EP0643293A1

Pattern defect inspection method and apparatus.

Abstract

The pattern edge direction in reference image data of an object to be examined is detected, the reference image data is differentiated using a differential operator in a direction along the pattern edge direction, and inspection image data obtained by picking up an image of the object to be inspected is differentiated using the differential operator in the direction along the pattern edge direction. The differential data obtained by the differential processing are compared with the inspection image data, and a pattern defect on the object to be inspected is detected based on the difference between these data.

EP0643293A1, drawing sheet 1
Sheet 1 of 16

Term

Term ended

Projected expiry passed 24 August 2014, 12.1 years ago.

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12 claims: 2 independent, 10 dependent

  1. 1
    A pattern defect inspection method characterized by comprising:the first step of detecting a pattern edge direction in reference image data used for detecting a pattern defect of an object to be inspected;the second step of executing differential processing of the reference image data using a differential operator in a direction along the detected pattern edge direction, and executing differential processing of inspection image data obtained by picking up an image of the object to be inspected using a differential operator in the direction along the detected pattern edge direction;and    the third step of comparing differential data obtained by the differential processing in the second step with the inspection image data and detecting a pattern defect on the object to be inspected on the basis of a difference between the said data.
  2. 2
    A pattern defect inspection apparatus characterized by comprising:image pickup means (40, 41) for picking up an image of an object to be inspected to generate inspection image data;reference image generation beans (45) for generating reference image data for comparing with the inspecting pattern on the object;edge direction detection means (46) for detecting a pattern edge direction in the reference image data;first edge direction differential means (47) for executing differential processing of the inspection image data using a differential operator in a direction along the pattern edge direction;second edge direction differential means (48) for executing differential processing of the reference image data using the differential operator in the direction along the pattern edge direction;differential processing means (50) for executing differential processing of surrounding pixels in the reference image data using the differential operator in the direction along the pattern edge direction, and executing differential processing of the reference image data using differential operators in directions neighboring the pattern edge direction;and    discrimination means (56, 57) for detecting a pattern defect of the object to be inspected on the basis of a difference between difference data obtained by said first edge direction differential means, and differential data obtained by said second edge direction differential means or at least one of differential data obtained by said differential processing means.