EP0808915A3

Chemical vapor deposition and sputtering method and apparatus

Abstract

This record has no abstract on file.

Term

Term ended

Projected expiry passed 21 May 2017, 9.3 years ago.

Every citation, both waysCites: the store holds 3 of 4

Citations
Document	Relation	Office	Category	Cited during	Relevant claims
EP0566040A2	Cites	European Patent Office (EPO)	Y	Search report	3,4
EP0634498A1	Cites	European Patent Office (EPO)	Y	Search report	17
US5322605A	Cites	United States of America	X	Search report	13-15
PATENT ABSTRACTS OF JAPAN vol. 017, no. 463 (E - 1420) 24 August 1993 (1993-08-24)	Non-patent	–	–	Search report	–
PATENT ABSTRACTS OF JAPAN vol. 095, no. 008 29 September 1995 (1995-09-29)	Non-patent	–	–	Search report	–

3 priority claims, no other members on record

This recordMember, by publication datePriority claim

Priority claims3

Priority claims
Document	Office	Kind	Date
65286096	United States of America	A	1996-05-23
65286096	United States of America	A	1996-05-23
US19960652860	–	–	–

6 legal events, as the office reported them to INPADOC

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Events

Legal events, newest first
	Event	Code
1999-12-08	Application deemed to be withdrawnWithdrawn18D	18D
1999-10-22	Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWNSTAA	STAA
1998-08-05	Designated contracting statesAK	AK
1998-06-19	Search report despatchedORIGINAL CODE: 0009013PUAL	PUAL
1997-11-26	Designated contracting statesAK	AK
1997-10-10	Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI	PUAI