DE
2005-01-05	No opposition filedOpposition26N	26N	EP
2004-12-29	Gb: european patent ceased through non-payment of renewal feeCeasedGBPC	GBPC	EP
2004-11-19	No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE	PLBE	EP
2004-11-19	Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA	STAA	EP
2004-05-08	Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25	PG25	EP
2004-02-19	Corresponds to:REF	REF	EP
2004-01-14	Designated contracting statesAK	AK	EP
2004-01-14	European patent grantedGrantedFG4D	FG4D	GB
2003-11-28	(expected) grantORIGINAL CODE: 0009210GRAA	GRAA	EP
2003-09-24	Grant fee paidORIGINAL CODE: EPIDOSNIGR3GRAS	GRAS	EP
2003-05-27	Despatch of communication of intention to grant a patentORIGINAL CODE: EPIDOS IGRAGRAH	GRAH	EP
2000-09-13	First examination report despatched17Q	17Q	EP
2000-03-01	Designation fees paidBE DE GBAKX	AKX	EP
1999-10-20	Request for examination filed17P	17P	EP
1999-06-23	Designated contracting statesAK	AK	EP
1999-06-23	Request for extension of the european patentAL;LT;LV;MK;RO;SIAX	AX	EP
1999-05-07	Search report despatchedORIGINAL CODE: 0009013PUAL	PUAL	EP
1998-11-11	Designated contracting statesAK	AK	EP
1998-11-11	Request for extension of the european patentAL;LT;LV;MK;RO;SIAX	AX	EP
1998-09-25	Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI	PUAI	EP

Positive photosensitive composition

Abstract

Term

Priority claims6

Members12

Over the term

Events

Numbers

Titles3

Classification

Designated states2