EP0484665A3
Pattern shift measuring method
Abstract
A method of measuring pattern shift on a diffused semiconductor wafer after an epitaxial process comprising: measuring a ratio between the line width of a linear pattern vertical to an orientation flat and line width of a linear pattern parallel to the orientation flat to determine the shift between these patterns.
Term
Term ended
Projected expiry passed 23 September 2011, 15 years ago.
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- Projected expiry
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1 sheet
Sheet 1
Every citation, both ways
| Document | Relation | Office | Category | Cited during |
|---|---|---|---|---|
| EP0013729A1 | Cites | European Patent Office (EPO) | A | Search report |
| EP0316624A2 | Cites | European Patent Office (EPO) | A | Search report |
| EP0352004A2 | Cites | European Patent Office (EPO) | A | Search report |
| GB2147411A | Cites | United Kingdom | A | Search report |
| US4363962A | Cites | United States of America | A | Search report |
4 priority claims, no other members on record
Priority claims4
| Document | Office | Kind | Date |
|---|---|---|---|
| 29697790 | Japan | – | |
| 29697790 | Japan | A | |
| 29697790 | Japan | A | |
| JP19900296977 | – | – | – |
22 legal events, as 2 offices reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | Office | |
|---|---|---|---|
| Notification of lapseLapsedST | ST | FR | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Gb: european patent ceased through non-payment of renewal feeCeasedGBPC | GBPC | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| No opposition filedOpposition26N | 26N | EP | |
| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: NO OPPOSITION FILED WITHIN TIME LIMITSTAA | STAA | EP | |
| Fr: translation filedET | ET | EP | |
| Corresponds to:REF | REF | EP | |
| Designated contracting statesAK | AK | EP | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| First examination report despatched17Q | 17Q | EP | |
| Request for examination filed17P | 17P | EP | |
| Designated contracting statesAK | AK | EP | |
| Main classification (correction)RHK1 | RHK1 | EP | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | EP | |
| Designated contracting statesAK | AK | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 0484665
- Publication, DOCDB
- 0484665
- Publication, EPODOC
- EP0484665
- Application
- 116143
- Application, DOCDB
- 91116143
- Application, EPODOC
- EP19910116143
Titles3
- German
- Musterverschiebungsmessmethode
- English
- Pattern shift measuring method
- French
- Méthode de mesure du décalage du specimen
Classification
- CPC, 2
- G06T7/70
- G06T2207/30148
- IPC, 7
- G01B11 00
- G01B21 00
- G01N21 88
- G03F9 00
- G06T1 00
- G06T7 00
- H01L21 66
Designated states1
- Contracting states, 1
- United Kingdom