Nova Patents
EP0807811A2

Spectrophotometric analysis

Abstract

Apparatus for spectrophotometric analysis of a material P in a container 16 by reflectance of a beam 4 applied to the material through aperture 11 in a primary mask 9. A restricted beam 12 resulting from the mask 9 is applied through a port 13 in an opaque secondary mask 10 to the material P. The beam 12 is wholly within the port 13 and radiation reflected from the material P passes through the port 13 to detectors 7 for analysis. The mask 10 defines by its port 13 an area on the base 17 of the container through which the beam 12 is applied to the material P and is not subjected to spurious reflections and refractions otherwise created by the container 16 between its base 17 and side wall 18. The container 16 may be spaced from the mask 10 and inclined relative thereto so that the mask 10 shields the top and bottom ends of the container 16. The invention also includes a conversion kit with masks 9 and 10 for fitting to existing spectrophotometers and an apparatus by which an array of containers 16 can be fed successively and automatically to overlie port 13 for analysis and thereafter removed.

EP0807811A2, drawing sheet 1
Sheet 1 of 8

Term

Term ended

Projected expiry passed 17 April 2017, 9.4 years ago.

  1. Priority
  2. Filed
  3. Published
  4. Projected expiry
  5. Today

29 claims: 16 independent, 13 dependent

  1. 1
    Apparatus for spectrophotometric analysis of a material by reflectance measurements resulting from a beam of electromagnetic radiation applied to the material which comprises a station at which a container housing the material is to be located, a primary mask having an aperture through which the beam is to be directed to the station and which aperture forms a restriction to provide a beam of predetermined cross section, and a secondary mask which is substantially non-reflective to the electromagnetic radiation and is interposed between the primary mask and the station, said secondary mask having a port through which the restricted beam is to be directed to the station, the primary mask and secondary mask being arranged so that the restricted beam is accommodated substantially wholly within the port for its application to the material and wherein reflected electromagnetic radiation from the material subjected to the restricted beam is detected for analysis measurement from such reflected radiation passing through the port of the secondary mask.
  2. 4
    Apparatus as claimed in any one of the preceding claims in which the aperture of the primary mask restricts the beam cross section to an area less than that of the port and said restricted beam is accommodated wholly within the port substantially centrally thereof.
  3. 5
    Apparatus as claimed in any one of the preceding claims in which the port of the secondary mask is substantially circular.
  4. 6
    Apparatus as claimed in any one of the preceding claims in which the aperture of the primary mask provides a restricted beam of substantially rectangular cross section.
  5. 7
    Apparatus as claimed in any one of the preceding claims in which a sheet window is disposed between the primary mask and the secondary mask and said restricted beam is directed through the window to the port and said reflected radiation is directed from the port through the window for detection and analysis.
  6. 8
    Apparatus as claimed in any one of the preceding claims in combination with a container within which the material for analysis is accommodated.
  7. 13
    Apparatus as claimed in any one of claims 8 to 12 in which the container is a vial having a substantially circular flat base and a substantially cylindrical side wall extending concentrically from said base and said restricted beam and reflected electromagnetic radiation are directed to and from the material in the vial through the flat base.
  8. 16
    Apparatus as claimed in any one of claims 13 to 15 in which the vial has a base diameter not greater than 20 millimetres and a wall thickness not greater than 2 millimetres.
  9. 17
    Apparatus as claimed in any one of claims 13 to 16 when appendant to claim 5 in which the circular base of the vial is substantially concentric with the port of the secondary mask.
  10. 18
    Apparatus as claimed in any one of the preceding claims in which the restricted beam is directed substantially vertically.
  11. 19
    Apparatus as claimed in any one of the preceding claims when appendant to claims 2 and 8 in which the container is for liquid material and is elongated and retained by said seating so that its axis over its elongated extent is other than horizontal for displacing to an end of the container any gas bubble which may be present in the material so that such gas bubble is clear of the part of the material that is subjected to the restricted beam through the port.
  12. 21
    Apparatus as claimed in any one of the preceding claims in which a surface reflective to the electromagnetic radiation is provided at said station, said surface being located so that the container can be disposed between it and the port for the restricted beam from the port, if passing through the container and material therein, to be reflected by the surface back towards the port.
  13. 22
    Apparatus as claimed in any one of the preceding claims in which the station is enclosed by a removable opaque cover which is substantially non-reflective to the electromagnetic radiation.
  14. 23
    Apparatus as claimed in any one of the preceding claims and comprising means for carrying an array of containers and feeding each container successively to locate it at said station for spectrophotometric measurements and removing the respective container from the station following said measurement.
  15. 27
    Apparatus as claimed in any one of claims 23 to 26 and comprising an opaque cover enclosing the station together with the means for carrying the array of containers and containers when carried thereby.
  16. 29
    A conversion kit for a spectrophotometer providing analysis of a material by reflectance measurements resulting from a beam of electromagnetic radiation applied to the material through a translucent sheet window thereof and which kit comprises a primary mask having an aperture and which is to be fitted to the spectrophotometer for said aperture to restrict the beam directed through the window to a predetermined cross section;a secondary mask which is substantially non-reflective to the electromagnetic radiation and having a port and which secondary mask is to be fitted to the spectrophotometer on the side of the window remote from the mask for the restricted beam passing through the window to be directed substantially wholly within the port, and means for locating a container housing the material on the side of said secondary mask remote from the window for said restricted beam passing through the port to be applied to the material in the container and for reflected electromagnetic radiation from the material which is subjected to the restricted beam to be directed through the port and window for analysis measurement.
Independent claims16