Laser deposition method and apparatus, and product thereof

A metal target and a substrate are placed, in confronting relation, in a vacuum chamber whose inte­rior is kept in a high vacuum state, and laser light is irradiated to the surface of the target to emit a high-speed evaporation material from the target. The emitted material is then deposited on the substrate. The composition of this deposited film on the sub­strate is controlled by providing a direction selec­ting means and a speed selection means between the target and the substrate, or by applying a predetermined high voltage between the target and the substrate. Particularly, the application of the high voltage increases the cooling speed and impact energy of the evaporated material on the substrate to form an amorphous metal film.